摘要:
A composition for a hardmask including copolymer including repeating units represented by Chemical Formulae 1 and 2 and a solvent, a method of forming a pattern using the same, and a semiconductor integrated circuit device including a pattern formed using the method are provided.
摘要:
A composition for a hardmask including copolymer including repeating units represented by Chemical Formulae 1 and 2 and a solvent, a method of forming a pattern using the same, and a semiconductor integrated circuit device including a pattern formed using the method are provided.
摘要:
Forming a dual damascene structure includes forming a first insulation layer and a second insulation layer, forming a resist mask, forming a via hole down to a lower end of the first insulation layer, forming a hardmask layer in the via hole and on the second insulation layer using a spin-coating method, forming a resist mask, forming a first trench hole down to a lower end of the second insulation layer, respectively removing a part of the hardmask layer in the via hole and a part of the hardmask layer on the second insulation layer, forming a second trench hole by removing a part of the first insulation layer between a top corner of the hardmask layer remaining in the via hole and a bottom corner of the first trench hole, removing the hardmask layer, and filling the via hole and the second trench hole with a conductive material.
摘要:
A polymer includes a first repeating unit represented by the following Chemical Formula 1, and a second repeating unit including at least one repeating unit represented by the following Chemical Formulae 2 to 6.
摘要:
Disclosed are a (meth)acrylate compound, a photosensitive polymer, and a resist composition, and the (meth)acrylate compound includes a lactone-group-containing (meth)acrylate compound represented by the following Chemical Formula 1.
摘要:
A method for manufacturing a linear compressor which has a cylinder block with a compressing chamber and an inner core which has a plurality of electric steel plates disposed around the cylinder block. The method includes punching each of the electric steel plates, radially stacking such plates and welding them to the inner core. The inner core is inserted into a cast mold for casting the cylinder block. Molten metal is then poured into the cast mold and pressure is applied to the cast mold so that the molten material fills the spaces between the electric steel plates, thus making the inner core integral with the cylinder block.
摘要:
There is disclosed a stator of a linear compressor which comprises a bobbin of a cylindrical shape having a recess for winding coils at the outer circumference thereof, coils wound in the coil winding recess, and a plurality of cores inserted into the bobbin. A plurality of guide rails extending to the axial direction of the bobbin are arranged radially at regular intervals on the inner circumference of the bobbin and the cores are mounted between the respective guide rails. Further, a plurality of guide projections extending outward from the outer circumferences of the upper and lower ends of the bobbin are arranged at regular intervals. In addition, there are further provided a plurality of supporting jaws extending toward the inside of the bobbin between the respective guide rails.
摘要:
A (meth)acrylate compound having an acid-labile ester group, a photosensitive polymer, and a resist composition including the same, the (meth)acrylate compound being represented by the following Chemical Formula 1 wherein, R1 is hydrogen or methyl, R2 and R3 are each independently a substituted or unsubstituted linear alkyl, a substituted or unsubstituted cyclic alkyl, or linked each other to form a monocyclic ring or a fused-ring, and R4 is a linear ester or cyclic ester group.
摘要翻译:具有酸不稳定酯基的(甲基)丙烯酸酯化合物,感光性聚合物和包含它们的抗蚀剂组合物,(甲基)丙烯酸酯化合物由以下化学式1表示,其中R 1是氢或甲基,R 2和 R 3各自独立地为取代或未取代的直链烷基,取代或未取代的环烷基,或彼此连接形成单环或稠环,并且R 4为直链酯或环酯基。
摘要:
Impurities can be eluted simultaneously from a plurality of local areas of a surface layer of a semiconductor substrate. A supporting unit supports the substrate, and a sample plate is disposed on the surface of the substrate. The sample plate has a plurality of holes that expose the local areas of the surface of the substrate. Eluant is provided onto the local areas of the surface layer of the substrate through the holes in the sample plate. The impurities are thus dissolved by the eluant to produce a sample. A nozzle transfers the sample from the local areas of the surface of the substrate to a plurality of sample cups. Therefore, samples from the surface layer of the substrate may be produced in a short amount of time.