公开(公告)号：US5441076A

公开(公告)日：1995-08-15

申请号：US222589

申请日：1994-04-04

申请人： Shuji Moriya ,  Takenobu Matsuo ,  Tsuyoshi Wakabayashi ,  Kazutoshi Miura ,  Takahiro Mori

发明人： Shuji Moriya ,  Takenobu Matsuo ,  Tsuyoshi Wakabayashi ,  Kazutoshi Miura ,  Takahiro Mori

IPC分类号： G05D7/06

CPC分类号： G05D7/0635 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/87885

摘要： A vertical heat treatment apparatus includes a heat treatment unit for performing a heat treatment process to a semiconductor wafer using a gas and a gas supply unit for supplying the gas to the heat treatment unit. The gas supply unit includes a plurality of gas controlling instruments having a plurality of gas flow control devices, a gas controlling instruments-storage vessel for storing the instruments, and a plurality of electrical parts arranged outside the storage vessel and belonging to the instruments, and an electrical parts-storage vessel for storing the electrical parts, and the plurality of gas flow control devices are integrated with each other by block-like joints.

摘要翻译： 立式热处理装置包括：热处理单元，用于使用气体和用于将气体供给到热处理单元的气体供给单元对半导体晶片进行热处理处理。 气体供给单元包括具有多个气体流量控制装置的多个气体控制装置，用于存储仪器的气体控制装置 - 储存容器，以及设置在存储容器外部并属于仪器的多个电气部件，以及 用于存储电气部件的电气部件存储容器，并且多个气体流量控制装置通过块状接头彼此一体化。

公开(公告)号：US5439026A

公开(公告)日：1995-08-08

申请号：US164545

申请日：1993-12-10

申请人： Shuji Moriya ,  Takenobu Matsuo ,  Tsuyoshi Wakabayashi

发明人： Shuji Moriya ,  Takenobu Matsuo ,  Tsuyoshi Wakabayashi

IPC分类号： G05D7/06

CPC分类号： G05D7/0635 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/87885 ,  Y10T137/9029

摘要： There is disclosed a flow control apparatus including a base body having a fluid inlet and a fluid outlet and a flow path for causing the inlet to communicate with the outlet, a flow adjustment means for adjusting a flow rate of the fluid in the flow path of said base body, a flow-rate detection means for detecting the flow rate of the fluid in the flow path, and a flow control means for outputting a flow-rate control signal to the flow adjustment means on the basis of a detection result of the flow-rate detection means to control the flow rate of the fluid to a predetermined value. At least one of the fluid inlet and the fluid outlet is positioned such that the flow direction of the fluid at a corresponding one of the fluid inlet and the fluid outlet is perpendicular to the flow path.

摘要翻译： 公开了一种流量控制装置，其包括具有流体入口和流体出口的基体，以及用于使入口与出口连通的流路，流量调节装置，用于调节流体入口和流体出口的流动路径中的流体的流速 所述基体，用于检测流路中流体的流量的流量检测装置，以及流量控制装置，用于根据流量调节装置的检测结果向流量调节装置输出流量控制信号 流量检测装置，用于将流体的流量控制到预定值。 流体入口和流体出口中的至少一个被定位成使得流​​体入口和流体出口中的相应一个处的流体的流动方向垂直于流动路径。

公开(公告)号：US5421365A

公开(公告)日：1995-06-06

申请号：US53354

申请日：1993-04-28

申请人： Takenobu Matsuo ,  Tsuyoshi Wakabayashi ,  Shuji Moriya

发明人： Takenobu Matsuo ,  Tsuyoshi Wakabayashi ,  Shuji Moriya

IPC分类号： C23C14/54 ,  C30B25/14 ,  G05D7/06 ,  H01L21/205 ,  H01L21/302 ,  H01L21/31

CPC分类号： G05D7/0635 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/87362

摘要： A flow control apparatus comprises a base body, first and second gas passages provided in the base body for passing gas therethrough, gas flow adjusting mechanism, provided so as to connect the first and second gas passages to each other, for adjusting the flow of gas passing therethrough, and gas flow control unit for outputting a flow control signal to the gas flow adjusting mechanism so as to control the flow of gas passing through the first or second gas passage. In the base body, a bypass passage is formed in the base body for connecting the first and second gas passages to each other, and a valve mechanism is employed for opening and closing the bypass passage. When a trouble has occurred, the valve mechanism is opened, and a purging gas is supplied through the bypass passage to purge a flammable or noxious gas. Thereafter, the gas flow control apparatus is removed and repaired.

摘要翻译： 一种流量控制装置，包括：基体，设置在基体中的用于使气体通过的第一和第二气体通道，设置成将第一和第二气体通路彼此连接的气体流量调节机构，用于调节气体流量 以及气体流量控制单元，用于向气体流量调节机构输出流量控制信号，以控制通过第一或第二气体通道的气体的流动。 在基体中，在基体中形成有用于将第一和第二气体通路彼此连接的旁通通道，并且采用阀机构来打开和关闭旁路通道。 当发生故障时，阀机构打开，并且通过旁路通道供应净化气体以吹扫易燃或有害气体。 此后，除去并修理气体流量控制装置。

公开(公告)号：US5294280A

公开(公告)日：1994-03-15

申请号：US904556

申请日：1992-06-26

申请人： Tsuyoshi Wakabayashi ,  Takenobu Matsuo ,  Shuji Moriya ,  Hidenobu Arimitsu

发明人： Tsuyoshi Wakabayashi ,  Takenobu Matsuo ,  Shuji Moriya ,  Hidenobu Arimitsu

IPC分类号： C23C16/44 ,  G01N27/416 ,  H01L21/00

CPC分类号： G01N27/4162 ,  C23C16/4401

摘要： A gas measuring device includes a dissolving unit for dissolving gas to be measured in solvent medium, a measuring unit for measuring the amount of ions generated when the gas to be measured is ionized in the liquid medium, and a calculating unit for calculating the amount of the gas to be measured from a value measured by the measuring unit.

摘要翻译： 一种气体测量装置，包括用于将待测量的气体溶解在溶剂介质中的溶解单元，用于测量待测气体在液体介质中离子化时产生的离子量的测量单元，以及计算单元， 由测量单元测量的值测量的气体。

公开(公告)号：US08381755B2

公开(公告)日：2013-02-26

申请号：US13483159

申请日：2012-05-30

申请人： Shuji Moriya ,  Wataru Okase ,  Tsutomu Shinohara ,  Nobukazu Ikeda ,  Michio Yamaji ,  Yasutaka Hayashi ,  Toshihide Yoshida ,  Yasuyuki Omata

发明人： Shuji Moriya ,  Wataru Okase ,  Tsutomu Shinohara ,  Nobukazu Ikeda ,  Michio Yamaji ,  Yasutaka Hayashi ,  Toshihide Yoshida ,  Yasuyuki Omata

IPC分类号： G05D7/06 ,  G05D7/00 ,  F16K31/12 ,  F16K31/02 ,  G01F25/00

CPC分类号： G05D7/0635 ,  Y10T137/2708 ,  Y10T137/776 ,  Y10T137/7761 ,  Y10T137/7793

摘要： A pressure type flow rate control reference allows the performance of flow rate calibrations of a flow rate controller on all types of gases, including corrosive gases, at low costs, and also has excellent flow rate control accuracy. The pressure type flow rate control reference includes a pressure controller for adjusting the pressure of a calibration gas from a calibration gas supply source, a first volume provided on the downstream side of a pressure controller, a first connection mouth of an uncalibrated flow rate controller provided on the downstream side of the first volume, a reference pressure type flow rate controller connected to a second connection mouth on the downstream side of the uncalibrated flow rate controller, a second volume provided on the downstream side of a reference pressure type flow rate controller, and an evacuation device provided on the downstream side of the second volume.

摘要翻译： 压力式流量控制参考允许以低成本执行流量控制器对所有类型气体（包括腐蚀性气体）的流量校准，并且还具有优异的流量控制精度。 压力型流量控制基准包括用于调节来自校准气体供给源的校准气体的压力的压力控制器，设置在压力控制器的下游侧的第一容积，未校准的流量控制器的第一连接口， 在第一容积的下游侧具有与未校准流量控制器的下游侧的第二连接口连接的基准压力型流量控制器，设置在基准压力型流量控制器的下游侧的第二容积， 以及设置在第二容积的下游侧的抽空装置。

公开(公告)号：US20120055402A1

公开(公告)日：2012-03-08

申请号：US13262005

申请日：2010-03-30

申请人： Shuji Moriya ,  Toyohiko Shindo ,  Noboru Tamura

发明人： Shuji Moriya ,  Toyohiko Shindo ,  Noboru Tamura

IPC分类号： C23C16/455 ,  C23C16/48

CPC分类号： C23C16/4402 ,  C23C16/448 ,  C23C16/4488 ,  C23C16/452 ,  C23C16/45561 ,  C23C16/52

摘要： A processing apparatus includes a gas supply passage for supplying a corrosive gas having a halogen, a part of the passage being made of a metal; a stabilization reaction unit which has an energy generator for supplying light energy or heat energy to the corrosive gas that has passed through the metallic part of the gas supply passage and/or has an obstacle configured to apply a collision energy to the corrosive gas that has passed through the metallic part of the gas supply passage, the collision energy being generated from a collision between the obstacle and said corrosive gas. A reaction for stabilizing a compound containing the metal and the halogen contained in the corrosive gas takes place by means of at least one of the light energy, heat energy, and collision energy; and a trapping unit which traps the compound stabilized in the stabilization reaction unit.

摘要翻译： 一种处理装置，包括用于供给具有卤素的腐蚀性气体的气体供给通道，所述通道的一部分由金属制成; 稳定化反应单元，其具有能量发生器，用于向已经通过气体供给通道的金属部分的腐蚀性气体提供光能或热能，和/或具有构造成将碰撞能量施加到具有 通过供气通道的金属部分，碰撞能量是由障碍物和腐蚀性气体之间的碰撞产生的。 通过光能，热能和碰撞能量中的至少一种，使包含在腐蚀性气体中的金属和卤素的化合物稳定化的反应; 以及捕获稳定化反应单元中稳定化合物的捕集单元。

公开(公告)号：US07682843B2

公开(公告)日：2010-03-23

申请号：US11817104

申请日：2006-06-28

申请人： Shuji Moriya ,  Tsuneyuki Okabe ,  Hiroyuki Ebi ,  Tetsuo Shimizu ,  Hitoshi Kitagawa

发明人： Shuji Moriya ,  Tsuneyuki Okabe ,  Hiroyuki Ebi ,  Tetsuo Shimizu ,  Hitoshi Kitagawa

IPC分类号： H01L21/66

CPC分类号： G05D7/0658 ,  C23C16/455 ,  C23C16/45561 ,  C23C16/52

摘要： Zero point shift based on thermal siphon effect occurring actually when a substrate is processed is detected accurately and corrected suitably. The semiconductor fabrication system comprises a gas supply passage (210) for supplying gas into a heat treatment unit (110), an MFC (240) for comparing an output voltage from a detecting unit for detecting the gas flow rate of the gas supply passage with a set voltage corresponding to a preset flow rate and controlling the gas flow rate of the gas supply passage to the set flow rate, and a control unit (300). The control unit replaces gas in the MFC by gas which is to be used at least for processing a substrate before the substrate is processed, detects the output voltage from the MFC under a state where valves (230, 250) provided in the upstream and the downstream of the MFC are closed and stores the detected output voltage in a storage unit, corrects the set voltage corresponding to the flow rate of gas to be used for processing the substrate based on the output voltage from the MFC stored in the storage unit at the time of processing the substrate, and sets the corrected set voltage in the MFC.

摘要翻译： 基于处理基板时实际发生的热虹吸效应的零点偏移被准确地检测并适当地校正。 半导体制造系统包括用于将气体供给到热处理单元（110）中的气体供给通道（210），MFC（240），用于将用于检测气体供应通道的气体流量的检测单元的输出电压与 与设定的流量对应的设定电压，将气体供给通路的气体流量控制为设定的流量，以及控制单元（300）。 控制单元通过在基板被处理之前至少用于处理基板的气体来替换MFC中的气体，在设置在上游的阀（230,250）的状态下检测来自MFC的输出电压， 关闭MFC的下游并将检测到的输出电压存储在存储单元中，基于来自存储在存储单元中的MFC的输出电压来校正与用于处理衬底的气体的流量对应的设定电压 处理基板的时间，并将校正的设定电压设置在MFC中。

公开(公告)号：US07239831B2

公开(公告)日：2007-07-03

申请号：US11011145

申请日：2004-12-15

申请人： Kazunari Hagiwara ,  Kouichi Okuda ,  Yasunori Chigono ,  Yasushi Shimizu ,  Hikaru Osada ,  Shuji Moriya

发明人： Kazunari Hagiwara ,  Kouichi Okuda ,  Yasunori Chigono ,  Yasushi Shimizu ,  Hikaru Osada ,  Shuji Moriya

IPC分类号： G03G15/09

CPC分类号： G03G15/065 ,  G03G2215/0617

摘要： An image forming apparatus includes an image bearing member; a charging device for electrically charging the image bearing member; a rotatable developer carrying member for carrying a developer to develop an electrostatic image formed on the image bearing member with the developer, the developer carrying member being supplied with a developing bias voltage including an AC voltage; non-rotatable magnetic field generating device, disposed inside the developer carrying member, for magnetically attracting the developer on the developer carrying member, wherein the developer carrying member has a surface elastic layer, and the developer carrying member is press-contacted to the image bearing member, and the developer is one component magnetic toner, and a maximum value of an absolute value of the developing bias voltage |V|max and a surface potential of the image bearing member charge by the charging device is Vd(V), satisfy, |V|max=|Vd|.

摘要翻译： 图像形成装置包括：图像承载部件; 用于对图像承载部件进行充电的充电装置; 可转动显影剂承载构件，用于承载显影剂以使显影剂形成在图像承载构件上形成的静电图像，显影剂承载构件被提供包括AC电压的显影偏压; 非旋转磁场产生装置，设置在显影剂承载构件内部，用于将显影剂吸引在显影剂承载构件上，其中显影剂承载构件具有表面弹性层，并且显影剂承载构件与图像承载件压接 显影剂是单组分磁性调色剂，显影偏压| V | max的绝对值的最大值和由充电装置充电的图像承载部件的表面电位为Vd（V）满足， <？in-line-formula description =“In-line Formulas”end =“lead”？> | V | max = | Vd |。<？in-line-formula description =“In-line Formulas”end =“tail “？>

公开(公告)号：US07233758B2

公开(公告)日：2007-06-19

申请号：US11011119

申请日：2004-12-15

申请人： Hikaru Osada ,  Kouichi Okuda ,  Yasushi Shimizu ,  Yasunori Chigono ,  Kenya Ogawa ,  Shuji Moriya ,  Kazunari Hagiwara

发明人： Hikaru Osada ,  Kouichi Okuda ,  Yasushi Shimizu ,  Yasunori Chigono ,  Kenya Ogawa ,  Shuji Moriya ,  Kazunari Hagiwara

IPC分类号： G03G15/08

CPC分类号： G03G15/09 ,  G03G9/0836 ,  G03G9/0837

摘要： A developing device includes a rotatable developer carrying member for carrying a developer to develop an electrostatic image formed on an image bearing member with the developer; non-rotatable magnetic field generating means, disposed inside the developer carrying member, for magnetically attracting the developer on the developer carrying member; a regulating member for regulating an amount of the developer carried on the developer carrying member, wherein the developer carrying member is provided with a surface elastic layer, and the developer carrying member is press-contacted to the image bearing member, and wherein, the developer is an one component magnetic toner having an average circularity not less than 0.965, and an amount of the developer per unit area of the developer regulated by the regulating member is 5-14 g/m2, and an amount of electric charge thereof is 10-50 μC/g.

摘要翻译： 显影装置包括可旋转的显影剂承载构件，用于承载显影剂以使显影剂形成在图像承载构件上的静电图像显影; 非旋转磁场产生装置，设置在显影剂承载构件内部，用于将显影剂磁性地吸引在显影剂承载构件上; 用于调节载持在显影剂承载构件上的显影剂的量的调节构件，其中显影剂承载构件设置有表面弹性层，并且显影剂承载构件与图像承载构件压接，并且其中，显影剂 是平均圆形度不小于0.965的单组分磁性调色剂，并且由调节构件调节的显影剂的每单位面积的显影剂的量为5-14g / m 2，并且 其电荷量为10-50微克/克。

公开(公告)号：US20060171745A1

公开(公告)日：2006-08-03

申请号：US11275729

申请日：2006-01-26

申请人： Kazunari Hagiwara ,  Kenya Ogawa ,  Shuji Moriya ,  Naoto Kichijima ,  Yasushi Shimizu ,  Koichi Okuda

发明人： Kazunari Hagiwara ,  Kenya Ogawa ,  Shuji Moriya ,  Naoto Kichijima ,  Yasushi Shimizu ,  Koichi Okuda

IPC分类号： G03G15/09

CPC分类号： G03G15/0812 ,  G03G15/0914 ,  G03G2215/0634

摘要： A developing apparatus having a developing sleeve provided with an elastic layer on its surface, and for developing an electrostatic image formed on an image bearing member with a mono-component magnetic toner having a mean degree of circularity of 0.965 or greater, a magnet provided in the developing sleeve, and a blade for regulating the amount of the developer carried on the developing sleeve satisfies the expressions |Br|/|B|≧0.5 and Nsb/(Bs×R)≦0.5, where B [G] is magnetic flux density formed on the surface of the developing sleeve by the magnet at the contact position between the blade and the developing sleeve, Nsb [mm] is the contact width between the blade and the developing sleeve, Br [G] is a component of magnetic flux density B [G] in a direction perpendicular to the surface of the developing sleeve, Bs [rad] is a half value width of the perpendicular component of the magnetic flux density of the nearest one of the magnetic poles of the magnet to the contact position on the surface of the developing sleeve, and R [mm] is the radius of the developing sleeve.

摘要翻译： 一种显影装置，具有在其表面上设置有弹性层的显影套筒，并且利用平均圆形度为0.965以上的单组分磁性调色剂在图像承载部件上形成静电图像，所述静电图像设置在 显影套筒和用于调节显影套筒上承载的显影剂量的刀片满足表达式| Br | / | B |> = 0.5和Nsb /（BsxR）<= 0.5，其中B [G]是磁通量 通过磁体在叶片和显影套筒之间的接触位置处形成在显影套筒的表面上的密度Nsb [mm]是刀片和显影套筒之间的接触宽度，Br [G]是磁通量的分量 密度B [G]在垂直于显影套筒表面的方向上，Bs [rad]是磁体的最接近的一个磁极与接触位置的磁通密度的垂直分量的半值宽度 在上 显影套筒的表面，R [mm]是显影套筒的半径。