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    Apparatus and method for detecting the relative positional deviation between two diffraction gratings
    1.
    发明授权
    Apparatus and method for detecting the relative positional deviation between two diffraction gratings 失效
    用于检测两个衍射光栅之间的相对位置偏差的装置和方法

    公开(公告)号：US5465148A

    公开(公告)日：1995-11-07

    申请号：US139143

    申请日：1993-10-21

    申请人： Takahiro Matsumoto ,  Noriyuki Nose ,  Kenji Saito ,  Koichi Sentoku

    发明人： Takahiro Matsumoto ,  Noriyuki Nose ,  Kenji Saito ,  Koichi Sentoku

    IPC分类号： G01B9/02 ,  G01B11/24 ,  G03F7/20 ,  G03F9/00

    CPC分类号： G03F7/70633 ,  G03F9/70

    摘要： A first Savart plate and an object to be measured are arranged on the light path of a Zeeman light source. The object to be measured is constructed of a diffraction grating on a mask and a diffraction grating on a wafer. A second Savart plate, a deflection plate and a photoelectric detector are sequentially arranged in the light path for the diffracted beams from the measured object. The output of the photoelectric detector is connected to a phase-difference unit to detect the phase difference between two beat signals. Herein, the light is split into two beams by the Savart plate. After a diffraction is caused by the diffraction gratings, thereafter, the beams are re-synthesized by the Savart plates. The two beams travel on the same light path, thereby improving a measurement accuracy.

    摘要翻译： 第一萨瓦特板和待测对象被布置在塞曼光源的光路上。 要测量的对象由掩模上的衍射光栅和晶片上的衍射光栅构成。 第二萨瓦特板，偏转板和光电检测器依次布置在来自测量对象的衍射光束的光路中。 光电检测器的输出连接到相位差单元，以检测两个差拍信号之间的相位差。 这里，萨瓦特板将光分成两束。 衍射由衍射光栅引起之后，光束由Savart板重新合成。 两个光束在相同的光路上行进，从而提高测量精度。

    Optical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detected
    2.
    发明授权
    Optical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detected 失效
    光学外差干涉测量装置和方法以及使用该光学外差干涉测量装置和方法的曝光装置和装置制造方法，其中检测到拍子信号之间的相位差

    公开(公告)号：US5432603A

    公开(公告)日：1995-07-11

    申请号：US153038

    申请日：1993-11-17

    申请人： Koichi Sentoku ,  Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saito ,  Toshihiko Tsuji ,  Takahiro Matsumoto

    发明人： Koichi Sentoku ,  Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saito ,  Toshihiko Tsuji ,  Takahiro Matsumoto

    IPC分类号： G03F9/00 ,  G01B9/02

    CPC分类号： G03F9/70

    摘要： An optical element comprised of a plurality of polarizing beam splitters is provided on the optical path of a two-frequency linearly polarized laser beam source, and the optical element divides a light beam from the two-frequency linearly polarized laser beam source into two light beams, whereafter these two light beams are incident on diffraction gratings provided on a mask and a wafer, respectively. A pair of mirrors are provided vertically above the mask, and a pair of lenses, a pair of polarizing plates and a pair of photoelectric detectors are arranged in succession in the directions of reflection of the pair of mirrors. The outputs of the two photoelectric detectors become beat signals, and the phase difference between these beat signals is measured, whereby the alignment of the mask and wafer is effected. Since the optical element is comprised of a plurality of polarizing beam splitters, leak-in light included in each light beam is reduced.

    摘要翻译： 在双频线性偏振激光束源的光路上设置由多个偏振分束器构成的光学元件，光学元件将来自双频线性偏振激光束源的光束分成两束光束 之后，这两个光束分别入射到设置在掩模和晶片上的衍射光栅上。 一对镜子垂直地设置在掩模上方，并且一对透镜，一对偏振片和一对光电检测器沿着该对反射镜的反射方向相继布置。 两个光电检测器的输出变为差拍信号，并且测量这些拍频信号之间的相位差，从而实现掩模和晶片的对准。 由于光学元件由多个偏振分束器组成，因此减少了包括在每个光束中的泄漏光。

    Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes
    5.
    发明授权
    Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes 失效
    用于检测彼此靠近布置的第一和第二衍射光栅之间的相对位移的装置和方法，其中所述光栅具有不同的间距尺寸

    公开(公告)号：US5610718A

    公开(公告)日：1997-03-11

    申请号：US297511

    申请日：1994-08-29

    申请人： Koichi Sentoku ,  Takahiro Matsumoto ,  Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saitoh

    发明人： Koichi Sentoku ,  Takahiro Matsumoto ,  Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saitoh

    IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B9/02

    CPC分类号： G03F7/70633 ,  G03F9/7049

    摘要： A method and device for measuring the relative displacement between first and second diffraction gratings includes an interference optical system forming first and second interference rays of light from light diffracted from the first and second diffraction gratings and separating the first and second interference rays of light on the basis of the difference in their direction of polarization, a first detector for detecting the first interference ray of light to generate a first detection signal, a second detector for detecting the second interference ray of light to generate a second detection signal, and signal processing section for detecting the phase difference between the first and second detection signals and for determining the relative displacement between the first and second diffraction gratings on the basis of the phase difference.

    摘要翻译： 用于测量第一和第二衍射光栅之间的相对位移的方法和装置包括干涉光学系统，其形成从第一和第二衍射光栅衍射的光的第一和第二干涉光线，并且将第一和第二干涉光线分离在 其偏振方向的差异的基础，用于检测第一干涉光线以产生第一检测信号的第一检测器，用于检测第二干涉光线以产生第二检测信号的第二检测器，以及信号处理部分 用于检测第一和第二检测信号之间的相位差，并且用于基于相位差确定第一和第二衍射光栅之间的相对位移。

    Position detector for detecting the position of an object using a diffraction grating positioned at an angle
    6.
    发明授权
    Position detector for detecting the position of an object using a diffraction grating positioned at an angle 失效
    位置检测器，用于使用位于一定角度的衍射光栅来检测物体的位置

    公开(公告)号：US5369486A

    公开(公告)日：1994-11-29

    申请号：US947383

    申请日：1992-09-21

    申请人： Takahiro Matsumoto ,  Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saitoh ,  Masanobu Hasegawa ,  Koichi Sentoku

    发明人： Takahiro Matsumoto ,  Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saitoh ,  Masanobu Hasegawa ,  Koichi Sentoku

    IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B9/02

    CPC分类号： G03F7/70633 ,  G03F9/7049

    摘要： A position detector includes a diffraction grating provided on the surface of an object, an illumination system for illuminating the diffraction grating, a detection system for detecting diffracted light diffracted from the diffraction grating, and a processing system for detecting positional information relating to the object. The illumination system emits a first pair of beams which are diffracted by the diffraction grating and interfere with each other, and emits a second pair of beams which are diffracted by the diffraction grating and also interfere with each other. The first pair of beams are incident upon the diffraction grating along a plane extending in a first direction in which the diffraction grating extends. The second pair of beams are incident upon the diffraction grating along a plane extending in a second direction in which the diffraction grating extends. The first and second directions are different from a grating line direction. The detection system detects the interfering light and generates first and second beat signals therefrom. The processing system detects positional information with respect to the first direction from the phase state of the first beat signal and with respect to the second direction from the phase state of the second beat signal.

    摘要翻译： 位置检测器包括设置在物体表面上的衍射光栅，用于照射衍射光栅的照明系统，用于检测衍射光栅衍射的衍射光的检测系统，以及用于检测与物体有关的位置信息的处理系统。 照明系统发射由衍射光栅衍射并彼此干涉的第一对光束，并且发射由衍射光栅衍射并且彼此干涉的第二对光束。 第一对光束沿着沿衍射光栅延伸的第一方向延伸的平面入射在衍射光栅上。 第二对光束沿着沿衍射光栅延伸的第二方向延伸的平面入射在衍射光栅上。 第一和第二方向与光栅线方向不同。 检测系统检测干扰光并从其产生第一和第二拍拍信号。 处理系统从第一拍子信号的相位状态和相对于第二拍摄信号的相位状态相对于第二方向检测关于第一方向的位置信息。

    Management system and apparatus method therefor, and device manufacturing method
    10.
    发明申请
    Management system and apparatus method therefor, and device manufacturing method 有权
    管理系统及其装置方法及装置制造方法

    公开(公告)号：US20050137837A1

    公开(公告)日：2005-06-23

    申请号：US10901106

    申请日：2004-07-29

    申请人： Satoru Oishi ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku ,  Takahiro Matsumoto

    发明人： Satoru Oishi ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku ,  Takahiro Matsumoto

    IPC分类号： G03F9/00 ,  G03F7/20 ,  G05B19/418 ,  H01L21/027 ,  G06F17/50

    CPC分类号： G03F7/70633 ,  G03F7/705 ,  G03F7/70525 ,  G03F9/7092 ,  G05B2219/32018 ,  Y02P90/22

    摘要： A management apparatus which manages a parameter for an industrial device acquires AGA measurement results obtained by operating the industrial device with an operation job parameter value and non-operation job parameter value. An inspection apparatus acquires an “inspection result” obtained by inspecting the result of operating the industrial device in the operation job. A change in inspection result upon a change in parameter value is estimated on the basis of the AGA measurement result and inspection result. A variable which minimizes (extreme) both or at least one of the sensitivity (slope) of the inspection result upon a change in parameter value and variations (3σ) in inspection result between objects to be processed (e.g., wafers) is set as an optimal parameter.

    摘要翻译： 管理工业设备的参数的管理装置获取通过操作工作装置具有操作作业参数值和非操作作业参数值而获得的AGA测量结果。 检查装置获取通过检查操作工作中的工业装置的操作结果而获得的“检查结果”。 根据AGA测量结果和检查结果估计参数值变化时检查结果的变化。 将待处理对象（例如，晶片）之间的参数值和检查结果中的变化（3sigma）的检查结果的灵敏度（斜率）两者或至少一个最小化（极端）的变量设置为 最优参数。