公开(公告)号：US20120146554A1

公开(公告)日：2012-06-14

申请号：US12962723

申请日：2010-12-08

申请人： Theodore H. Smick ,  Geoffrey Ryding ,  William H. Park ,  Ronald Horner

发明人： Theodore H. Smick ,  Geoffrey Ryding ,  William H. Park ,  Ronald Horner

IPC分类号： H05H7/22 ,  H02K16/00

CPC分类号： H05H5/04 ,  H02K11/0094 ,  H02K16/00 ,  H02K21/14 ,  H02M7/106

摘要： A d. c. charged particle accelerator comprises accelerator electrodes separated by insulating spacers defining acceleration gaps between adjacent pairs of electrodes. Individually regulated gap voltages are applied across each adjacent pair of accelerator electrodes. In embodiments, the individually regulated gap voltages are generated by electrically isolated alternators mounted on a common rotor shaft driven by an electric motor. Alternating power outputs from the alternators provide inputs to individual regulated d. c. power supplies to generate the gap voltages. The power supplies are electrically isolated and have outputs connected in series across successive pairs of accelerator electrodes. The described embodiment enables an ion beam to be accelerated to high energies and high beam currents, with good accelerator stability.

摘要翻译： 广告。 C。 带电粒子加速器包括通过绝缘垫片间隔开的加速器电极，其限定相邻电极对之间的加速间 单独调节的间隙电压施加在每个相邻的加速器电极对之间。 在实施例中，单独调节的间隙电压由安装在由电动机驱动的公共转子轴上的电隔离交流发电机产生。 交流发电机的交流电源输出为单独调节的d提供输入。 C。 电源产生间隙电压。 电源是电隔离的，并且具有串联连接成对的加速器电极的输出。 所描述的实施例使得能够将离子束加速到高能量和高束流，具有良好的加速器稳定性。

公开(公告)号：US08558486B2

公开(公告)日：2013-10-15

申请号：US12962723

申请日：2010-12-08

申请人： Theodore H. Smick ,  Geoffrey Ryding ,  William H. Park ,  Ronald Horner

发明人： Theodore H. Smick ,  Geoffrey Ryding ,  William H. Park ,  Ronald Horner

IPC分类号： H05H7/22 ,  H02K16/00

CPC分类号： H05H5/04 ,  H02K11/0094 ,  H02K16/00 ,  H02K21/14 ,  H02M7/106

摘要： A d.c. charged particle accelerator comprises accelerator electrodes separated by insulating spacers defining acceleration gaps between adjacent pairs of electrodes. Individually regulated gap voltages are applied across each adjacent pair of accelerator electrodes. In embodiments, the individually regulated gap voltages are generated by electrically isolated alternators mounted on a common rotor shaft driven by an electric motor. Alternating power outputs from the alternators provide inputs to individual regulated d.c. power supplies to generate the gap voltages. The power supplies are electrically isolated and have outputs connected in series across successive pairs of accelerator electrodes. The described embodiment enables an ion beam to be accelerated to high energies and high beam currents, with good accelerator stability.

摘要翻译： 一个d.c. 带电粒子加速器包括通过绝缘垫片间隔开的加速器电极，其限定相邻电极对之间的加速间隙。 单独调节的间隙电压施加在每个相邻的加速器电极对之间。 在实施例中，单独调节的间隙电压由安装在由电动机驱动的公共转子轴上的电隔离交流发电机产生。 交流发电机的交流电源输出为各个调节直流电源提供输入。 电源产生间隙电压。 电源是电隔离的，并且具有串联连接成对的加速器电极的输出。 所描述的实施例使得能够将离子束加速到高能量和高束流，具有良好的加速器稳定性。

公开(公告)号：US20110073781A1

公开(公告)日：2011-03-31

申请号：US12894229

申请日：2010-09-30

申请人： William H. Leavitt ,  Theodore H. Smick ,  Joseph Daniel Gillespie ,  William H. Park ,  Paul Eide ,  Drew Arnold ,  Geoffrey Ryding

发明人： William H. Leavitt ,  Theodore H. Smick ,  Joseph Daniel Gillespie ,  William H. Park ,  Paul Eide ,  Drew Arnold ,  Geoffrey Ryding

IPC分类号： H01L21/265

CPC分类号： H01J37/20 ,  H01J37/3171 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/201

摘要： An ion implanter has an implant wheel with a plurality of wafer carriers distributed about a periphery of the wheel. Each wafer carrier has a heat sink for removing heat from a wafer on the carrier during the implant process by thermal contact between the wafer and the heat sink. The wafer carriers have wafer retaining fences formed as cylindrical rollers with axes in the respective wafer support planes of the wafer carriers. The cylindrical surfaces of the rollers provide wafer abutment surfaces which can move transversely to the wafer support surfaces so that no transverse loading is applied by the fences to wafer edges as the wafer is pushed against the heat sink by centrifugal force. The wafer support surfaces comprise layers of elastomeric material and the movable abutment surfaces of the fences allow even thermal coupling with the heat sink over the whole area of the wafer.

摘要翻译： 离子注入机具有植入轮，其具有围绕轮的周边分布的多个晶片载体。 每个晶片载体具有散热器，用于在植入过程期间通过晶片和散热器之间的热接触从载体上的晶片去除热量。 晶片载体具有晶片保持栅栏，其形成为具有在晶片载体的相应晶片支撑平面中的轴线的圆柱形辊。 辊的圆柱形表面提供可以横向移动到晶片支撑表面的晶片邻接表面，使得当晶片通过离心力推靠在散热片上时，栅栏不会向晶片边缘施加横向负载。 晶片支撑表面包括弹性体材料层，并且栅栏的可移动邻接表面允许在晶片的整个区域上均匀地与散热器的热耦合。

公开(公告)号：US08723452B2

公开(公告)日：2014-05-13

申请号：US13186513

申请日：2011-07-20

申请人： Geoffrey Ryding ,  Steven Richards ,  Paul Eide ,  Theodore H. Smick ,  Malcolm Barnett

发明人： Geoffrey Ryding ,  Steven Richards ,  Paul Eide ,  Theodore H. Smick ,  Malcolm Barnett

IPC分类号： H05H7/22

CPC分类号： H05H5/04

摘要： A d. c. charged particle accelerator comprises accelerator electrodes separated by insulating spacers defining acceleration gaps between adjacent pairs of electrodes. Individually regulated gap voltages are applied across each adjacent pair of accelerator electrodes. In an embodiment, direct connections are provided to gap electrodes from the stage points of a multistage Cockcroft Walton type voltage multiplier circuit. The described embodiment enables an ion beam to be accelerated to high energies and high beam currents, with good accelerator stability.

摘要翻译： 广告。 C。 带电粒子加速器包括通过绝缘垫片间隔开的加速器电极，其限定相邻电极对之间的加速间 单独调节的间隙电压施加在每个相邻的加速器电极对之间。 在一个实施例中，从多级Cockcroft Walton型电压倍增器电路的级点向间隙电极提供直接连接。 所描述的实施例使得能够将离子束加速到高能量和高束流，具有良好的加速器稳定性。

公开(公告)号：US07939812B2

公开(公告)日：2011-05-10

申请号：US12494272

申请日：2009-06-30

申请人： Hilton Glavish ,  Geoffrey Ryding ,  Theodore H. Smick

发明人： Hilton Glavish ,  Geoffrey Ryding ,  Theodore H. Smick

IPC分类号： H01J37/317 ,  H01J37/08 ,  H01J27/02 ,  H01J1/50

CPC分类号： H01J37/3171 ,  H01J37/08 ,  H01J2237/083

摘要： A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis of rotation of the wheel is fixed and a ribbon beam of hydrogen ions is directed down on a peripheral edge of the wheel. The ribbon beam extends over the full radial width of wafers on the wheel. The beam is generated by an ion source providing an extracted ribbon beam having at least 100 mm major cross-sectional diameter. The ion source may use core-less saddle type coils to provide a uniform field confining the plasma in the ion source. The ribbon beam may be passed through a 90° bending magnet which bends the beam in the plane of the ribbon.

摘要翻译： 用于从硅晶片剥离硅的氢离子注入机使用大的扫描轮，围绕其周边承载50个以上的晶圆并围绕一个轴线旋转。 在一个实施例中，车轮的旋转轴线是固定的，并且带状的氢离子束被向下指向车轮的周缘。 带状束在轮上的晶片的整个径向宽度上延伸。 光束由离子源产生，提供具有至少100mm主横截面直径的抽出的带状束。 离子源可以使用无芯鞍型线圈来提供限制离子源中的等离子体的均匀场。 带状光束可以穿过将光束弯曲在色带平面中的90°弯曲磁体。

公开(公告)号：US06515288B1

公开(公告)日：2003-02-04

申请号：US09527029

申请日：2000-03-16

申请人： Geoffrey Ryding ,  Theodore H. Smick ,  Marvin Farley ,  Takao Sakase

发明人： Geoffrey Ryding ,  Theodore H. Smick ,  Marvin Farley ,  Takao Sakase

IPC分类号： G01F2300

CPC分类号： F16C29/025 ,  F16C32/0603 ,  F16C32/0618 ,  F16C33/748 ,  F16C2300/62 ,  H01J37/18 ,  H01J2237/166 ,  H01J2237/2006 ,  H01J2237/31701

摘要： A vacuum bearing structure comprises a combination of a planar gas bearing with a differentially-pumped vacuum seal. The bearing surface and the vacuum seal surfaces are formed of a porous material divided into a first outer region through which bearing gas can percolate to provide support and an inner second region providing the vacuum seal. An exhaust groove separates the two regions so that bearing gas can flow to atmosphere. The resulting structure can operate at a lower fly height to reduce loading on the differentially-pumped vacuum seal. The structure is particularly useful for motion feedthroughs into vacuum processes such as ion implantation.

摘要翻译： 真空承载结构包括平面气体轴承与差动抽真空密封件的组合。 轴承表面和真空密封表面由被分成第一外部区域的多孔材料形成，轴承气体可以通过该第一外部区域渗透以提供支撑，以及提供真空密封的内部第二区域。 排气槽分离两个区域，使得轴承气体可以流到大气中。 所得到的结构可以在较低的飞行高度下操作以减少差动泵真空密封件上的负载。 该结构对于诸如离子注入的真空过程中的运动馈通特别有用。

公开(公告)号：US06323496B1

公开(公告)日：2001-11-27

申请号：US09293955

申请日：1999-04-19

申请人： Takao Sakase ,  Theodore H. Smick ,  Geoffrey Ryding

发明人： Takao Sakase ,  Theodore H. Smick ,  Geoffrey Ryding

IPC分类号： H01J37317

CPC分类号： F16C32/0662 ,  F16C32/0603 ,  F16C33/748 ,  F16C2300/62 ,  H01J2237/166 ,  H01J2237/31701 ,  Y10S277/913 ,  Y10S277/927

摘要： A vacuum seal and fluid bearing apparatus for reducing the distortion of the bearing surfaces of a gas bearing is described. The apparatus includes a stator attached around an aperture in a vacuum housing and having a first planar fluid bearing surface. A movable member for closing the vacuum housing aperture having a second fluid bearing surface extending parallel to the first bearing surface is adapted to be supported spaced from the first bearing surface by a bearing fluid. A vacuum seal is provided between the movable member and the stator. In use, a force due to atmospheric pressure acts on the movable member in a direction normal to the bearing surfaces and a movable member includes a pressure relief structure to reduce any bending moment produced in the movable member by the force.

摘要翻译： 描述了用于减小气体轴承的支承表面的变形的真空密封和流体轴承装置。 该装置包括定子，其围绕真空壳体中的孔附接并且具有第一平面流体支承表面。 用于关闭具有平行于第一支承表面延伸的第二流体支承表面的真空容纳孔的可移动构件适于通过轴承流体与第一支承表面间隔开。 在可动构件和定子之间设置真空密封件。 在使用中，由于大气压而产生的力在垂直于支承面的方向作用在可动件上，并且可移动部件包括压力释放结构，以减少由该力产生的可动件中产生的任何弯矩。

公开(公告)号：US20120146555A1

公开(公告)日：2012-06-14

申请号：US13186513

申请日：2011-07-20

申请人： Geoffrey Ryding ,  Steven Richards ,  Paul Eide ,  Theodore H. Smick ,  Malcolm Barnett

发明人： Geoffrey Ryding ,  Steven Richards ,  Paul Eide ,  Theodore H. Smick ,  Malcolm Barnett

IPC分类号： H05H7/22

CPC分类号： H05H5/04

摘要： A d. c. charged particle accelerator comprises accelerator electrodes separated by insulating spacers defining acceleration gaps between adjacent pairs of electrodes. Individually regulated gap voltages are applied across each adjacent pair of accelerator electrodes. In an embodiment, direct connections are provided to gap electrodes from the stage points of a multistage Cockcroft Walton type voltage multiplier circuit. The described embodiment enables an ion beam to be accelerated to high energies and high beam currents, with good accelerator stability.

摘要翻译： 广告。 C。 带电粒子加速器包括通过绝缘垫片间隔开的加速器电极，其限定相邻电极对之间的加速间隙。 单独调节的间隙电压施加在每个相邻的加速器电极对之间。 在一个实施例中，从多级Cockcroft Walton型电压倍增器电路的级点向间隙电极提供直接连接。 所描述的实施例使得能够将离子束加速到高能量和高束流，具有良好的加速器稳定性。

公开(公告)号：US07989784B2

公开(公告)日：2011-08-02

申请号：US12494270

申请日：2009-06-30

申请人： Hilton Glavish ,  Geoffrey Ryding ,  Theodore H. Smick ,  Kenneth Harry Purser

发明人： Hilton Glavish ,  Geoffrey Ryding ,  Theodore H. Smick ,  Kenneth Harry Purser

IPC分类号： H01J37/317 ,  H01J37/20

CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J37/08 ,  H01J37/20 ,  H01J2237/057 ,  H01J2237/061 ,  H01J2237/082 ,  H01J2237/166 ,  H01J2237/2001 ,  H01J2237/2006 ,  H01J2237/201 ,  H01J2237/202

摘要： A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis of rotation of the wheel is fixed and a ribbon beam of hydrogen ions is directed down on a peripheral edge of the wheel. The ribbon beam extends over the full radial width of wafers on the wheel. The beam is generated by an ion source providing an extracted ribbon beam having at least 100 mm major cross-sectional diameter. The ribbon beam may be passed through a 90° bending magnet which bends the beam in the plane of the ribbon. The magnet provides intensity correction across the ribbon to compensate for the dependency on the radial distance from the wheel axis of the speed at which parts of the wafers pass through the ribbon beam.

摘要翻译： 用于从硅晶片剥离硅的氢离子注入机使用大的扫描轮，围绕其周边承载50个以上的晶圆并围绕一个轴线旋转。 在一个实施例中，车轮的旋转轴线是固定的，并且带状的氢离子束被向下指向车轮的周缘。 带状束在轮上的晶片的整个径向宽度上延伸。 光束由离子源产生，提供具有至少100mm主横截面直径的抽出的带状束。 带状光束可以穿过将光束弯曲在色带平面中的90°弯曲磁体。 磁体在色带上提供强度校正，以补偿从轮轴的径向距离对晶片的一部分通过带状束的速度的依赖性。

公开(公告)号：US07982197B2

公开(公告)日：2011-07-19

申请号：US12494268

申请日：2009-06-30

申请人： Theodore H. Smick ,  Geoffrey Ryding ,  Kenneth Harry Purser ,  Joseph Daniel Gillespie

发明人： Theodore H. Smick ,  Geoffrey Ryding ,  Kenneth Harry Purser ,  Joseph Daniel Gillespie

IPC分类号： H01J37/317 ,  H01J37/20

CPC分类号： H01J37/3171 ,  H01J37/20 ,  H01J2237/184 ,  H01J2237/2001

摘要： A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis of rotation of the wheel is fixed and the wheel is formed with tensioned spokes supporting a rim carrying the wafer supports. The spokes may be used for carrying cooling fluid to and from the wafer supports. Detachable connections in the cooling fluid conduits in the vacuum chamber may comprise tandem seals with an intermediate chamber between them which can be vented outside the vacuum chamber, or independently vacuum pumped. In one embodiment, a ribbon beam of hydrogen ions is directed down on a peripheral edge of the wheel. The ribbon beam extends over the full radial width of wafers on the wheel.

摘要翻译： 用于从硅晶片剥离硅的氢离子注入机使用大的扫描轮，围绕其周边承载50个以上的晶圆并围绕一个轴线旋转。 在一个实施例中，车轮的旋转轴线是固定的，并且车轮形成有支撑承载晶片支架的轮辋的张紧轮辐。 轮辐可以用于将冷却流体携带到晶片支撑件和从晶片支撑件传送冷却流体。 真空室中的冷却流体管道中的可分离连接可以包括串联密封件，其间具有中间室，其可以在真空室外排气，或独立地抽真空。 在一个实施例中，氢离子的带状光束被向下指向轮的外围边缘。 带状束在轮上的晶片的整个径向宽度上延伸。