MAGNETIC HEAD COMPRISING MAGNETO-RESISTANCE EFFECT ELEMENT AND SIDE SHIELDS

    公开(公告)号:US20170270954A1

    公开(公告)日:2017-09-21

    申请号:US15074071

    申请日:2016-03-18

    申请人: TDK Corporation

    IPC分类号: G11B5/39

    摘要: A magnetic head includes a magneto-resistance effect element in the form of a multilayer film, a pair of shields between which the magneto-resistance effect element is interposed in the lamination direction of the layers of the magneto-resistance effect element and each functioning as an electrode, a pair of side shields with one of said side shields on each side of the magneto-resistance effect element in the direction perpendicular to the lamination direction of the magneto-resistance effect element interposed between the pair of shields, the side shields magnetically coupled to either of the pair of shields, and an anisotropy-application layer disposed adjacent to the shield magnetically coupled to the pair of side shields. The pair of shields, the magneto-resistance effect element, and the pair of side shields are exposed on the air bearing surface facing a recording medium. The anisotropy-application layer is not exposed on the air bearing surface and is provided at a position away from the air bearing surface.

    MAGNETO-RESISTIVE EFFECT ELEMENT HAVING SIDE SHIELD INTEGRATED WITH UPPER SHIELD

    公开(公告)号:US20170236538A1

    公开(公告)日:2017-08-17

    申请号:US15044559

    申请日:2016-02-16

    申请人: TDK Corporation

    IPC分类号: G11B5/39

    CPC分类号: G11B5/3912 G11B2005/3996

    摘要: A magneto-resistive effect element (MR element) has an upper shield that is magnetized in a cross track direction, a lower shield that is positioned at an interval relative to the upper shield in a down track direction, and a multilayer film that is positioned between the upper shield and the lower shield and that faces an air bearing surface (ABS). The multilayer film has a free layer where its magnetization direction fluctuates relative to an external magnetic field, a pinned layer where its magnetization direction is pinned against the external magnetic field, a nonmagnetic spacer layer that is positioned between the free layer and the pinned layer, and an insulating layer that is positioned at a back side of the free layer viewed from the ABS. The MR element further has a pair of side shields that are positioned at both sides of the free layer and the insulating layer in a cross track direction. The side shields contact the upper shield on the sides of the free layer and the insulating layer in the cross track direction.

    MANUFACTURING METHOD FOR PATTERN MULTILAYER BODY AND MASK SET
    6.
    发明申请
    MANUFACTURING METHOD FOR PATTERN MULTILAYER BODY AND MASK SET 有权
    用于图案多层体和面罩的制造方法

    公开(公告)号:US20150140685A1

    公开(公告)日:2015-05-21

    申请号:US14082249

    申请日:2013-11-18

    申请人: TDK Corporation

    IPC分类号: H01L43/12 G03F1/00 H01L43/08

    摘要: A method for manufacturing a pattern multilayer body that has a plurality of pattern layers, and where a pattern is formed in each pattern layer, includes a step of forming an overlay pattern within an overlay pattern formation region, and in the step of forming the overlay pattern, a photoresist film is formed, and after a photoresist film is exposed via a main mask, a resist pattern is formed by exposing a sub mask(s). The main mask has a pattern light-shielding part that is commonly used for forming a pattern in each pattern layer, and each main light-shielding part for forming each overlay patter; and a sub mask has an opening part that is exposable to an unexposed region(s) within an overlay pattern formation region other than an unexposed region(s) on the photoresist film, which has been light-shielded by the main light-shielding part for forming a corresponding overlay pattern. This enables forming an overlay pattern that is high in position gap measurement accuracy in a direction orthogonal to the lamination direction when manufacturing a pattern multilayer body.

    摘要翻译: 一种用于制造具有多个图案层并且在每个图案层中形成图案的图案多层体的方法包括在覆盖图案形成区域内形成覆盖图案的步骤,并且在形成覆盖层的步骤中 形成光致抗蚀剂膜,并且在通过主掩模曝光光致抗蚀剂膜之后,通过暴露子掩模形成抗蚀剂图案。 主掩模具有通常用于在每个图案层中形成图案的图案遮光部分和用于形成每个覆盖图案的每个主遮光部分; 并且子掩模具有可暴露于除光致抗蚀剂膜上的未曝光区域之外的覆盖图案形成区域内的未曝光区域的开口部分,其被主遮光部分遮光 用于形成对应的覆盖图案。 由此,能够在制造图案层叠体时形成与层叠方向正交的方向上的位置间隙测定精度高的覆盖图形。