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公开(公告)号：US10655619B2
公开(公告)日：2020-05-19
申请号：US14918707
申请日：2015-10-21
Applicant: Tokyo Electron Limited
Inventor： Takashi Sasa , Daisuke Ishimaru , Takahiro Okubo , Tomoyuki Yumoto , Tomohiko Muta
Abstract: A stay of a liquid can be suppressed. A pump 100 includes a tube 102, having elasticity, in which a liquid as a target to be delivered flows; a tube housing 104 which covers an outside of the tube 102 and keeps a gas in an inner space V between an outer surface of the tube 102 and the tube housing 104; and an electropneumatic regulator RE configured to supply the gas into the inner space V and discharge the gas from the inner space V.
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公开(公告)号：US10518199B2
公开(公告)日：2019-12-31
申请号：US15696365
申请日：2017-09-06
Applicant: Tokyo Electron Limited
Inventor： Takashi Sasa , Daisuke Ishimaru , Katsuya Hashimoto , Hideo Shite , Shinya Wakamizu , Kazuhiko Kimura
IPC: B01D29/60 , G03F7/16 , B01D37/04 , B01D35/02 , G03F7/30 , F04B43/08 , F04B43/02 , F04B53/10 , F04B53/20
Abstract: A treatment solution supply apparatus for supplying a treatment solution to a treatment solution discharge unit that discharges the treatment solution to a treatment body, includes: a temporary storage apparatus that temporarily stores the treatment solution supplied from a treatment solution supply source that stores the treatment solution; a filter that removes a foreign substance in the treatment solution from the temporary storage apparatus; and a pump that sends the treatment solution from which the foreign substance has been removed by the filter to the treatment solution discharge unit, wherein the temporary storage apparatus has a pressure-feeding function of pressure-feeding the treatment solution stored in the temporary storage apparatus.
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3.发明授权公开(公告)号：US09778571B2
公开(公告)日：2017-10-03
申请号：US14548719
申请日：2014-11-20
Applicant: TOKYO ELECTRON LIMITED
Inventor： Takashi Sasa , Daisuke Ishimaru
CPC classification number: G03F7/162 , G03F7/3021 , H01L21/67017 , H01L21/6715
Abstract: A processing liquid supplying apparatus supplies a processing liquid to a process object via a discharging part. In one embodiment, the apparatus includes: a processing liquid source that supplies a processing liquid; an intermediate tank connected to the processing liquid source via a transport line; a feed line provided between the intermediate tank and the discharging part; an evacuating unit that evacuates an interior of the intermediate tank to transport the processing liquid from the processing liquid source to the intermediate tank through the transport line; and a pressure adjusting unit that supplies a gas into the intermediate tank to return a pressure in the evacuated intermediate tank from a reduced pressure to a normal pressure, thereby to place the intermediate tank ready for feeding the processing liquid, having been transported into the intermediate tank, into the feed line.
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Patent Agency Ranking
公开(公告)号：US11333142B2
公开(公告)日：2022-05-17
申请号：US16775468
申请日：2020-01-29
Applicant: Tokyo Electron Limited
Inventor： Daisuke Ishimaru , Katsuya Hashimoto , Yasuhiro Takaki
Abstract: There is disclosed a hollow tube body used for a liquid feeding member and deformable by pressurization, wherein: an axial cross-section of the tube body has two opposing long side parts and two opposing short side parts; four corner portions formed by the long side parts and the short side parts each have a shape curved to protrude outward; each of the long side parts has a recessed part recessed inward and continuing from the corner portions; and a portion other than the corner portions of each of the short side parts is in a flat shape.
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公开(公告)号：US12094737B2
公开(公告)日：2024-09-17
申请号：US16930959
申请日：2020-07-16
Applicant: Tokyo Electron Limited
Inventor： Masayuki Kajiwara , Katsunori Ichino , Daisuke Ishimaru , Takuya Tajiri , Atsushi Yamamoto , Masato Imamura , Tomohiko Muta , Tetsuro Iriyama , Takeaki Sakamoto , Hiroki Okaguchi , Kenji Adachi
CPC classification number: H01L21/6715 , B05B1/30 , B05B9/0406 , B05B15/40
Abstract: A substrate processing apparatus includes a discharge part including a nozzle configured to discharge a processing liquid onto a substrate; a liquid feeder configured to feed the processing liquid to the discharge part; a replenishment part configured to replenish the liquid feeder with the processing liquid to be fed to the discharge part; a connector including a switching valve configured to open/close a flow path between the replenishment part and the liquid feeder; a filter configured to remove foreign matters contained in the processing liquid; a replenishment preparation part configured to open the switching valve after reducing a pressure difference between the inside of the replenishment part and the liquid feeder; and a replenishment controller configured to start replenishment of the processing liquid from the replenishment part to the liquid feeder in a state in which the switching valve is opened by the replenishment preparation part.
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公开(公告)号：US10268116B2
公开(公告)日：2019-04-23
申请号：US15816088
申请日：2017-11-17
Applicant: Tokyo Electron Limited
Inventor： Kousuke Yoshihara , Koji Takayanagi , Toshinobu Furusho , Takashi Sasa , Daisuke Ishimaru
Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.
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公开(公告)号：US09846363B2
公开(公告)日：2017-12-19
申请号：US14528290
申请日：2014-10-30
Applicant: TOKYO ELECTRON LIMITED
Inventor： Kousuke Yoshihara , Koji Takayanagi , Toshinobu Furusho , Takashi Sasa , Daisuke Ishimaru
CPC classification number: G03F7/16 , H01L21/67017
Abstract: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.
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公开(公告)号：US20160115952A1
公开(公告)日：2016-04-28
申请号：US14918707
申请日：2015-10-21
Applicant: Tokyo Electron Limited
Inventor： Takashi Sasa , Daisuke Ishimaru , Takahiro Okubo , Tomoyuki Yumoto , Tomohiko Muta
IPC: F04B43/08
Abstract: A stay of a liquid can be suppressed. A pump 100 includes a tube 102, having elasticity, in which a liquid as a target to be delivered flows; a tube housing 104 which covers an outside of the tube 102 and keeps a gas in an inner space V between an outer surface of the tube 102 and the tube housing 104; and an electropneumatic regulator RE configured to supply the gas into the inner space V and discharge the gas from the inner space V.
Abstract translation: 可以抑制液体滞留。 泵100包括具有弹性的管102，其中作为待输送的靶的液体流动; 管壳体104，其覆盖管102的外部并将气体保持在管102的外表面和管壳体104之间的内部空间V中; 以及电气调节器RE，其构造成将气体供应到内部空间V并从内部空间V排出气体。
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