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192 条记录 (耗时 0.043 秒)

    Winding type plasma CVD apparatus
    1.
    发明授权
    Winding type plasma CVD apparatus 有权
    卷绕式等离子体CVD装置

    公开(公告)号：US07896968B2

    公开(公告)日：2011-03-01

    申请号：US11792810

    申请日：2006-05-10

    申请人： Takayoshi Hirono ,  Isao Tada ,  Atsushi Nakatsuka ,  Masashi Kikuchi ,  Hideyuki Ogata ,  Hiroaki Kawamura ,  Kazuya Saito ,  Masatoshi Sato

    发明人： Takayoshi Hirono ,  Isao Tada ,  Atsushi Nakatsuka ,  Masashi Kikuchi ,  Hideyuki Ogata ,  Hiroaki Kawamura ,  Kazuya Saito ,  Masatoshi Sato

    IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306

    CPC分类号： H01J37/3277 ,  B08B7/00 ,  C23C16/4405 ,  C23C16/46 ,  C23C16/5096 ,  C23C16/545 ,  H01J37/32009

    摘要： The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film.A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33, 34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37). Self-cleaning can be carried out in the path of the deposition onto the film by closing the aperture of a mask (51) with a shutter (65), thereby preventing leakage of cleaning gas.

    摘要翻译： 本发明的目的是提供一种绕线式等离子体CVD装置，通过将反应气体均匀地供应到膜的沉积区域，可以使层的质量均匀，并且可以进行沉积部分的自清洁处理 在沉积到膜上的路径。 相对于膜的行进方向，膜（22）被支撑在布置在沉积部分（25）的上游侧和下游侧的一对可动辊（33,34）之间，然后，膜（22） 使其在沉积位置大致线性地移动。 因此，喷淋板（37）和膜（22）之间的距离保持恒定，并且使层的质量均匀。 薄膜通过金属带（40）加热，同时在薄膜背面行进。 可移动辊（33,34）从沉积位置上升到自清洁位置，并且膜（22）可以与喷淋板（37）分离。 通过用挡板（65）封闭掩模（51）的孔径，可以在沉积到膜上的路径中进行自清洁，从而防止清洁气体的泄漏。

    Winding Type Plasma Cvd Apparatus
    2.
    发明申请
    Winding Type Plasma Cvd Apparatus 有权
    绕组式等离子体Cvd装置

    公开(公告)号：US20080006206A1

    公开(公告)日：2008-01-10

    申请号：US11792810

    申请日：2006-05-10

    申请人： Takayoshi Hirono ,  Isao Tada ,  Atsushi Nakatsuka ,  Masashi Kikuchi ,  Hideyuki Ogata ,  Hiroaki Kawamura ,  Kazuya Saito ,  Masatoshi Sato

    发明人： Takayoshi Hirono ,  Isao Tada ,  Atsushi Nakatsuka ,  Masashi Kikuchi ,  Hideyuki Ogata ,  Hiroaki Kawamura ,  Kazuya Saito ,  Masatoshi Sato

    IPC分类号： C23C16/505 ,  C23C16/44 ,  H01L21/205

    CPC分类号： H01J37/3277 ,  B08B7/00 ,  C23C16/4405 ,  C23C16/46 ,  C23C16/5096 ,  C23C16/545 ,  H01J37/32009

    摘要： The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film. A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33,34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37). Self-cleaning can be carried out in the path of the deposition onto the film by closing the aperture of a mask (51) with a shutter (65), thereby preventing leakage of cleaning gas.

    摘要翻译： 本发明的目的是提供一种绕线式等离子体CVD装置，通过将反应气体均匀地供应到膜的沉积区域，可以使层的质量均匀，并且可以进行沉积部分的自清洁处理 在沉积到膜上的路径。 相对于膜的行进方向，膜（22）被支撑在布置在沉积部分（25）的上游侧和下游侧的一对可动辊（33,34）之间，然后，膜（22） 使其在沉积位置基本线性地行进。 因此，喷淋板（37）和膜（22）之间的距离保持恒定，并且使层的质量均匀。 薄膜通过金属带（40）加热，同时在薄膜背面行进。 可移动辊（33,34）从沉积位置上升到自清洁位置，并且膜（22）可以与喷淋板（37）分离。 通过用挡板（65）封闭掩模（51）的孔径，可以在沉积到膜上的路径中进行自清洁，从而防止清洁气体的泄漏。

    Fixing device and image forming apparatus
    5.
    发明授权
    Fixing device and image forming apparatus 有权

    公开(公告)号：US10067449B2

    公开(公告)日：2018-09-04

    申请号：US15194090

    申请日：2016-06-27

    申请人： Ryohei Matsuda ,  Yutaka Ikebuchi ,  Yasunori Ishigaya ,  Kazuya Saito ,  Keitaro Shoji

    发明人： Ryohei Matsuda ,  Yutaka Ikebuchi ,  Yasunori Ishigaya ,  Kazuya Saito ,  Keitaro Shoji

    IPC分类号： G03G15/20

    CPC分类号： G03G15/2053 ,  G03G15/2042 ,  G03G2215/2035

    摘要： A fixing device includes a primary heater and a secondary heater that heat a fixing rotator. The primary heater includes a primary major heat generation portion and a primary minor heat generation portion. The primary minor heat generation portion includes a major heat generator that generates an increased amount of heat and a minor heat generator that generates a decreased amount of heat smaller than the increased amount of heat generated by the major heat generator. The major heat generator has a width in an axial direction of the fixing rotator that is not smaller than 30 percent and not greater than 35 percent with respect to a width of the primary minor heat generation portion in the axial direction of the fixing rotator. A temperature detector is disposed opposite the minor heat generator of the primary heater to detect a temperature of the fixing rotator.

    Fixing device and image forming apparatus
    8.
    发明授权
    Fixing device and image forming apparatus 有权
    固定装置和成像装置

    公开(公告)号：US09575447B2

    公开(公告)日：2017-02-21

    申请号：US15010262

    申请日：2016-01-29

    申请人： Yutaka Ikebuchi ,  Yasunori Ishigaya ,  Takuya Seshita ,  Kazuya Saito ,  Motoyoshi Yamano ,  Keitaro Shoji

    发明人： Yutaka Ikebuchi ,  Yasunori Ishigaya ,  Takuya Seshita ,  Kazuya Saito ,  Motoyoshi Yamano ,  Keitaro Shoji

    IPC分类号： G03G15/20

    CPC分类号： G03G15/2053 ,  G03G15/2064

    摘要： A fixing device includes a nip formation pad to form a fixing nip between a first fixing rotator and a second fixing rotator, through which a recording medium bearing a toner image is conveyed. The nip formation pad includes a first planar face, a second planar face disposed downstream from the first planar face in a recording medium conveyance direction and being parallel to the first planar face, and a joint face bridging the first planar face and the second planar face. The joint face includes a first curved portion adjoining the first planar face and having a first curvature in a first direction in which a circumferential face of the second fixing rotator is curved and a second curved portion adjoining the second planar face and having a second curvature in a second direction opposite the first direction.

    摘要翻译： 定影装置包括压区形成垫，以在第一固定旋转器和第二固定旋转器之间形成定影夹持部，通过该固定旋转器传送承载调色剂图像的记录介质。 压区形成垫包括第一平面，第二平面，其在记录介质传送方向上设置在第一平面的下游并且平行于第一平面;以及接合面，桥接第一平面和第二平面 。 接合面包括与第一平面相邻的第一弯曲部分，并且具有第一方向的第一曲率，其中第二定影旋转体的周面弯曲，第二弯曲部分邻接第二平面并且具有第二曲率 与第一方向相反的第二方向。

    FIXING DEVICE AND IMAGE FORMING APPARATUS
    9.
    发明申请
    FIXING DEVICE AND IMAGE FORMING APPARATUS 审中-公开
    固定装置和图像形成装置

    公开(公告)号：US20170010571A1

    公开(公告)日：2017-01-12

    申请号：US15194090

    申请日：2016-06-27

    申请人： Ryohei MATSUDA ,  Yutaka Ikebuchi ,  Yasunori Ishigaya ,  Kazuya Saito ,  Keitaro Shoji

    发明人： Ryohei MATSUDA ,  Yutaka Ikebuchi ,  Yasunori Ishigaya ,  Kazuya Saito ,  Keitaro Shoji

    IPC分类号： G03G15/20

    CPC分类号： G03G15/2053 ,  G03G15/2042 ,  G03G2215/2035

    摘要： A fixing device includes a primary heater and a secondary heater that heat a fixing rotator. The primary heater includes a primary major heat generation portion and a primary minor heat generation portion. The primary minor heat generation portion includes a major heat generator that generates an increased amount of heat and a minor heat generator that generates a decreased amount of heat smaller than the increased amount of heat generated by the major heat generator. The major heat generator has a width in an axial direction of the fixing rotator that is not smaller than 30 percent and not greater than 35 percent with respect to a width of the primary minor heat generation portion in the axial direction of the fixing rotator. A temperature detector is disposed opposite the minor heat generator of the primary heater to detect a temperature of the fixing rotator.

    摘要翻译： 定影装置包括加热定影旋转器的主加热器和二次加热器。 主加热器包括主要主要发热部分和初级次要发热部分。 主要次要发热部分包括产生增加的热量的主要发热体和产生比主要发热体产生的增加的热量小的热量减少的次要发热体。 主发热体的固定旋转体的轴向宽度相对于初级次发热部在固定旋转体的轴向上的宽度为30％以上且35％以下。 温度检测器设置成与初级加热器的次要发热体相对，以检测定影旋转器的温度。