System for monitoring the leak tightness of a tank
    2.
    发明授权
    System for monitoring the leak tightness of a tank 有权
    监测罐体密封性的系统

    公开(公告)号:US09410865B2

    公开(公告)日:2016-08-09

    申请号:US13994182

    申请日:2011-12-08

    摘要: A system for monitoring the leak-tightness of a tank, which is filled with a liquid with a lower density than water. The system has a liquid drain pipe, with a container that has a bottom, which is integrated horizontally in the liquid drain pipe with a damming element, which divides the container into a partial area on the supply flow side and partial area on the drain side. A first vibronic measuring device with a first vibrating unit protruding into the supply flow side partial area of the bottom determines whether the density of the medium undershoots a specified limit. A second vibronic measuring device with a second vibrating unit, at a position not exceeding the level of the first vibrating unit, which detects whether the vibrating unit are covered with medium, and with an evaluation unit uses the measured values of measuring devices to determine whether there is liquid from the tank in the container.

    摘要翻译: 一种用于监测罐的密封性的系统,其中填充有比水密度低的液体。 该系统具有排液管,容器具有底部,其水平地集成在排液管中,具有阻塞元件,该容器将容器分成供给流侧的一部分区域和排水侧的局部区域 。 具有突出到底部的供给流侧部分区域中的第一振动单元的第一振动测量装置确定介质的密度是否下冲到指定的极限。 具有第二振动单元的第二振动测量装置,在不超过第一振动单元的高度的位置,其检测振动单元是否被介质覆盖,并且使用评估单元,使用测量装置的测量值来确定是否 在容器中有罐中的液体。

    Device for reactive sputtering
    3.
    发明申请
    Device for reactive sputtering 审中-公开
    反应溅射装置

    公开(公告)号:US20050211550A1

    公开(公告)日:2005-09-29

    申请号:US10918749

    申请日:2004-08-12

    CPC分类号: C23C14/0042

    摘要: A device for reactive sputtering, wherein a cathode is applied a discharge voltage for a plasma, and a working gas and a reactive gas are introduced into a sputter chamber. The total gas flow in the sputter chamber is controlled with the aid of a valve, while the ratio of the partial pressures of both gases is kept constant.

    摘要翻译: 一种用于反应溅射的装置,其中向等离子体施加阴极,并且将工作气体和反应性气体引入溅射室。 借助于阀门控制溅射室中的总气体流量,而两种气体的分压比保持恒定。

    MEASURING DEVICE FOR DETERMINING AND/OR MONITORING AT LEAST ONE PROCESS VARIABLE
    5.
    发明申请
    MEASURING DEVICE FOR DETERMINING AND/OR MONITORING AT LEAST ONE PROCESS VARIABLE 有权
    用于确定和/或监控至少一个过程的测量装置可变

    公开(公告)号:US20130263666A1

    公开(公告)日:2013-10-10

    申请号:US13994182

    申请日:2011-12-08

    IPC分类号: G01M3/00

    摘要: A system for monitoring the leak-tightness of a tank, which is filled with a liquid with a lower density than water. The system has a liquid drain pipe, with a container that has a bottom, which is integrated horizontally in the liquid drain pipe with a damming element, which divides the container into a partial area on the supply flow side and partial area on the drain side. A first vibronic measuring device with a first vibrating unit protruding into the supply flow side partial area of the bottom determines whether the density of the medium undershoots a specified limit. A second vibronic measuring device with a second vibrating unit, at a position not exceeding the level of the first vibrating unit, which detects whether the vibrating unit are covered with medium, and with an evaluation unit uses the measured values of measuring devices to determine whether there is liquid from the tank in the container.

    摘要翻译: 一种用于监测罐的密封性的系统,其中填充有比水密度低的液体。 该系统具有排液管,容器具有底部,其水平地集成在排液管中,具有阻塞元件,该容器将容器分成供给流侧的一部分区域和排水侧的局部区域 。 具有突出到底部的供给流侧部分区域中的第一振动单元的第一振动测量装置确定介质的密度是否下冲到指定的极限。 具有第二振动单元的第二振动测量装置,在不超过第一振动单元的高度的位置,其检测振动单元是否被介质覆盖,并且使用评估单元,使用测量装置的测量值来确定是否 在容器中有罐中的液体。