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13 条记录 (耗时 0.033 秒)

    Motion limiter for disk drive integrated gimbal suspension
    1.
    发明授权
    Motion limiter for disk drive integrated gimbal suspension 有权
    磁盘驱动器集成云台悬架的运动限制器

    公开(公告)号：US06801400B2

    公开(公告)日：2004-10-05

    申请号：US10057639

    申请日：2002-01-24

    申请人： Ta-Chang Fu ,  Hienminh Huu Le ,  Tzong-Shii Pan

    发明人： Ta-Chang Fu ,  Hienminh Huu Le ,  Tzong-Shii Pan

    IPC分类号： G11B548

    CPC分类号： G11B5/4826

    摘要： An integrated gimbal suspension includes a flexure with an integrated, built-in gimbal, and includes a limiter structure that constrains motions of the gimbal in multi-degrees of freedom. The limiter structure includes one or more tab-shaped limiters and corresponding stops integrally formed into the gimbal assembly at strategic locations, which interact to provide the desired constraints to the motions of the flexure gimbal to prevent permanent damage from over-straining the gimbal or flexure beyond its designed range. The limiters may be pre-formed tab-shaped structures that are bent from the plane of the flexure. As the gimbal moves from its nominal position, one or more limiters engage the stops before such motion reaches the limit of the designed range of motion of the gimbal.

    摘要翻译： 一体化万向节悬架包括具有集成的内置万向架的挠曲件，并且包括限制器结构，其以多自由度约束万向节的运动。 限制器结构包括一个或多个翼片限位器和在战略位置处一体地形成在万向节组件中的相应的止挡件，其相互作用以对弯曲万向架的运动提供期望的约束，以防止由于万向架或挠曲件过度拉伸导致的永久性损坏 超出其设计范围。 限制器可以是从挠曲件的平面弯曲的预成形的片状结构。 当万向架从其标称位置移动时，一个或多个限位器在这种运动达到设计的万向节运动范围的极限之前接合止挡件。

    Suspension design for improving the curing process for head bonding application and method for same
    2.
    发明授权
    Suspension design for improving the curing process for head bonding application and method for same 有权
    用于改善头部粘合应用的固化过程的悬架设计及其方法

    公开(公告)号：US06552875B1

    公开(公告)日：2003-04-22

    申请号：US09620791

    申请日：2000-07-21

    申请人： Hienminh Huu Le ,  Tzong-Shii Pan

    发明人： Hienminh Huu Le ,  Tzong-Shii Pan

    IPC分类号： G11B560

    CPC分类号： G11B5/484 ,  G11B5/6005

    摘要： A suspension design for improving the curing process for head bonding application and a method for same is disclosed. Vias are formed in the load beam and the flexure so that UV light is allowed to pass to cure the UV sensitive adhesive thereby bonding the slider to the head gimbal assembly.

    摘要翻译： 公开了一种用于改善头部粘合应用的固化过程的悬架设计及其方法。 在负载梁和挠曲件中形成通孔，使得允许UV光通过以固化UV敏感粘合剂，从而将滑块结合到头部万向架组件。

    Polymer bumps for trace and shock protection
    3.
    发明授权
    Polymer bumps for trace and shock protection 失效
    聚合物凸块用于痕量和冲击保护

    公开(公告)号：US06201664B1

    公开(公告)日：2001-03-13

    申请号：US09192410

    申请日：1998-11-16

    申请人： Hienminh Huu Le ,  Tzong-Shii Pan ,  Victor Wing Chung Shum

    发明人： Hienminh Huu Le ,  Tzong-Shii Pan ,  Victor Wing Chung Shum

    IPC分类号： G11B2116

    CPC分类号： G11B5/486 ,  G11B5/5582 ,  G11B21/21

    摘要： A hard disk drive has actuator arms with a load beam or suspension extending from one end. Each suspension carries an integrated lead layer with electrical traces which are connected to a magnetic read/write heads for interacting with magnetic disks in the disk drive. Each suspension also has a pair of polymer pads on each side of the traces. Each pad has a series of bumps which give the pads a greater thickness than the lead layer for preventing contact between the traces, suspensions and magnetic disks during shock vibration. The pads also prevent contact between the trace conductors and the head separator during the separation process.

    摘要翻译： 硬盘驱动器具有致动器臂，其具有从一端延伸的负载梁或悬架。 每个悬架都带有一个带有电气迹线的集成引线层，该引线层连接到磁读/写头，用于与磁盘驱动器中的磁盘进行交互。 每个悬架还在轨迹的每一侧上都有一对聚合物垫。 每个焊盘具有一系列凸块，其给予焊盘比引线层更大的厚度，以防止在冲击振动期间迹线，悬架和磁盘之间的接触。 垫片还可防止在分离过程中迹线导体和头部分离器之间的接触。

    High performance suspension with reduced flow-induced vibration
    4.
    发明授权
    High performance suspension with reduced flow-induced vibration 有权
    高性能悬挂，减少流动振动

    公开(公告)号：US06747849B1

    公开(公告)日：2004-06-08

    申请号：US09531872

    申请日：2000-03-21

    申请人： Hienminh Huu Le ,  Tzong-Shii Pan

    发明人： Hienminh Huu Le ,  Tzong-Shii Pan

    IPC分类号： G11B2116

    CPC分类号： G11B5/484

    摘要： An integrated suspension for a hard disk drive is formed as a single-piece flat assembly. The design eliminates the need for mechanical reinforcement such as flange forming, and requires no additional weld processing to form the functional portion of the assembly. A partial etch process is used to reduce local thicknesses in the gimbal and hinge areas to reduce the overall stiffness of the suspension. The proximal end structure of the suspension is also built by partial etching to achieve higher natural frequencies. The suspension design also incorporates built-in load/unload features and two-sided, opposite-facing limiters to limit excessive slider displacement during the manufacturing process, loading/unloading, and non-operational shock environments.

    摘要翻译： 用于硬盘驱动器的集成悬架形成为单件式平面组件。 该设计消除了对诸如凸缘成形的机械加强件的需要，并且不需要额外的焊接加工来形成组件的功能部分。 部分蚀刻工艺用于减小万向节和铰链区域中的局部厚度，以降低悬架的总体刚度。 悬架的近端结构也通过部分蚀刻来构建，以实现更高的固有频率。 悬挂设计还包含内置的装载/卸载功能以及双面对面限位器，以限制制造过程中的过度滑动位移，装载/卸载以及非操作冲击环境。

    COOLED PVD SHIELD
    5.
    发明申请
    COOLED PVD SHIELD 审中-公开
    冷却PVD膜

    公开(公告)号：US20080006523A1

    公开(公告)日：2008-01-10

    申请号：US11764217

    申请日：2007-06-17

    申请人： Akihiro Hosokawa ,  Bradley O. Stimson ,  Hienminh Huu Le ,  Makoto Inagawa

    发明人： Akihiro Hosokawa ,  Bradley O. Stimson ,  Hienminh Huu Le ,  Makoto Inagawa

    IPC分类号： C23C16/00 ,  C23C14/32

    CPC分类号： C23C14/042 ,  C23C14/50 ,  C23C14/564 ,  H01J37/32458 ,  H01J37/32623 ,  H01J37/32651 ,  H01J37/32715

    摘要： The present invention generally comprises a top shield for shielding a shadow frame within a PVD chamber. The top shield may remain in a stationary position and at least partially shield the shadow frame to reduce the amount of material that may deposit on the shadow frame during processing. The top shield may be cooled to reduce the amount of fluxuation in temperature of the top shield and shadow frame during processing and/or during down time.

    摘要翻译： 本发明通常包括用于屏蔽PVD室内的阴影框架的顶部屏蔽件。 顶部屏蔽可以保持在静止位置，并且至少部分地遮蔽阴影框架以减少在处理期间可能沉积在阴影框架上的材料的量。 顶部屏蔽可以被冷却以减少处理期间和/或在停机期间顶部屏蔽和阴影框架的温度的变化量。

    Integrated PVD system using designated PVD chambers
    8.
    发明授权
    Integrated PVD system using designated PVD chambers 失效
    集成PVD系统使用指定的PVD腔

    公开(公告)号：US07432184B2

    公开(公告)日：2008-10-07

    申请号：US11213662

    申请日：2005-08-26

    申请人： Akihiro Hosokawa ,  Makoto Inagawa ,  Hienminh Huu Le ,  John M. White

    发明人： Akihiro Hosokawa ,  Makoto Inagawa ,  Hienminh Huu Le ,  John M. White

    IPC分类号： H01L21/00 ,  H01L21/44

    CPC分类号： H01L21/67201 ,  C23C14/566 ,  C23C14/568 ,  H01L21/67167 ,  H01L21/67184 ,  H01L21/67196 ,  H01L29/66765

    摘要： A method for making a film stack containing one or more metal-containing layers and a substrate processing system for forming the film stack on a substrate are provided. The substrate processing system includes at least one transfer chamber coupled to at least one load lock chamber, at least one first physical vapor deposition (PVD) chamber configured to deposit a first material layer on a substrate, and at least one second PVD chamber for in-situ deposition of a second material layer over the first material layer within the same substrate processing system without breaking the vacuum or taking the substrate out of the substrate processing system to prevent surface contamination, oxidation, etc. The substrate processing system is configured to provide high throughput and compact footprint for in-situ sputtering of different material layers in designated PVD chambers.

    摘要翻译： 提供了一种制造包含一个或多个含金属层的膜堆叠的方法和用于在基板上形成膜堆叠的基板处理系统。 衬底处理系统包括耦合到至少一个负载锁定室的至少一个传送室，被配置成将第一材料层沉积在衬底上的至少一个第一物理气相沉积（PVD）室和至少一个第二PVD室 在相同的基板处理系统内在第一材料层上沉积第二材料层而不破坏真空或将基板从基板处理系统取出以防止表面污染，氧化等。基板处理系统被配置为提供 高产量和紧凑的占地面积，用于在指定的PVD室中不同材料层的原位溅射。

    PVD TARGET
    9.
    发明申请
    PVD TARGET 有权
    PVD目标

    公开(公告)号：US20070295596A1

    公开(公告)日：2007-12-27

    申请号：US11426271

    申请日：2006-06-23

    申请人： Makoto INAGAWA ,  Bradley O. Stimson ,  Akihiro Hosokawa ,  Hienminh Huu Le ,  Jrjyan Jerry Chen

    发明人： Makoto INAGAWA ,  Bradley O. Stimson ,  Akihiro Hosokawa ,  Hienminh Huu Le ,  Jrjyan Jerry Chen

    IPC分类号： C23C14/32 ,  C23C14/00

    CPC分类号： C23C14/3407 ,  C23C14/352 ,  C23C14/564 ,  H01J37/3435

    摘要： A physical vapor deposition target assembly is configured to isolate a target-bonding layer from a processing region. In one embodiment, the target assembly comprises a backing plate, a target having a first surface and a second surface, and a bonding layer disposed between the backing plate and the second surface. The first surface of the target is in fluid contact with a processing region and the second surface of the target is oriented toward the backing plate. The target assembly may include multiple targets.

    摘要翻译： 物理气相沉积靶组件被配置为将目标结合层与处理区域隔离。 在一个实施例中，目标组件包括背板，具有第一表面和第二表面的靶，以及设置在背板和第二表面之间的结合层。 目标的第一表面与处理区域流体接触，并且目标物的第二表面朝向背板取向。 目标组件可以包括多个目标。