公开(公告)号：US20220112603A1

公开(公告)日：2022-04-14

申请号：US17495837

申请日：2021-10-07

Applicant: Tokyo Electron Limited

Inventor： Hiroki SAKURAI ,  Daisuke GOTO ,  Nobuhiro OGATA ,  Yusuke HASHIMOTO ,  Shoki MIZUGUCHI ,  Yenrui HSU

IPC: C23C18/18 ,  C23C18/16

Abstract: A substrate processing method includes discharging a processing liquid to a substrate, and discharging a mixed fluid that is produced by mixing a processing liquid and a purified water in a vapor state or a mist state thereof to a substrate where a processing liquid is discharged.

公开(公告)号：US20240021445A1

公开(公告)日：2024-01-18

申请号：US18215184

申请日：2023-06-28

Applicant: Tokyo Electron Limited

Inventor： Hiroki SAKURAI ,  Yenrui HSU ,  Shoki MIZUGUCHI ,  Nobuhiro OGATA ,  Shinichi UMENO ,  Kazuya GODA ,  Minsung KIM ,  Hiroyuki HIGASHI

IPC: H01L21/67 ,  H01L21/687 ,  H01L21/02

CPC classification number: H01L21/67051 ,  H01L21/67248 ,  H01L21/68764 ,  H01L21/02057

Abstract: A substrate processing apparatus according to the present disclosure includes a substrate holding unit, a fluid supplying unit, a processing-liquid supplying unit, a nozzle, a fluid amount adjusting unit, and a controller. The substrate holding unit holds a substrate to be rotatable. The fluid supplying unit supplies fluid including pressurized vapor or mist of deionized water. The processing-liquid supplying unit supplies processing liquid including at least a sulfuric acid. The nozzle is connected to the fluid supplying unit and the processing-liquid supplying unit to discharge mixed fluid of the fluid and the processing liquid toward the substrate. The fluid amount adjusting unit adjusts a flow volume of the fluid that is flowing through the fluid supplying unit. The controller controls the fluid amount adjusting unit to adjust a ratio of the fluid to the processing liquid.

公开(公告)号：US20230185199A1

公开(公告)日：2023-06-15

申请号：US18077577

申请日：2022-12-08

Applicant: Tokyo Electron Limited

Inventor： Hiroki SAKURAI ,  Nobuhiro OGATA ,  Daisuke GOTO ,  Kanta MORI ,  Kenji YADA ,  Yusuke HASHIMOTO ,  Shoki MIZUGUCHI ,  Yenrui HSU

IPC: G03F7/30 ,  G03F7/42

CPC classification number: G03F7/3021 ,  G03F7/426

Abstract: A nozzle that mixes fluid containing steam or mist of pressurized pure water and processing liquid containing at least sulfuric acid and ejects mixed fluid of the fluid and the processing liquid, the nozzle comprising: at least one first ejection port ejecting the fluid; at least one second ejection port ejecting the processing liquid; and at least one lead-out path being in fluid communication with the at least one first ejection port and the at least one second ejection port and leading out the mixed fluid of the fluid ejected from the at least one first ejection port and the processing liquid ejected from the at least one second ejection port, wherein the at least one first ejection port or the at least one second ejection port is arranged to be directed to position deviated from central axis of the at least one lead-out path in a plan view.