Liquid crystal display and method of manufacturing the same
    1.
    发明授权
    Liquid crystal display and method of manufacturing the same 有权
    液晶显示器及其制造方法

    公开(公告)号:US08379176B2

    公开(公告)日:2013-02-19

    申请号:US13086072

    申请日:2011-04-13

    IPC分类号: G02F1/1343

    摘要: A liquid crystal display includes a first substrate including a pixel area, a second substrate facing the first substrate, a liquid crystal layer interposed between the first substrate and the second substrate, and including liquid crystal molecules, a first electrode, a second electrode including a minute slit pattern, disposed on the first substrate and an insulating layer disposed between the first electrode and the second electrode, and a third electrode disposed on the second substrate. The pixel area includes a first region having a double-electrode structure wherein the first electrode and the second electrode overlap, and a second region having a single electrode structure including the second electrode.

    摘要翻译: 液晶显示器包括:第一基板,包括像素区域;第二基板;面对第一基板的第二基板;插入在第一基板和第二基板之间的液晶层,并且包括液晶分子;第一电极;第二电极; 设置在第一基板上的绝缘层和设置在第一电极和第二电极之间的绝缘层,以及设置在第二基板上的第三电极。 像素区域包括具有双电极结构的第一区域,其中第一电极和第二电极重叠,第二区域具有包括第二电极的单个电极结构。

    Exposure apparatus for photoalignment process and method for manufacturing liquid crystal display
    9.
    发明授权
    Exposure apparatus for photoalignment process and method for manufacturing liquid crystal display 有权
    用于光对准工艺的曝光装置和用于制造液晶显示器的方法

    公开(公告)号:US08796645B2

    公开(公告)日:2014-08-05

    申请号:US13241376

    申请日:2011-09-23

    IPC分类号: G01N23/00 G03F1/00

    CPC分类号: G03F1/00 G02F1/133788

    摘要: An exposure apparatus for a photoalignment process includes; a first photomask including a plurality of transmission parts; and a second photomask including a plurality of transmission parts, where the first photomask and the second photomask partially overlap each other such that each of the first photomask and the second photomask includes an overlapping region and a non-overlapping region, the overlapping region of at least one of the first photomask and the overlapping region of the second photomask includes at least two subregions, and shapes or arrangements of the transmission parts in the at least two subregions are different from each other.

    摘要翻译: 一种用于光取向处理的曝光装置包括: 第一光掩模,包括多个透射部分; 以及包括多个透射部分的第二光掩模,其中所述第一光掩模和所述第二光掩模部分地彼此重叠,使得所述第一光掩模和所述第二光掩模中的每一个包括重叠区域和不重叠区域,所述重叠区域处于 第一光掩模和第二光掩模的重叠区域中的至少一个包括至少两个子区域,并且至少两个子区域中的透射部件的形状或布置彼此不同。

    Exposure device, photo-mask, and method for manufacturing liquid crystal display
    10.
    发明授权
    Exposure device, photo-mask, and method for manufacturing liquid crystal display 有权
    曝光装置,光掩模和液晶显示器的制造方法

    公开(公告)号:US09075323B2

    公开(公告)日:2015-07-07

    申请号:US13285789

    申请日:2011-10-31

    IPC分类号: G03F7/20

    摘要: The present invention is directed to an exposure apparatus and photo-mask, and method for manufacturing liquid crystal display using the same. An exposure apparatus according to an exemplary embodiment of the present invention provides an exposure apparatus which includes: a first photo-mask comprising a plurality of transmission parts; and a second photo-mask comprising a plurality of transmission parts, the first photo-mask and the second photo-mask comprising an overlapping region where the first photo-mask and the second photo-mask are partially overlapped, wherein at least one transmission part included in at least one of the first photo-mask and the second photo-mask in the overlapping region comprises a semi-transmission section, and a transmittance of the semi-transmission section is greater than or equal to 0% and less than 100%.

    摘要翻译: 本发明涉及一种曝光装置和光掩模,以及使用其的液晶显示器的制造方法。 根据本发明的示例性实施例的曝光装置提供一种曝光装置,其包括:包括多个透射部分的第一光掩模; 和包括多个透射部分的第二光掩模,所述第一光掩模和第二光掩模包括第一光掩模和第二光掩模部分重叠的重叠区域,其中至少一个透射部分 包括在重叠区域中的第一光掩模和第二光掩模中的至少一个包括半透射部分,并且半透射部分的透射率大于或等于0%且小于100% 。