Stain resistant fluorescent lamp
    4.
    发明授权
    Stain resistant fluorescent lamp 失效
    防污荧光灯

    公开(公告)号:US4642512A

    公开(公告)日:1987-02-10

    申请号:US667135

    申请日:1984-11-01

    CPC分类号: H01J61/72

    摘要: A low-pressure mercury vapor discharge lamp comprising a glass tube in which a metal oxide or phosphate layer and then a phosphor layer are formed on its inner surface, in which during operation of the lamp, the lowest temperature of the wall of the glass tube along its discharge path is kept at 80.degree. C. or above.

    摘要翻译: 一种低压汞蒸汽放电灯,包括玻璃管,其中在其内表面上形成有金属氧化物或磷酸盐层,然后形成荧光体层,其中在灯的操作期间,玻璃管的壁的最低温度 沿其排放路径保持在80℃或更高。

    Circular fluorescent lamp
    5.
    发明授权
    Circular fluorescent lamp 失效
    圆形荧光灯

    公开(公告)号:US5034655A

    公开(公告)日:1991-07-23

    申请号:US397856

    申请日:1989-08-24

    IPC分类号: H01J61/72 H01J61/32 H01J61/42

    CPC分类号: H01J61/42 H01J61/322

    摘要: A fluorescent lamp has at least a pair of electrodes, at least two circular discharge tubes connected to said electrodes and enclosing rare gas and mercury therein, and a phosphor coating provided on an inside wall of each of said discharge tubes, the two circular discharge tubes being arranged coaxially circularly on one and the same plane, the diameter of each of the discharge tubes being selected to have a value within a range of from 5 mm to 25 mm both inclusive, the luminance on surface of each of the discharge tubes being selected to have a value within a range of from 2.times.10.sup.4 Cd/m.sup.2 to 6.times.10.sup.4 Cd/m.sup.2.

    摘要翻译: 荧光灯具有至少一对电极,至少两个连接到所述电极的圆形放电管并且包围其中的稀有气体和汞,以及设置在每个所述放电管的内壁上的荧光体涂层,所述两个圆形放电管 在同一平面上圆周同轴地布置,每个放电管的直径被选择为具有在5mm至25mm的范围内的值,其中,每个放电管的表面上的亮度被选择 具有在2×10 4 Cd / m 2至6×10 4 Cd / m 2范围内的值。

    Compact fluorescent lamp
    6.
    发明授权
    Compact fluorescent lamp 失效
    紧凑型荧光灯

    公开(公告)号:US4803401A

    公开(公告)日:1989-02-07

    申请号:US886238

    申请日:1986-07-16

    CPC分类号: H01J61/35 Y02B20/19

    摘要: Disclosed is a compact fluorescent lamp which comprises an airtight outer bulb filled with a rare gas and mercury; inner tube means provided within the outer bulb, said means having opening to a space of the inside of the outer bulb, and a coating formed onto at least one of an inner surface of said outer bulb and an outer surface of said inner tube means, said coating being so transparent as substantially not to scater visible rays and which consists of at least one material of an oxide and a phosphate.A compact fluorescent lamp mostly in the electric bulb shape of the present invention has been remarkably improved in the so-called lumen output maintenance without lowering of the initial lumen output.

    摘要翻译: 公开了一种紧凑型荧光灯,其包括填充有稀有气体和汞的气密外灯泡; 设置在外灯泡内的内管装置,所述装置具有通向外灯泡内部的空间的开口,以及形成在所述外灯泡的内表面和所述内管装置的外表面中的至少一个上的涂层, 所述涂层是如此透明的,基本上不能扫射可见光线并且由至少一种氧化物和磷酸盐材料组成。 本发明的电灯泡形状的紧凑型荧光灯在所谓的流明输出维护中得到显着改善,而不降低初始流明输出。

    Apparatus for generating light by utilizing microwave
    8.
    发明授权
    Apparatus for generating light by utilizing microwave 失效
    利用微波产生光的装置

    公开(公告)号:US4933602A

    公开(公告)日:1990-06-12

    申请号:US155507

    申请日:1988-02-12

    IPC分类号: H01J65/04

    CPC分类号: H01J65/04

    摘要: A light source apparatus for irradiating a large area with high intensity of light comprises a microwave cavity having a section of a flat shape and a plurality of electrodeless lamps disposed within the cavity in juxtaposition with one another in a flat array.

    摘要翻译: 用于以高强度的光照射大面积的光源装置包括具有扁平形状的一部分的微波空腔和布置在空腔内的多个无电极灯,其以平面阵列彼此并置。

    Plasma processing apparatus and plasma processing method
    9.
    发明授权
    Plasma processing apparatus and plasma processing method 有权
    等离子体处理装置和等离子体处理方法

    公开(公告)号:US09305803B2

    公开(公告)日:2016-04-05

    申请号:US13185598

    申请日:2011-07-19

    摘要: Provided are a plasma processing apparatus with a radio-frequency power supply supplying temporally modulated intermittent radio-frequency power which can be controlled with high precision in a wide repetition frequency band, and a plasma processing method using the plasma processing apparatus.A plasma processing apparatus includes: a vacuum vessel; a plasma generating section plasma in the vacuum vessel; a stage installed in the vacuum vessel and mounted with a sample; and a radio-frequency power supply applying temporally modulated intermittent radio-frequency power to the stage, wherein the radio-frequency power supply has two or more different frequency bands and temporally modulates the radio-frequency power by a repetition frequency which has the same range of analog signals used in each of the frequency band.

    摘要翻译: 提供一种等离子体处理装置,其具有提供可在宽重复频带中高精度地控制的时间调制的间歇射频功率的射频电源,以及使用等离子体处理装置的等离子体处理方法。 一种等离子体处理装置,包括:真空容器; 真空容器中的等离子体产生部等离子体; 安装在真空容器中并安装有样品的阶段; 以及向所述载波台施加临时调制的间歇射频功率的射频电源,其中,所述射频电源具有两个以上的不同频带,并且通过具有相同范围的重复频率对所述射频功率进行时间调制 在每个频带中使用的模拟信号。

    Plasma etching method
    10.
    发明授权
    Plasma etching method 有权
    等离子蚀刻法

    公开(公告)号:US08580131B2

    公开(公告)日:2013-11-12

    申请号:US13363488

    申请日:2012-02-01

    CPC分类号: H01L21/31116

    摘要: It is an object of the present invention to provide a plasma etching method that can improve a selection ratio of a film to be etched to a film different from the film to be etched than that in the related art. The present invention provides a plasma etching method for selectively etching a film to be etched with respect to another film different from the film to be etched, the plasma etching method including etching, using gas that can generate a deposited film containing components same as components of the another film different from the film to be etched, the film on which generation of the deposited film is suppressed.

    摘要翻译: 本发明的目的是提供一种等离子体蚀刻方法,其可以提高与要蚀刻的膜相比不同于待蚀刻的膜的膜的选择比,而不是现有技术。 本发明提供了一种等离子体蚀刻方法,用于相对于不同于待蚀刻的膜的另一膜选择性地蚀刻待蚀刻的膜,该等离子体蚀刻方法包括蚀刻,使用可产生含有与 与被蚀刻的膜不同的另一膜,抑制了沉积膜的一代的膜。