摘要:
According to the present invention, there is provided an electrode structure which includes: a nitride semiconductor layer; an electrode provided over the nitride semiconductor layer; and an electrode protective film provided over the electrode, wherein the nitride semiconductor layer contains a metal nitride containing Nb, Hf or Zr as a constitutive element, the electrode has a portion having a metal oxide containing Ti or V as a constitutive element formed therein, and the electrode protective film covers at least a portion of the electrode, and contains a protective layer having Au or Pt as a constitutive element.
摘要:
According to the present invention, there is provided an electrode structure which includes: a nitride semiconductor layer; an electrode provided over the nitride semiconductor layer; and an electrode protective film provided over the electrode, wherein the nitride semiconductor layer contains a metal nitride containing Nb, Hf or Zr as a constitutive element, the electrode has a portion having a metal oxide containing Ti or V as a constitutive element formed therein, and the electrode protective film covers at least a portion of the electrode, and contains a protective layer having Au or Pt as a constitutive element.
摘要:
A first layer containing Ti as a constituent element, a second layer containing Nb as a constituent element, and a third layer containing Au as a constituent element are formed on a GaN substrate 11. Thereafter, the GaN substrate 11 and the first to third layers are kept at 700° C. or higher and at 1300° C. or lower. This allows a metal oxide of Ti to be distributed to extend from the interface between the GaN substrate 11 and the electrode 14 over to the inside of the electrode 14. Further, a metal nitride of Nb is formed in the inside of the GaN substrate 11. The metal nitride of Nb will be distributed to extend from the inside of the electrode 14 over to the inside of the GaN substrate 11.
摘要:
According to the present invention, there is provided an electrode structure which includes: a nitride semiconductor layer; an electrode provided over the nitride semiconductor layer; and an electrode protective film provided over the electrode, wherein the nitride semiconductor layer contains a metal nitride containing Hb, Hf or Zr as a constitutive element, the electrode has a portion having a metal oxide containing Ti or V as a constitutive element formed therein, and the electrode protective film covers at least a portion of the electrode, and contains a protective layer having Au or Pt as a constitutive element.
摘要:
The Si waveguide 305 includes a first conductivity-type Si layer 301 and an intrinsic Si layer 302, and a second conductivity-type light-absorption layer 303 is partially formed on an area thereof. During operation, a reverse bias is applied between the first conductivity-type Si layer 301 and the light-absorption layer 303. Since the light-absorption layer 303 has a conductivity type, it is not depleted when a voltage is applied, but the intrinsic Si layer 302 forming the Si waveguide 305 is depleted. Therefore, it is possible to reduce a CR time constant. Furthermore, since the intrinsic Si layer 302 can be formed on the first conductivity-type Si layer 301 in a continuous manner, it is possible to reduce lattice defects. As a result, it is possible to suppress the dark current generated in the light-receiving element.
摘要:
A light receiving element 1 has a semiconductor substrate 101; a first mesa 11 provided over the semiconductor substrate 101, and having an active region and a first electrode (p-side electrode 111) provided over the active region; a second mesa 12 provided over the semiconductor substrate 101, and having a semiconductor layer and a second electrode (n-side electrode 121) provided over the semiconductor layer; and a third mesa 13 provided over the semiconductor substrate 101, and having a semiconductor layer, wherein the third mesa 13 is arranged so as to surround the first mesa 11.
摘要:
A feed velocity of a control axis and acceleration thereof do not exceed a maximum feed velocity and a maximum acceleration defined in mechanical specifications even if a radial operation is carried out for the purpose of a cut-in or escape operation in a contour describing control. A radial permissible maximum velocity (Vnp) and a radial permissible maximum acceleration (&agr;np) in a contour describing control using a circular interpolation is set separately from a setting value of a maximum feed velocity (Vm) of a control axis and that of a maximum acceleration (&agr;m) thereof set as mechanical specifications, and when a command of the circular interpolation is given, limitations are given to a radial velocity (Vn) and acceleration (&agr;n) so that the radial velocity (Vn) and acceleration (&agr;n) do not exceed the radial permissible maximum velocity (Vnp) and permissible maximum acceleration (&agr;np).
摘要:
Disclosed is a semiconductor light-receiving device having high reproducibility and reliability. Also disclosed is a method for manufacturing a semiconductor light-receiving device. Specifically disclosed is a semiconductor light-receiving device 100 with a mesa structure wherein a light-absorbing layer 6, an avalanche multiplication layer 4 and an electric-field relaxation layer 5 are formed on a semiconductor substrate 2. The light-absorbing layer 6, avalanche multiplication layer 4 and electric-field relaxation layer 5 exposed in the side wall of the mesa structure are protected by an SiNx film or an SiOyNz film. The hydrogen concentration in the side wall surface of the electric-field relaxation layer 5 is set at not more than 15%, preferably not more than 10% of the carrier concentration of the electric-field relaxation layer 5.
摘要:
A numerical control device is disclosed having a parameter memory section 12B that stores discrete optimum parameters for respective operational modes, an operational mode setting switch 20 to allow operational modes to be selectively set through user's operation, and a defect content setting means for registering defect contents of machined results. The optimum parameter, suited for a particular operational mode selected and set with the operational mode setting switch 20, is retrieved for executing setting of the parameter while enabling setting of the parameter based on information obtained with the defect content setting means.
摘要:
A position control apparatus and method has been devised which provides for an improved means of suppressing tracking error from a variable position reference occurring when a control object positioned via a transmission mechanism with mechanical transmission error resumes movement from a state stopped at a target position. A selection between two alternative tracking error compensating means within the control apparatus is made based on whether the detected position of the control object changes in a period after the control object stops and before the variable position reference is input again to a control deviation generating unit.