摘要:
A photosensitive color-forming element comprises a support and a photosensitive color-forming layer carried on the support and containing therein a color-forming coupler, for example, 1-naphthol, 2-naphthol and 2,4-dichloro-1-naphthol, and a photosensitive azido compound of the formula (I) or (II): ##STR1## wherein R.sub.1 represents a hydrogen or halogen atom or an alkyl, alkoxyl, diethylamino or hydroxyl radical R.sub. 2 an alkyl, alkoxyl or hydroxyl radical, and R.sub.3 a hydrogen atom or an alkyl or phenyl radical, and, if necessary, a polymeric material capable of hardening or being insolubilized in solvent when the polymeric material is exposed to radiation rays in the presence of the above azido compound, the above-mentioned azido compound and color-forming coupler being capable of forming a dark color upon exposure to radiation rays, without a color-developing agent.
摘要翻译:感光成色元件包括载体和承载在载体上的感光着色层,并含有成色成色剂,例如1-萘酚,2-萘酚和2,4-二氯-1-萘酚, 和式(I)或(II)的光敏叠氮化合物:其中R 1表示氢或卤素原子或烷基,烷氧基,二乙基氨基或羟基R 2 a 烷基,烷氧基或羟基,R3为氢原子或烷基或苯基,如有必要,当聚合物材料在上述存在下暴露于辐射线时能够固化或不溶于溶剂的聚合物材料 叠氮化合物,上述叠氮化合物和成色剂可以在没有着色剂的情况下在辐射线下形成深色。
摘要:
A photosensitive color-forming element comprises a support and a photosensitive color-forming layer formed on said support and containing therein at least one photosensitive color-forming azido compound of the formula ##STR1## wherein [A] is a benzene ring or naphthalene ring, R.sub.1 and R.sub.2 each is a hydrogen or halogen atom or alkyl, alkoxyl, dialkylamino, acyl, acylamino, nitro or hydroxyl radical, and R.sub.3 is a hydrogen or halogen atom, or alkyl, alkoxyl, nitro, carboxyl, alkylcarboxyl, dialkylcarbamoyl, sulfonic acid, dialkylaminosulfonyl, alkylsulfonyl or acyl radical or a group of the formula (II), (III), (IV) or (V): ##STR2## in which formula X is an --O-- bonding or --NH-- bonding.[B] is a benzene ring or naphthalene ring, and R.sub.4 and R.sub.5 each is a hydrogen or halogen atom or alkyl, alkoxyl, dialkylamino, acyl, acylamino or nitro radical, the photosensitive azido compound being capable of forming a dark color and hardening or solvent-non-solubilizing polymeric material, for example, novolak resins, by exposure to radiation ray.
摘要:
A photosensitive composition in solution for printing screens which comprises:(a) a liquid medium selected from the group consisting of water-miscible organic solvents and solvent mixtures of said organic solvents and water;(b) a polymer soluble in both said organic solvents and water; and(c) a sensitizer soluble in said organic solvents which is selected from the group consisting of photosensitive monomers and prepolymers thereof.This composition makes it possible to produce presensitized printing screens of excellent preservability and printing resistance and to provide a process for efficiently producing pre-sensitized printing screens.
摘要:
Solvent-developed type photosensitive compositions containing as an essential ingredient at least one selected from the group of the cyclization product of butadiene polymer or copolymer and organic solvent, with or without at least one member selected from the group consisting of photosensitizer and photosensitive crosslinking agent, both soluble in an organic solvent.
摘要:
A fluoroalkyl acrylate copolymer comprising recurring units of the general formula (I): ##STR1## wherein R.sub.1 is hydrogen atom or methyl group, R.sub.2 is a bivalent hydrocarbon group and R.sub.f is a C.sub.2 to C.sub.6 straight or branched perfluoroalkyl group or a C.sub.2 to C.sub.6 straight or branched fluoroalkyl group having hydrogen atoms of not less than one and of not more than half of the number of the carbon atoms,and recurring units of the general formula (II): ##STR2## wherein R.sub.3 is hydrogen atom or methyl group and R.sub.4 is a bivalent hydrocarbon group or a mono-substituted bivalent hydrocarbon group with hydroxyl group or a halogen except fluorine. The copolymer is curable with light and energy rays, and is suitable as a material sensitive thereto for use in resist, dry lithographic printing plate and paint.
摘要:
A copolymer comprising (a) units of a fluorine-containing acrylic monomer having a general formula ##STR1## wherein X is F or CF.sub.3, Y is H or CH.sub.3, n is an integer of 2 to 7, and (b) units of an ethylenically unsaturated monomer having a photosensitive group. The copolymer has an excellent photosensitivity and excellent water and oil repellent properties, and is useful for example as a photosensitive material for dry offset printing plate or resist and as a photo-curable, water and oil repelling coating material.
摘要:
The photosensitive composition contains a water-soluble graft copolymer of a partially hydrolyzed polyvinyl acetate grafted with acrylonitrile and optionally another vinylic monomer, a polymeric emulsion and a diazo compound. This composition possesses high resistance to solvent, abrasion and moisture and a favorable water-dissolubility as well.
摘要:
A copolymer comprising (a) a monomer having a C.sub.7 to C.sub.21 perfluoroalkyl or perfluoroalkenyl group at one end of the molecule and an ethylenically unsaturated group at the other end of the molecule, and (b) a monomer having a photosensitive group, e.g. an azidobenzoyloxy group, cinnamoyloxy group, benzoylphenyl group or .alpha.,.beta.-unsaturated ketone group. The copolymer has an excellent photosensitivity and excellent water and oil repellent properties, and is useful for various purposes, e.g. as a photosensitive material for dry offset printing plate or resist and as a photo-curable, water and oil repelling coating material.