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1.发明授权公开(公告)号：US08354180B2
公开(公告)日：2013-01-15
申请号：US12092966
申请日：2006-12-20
申请人： Takashi Kamo , Kyoichi Shukuri , Shunji Kuramoto
发明人： Takashi Kamo , Kyoichi Shukuri , Shunji Kuramoto
IPC分类号： H01M6/50
CPC分类号： H01M10/54 , H01M4/131 , H01M4/133 , H01M4/242 , H01M10/0525 , H01M10/345 , Y02E60/122 , Y02E60/124 , Y02W30/84 , Y10T29/53135
摘要： An electrode plate (20) for storage batteries is immersed into an aqueous solution (18) containing phosphoric acid, an ethoxy alcohol, ammonium bifluoride, sulfonic acid and sodium xylenesulfonate, and the aqueous solution (18) is stirred by a screw stirrer (22). The aqueous solution (18) is kept at about 30° C. by a heater (14), and the active material of the electrode (20) is separated therefrom. The aqueous solution (18) contains the respective solutes in the following mass ratios: 15-20 parts by mass of the phosphoric acid; 3-7 parts by mass of the ethoxy alcohol; 2-6 parts by mass of the ammonium bifluoride; 4-8 parts by mass of the sulfonic acid; and 1-3 parts by mass of the sodium xylenesulfonate.
摘要翻译： 将用于蓄电池的电极板（20）浸入含有磷酸，乙氧基醇，二氟化铵，磺酸和二甲苯磺酸钠的水溶液（18）中，并将水溶液（18）用螺杆搅拌器 ）。 水溶液（18）通过加热器（14）保持在约30℃，电极（20）的活性物质与其分离。 水溶液（18）含有以下质量比的各溶质：15〜20质量份的磷酸; 3-7质量份乙氧基醇; 2-6质量份的二氟化铵; 4-8质量份磺酸; 和1-3质量份的二甲苯磺酸钠。
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2.发明申请公开(公告)号：US20090095631A1
公开(公告)日：2009-04-16
申请号：US12092966
申请日：2006-12-20
申请人： Takashi Kamo , Kyoichi Shukuri , Shunji Kuramoto
发明人： Takashi Kamo , Kyoichi Shukuri , Shunji Kuramoto
IPC分类号： C25B1/00
CPC分类号： H01M10/54 , H01M4/131 , H01M4/133 , H01M4/242 , H01M10/0525 , H01M10/345 , Y02E60/122 , Y02E60/124 , Y02W30/84 , Y10T29/53135
摘要： An electrode plate (20) for storage batteries is immersed into an aqueous solution (18) containing phosphoric acid, an ethoxy alcohol, ammonium bifluoride, sulfonic acid and sodium xylenesulfonate, and the aqueous solution (18) is stirred by a screw stirrer (22). The aqueous solution (18) is kept at about 30° C. by a heater (14), and the active material of the electrode (20) is separated therefrom. The aqueous solution (18) contains the respective solutes in the following mass ratios: 15-20 parts by mass of the phosphoric acid; 3-7 parts by mass of the ethoxy alcohol; 2-6 parts by mass of the ammonium bifluoride; 4-8 parts by mass of the sulfonic acid; and 1-3 parts by mass of the sodium xylenesulfonate.
摘要翻译： 将用于蓄电池的电极板（20）浸入含有磷酸，乙氧基醇，二氟化铵，磺酸和二甲苯磺酸钠的水溶液（18）中，并将水溶液（18）用螺杆搅拌器（22 ）。 水溶液（18）通过加热器（14）保持在约30℃，电极（20）的活性物质与其分离。 水溶液（18）含有以下质量比的各溶质：15〜20质量份的磷酸; 3-7质量份乙氧基醇; 2-6质量份的二氟化铵; 4-8质量份磺酸; 和1-3质量份的二甲苯磺酸钠。
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公开(公告)号：US4682041A
公开(公告)日：1987-07-21
申请号：US777682
申请日：1985-09-19
申请人： Tsuneyuki Egami , Tsutomu Saito , Mitosi Ando , Ryuzou Hori , Takashi Kamo , Kazunori Yoshida
发明人： Tsuneyuki Egami , Tsutomu Saito , Mitosi Ando , Ryuzou Hori , Takashi Kamo , Kazunori Yoshida
CPC分类号： G01B11/303
摘要： A coating quality measuring device and a pattern plate including one reference pattern portion having a large pattern width and a plurality of strip pattern portions each having a smaller pattern width. The pattern plate is disposed opposite the coated surface. The pattern plate is reflected off the coated surface and a reflected image is formed on an image sensor. The image sensor successively outputs signals each corresponding to the light level of each strip pattern portion on a line extending in a width direction of each strip pattern portion of the reflected image. A computing device calculates an average signal level of the signals outputted by the image sensor, divides the difference between the average signal level and the signal level of each signal by the signal level of the reference pattern portion and calculates a square average value of the obtained division value to obtain a measure of the coating quality of the coated surface.
摘要翻译： 一种涂层质量测量装置和包括具有大图案宽度的一个参考图案部分和每个具有较小图案宽度的多个条形图案部分的图案板。 图案板与涂覆表面相对设置。 图案板从涂覆表面反射，并且在图像传感器上形成反射图像。 图像传感器连续地在与反射图像的每个条图案部分的宽度方向上延伸的线上相应地输出与每个条形图案部分的光级对应的信号。 计算装置计算由图像传感器输出的信号的平均信号电平，将平均信号电平与每个信号的信号电平之差除以参考图形部分的信号电平，并计算所获得的平均信号电平 分割值以获得涂层表面的涂层质量的量度。
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4.发明授权Oxygen sensor element with a ceramic heater and a method for manufacturing it 失效具有陶瓷加热器的氧传感器元件及其制造方法
公开(公告)号：US4540479A
公开(公告)日：1985-09-10
申请号：US431366
申请日：1982-09-30
IPC分类号： G01N27/409 , G01N27/406 , G01N27/407 , G01N27/416 , G01N27/46
CPC分类号： G01N27/4077 , G01N27/4067
摘要： An oxygen sensor element with a ceramic heater, having a cylindrical element body formed of an oxygen ion permeable solid electrolyte with one end closed, inner and outer electrodes formed on the inner and outer surfaces of the element body, and an electrode protective layer covering at least one of the inner and outer electrodes, the ceramic heater including a bar-like ceramic core member, a ceramic covering layer which covers the outer surface of the ceramic core member and a heating member disposed in the interface between the core member and the covering layer.
摘要翻译： 一种具有陶瓷加热器的氧传感器元件，具有由一端闭合的氧离子可渗透固体电解质形成的圆柱形元件体，形成在元件体的内表面和外表面上的内电极和外电极，以及覆盖在电极保护层 内电极和外电极中的至少一个，陶瓷加热器包括棒状陶瓷芯构件，覆盖陶瓷芯构件的外表面的陶瓷覆盖层和设置在芯构件和覆盖物之间的界面中的加热构件 层。
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公开(公告)号：US4395319A
公开(公告)日：1983-07-26
申请号：US377017
申请日：1982-05-11
IPC分类号： G01N27/41 , F02D35/00 , F02D41/14 , G01N27/407 , G01N27/409 , G01N27/413 , G01N27/416 , G01N27/58
CPC分类号： G01N27/4071
摘要： A lean sensor for sensing oxygen concentration in exhaust emissions, including a sensor element consisting of a tabular solid electrolyte having opposed sides provided with electrodes with at least one surface thereof coated with a porous coating layer, an element fixing plate having an element fitting hole to which the element is fitted, and a pair of heat-resistant insulating support plates having opposing windows and clamping therebetween the element fixing plate together with the sensor element disposed in the windows. In this way, it is possible precisely to locate the element in relation to the plate and to improve the bonding strength and reliability while reducing the size of the sensor as a whole.
摘要翻译： 一种用于感测废气排放物中的氧浓度的稀薄传感器，包括由片状固体电解质组成的传感器元件，所述传感器元件具有相对的侧面，所述相对侧面设置有至少一个表面涂覆有多孔涂层的电极，元件固定板具有元件装配孔 以及一对耐热绝缘支撑板，其具有相对的窗口，并将元件固定板与布置在窗户中的传感器元件一起夹在其间。 以这种方式，可以精确地将元件相对于板定位，并且在减小传感器整体尺寸的同时提高接合强度和可靠性。
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6.发明授权Method of correcting defects in a reflection-type mask and mask-defect correction apparatus 有权校正反射型掩模和掩模缺陷校正装置中的缺陷的方法公开(公告)号：US09164371B2
公开(公告)日：2015-10-20
申请号：US13423644
申请日：2012-03-19
申请人： Takashi Kamo
发明人： Takashi Kamo
CPC分类号： G03F1/24 , G03F1/72 , G03F7/70283 , G03F7/70908
摘要： According to one embodiment, a method of correcting defects in a reflection-type mask is provided, which comprises acquiring a mask-pattern image of the mask, by using a mask-defect correction apparatus includes a mechanism configured to detect a defect in the mask and a mechanism configured to correct the defect, acquiring a simulated wafer-transfer optical image for the mask, by using an AIMS configured to simulate a wafer-transfer optical image, thereby to determine whether the mask is defective, locating a mask defect, in a mask-pattern image acquired by the mask-defect correction apparatus, by referring to the simulated pattern image acquired by the AIMS, and correcting the defect by the mask-defect correction apparatus, on the basis of the position of the mask defect, thus detected.
摘要翻译： 根据一个实施例，提供了一种校正反射型掩模中的缺陷的方法，其包括通过使用掩模缺陷校正装置获取掩模的掩模图案图像，所述掩模缺陷校正装置包括被配置为检测掩模中的缺陷的机构 以及被配置为校正所述缺陷的机构，通过使用被配置为模拟晶片转移光学图像的AIMS来获取所述掩模的模拟晶片转移光学图像，从而确定所述掩模是否有缺陷，将掩模缺陷定位在 由掩模缺陷校正装置获取的掩模图案图像，通过参考由AIMS获取的模拟图案图像，并且基于掩模缺陷校正装置校正缺陷，基于掩模缺陷的位置，从而 检测到。
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公开(公告)号：US07960076B2
公开(公告)日：2011-06-14
申请号：US12329126
申请日：2008-12-05
申请人： Takashi Kamo , Osamu Suga , Toshihiko Tanaka
发明人： Takashi Kamo , Osamu Suga , Toshihiko Tanaka
IPC分类号： G03F1/00
摘要： A reflective-type mask having a main surface including a pattern region in the main surface, the pattern region including a multilayer reflective film which reflects the exposure light and a first absorber pattern on the multilayer reflective film, the first absorber pattern including a pattern which absorbs the exposure light and corresponds to a pattern to be formed on a wafer, a light shielding region in the main surface for preventing a region on the wafer excluding a predetermined region from being irradiated with the exposure light when the main surface is irradiated with the exposure light for transferring the first absorber pattern to the predetermined region, the light shielding region including a second absorber pattern having a lower reflectivity to the exposure light than the first absorber pattern and being provided in a position differing from a position in which the first absorber pattern is provided.
摘要翻译： 一种反射型掩模，其具有包括主表面中的图案区域的主表面，所述图案区域包括反射所述曝光光的多层反射膜和所述多层反射膜上的第一吸收体图案，所述第一吸收体图案包括图案， 吸收曝光光并且对应于要在晶片上形成的图案，主表面上的遮光区域，用于防止当主表面被照射时，除了预定区域之外的晶片上的区域被照射曝光 用于将第一吸收体图案转印到预定区域的曝光光，所述遮光区域包括与所述第一吸收体图案相比对所述曝光光具有较低反射率的第二吸收体图案，并且设置在与所述第一吸收体 提供图案。
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8.发明申请Method of producing mask inspection data, method of manufacturing a photo mask and method of manufacturing a semiconductor device 审中-公开制造掩模检查数据的方法，制造光掩模的方法和制造半导体器件的方法公开(公告)号：US20060206853A1
公开(公告)日：2006-09-14
申请号：US11360688
申请日：2006-02-24
申请人： Takashi Kamo , Osamu Ikenaga , Tomohiro Tsutsui
发明人： Takashi Kamo , Osamu Ikenaga , Tomohiro Tsutsui
摘要： There is disclosed a method of producing mask inspection data, including preparing design data of a semiconductor device preparing a lithography condition relevant to a lithography process for transferring a mask pattern formed on a photo mask onto a wafer, preparing a wafer processing condition relevant to wafer processing using a pattern transferred onto the wafer, preparing a first proximity correction model for correcting proximity effect relevant to the lithography condition and the wafer processing condition, generating mask pattern data based on the design data and the first proximity correction model, and generating mask inspection data corresponding to the mask pattern data.
摘要翻译： 公开了一种制造掩模检查数据的方法，包括准备准备与光刻工艺相关的光刻条件的半导体器件的设计数据，用于将形成在光掩模上的掩模图案转印到晶片上，制备与晶片相关的晶片处理条件 使用转移到晶片上的图案进行处理，准备用于校正与光刻条件和晶片处理条件相关的邻近效应的第一接近校正模型，基于设计数据和第一邻近校正模型生成掩模图案数据，以及生成掩模检查 对应于掩模图案数据的数据。
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公开(公告)号：US4452687A
公开(公告)日：1984-06-05
申请号：US386527
申请日：1982-06-09
IPC分类号： G01N27/41 , G01N27/30 , G01N27/407 , G01N27/409 , G01N27/413 , G01N27/58
CPC分类号： G01N27/4073 , G01N27/407 , G01N27/4077
摘要： A leanness sensor has a sensor element made of an oxygen-permeable solid electrolyte and having a cylindrical form or a form like a vessel closed at one end thereof. The sensor element is provided with metallic electrodes formed on the inner and outer surfaces thereof. An inner metallic member and an outer metallic member are mounted on the sensor element and electrically connected to the metallic electrodes. The sensor element is fixed to the inner side of the end portion of a cylindrical insulating tube.
摘要翻译： 稀薄传感器具有由透氧性固体电解质制成的传感器元件，并且具有圆柱形或像在其一端封闭的容器的形式。 传感器元件设置有形成在其内表面和外表面上的金属电极。 内部金属构件和外部金属构件安装在传感器元件上并电连接到金属电极。 传感器元件固定在圆柱形绝缘管的端部的内侧。
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公开(公告)号：US5728494A
公开(公告)日：1998-03-17
申请号：US730017
申请日：1996-10-11
申请人： Kenji Kawano , Shinichi Ito , Iwao Higashikawa , Masamitsu Itoh , Takashi Kamo , Hiroaki Hazama , Takayuki Iwamatsu
发明人： Kenji Kawano , Shinichi Ito , Iwao Higashikawa , Masamitsu Itoh , Takashi Kamo , Hiroaki Hazama , Takayuki Iwamatsu
摘要： This invention provides an exposure mask including a translucent film formed on a light-transmitting substrate and having a mask pattern, and a stabilized region formed in the boundary between the light-transmitting substrate and the translucent film or on at least the surface of the translucent film to prevent variations in physical properties of the translucent film. In addition, this invention provides a method of manufacturing an exposure mask, including the steps of forming a translucent film on a light-transmitting substrate, forming a photosensitive resin film on the translucent film, forming a photosensitive resin pattern by exposing the photosensitive resin film to a radiation or a charged particle beam, removing an exposed portion of the translucent film by using the photosensitive resin pattern as a mask, removing the photosensitive resin pattern, and forming a stabilized region in the boundary between the light-transmitting substrate and the translucent film or on at least the surface of the translucent film before the step of forming the photo-sensitive resin film or after the step of forming the photosensitive resin pattern. Also, this invention provides an apparatus for manufacturing an exposure mask.
摘要翻译： 本发明提供一种曝光掩模，其包括形成在透光基板上并具有掩模图案的半透明膜，以及形成在透光基板和半透膜之间的边界中的至少半透明的表面的稳定区域 膜以防止半透明膜的物理性质的变化。 此外，本发明提供一种制造曝光掩模的方法，包括以下步骤：在透光性基板上形成半透膜，在半透膜上形成感光性树脂膜，通过使感光性树脂膜曝光，形成感光性树脂图案 通过使用感光性树脂图案作为掩模去除透光性膜的露出部分，除去感光性树脂图案，在透光性基板与透光性的界面之间形成稳定区域 或在形成感光树脂膜的步骤之前或在形成感光性树脂图案的步骤之后，至少在半透明膜的表面上。 此外，本发明提供了一种用于制造曝光掩模的装置。
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