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23 条记录 (耗时 0.016 秒)

    Adjusting screw of a carburetor
    4.
    发明授权
    Adjusting screw of a carburetor 失效
    调节化油器的螺丝

    公开(公告)号：US4331616A

    公开(公告)日：1982-05-25

    申请号：US217123

    申请日：1980-12-17

    申请人： Yuzo Kato ,  Mikitoshi Kako ,  Kunio Kadowaki

    发明人： Yuzo Kato ,  Mikitoshi Kako ,  Kunio Kadowaki

    IPC分类号： F02M19/01 ,  F02M3/10 ,  F02M7/22 ,  F16B41/00

    CPC分类号： F02M7/22 ,  F02M3/10 ,  F02M2003/105 ,  Y10S261/84 ,  Y10T137/7062 ,  Y10T137/71

    摘要： An adjusting screw of a carburetor comprising a threaded portion, an enlarged head portion and a reduced diameter portion located therebetween. A thin hollow cylindrical wall is formed on a link lever of the carburetor. After the adjusting screw is screwed into the threaded hole of the hollow cylindrical wall, the reduced diameter portion of the adjusting screw is cut. Then, the top portion of the hollow cylindrical wall is bent inward for irremovably fixing the adjusting screw onto the link lever.

    摘要翻译： 化油器的调节螺钉包括螺纹部分，扩大的头部和位于其间的直径减小的部分。 在化油器的连杆上形成一个薄的中空圆柱形壁。 调整螺丝拧入中空圆筒壁的螺纹孔后，调节螺丝的直径减小部分被切断。 然后，中空圆柱形壁的顶部向内弯曲，以将调节螺钉可拆卸地固定在连杆上。

    Alignment apparatus
    5.
    发明授权
    Alignment apparatus 失效
    校准装置

    公开(公告)号：US4275306A

    公开(公告)日：1981-06-23

    申请号：US16165

    申请日：1979-02-23

    申请人： Yuzo Kato ,  Yasuo Ogino ,  Ryozo Hiraga ,  Hideki Yoshinari ,  Masao Tozuka ,  Ichiro Kano

    发明人： Yuzo Kato ,  Yasuo Ogino ,  Ryozo Hiraga ,  Hideki Yoshinari ,  Masao Tozuka ,  Ichiro Kano

    IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  H01L21/67 ,  H01L21/68 ,  G01N21/86

    CPC分类号： G03F9/70 ,  H01L21/681

    摘要： An alignment apparatus in which alignment marks on a mask and a wafer for producing a semiconductor circuit element are photoelectrically read and the positional deviation between the two alignment marks is detected and one of the mask and the wafer is parallel-moved in accordance with the detected amount to align the mask and wafer into a predetermined positional relation. This apparatus has the function of correcting any interval error which may be present between the alignment marks.

    摘要翻译： 对其进行光电读取的掩模和用于制造半导体电路元件的晶片的对准标记，并且检测出两个对准标记之间的位置偏差，并根据检测到的掩模和晶片中的一个平行移动 将掩模和晶片对准到预定的位置关系。 该装置具有校正可能存在于对准标记之间的间隔误差的功能。

    Facsimile apparatus
    6.
    发明授权
    Facsimile apparatus 失效
    传真机

    公开(公告)号：US4193097A

    公开(公告)日：1980-03-11

    申请号：US899724

    申请日：1978-04-25

    申请人： Sadasuke Kurahayashi ,  Yuzo Kato ,  Shin Tsuda ,  Hakaru Muto ,  Asao Watanabe

    发明人： Sadasuke Kurahayashi ,  Yuzo Kato ,  Shin Tsuda ,  Hakaru Muto ,  Asao Watanabe

    IPC分类号： H04N1/411 ,  H04N7/12

    CPC分类号： H04N1/411

    摘要： This invention relates to the reduction in time required for signal transmission in facsimile apparatus, and consists of a transmitting apparatus adapted for eliminating the signal indicating the line thickness from the binary image signal obtained by scanning the original to be transmitted and transmitting thus obtained band-compressed transmission signal, and a receiving apparatus adapted for adding a signal approximately equal to the above-mentioned signal indicating the line thickness to the above-mentioned transmission signal thereby forming received image.

    摘要翻译： 本发明涉及传真装置中信号传输所需的时间的减少，并且包括一种发射装置，其适用于从通过扫描待传送的原稿获得的二进制图像信号中消除指示线路厚度的信号， 压缩的发送信号，以及适于将与上述表示线路厚度的信号大致相等的信号添加到上述发送信号的接收装置，从而形成接收图像。

    Method and apparatus for changing image size
    7.
    发明授权
    Method and apparatus for changing image size 失效
    改变图像尺寸的方法和装置

    公开(公告)号：US4686580A

    公开(公告)日：1987-08-11

    申请号：US577250

    申请日：1984-02-06

    申请人： Yuzo Kato ,  Hidetoshi Suzuki

    发明人： Yuzo Kato ,  Hidetoshi Suzuki

    IPC分类号： G06T3/40 ,  H04N1/393 ,  H04N1/04

    CPC分类号： H04N1/3935 ,  G06T3/4023

    摘要： An image is magnified or reduced by dividing the image into divisional images, magnifying or reducing each of the divisional images and combining the magnified or reduced divisional images. The magnification or reduction of the divisional images is carried out by inserting one pixel into, or deleting one pixel from, each of the divisional images.

    摘要翻译： 通过将图像划分成分割图像来放大或缩小图像，放大或缩小每个分割图像并组合放大或缩小的分割图像。 分割图像的放大或缩小通过将每个分割图像插入一个像素或从其中删除一个像素来进行。

    Image signal processing method and apparatus therefor
    8.
    发明授权
    Image signal processing method and apparatus therefor 失效
    图像信号处理方法及其装置

    公开(公告)号：US4414581A

    公开(公告)日：1983-11-08

    申请号：US313302

    申请日：1981-10-20

    申请人： Yuzo Kato ,  Shunichi Ishihara ,  Yasushi Sato ,  Nobuyoshi Tanaka ,  Naoto Kawamura ,  Hisashi Nakatsui

    发明人： Yuzo Kato ,  Shunichi Ishihara ,  Yasushi Sato ,  Nobuyoshi Tanaka ,  Naoto Kawamura ,  Hisashi Nakatsui

    IPC分类号： H04N1/40 ,  H04N1/405

    CPC分类号： H04N1/40062 ,  H04N1/4058

    摘要： An image signal processing method and apparatus for practicing the method are capable of identifying and differentiating information not having tonal rendition such as characters and linetone images from information having tonal rendition such as photographs and pictures, based on the difference of signal characteristics, for example based on the fact that the spatial frequency distribution in portions of an image not having tonal rendition are in the higher frequency range compared to that of the portions of the image having tonal rendition. The method and apparatus are also capable of conducting different processes on the identified different images.

    摘要翻译： 用于实施该方法的图像信号处理方法和装置能够基于信号特性的差异来识别和区分不具有诸如照片和图像的音调再现的信息的诸如字符和动画图像的音调再现的信息，例如基于 关于不具有音调再现的图像的部分中的空间频率分布与具有音调再现的图像的部分相比更高的频率范围的事实。 所述方法和装置还能够对所识别的不同图像进行不同的处理。

    Alignment apparatus for mask and wafer used in manufacturing semiconductor circuit elements
    9.
    发明授权
    Alignment apparatus for mask and wafer used in manufacturing semiconductor circuit elements 失效
    用于制造半导体电路元件的掩模和晶片的对准装置

    公开(公告)号：US4315201A

    公开(公告)日：1982-02-09

    申请号：US884534

    申请日：1978-03-08

    申请人： Akiyoshi Suzuki ,  Ryozo Hiraga ,  Ichiro Kano ,  Hideki Yoshinari ,  Masao Totsuka ,  Yuzo Kato ,  Yasuo Ogino

    发明人： Akiyoshi Suzuki ,  Ryozo Hiraga ,  Ichiro Kano ,  Hideki Yoshinari ,  Masao Totsuka ,  Yuzo Kato ,  Yasuo Ogino

    IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  H01L21/67 ,  H01L21/68 ,  G05B1/06

    CPC分类号： G03F9/70

    摘要： An alignment apparatus for mask and wafer each having alignment marks provided in a narrow strip like area between circuit patterns is disclosed, which mask and wafer are used in manufacturing semiconductor circuit elements. In the apparatus, the mask and wafer are scanned to obtain scan signals by means of which the amount of relative deviation between the alignment marks on mask and wafer is detected. By means of the detected signal, an alignment is effected between the mask and wafer in the apparatus. For this type of alignment apparatus, there is a problem that since the alignment marks are provided in the narrow strip like area, no coincidence between the scanning position and the strip area is attainable with pre-alignment accuracy. Improvement in the alignment apparatus according to the invention lies in that a reading of alignment marks is initiated after the coincidence is photoelectrically detected.

    摘要翻译： 公开了一种用于掩模和晶片的对准装置，每个具有设置在电路图案之间的窄带状区域中的对准标记，该掩模和晶片用于制造半导体电路元件。 在该装置中，对掩模和晶片进行扫描以获得扫描信号，通过该扫描信号检测掩模和晶片上的对准标记之间的相对偏离量。 通过检测到的信号，在设备中的掩模和晶片之间进行对准。 对于这种对准装置，存在这样的问题，即由于将对准标记设置在窄条状区域中，所以在预定位精度下不能使扫描位置和条带区域之间重合。 根据本发明的对准装置的改进在于，在光电检测一致之后开始对准标记的读取。

    COATED FILM
    10.
    发明申请
    COATED FILM 审中-公开
    涂膜

    公开(公告)号：US20140356629A1

    公开(公告)日：2014-12-04

    申请号：US14238483

    申请日：2012-08-30

    申请人： Yuzo Kato ,  Taishi Kawasaki ,  Masato Fujita

    发明人： Yuzo Kato ,  Taishi Kawasaki ,  Masato Fujita

    IPC分类号： C09D167/02

    CPC分类号： C09D167/02 ,  G02B1/111 ,  Y10T428/31511 ,  C08K3/22 ,  C08K5/1515 ,  C08L67/02

    摘要： According to the present invention, there is provide a coated film that suffers from less occurrence of interference fringes when forming various surface functional layers such as a hard coat layer thereon, and can exhibit a good visibility and an excellent adhesion property to the surface functional layers.The present invention relates to a coated film comprising: a polyester film, a first coating layer formed on one surface of the polyester film which is prepared from a coating solution comprising a polyester resin, titanium oxide and an epoxy compound, and a second coating layer formed on the other surface of the polyester film which is prepared from a coating solution comprising a metal oxide and two or more crosslinking agents and which has an absolute reflectance having one minimum value in a wavelength range of 400 to 800 nm, and which has the absolute reflectance at the minimum value of not less than 4.0%.

    摘要翻译： 根据本发明，提供一种涂布膜，当在其上形成各种表面功能层如硬涂层时，其干涉条纹的发生较少，并且可以显示出良好的可见性和对表面功能层的优异粘合性 。 本发明涉及一种涂膜，包括：聚酯膜，由聚酯树脂，氧化钛和环氧化合物的涂布溶液制成的聚酯膜的一个表面上形成的第一涂层和第二涂层 形成在由包含金属氧化物和两种或更多种交联剂的涂布溶液制备的聚酯膜的另一表面上，并且其具有在400至800nm的波长范围内具有一个最小值的绝对反射率，并且其具有 绝对反射率最小值不小于4.0％。