公开(公告)号：US06367415B2

公开(公告)日：2002-04-09

申请号：US09800894

申请日：2001-03-08

申请人： Tae-Hoon Kim ,  Byung-Chul Kim ,  Kwon Son ,  Bong-Soon Lim

发明人： Tae-Hoon Kim ,  Byung-Chul Kim ,  Kwon Son ,  Bong-Soon Lim

IPC分类号： C23C1452

CPC分类号： B01J3/004 ,  C23C16/488 ,  G02B7/007

摘要： A view port of chemical vapor deposition apparatus for manufacturing semiconductor devices prevents heat loss in a chamber during a plasma deposition process. The view port includes a bracket protruding at the circumference of an opening in an electrode serving as a wall of a chamber of the apparatus, a transparent window pressed by the bracket against the wall via an O-ring, a pivoting cap for capping an opening in the bracket aligned with the window, and heat-insulative material and/or a heating element integral with the cap so as to be positioned close to the window when the cap is closed. The heating element can be a resistive heating wire or a warm air duct formed by a hose or the like. During the deposition process, the temperature of the window is maintained, thereby minimizing the tendency of polymer to adhere to the window.

摘要翻译： 用于制造半导体器件的化学气相沉积设备的观察口防止在等离子体沉积过程中室内的热损失。 所述视口包括在所述设备的室的壁的开口的圆周处突出的支架，由所述托架通过O形环压靠在所述壁上的透明窗，用于封盖开口的枢转盖 在与窗口对齐的支架中，以及绝热材料和/或与盖一体的加热元件，以便当盖关闭时定位成靠近窗口。 加热元件可以是电阻加热线或由软管等形成的暖风管道。 在沉积过程中，保持窗口的温度，从而最小化聚合物粘附到窗口的趋势。

公开(公告)号：US06287981B1

公开(公告)日：2001-09-11

申请号：US09389027

申请日：1999-09-02

申请人： Tae-Hoon Kim ,  Kwon Son

发明人： Tae-Hoon Kim ,  Kwon Son

IPC分类号： H01L2100

CPC分类号： H01L21/67069 ,  C23C16/509 ,  H01J37/32009 ,  H01J37/32082 ,  H01J37/32541

摘要： A plasma processing apparatus includes a plasma generating electrode containing at least one protrusion for improving the plasma density and uniformity. The apparatus may be a plasma dry etching apparatus, a plasma enhanced CVD deposition apparatus or a sputtering apparatus.

摘要翻译： 等离子体处理装置包括等离子体产生电极，其包含至少一个用于提高等离子体密度和均匀性的突起。 该装置可以是等离子体干蚀刻装置，等离子体增强CVD沉积装置或溅射装置。

公开(公告)号：US5892240A

公开(公告)日：1999-04-06

申请号：US770442

申请日：1996-12-20

申请人： Kyoung-jeong Bae ,  Kwon Son

发明人： Kyoung-jeong Bae ,  Kwon Son

IPC分类号： H01L21/677 ,  H01L21/67 ,  H01L21/68 ,  G01N21/84

CPC分类号： H01L21/681 ,  Y10S414/137

摘要： A wafer sensing apparatus for sensing whether a wafer is inserted in a wafer cassette. The wafer sensing apparatus includes a light emitting device for emitting light of a predetermined wavelength toward the inside of a wafer cassette, a light sensing device, positioned opposite to the light emitting device, for sensing the emitted light, and an optical filter device for passing light corresponding only to the predetermined wavelength of light emitted from the light emitting device. The light sensing device is not affected by interference light from outside sources that can cause a faulty wafer sensing function, since the interfering light is reflected or absorbed by the optical filter device. Equipment malfunctions caused by faulty sensing from the light sensing device are prevented, thereby improving the equipment operating efficiency.

摘要翻译： 一种用于检测晶片是否插入晶片盒中的晶片感测装置。 晶片感测装置包括用于向晶片盒内部发射预定波长的光的发光装置，与发光装置相对设置的用于感测发射光的光感测装置，以及用于通过的光学滤波装置 仅对应于从发光装置发射的光的预定波长的光。 由于干涉光被滤光器件反射或吸收，光感测装置不受来自外部源的干扰光的影响，这可能导致故障的晶片感测功能。 防止了由光感测装置的故障检测引起的设备故障，从而提高了设备​​的运行效率。

公开(公告)号：US20070181148A1

公开(公告)日：2007-08-09

申请号：US11642893

申请日：2006-12-21

申请人： Min-Sang Yun ,  Kwon Son ,  Jae-Hyung Jung ,  Hee-Chan Jung ,  Ki-Ryong Choi ,  Byung-Joo Park ,  Kang-Young Kim

发明人： Min-Sang Yun ,  Kwon Son ,  Jae-Hyung Jung ,  Hee-Chan Jung ,  Ki-Ryong Choi ,  Byung-Joo Park ,  Kang-Young Kim

IPC分类号： C23G1/00 ,  B08B3/00 ,  B08B7/00

CPC分类号： H01L21/67051 ,  H01L21/02052

摘要： Embodiments of the invention provide a semiconductor wafer cleaning apparatus and a related method. In one embodiment, the invention provides a semiconductor wafer cleaning apparatus comprising a wafer stage adapted to support a wafer; a first cleaning unit adapted to spray a first cleaning solution onto the wafer to remove particles from the wafer, wherein the first cleaning solution prevents static electricity from being generated on the surface of the wafer; and a second cleaning unit adapted to provide a second cleaning solution onto the wafer and oscillate a quartz rod to remove particles from the wafer, wherein the second cleaning solution makes a surface of the wafer hydrophilic.

摘要翻译： 本发明的实施例提供一种半导体晶片清洗装置及相关方法。 在一个实施例中，本发明提供一种半导体晶片清洁设备，其包括适于支撑晶片的晶片台; 第一清洁单元，其适于将第一清洁溶液喷射到所述晶片上以从所述晶片去除颗粒，其中所述第一清洁溶液防止在所述晶片的表面上产生静电; 以及第二清洁单元，其适于将第二清洁溶液提供到所述晶片上并振荡石英棒以从所述晶片去除颗粒，其中所述第二清洁溶液使所述晶片的表面具有亲水性。