Heat treatment method and heat treatment apparatus
    4.
    发明授权
    Heat treatment method and heat treatment apparatus 有权
    热处理方法和热处理装置

    公开(公告)号:US09064916B2

    公开(公告)日:2015-06-23

    申请号:US14250131

    申请日:2014-04-10

    CPC classification number: H01L21/67309 C21D9/0068 C23C16/56 H01L21/67109

    Abstract: A substrate holder has two holder constituting bodies, each having a plurality of columns arranged on an imaginary circle, and substrate holding sections that hold circumferential portions of respective substrates. The holder constituting bodies hold the substrates so that either their front surfaces or their back surfaces face upward with a substrate having an upward facing front and a substrate having an upward facing rear being alternately arranged in a vertical direction. At least one of the holder constituting bodies moves in the vertical direction to change the positions of the holder constituting bodies relative to each other. A distance between a first pair of vertically adjacent substrates with their respective front surfaces facing each other is set to ensure treatment uniformity, and to be larger than a distance between a second pair of vertically adjacent substrates with their respective back surfaces facing each other.

    Abstract translation: 衬底保持器具有两个保持器构成体,每个保持器构造体具有布置在假想圆上的多个列,以及保持各个衬底周向部分的衬底保持部。 保持器构成体保持基板,使得它们的前表面或其背面朝向上方具有面向上的基板和具有面向上的后部的基板沿垂直方向交替布置。 保持构造体中的至少一个沿垂直方向移动,以改变保持器构成体相对于彼此的位置。 设置第一对垂直相邻的基板与它们各自的前表面彼此面对的距离,以确保处理均匀性,并且大于第二对垂直相邻的基板之间的距离,并且其相应的后表面彼此面对。

Patent Agency Ranking