摘要:
Hydrazine sulfate having a relatively large particle diameter and a high purity is produced by hydrolysis of benzophenoneazines by sulfuric acid having a concentration of 75% by weight or less in an amount of 1.1 times by mole or more the stoichiometric amount in a very high conversion and a high yield with less operational loss.
摘要:
In a process for recovering an aliphatic carboxylic acid and/or an ester thereof by distilling a liquid mixture containing the aliphatic carboxylic acid and/or the ester thereof and a catalyst of a metal of Group VIII of the periodic table of elements, the improvement wherein the distillation is carried out in the presence of carbon monoxide at a partial pressure of at least 0.01 kg/cm.sup.2 (absolute) in the distillation system to prevent the decomposition of said catalyst.
摘要翻译:在通过蒸馏含有脂族羧酸和/或其酯的液体混合物和元素周期表第Ⅷ族金属催化剂的方法中回收脂肪族羧酸和/或其酯的方法,其改进在于 蒸馏在一氧化碳存在下,在蒸馏系统中以至少0.01kg / cm 2(绝对)的分压进行,以防止所述催化剂分解。
摘要:
The invention provides a method for producing a peroxymonosulfuric acid solution with high stability, including the steps of mixing 35 mass % or more of hydrogen peroxide and 70 mass % or more of sulfuric acid to react them, cooling the reaction solution to 80° C. or lower within five minutes after initiation of the mixing step, and diluting the reaction solution with water four times or more as much as the reaction solution by mass.
摘要:
The invention provides a method for producing a peroxymonosulfuric acid solution with high stability, including the steps of mixing 35 mass % or more of hydrogen peroxide and 70 mass % or more of sulfuric acid to react them, cooling the reaction solution to 80° C. or lower within five minutes after initiation of the mixing step, and diluting the reaction solution with water four times or more as much as the reaction solution by mass.
摘要:
A flux washing agent which comprises an aqueous solution containing a quaternary ammonium salt and hydrazine is disclosed. The flux washing agent is used in the production of printed circuit boards and the like. The flux washing agent has a washing ability, and a property to suppress etching of solder which are comparable with those of Flon 113 and trichloroethylene heretofore used as flux washing agents. Furthermore, the flux washing agent is safe, does not cause environmental pollution and has an excellent rinsing property.