Electron beam exit window in electron beam emitter and method for forming the same
    1.
    发明授权
    Electron beam exit window in electron beam emitter and method for forming the same 有权
    电子束发射器中的电子束出射窗及其形成方法

    公开(公告)号:US08766523B2

    公开(公告)日:2014-07-01

    申请号:US13618682

    申请日:2012-09-14

    IPC分类号: H01J33/04

    摘要: An exit window can include an exit window foil, and a support grid contacting and supporting the exit window foil. The support grid can have first and second grids, each having respective first and second grid portions that are positioned in an alignment and thermally isolated from each other. The first and second grid portions can each have a series of apertures that are aligned for allowing the passage of a beam therethrough to reach and pass through the exit window foil. The second grid portion can contact the exit window foil. The first grid portion can mask the second grid portion and the exit window foil from heat caused by the beam striking the first grid portion.

    摘要翻译: 出口窗口可以包括出口窗口箔片和支撑出口窗口箔片的支撑格栅。 支撑格栅可以具有第一和第二格栅,每个栅格具有相互对准的第一和第二格栅部分,并且彼此热隔离。 第一和第二格栅部分可以各自具有一系列孔,其被对准以允许梁通过其到达并通过出射窗箔。 第二格栅部分可以接触出口窗箔。 第一格栅部分可以掩蔽第二格栅部分和出射窗箔,以防止由射束撞击第一格栅部分引起的热量。

    EMITTER EXIT WINDOW
    3.
    发明申请
    EMITTER EXIT WINDOW 有权
    发动机出口窗口

    公开(公告)号:US20130009077A1

    公开(公告)日:2013-01-10

    申请号:US13618682

    申请日:2012-09-14

    IPC分类号: G21K1/00 B32B37/14

    摘要: An exit window can include an exit window foil, and a support grid contacting and supporting the exit window foil. The support grid can have first and second grids, each having respective first and second grid portions that are positioned in an alignment and thermally isolated from each other. The first and second grid portions can each have a series of apertures that are aligned for allowing the passage of a beam therethrough to reach and pass through the exit window foil. The second grid portion can contact the exit window foil. The first grid portion can mask the second grid portion and the exit window foil from heat caused by the beam striking the first grid portion.

    摘要翻译: 出口窗口可以包括出口窗口箔片和支撑出口窗口箔片的支撑格栅。 支撑格栅可以具有第一和第二格栅,每个栅格具有相互对准的第一和第二格栅部分,并且彼此热隔离。 第一和第二格栅部分可以各自具有一系列孔,其被对准以允许梁通过其到达并通过出射窗箔。 第二格栅部分可以接触出口窗箔。 第一格栅部分可以掩蔽第二格栅部分和出射窗箔,以防止由射束撞击第一格栅部分引起的热量。

    Methods and apparatuses for reducing heat on an emitter exit window
    4.
    发明授权
    Methods and apparatuses for reducing heat on an emitter exit window 有权
    用于减少发射器出口窗口的热量的方法和装置

    公开(公告)号:US08339024B2

    公开(公告)日:2012-12-25

    申请号:US12837914

    申请日:2010-07-16

    IPC分类号: H01J33/04

    摘要: An exit window can include an exit window foil, and a support grid contacting and supporting the exit window foil. The support grid can have first and second grids, each having respective first and second grid portions that are positioned in an alignment and thermally isolated from each other. The first and second grid portions can each have a series of apertures that are aligned for allowing the passage of a beam therethrough to reach and pass through the exit window foil. The second grid portion can contact the exit window foil. The first grid portion can mask the second grid portion and the exit window foil from heat caused by the beam striking the first grid portion.

    摘要翻译: 出口窗口可以包括出口窗口箔片和支撑出口窗口箔片的支撑格栅。 支撑格栅可以具有第一和第二格栅,每个栅格具有相互对准的第一和第二格栅部分,并且彼此热隔离。 第一和第二格栅部分可以各自具有一系列孔,其被对准以允许梁通过其到达并通过出射窗箔。 第二格栅部分可以接触出口窗箔。 第一格栅部分可以掩蔽第二格栅部分和出射窗箔,以防止由射束撞击第一格栅部分引起的热量。

    Emitter Exit Window
    5.
    发明申请
    Emitter Exit Window 有权
    发射器退出窗口

    公开(公告)号:US20110012495A1

    公开(公告)日:2011-01-20

    申请号:US12837914

    申请日:2010-07-16

    IPC分类号: H01J61/52 H01J33/04

    摘要: An exit window can include an exit window foil, and a support grid contacting and supporting the exit window foil. The support grid can have first and second grids, each having respective first and second grid portions that are positioned in an alignment and thermally isolated from each other. The first and second grid portions can each have a series of apertures that are aligned for allowing the passage of a beam therethrough to reach and pass through the exit window foil. The second grid portion can contact the exit window foil. The first grid portion can mask the second grid portion and the exit window foil from heat caused by the beam striking the first grid portion.

    摘要翻译: 出口窗口可以包括出口窗口箔片和支撑出口窗口箔片的支撑格栅。 支撑格栅可以具有第一和第二格栅,每个栅格具有相互对准的第一和第二格栅部分,并且彼此热隔离。 第一和第二格栅部分可以各自具有一系列孔,其被对准以允许梁通过其到达并通过出射窗箔。 第二格栅部分可以接触出口窗箔。 第一格栅部分可以掩蔽第二格栅部分和出射窗箔,以防止由射束撞击第一格栅部分引起的热量。

    Patterned assembly for manufacturing a solar cell and a method thereof
    6.
    发明授权
    Patterned assembly for manufacturing a solar cell and a method thereof 有权
    用于制造太阳能电池的图案化组件及其方法

    公开(公告)号:US07820460B2

    公开(公告)日:2010-10-26

    申请号:US12205514

    申请日:2008-09-05

    IPC分类号: H01L21/00 H01L31/00 C23C16/00

    摘要: Apparatuses and methods for manufacturing a solar cell are disclosed. In a particular embodiment, the solar cell may be manufactured by disposing a solar cell in a chamber having a particle source; disposing a patterned assembly comprising an aperture and an assembly segment between the particle source and the solar cell; and selectively implanting first type dopants traveling through the aperture into a first region of the solar cell while minimizing introduction of the first type dopants into a region outside of the first region.

    摘要翻译: 公开了用于制造太阳能电池的装置和方法。 在特定实施例中,太阳能电池可以通过在具有粒子源的室中设置太阳能电池来制造; 布置图案化组件,其包括孔和在所述颗粒源和所述太阳能电池之间的组件段; 以及将穿过所述孔的第一类型掺杂剂选择性地注入到所述太阳能电池的第一区域中,同时最小化将所述第一类型掺杂剂引入所述​​第一区域外的区域。

    Techniques for detecting wafer charging in a plasma processing system
    7.
    发明授权
    Techniques for detecting wafer charging in a plasma processing system 有权
    用于在等离子体处理系统中检测晶片充电的技术

    公开(公告)号:US07675730B2

    公开(公告)日:2010-03-09

    申请号:US11767730

    申请日:2007-06-25

    IPC分类号: H01L23/00

    CPC分类号: H01J37/3299 H01J37/32935

    摘要: Techniques for detecting wafer charging in a plasma processing system are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for detecting wafer charging in a plasma processing system. The apparatus may comprise a plasma chamber to produce a plasma discharge above a wafer in the plasma chamber. The apparatus may also comprise a biasing circuit to bias the wafer to draw ions from the plasma discharge towards the wafer. The apparatus may further comprise a detection mechanism to detect charge buildup on the wafer by measuring an electric field in one or more designated locations near a top surface of the wafer.

    摘要翻译: 公开了一种在等离子体处理系统中检测晶片充电的技术。 在一个特定的示例性实施例中,这些技术可以被实现为用于在等离子体处理系统中检测晶片充电的装置。 该装置可以包括等离子体室,以在等离子体室中的晶片之上产生等离子体放电。 该装置还可以包括偏置电路,用于偏置晶片以从离子放电中向离子晶片提取离子。 该装置还可以包括检测机构,以通过测量在晶片顶表面附近的一个或多个指定位置的电场来检测晶片上的电荷积累。

    PATTERNED ASSEMBLY FOR MANUFACTURING A SOLAR CELL AND A METHOD THEREOF
    8.
    发明申请
    PATTERNED ASSEMBLY FOR MANUFACTURING A SOLAR CELL AND A METHOD THEREOF 有权
    用于制造太阳能电池的图案组件及其方法

    公开(公告)号:US20100041176A1

    公开(公告)日:2010-02-18

    申请号:US12603707

    申请日:2009-10-22

    IPC分类号: H01L31/0232 H01L31/02

    摘要: Apparatuses and methods for manufacturing a solar cell are disclosed. In a particular embodiment, the solar cell may be manufactured by disposing a solar cell in a chamber having a particle source; disposing a patterned assembly comprising an aperture and an assembly segment between the particle source and the solar cell; and selectively implanting first type dopants traveling through the aperture into a first region of the solar cell while minimizing introduction of the first type dopants into a region outside of the first region.

    摘要翻译: 公开了用于制造太阳能电池的装置和方法。 在特定实施例中,太阳能电池可以通过在具有粒子源的室中设置太阳能电池来制造; 布置图案化组件,其包括孔和在所述颗粒源和所述太阳能电池之间的组件段; 以及将穿过所述孔的第一类型掺杂剂选择性地注入到所述太阳能电池的第一区域中,同时最小化将所述第一类型掺杂剂引入所述​​第一区域外的区域。

    Local pressure sensing in a plasma processing system
    9.
    发明授权
    Local pressure sensing in a plasma processing system 失效
    等离子体处理系统中的局部压力感测

    公开(公告)号:US07638781B2

    公开(公告)日:2009-12-29

    申请号:US11860333

    申请日:2007-10-22

    IPC分类号: A61N5/00

    摘要: A plasma processing system includes a process chamber, a source configured to generate a plasma in the process chamber, a platen configured to support a workpiece in the process chamber, and a pressure sensor positioned adjacent to the workpiece. The pressure sensor is configured to monitor a local pressure adjacent to the workpiece. A method includes generating a plasma in a process chamber, supporting a workpiece in the process chamber, and monitoring a local pressure adjacent to the workpiece with a pressure sensor positioned adjacent to the workpiece.

    摘要翻译: 等离子体处理系统包括处理室,被配置为在处理室中产生等离子体的源,被配置为支撑处理室中的工件的压板和邻近工件定位的压力传感器。 压力传感器被配置为监测邻近工件的局部压力。 一种方法包括在处理室中产生等离子体,在处理室中支撑工件,并用邻近工件定位的压力传感器监测与工件相邻的局部压力。

    LOCAL PRESSURE SENSING IN A PLASMA PROCESSING SYSTEM
    10.
    发明申请
    LOCAL PRESSURE SENSING IN A PLASMA PROCESSING SYSTEM 失效
    等离子体处理系统中的局部压力感测

    公开(公告)号:US20090101848A1

    公开(公告)日:2009-04-23

    申请号:US11860333

    申请日:2007-10-22

    IPC分类号: G21K5/00

    摘要: A plasma processing system includes a process chamber, a source configured to generate a plasma in the process chamber, a platen configured to support a workpiece in the process chamber, and a pressure sensor positioned adjacent to the workpiece. The pressure sensor is configured to monitor a local pressure adjacent to the workpiece. A method includes generating a plasma in a process chamber, supporting a workpiece in the process chamber, and monitoring a local pressure adjacent to the workpiece with a pressure sensor positioned adjacent to the workpiece.

    摘要翻译: 等离子体处理系统包括处理室,被配置为在处理室中产生等离子体的源,被配置为支撑处理室中的工件的压板和邻近工件定位的压力传感器。 压力传感器被配置为监测邻近工件的局部压力。 一种方法包括在处理室中产生等离子体,在处理室中支撑工件,并用邻近工件定位的压力传感器监测与工件相邻的局部压力。