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119 条记录 (耗时 0.043 秒)

    Positive working photosensitive composition
    1.
    发明授权
    Positive working photosensitive composition 失效
    正光敏组合物

    公开(公告)号：US5002853A

    公开(公告)日：1991-03-26

    申请号：US417496

    申请日：1989-10-05

    申请人： Toshiaki Aoai ,  Teruo Nagano

    发明人： Toshiaki Aoai ,  Teruo Nagano

    IPC分类号： C07C303/36 ,  C07C311/51 ,  C07D207/30 ,  C07D207/448 ,  G03F7/039

    CPC分类号： G03F7/039

    摘要： The present invention relates to a positive working photosensitive composition having an improved sensitivity due to the use of a sensitizer and having an excellent incandescent light safety. This composition comprises at least 1 molar % of a structural unit derived from at least one of monomers having the following general formulae: ##STR1## wherein: R.sub.1 represents a hydrogen atom, an alkyl group or a substituted alkyl group,R.sub.2 represents a divalent alkylene group or a substituted divalent alkylene group,R.sub.3, R.sub.4 and R.sub.5 may be the same as or different from each other and each represents an alkyl group, a substituted alkyl group, an aryl group or a substituted aryl group,R.sub.6 and R.sub.7 may be the same as or different from each other and each represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group or a substituted aryl group,Ar.sub.1 represents a single bond or Ar.sub.2, andAr.sub.2 represents a divalent arylene group or a substituted divalent arylene group.

    Photosensitive composition with o-quinonediazide compound and condensate of dihydric phenol and aldehyde or ketone
    2.
    发明授权
    Photosensitive composition with o-quinonediazide compound and condensate of dihydric phenol and aldehyde or ketone 失效
    具有邻醌二叠氮化合物和二元酚和醛或酮缩合物的光敏组合物

    公开(公告)号：US4536464A

    公开(公告)日：1985-08-20

    申请号：US550420

    申请日：1983-11-10

    申请人： Akira Nagashima ,  Akira Hasegawa ,  Toshiaki Aoai ,  Teruo Nagano

    发明人： Akira Nagashima ,  Akira Hasegawa ,  Toshiaki Aoai ,  Teruo Nagano

    IPC分类号： C08G8/20 ,  C08K5/28 ,  G03C1/72 ,  G03F7/008 ,  G03F7/023 ,  G03C1/60 ,  G03C1/54 ,  G03F7/08

    CPC分类号： G03F7/0236 ,  C08G8/20 ,  C08K5/28 ,  G03C1/72

    摘要： The photosensitive composition suitable as a posi-posi photosensitive composition for photosensitive lithographic printing plates is composed of a high molecular compound shown by following general formula I or II and an o-naphthoquinonediazide compound; ##STR1## wherein R.sub.1 is a hydrogen atom, an alkyl group having 1 to 8 carbon atoms and R.sub.2 and R.sub.3 each is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.When the photosensitive composition is used as a photosensitive layer of a photosensitive lithographic printing plate and the plate is developed by rubbing with a sponge containing a developer, the photosensitive composition at the exposed areas is completely removed leaving no patches of the composition.

    摘要翻译： 适合作为光敏平版印刷版的磷光敏组合物的光敏组合物由以下通式I或II所示的高分子化合物和邻萘醌二叠氮化合物组成; 其中R 1是氢原子，具有1至8个碳原子的烷基，R 2和R 3各自是氢原子或具有1至4个碳原子的烷基。 当感光性组合物用作感光性平版印刷版的感光层时，通过用含有显影剂的海绵进行摩擦而使印版显影，曝光区域的感光性组合物被完全除去，不存在组合物的斑块。

    Positive type photoresist composition
    4.
    发明授权
    Positive type photoresist composition 有权
    正型光致抗蚀剂组合物

    公开(公告)号：US07223516B2

    公开(公告)日：2007-05-29

    申请号：US09729953

    申请日：2000-12-06

    申请人： Kenichiro Sato ,  Toshiaki Aoai

    发明人： Kenichiro Sato ,  Toshiaki Aoai

    IPC分类号： G03F7/004

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

    摘要： A positive type photoresist composition suitable for light in the wavelength region of 170 nm to 220 nm, high in sensitivity, excellent in adhesion and giving a good resist pattern profile, which comprises a resin having an ester group represented by the following general formula [I] in its molecule and a compound generating an acid by irradiation of an active light ray or radiation: wherein R1 represents a hydrogen atom, an alkyl group or a cycloalkyl group; and R2 and R3, which may be the same or different, each represents a hydrogen atom, an alkyl group, a cycloalkyl group or -A-R4, and R2 and R3 may combine together to form a ring, wherein R4 represents a hydrogen atom, an alkyl group or a cycloalkyl group, R4 and R2 or R3 may combine together to form a ring, and A represents an oxygen atom or a sulfur atom.

    摘要翻译： 一种适用于170nm至220nm波长区域的光的正型光致抗蚀剂组合物，其灵敏度高，粘附性优异，并且具有良好的抗蚀剂图案轮廓，其包含具有由以下通式[I ]和通过活性光线或辐射的照射产生酸的化合物：其中R 1表示氢原子，烷基或环烷基; 和R 2和R 3可以相同或不同，分别表示氢原子，烷基，环烷基或-AR 4， / SUB，R 2和R 3可以结合在一起形成环，其中R 4代表氢原子，烷基 或环烷基，R 4和R 2或R 3可以结合在一起形成环，A表示氧原子或 硫原子。

    Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate
    5.
    发明申请
    Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate 有权
    油墨组合物，喷墨记录方法，印刷材料，平版印刷版的制造方法和平版印刷版

    公开(公告)号：US20070052790A1

    公开(公告)日：2007-03-08

    申请号：US11516650

    申请日：2006-09-07

    申请人： Toshiaki Aoai

    发明人： Toshiaki Aoai

    IPC分类号： B41J2/435

    CPC分类号： C09D11/101 ,  Y10T428/24802

    摘要： An ink composition is provided that includes a cationically polymerizable compound (a), a compound (b) that generates an acid when exposed to radiation, a colorant (c), and a salt of a weak acid having a pKa of 4 to 8 (d). There is also provided an inkjet recording method that includes a step of discharging the ink composition onto a recording medium, and a step of irradiating the discharged ink composition with radiation so as to cure the ink composition.

    摘要翻译： 提供一种油墨组合物，其包含阳离子聚合性化合物（a），暴露于辐射时产生酸的化合物（b），着色剂（c）和pKa为4-8的弱酸盐（ d）。 还提供了一种喷墨记录方法，其包括将油墨组合物排出到记录介质上的步骤，以及用放射线照射排出的油墨组合物以固化油墨组合物的步骤。

    Electron beam or X-ray negative-working resist composition
    9.
    发明授权
    Electron beam or X-ray negative-working resist composition 有权
    电子束或X射线负极抗蚀剂组合物

    公开(公告)号：US06824948B1

    公开(公告)日：2004-11-30

    申请号：US09759362

    申请日：2001-01-16

    申请人： Toshiaki Aoai ,  Yutaka Adegawa ,  Morio Yagihara

    发明人： Toshiaki Aoai ,  Yutaka Adegawa ,  Morio Yagihara

    IPC分类号： G03F7004

    CPC分类号： G03F7/0045 ,  G03F7/038

    摘要： A negative-working resist composition for electron beams or X-rays comprising (A) a compound generating an acid and/or radical species by the irradiation of electron beams or X-rays, (B) a resin which is insoluble in water and soluble in an alkali aqueous solution, (C) a crosslinking agent causing crosslinking with the resin of component (B) by the action of an acid, and (D) a compound having at least one unsaturated bond capable of being polymerized by an acid and/or a radical, and a negative-working resist composition for electron beams or X-rays comprising (A) a compound generating an acid and/or radical species by the irradiation of electron beams or X-rays, (B′) a resin having at least one unsaturated bond polymerizable by an acid and/or an alkali, which is insoluble in water but soluble in an alkali aqueous solution, and (C) a crosslinking agent causing crosslinking with the resin (B′) by the action of an acid are disclosed.

    摘要翻译： 一种用于电子束或X射线的负性抗蚀剂组合物，包括（A）通过电子束或X射线的照射产生酸和/或自由基的化合物，（B）不溶于水和可溶的树脂 在碱性水溶液中，（C）通过酸的作用与成分（B）的树脂交联的交联剂，（D）具有至少一个能够被酸和/ 或用于电子束或X射线的负性抗蚀剂组合物，其包含（A）通过照射电子束或X射线产生酸和/或自由基的化合物，（B'）具有 至少一个不溶于水但可溶于碱性水溶液的酸和/或碱可聚合的不饱和键，和（C）通过酸的作用与树脂（B'）交联的交联剂 被披露。

    Positive photoresist composition
    10.
    发明授权
    Positive photoresist composition 失效
    正光致抗蚀剂组合物

    公开(公告)号：US06638683B1

    公开(公告)日：2003-10-28

    申请号：US09103544

    申请日：1998-06-24

    申请人： Shiro Tan ,  Toshiaki Aoai ,  Toru Fujimori

    发明人： Shiro Tan ,  Toshiaki Aoai ,  Toru Fujimori

    IPC分类号： G03C173

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/115

    摘要： A positive photoresist composition comprises the combination of (a) Resin A obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (I) and (b) Resin B obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (II) or (III) or a nonpolymeric dissolution inhibitive compound which has at least one kind of group selected from tertiary alkyl ester groups and tertiary alkyl carbonate groups; wherein R1, W, n, and R4 are as defined in the specification.

    摘要翻译： 正型光致抗蚀剂组合物包含（a）由含有酚羟基的碱溶性树脂得到的树脂A的组合，通过用式（I）和（b）表示的基团代替10至80％的酚羟基， 通过用式（II）或（III）表示的基团代替10〜80％的酚羟基或由至少一种以上的非聚合物溶解抑制化合物代替的酚醛羟基的碱溶性树脂得到的树脂B 选自叔烷基酯基和叔烷基碳酸酯基的一类基团;其中R 1，W，n和R 4如说明书中所定义。