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1.发明授权公开(公告)号：US09069133B2
公开(公告)日：2015-06-30
申请号：US10495686
申请日：2002-11-12
申请人： Teresa Baldwin , Joseph Kennedy , Nancy Iwamoto , Tadashi Nakano , William Bedwell , Jason Stuck , Arlene Suedemeyer , Mello Hebert
发明人： Teresa Baldwin , Joseph Kennedy , Nancy Iwamoto , Tadashi Nakano , William Bedwell , Jason Stuck , Arlene Suedemeyer , Mello Hebert
IPC分类号： C08G77/26 , G02B5/23 , C03C17/00 , C03C17/30 , C08G77/04 , C08G77/12 , C08K5/00 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/09 , H01L21/027
CPC分类号： G02B5/23 , C03C17/008 , C03C17/30 , C08G77/04 , C08G77/12 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/091 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要： Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.
摘要翻译： 用于紫外光刻的抗反射涂层材料包括至少一种吸收化合物和至少一种材料改性剂，例如至少一种致孔剂，至少一种高沸点溶剂，至少一种封端剂，至少一种流平剂， 至少一种催化剂，至少一种替代溶剂，至少一种pH调节剂和/或其组合，其掺入无机基材料或无机组合物和/或化合物中。 合适的吸收化合物是可以在光刻中使用的波长如365nm，248nm，193nm和157nm的那些吸收化合物。
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2.发明申请公开(公告)号：US20140227538A1
公开(公告)日：2014-08-14
申请号：US10495686
申请日：2002-11-12
申请人： Teresa Baldwin , Joseph Kennedy , Nancy Iwamoto , Tadashi Nakano , William Bedwell , Jason Stuck , Arlene Suedmeyer , Mello Hebert
发明人： Teresa Baldwin , Joseph Kennedy , Nancy Iwamoto , Tadashi Nakano , William Bedwell , Jason Stuck , Arlene Suedmeyer , Mello Hebert
CPC分类号： G02B5/23 , C03C17/008 , C03C17/30 , C08G77/04 , C08G77/12 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/091 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要： Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds
摘要翻译： 用于紫外光刻的抗反射涂层材料包括至少一种吸收化合物和至少一种材料改性剂，例如至少一种致孔剂，至少一种高沸点溶剂，至少一种封端剂，至少一种流平剂， 至少一种催化剂，至少一种替代溶剂，至少一种pH调节剂和/或其组合，其掺入无机基材料或无机组合物和/或化合物中。 合适的吸收化合物
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公开(公告)号：US06365765B1
公开(公告)日：2002-04-02
申请号：US09698883
申请日：2000-10-27
申请人： Teresa Baldwin , Nigel Hacker , Joseph Kennedy , Richard Spear
发明人： Teresa Baldwin , Nigel Hacker , Joseph Kennedy , Richard Spear
IPC分类号： C07F718
CPC分类号： G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要： Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic dyes incorporated into spin-on-glass materials. Suitable dyes are strongly absorbing over wavelength ranges around wavelengths such as 248 nm and 193 nm that may be used in photolithography. A method of making dyed spin-on-glass materials includes combining one or more organic dyes with alkoxysilane reactants during synthesis of the spin-on-glass materials.
摘要翻译： 用于深紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的一种或多种有机染料。 合适的染料在诸如248nm和193nm的波长周围的波长范围上是强吸收的，可以用于光刻。 制造染色旋涂玻璃材料的方法包括在旋涂玻璃材料合成期间将一种或多种有机染料与烷氧基硅烷反应物组合。
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公开(公告)号：US07678462B2
公开(公告)日：2010-03-16
申请号：US11178544
申请日：2005-07-11
申请人： Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
发明人： Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
IPC分类号： B32B9/04
CPC分类号： G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/0752 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要： Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
摘要翻译： 用于深紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的一种或多种有机光吸收化合物。 合适的吸收化合物在可用于光刻的诸如365nm，248nm和193nm的波长附近的波长范围上是强吸收的。 制造吸收旋涂玻璃材料的方法包括在旋涂玻璃材料的合成期间将一种或多种有机吸收化合物与烷氧基硅烷或卤代硅烷反应物组合。
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公开(公告)号：US20050245717A1
公开(公告)日：2005-11-03
申请号：US11178544
申请日：2005-07-11
申请人： Joseph Kennedy , Teresa Baldwin , Nigel Hacker , Richard Spear
发明人： Joseph Kennedy , Teresa Baldwin , Nigel Hacker , Richard Spear
IPC分类号： G03F7/004 , C03C17/00 , C03C17/30 , C07F7/18 , C08K5/00 , C09D7/12 , C09D183/04 , C09D183/06 , C09D183/08 , G03C1/492 , G03F7/075 , G03F7/09 , G03F7/11 , H01L21/027
CPC分类号： G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/0752 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要： Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
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公开(公告)号：US07012125B2
公开(公告)日：2006-03-14
申请号：US10012649
申请日：2001-11-05
申请人： Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
发明人： Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
IPC分类号： C08G77/18
CPC分类号： G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要： Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic dyes incorporated into spin-on-glass materials. Suitable dyes are strongly absorbing over wavelength ranges around wavelengths such as 248 nm and 193 nm that may be used in photolithography. A method of making dyed spin-on-glass materials includes combining one or more organic dyes with alkoxysilane reactants during synthesis of the spin-on-glass materials.
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公开(公告)号：US06956097B2
公开(公告)日：2005-10-18
申请号：US10076846
申请日：2002-02-14
申请人： Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
发明人： Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
IPC分类号： G03F7/004 , C03C17/00 , C03C17/30 , C07F7/18 , C08K5/00 , C09D7/12 , C09D183/04 , C09D183/06 , C09D183/08 , G03C1/492 , G03F7/075 , G03F7/09 , G03F7/11 , H01L21/027 , C08G77/12
CPC分类号： G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/0752 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要： Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
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公开(公告)号：US06969753B2
公开(公告)日：2005-11-29
申请号：US10300357
申请日：2002-11-19
申请人： Teresa Baldwin , Joseph Kennedy , Nigel Hacker , Richard Spear
发明人： Teresa Baldwin , Joseph Kennedy , Nigel Hacker , Richard Spear
IPC分类号： G03F7/004 , C03C17/00 , C03C17/30 , C07F7/18 , C08K5/00 , C09D7/12 , C09D183/04 , C09D183/06 , C09D183/08 , G03C1/492 , G03F7/075 , G03F7/09 , G03F7/11 , H01L21/027 , C08G77/12
CPC分类号： G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/0752 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要： Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
摘要翻译： 用于深紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的一种或多种有机光吸收化合物。 合适的吸收化合物在可用于光刻的诸如365nm，248nm和193nm的波长附近的波长范围上是强吸收的。 制造吸收旋涂玻璃材料的方法包括在旋涂玻璃材料的合成期间将一种或多种有机吸收化合物与烷氧基硅烷或卤代硅烷反应物组合。
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公开(公告)号：US06824879B2
公开(公告)日：2004-11-30
申请号：US10001143
申请日：2001-11-15
申请人： Teresa Baldwin , Joseph Kennedy , Nigel Hacker , Richard Spear
发明人： Teresa Baldwin , Joseph Kennedy , Nigel Hacker , Richard Spear
IPC分类号： C08G7718
CPC分类号： G02B5/23 , C03C17/008 , C03C17/30 , C08G77/04 , C08G77/12 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , G03F7/091 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要： Anti-reflective coating materials for ultraviolet photolithography include at least one organic light-absorbing compound incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining at least one organic absorbing compound with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
摘要翻译： 用于紫外光刻的抗反射涂层材料包括掺入旋涂玻璃材料中的至少一种有机光吸收化合物。 合适的吸收化合物在可用于光刻的诸如365nm，248nm，193nm和157nm的波长周围的波长范围上是强吸收的。 制造吸收旋涂玻璃材料的方法包括在旋涂玻璃材料的合成期间将至少一种有机吸收化合物与烷氧基硅烷或卤代硅烷反应物组合。
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公开(公告)号：US06506497B1
公开(公告)日：2003-01-14
申请号：US09491166
申请日：2000-01-26
申请人： Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
发明人： Joseph Kennedy , Teresa Baldwin , Nigel P. Hacker , Richard Spear
IPC分类号： B32B904
CPC分类号： G03F7/091 , C03C17/008 , C03C17/30 , C08K5/0008 , C09D183/04 , C09D183/06 , C09D183/08 , H01L21/0276 , Y10T428/31663 , C08L83/04 , C08L2666/28
摘要： Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
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