公开(公告)号：US6079840A

公开(公告)日：2000-06-27

申请号：US953553

申请日：1997-10-17

申请人： Toshiaki Ono ,  Manabu Takashio ,  Nobuhiro Arai

发明人： Toshiaki Ono ,  Manabu Takashio ,  Nobuhiro Arai

IPC分类号： G02B6/00 ,  F21V8/00 ,  G02F1/1335 ,  G02F1/13357 ,  F21V7/04

CPC分类号： G02B6/0055

摘要： There is provided a surface light source device of side light type, which is not reduced in efficiency of illumination light utilization, even if the surface light source device is subjected to fringing such as to trim a luminant portion. For instance, a light shielding layer formed by coating black ink 21A, which absorbs illumination light, by means of printing is provided on a protection sheet 21 arranged as the outermost emission-side additional sheet. The light shielding layer absorbs and shields illumination light L1 tending to be transmitted through a peripheral edge portion of the protection sheet 12, and as a result, provides fringing. A reflective surface is formed by applying a silver tape 21B or the like to a surface facing the light guide plate 6. Since illumination light reflected by the silver tape 21B is used again inside the light guide plate 6, it is possible to avoid a reduction in efficiency of light utilization. The reflective layer may be narrower or wider than the light shielding layer, or may be equal in width to the light shielding layer at need. The reflective surface and the light shielding layer may be also formed on other components.

摘要翻译： 提供了一种侧光型的面光源装置，即使表面光源装置受到诸如修整发光体部分的边缘的影响，也不会降低照明光利用的效率。 例如，在作为最外侧发光侧附加片配置的保护片21上设置通过涂布通过印刷吸收照明光的黑色墨21A形成的遮光层。 遮光层吸收并遮蔽趋向于透过保护片12的周边部分的照明光L1，结果提供了边缘。 通过将银带21B等施加到与导光板6相对的表面来形成反射表面。由于在导光板6内再次使用由银带21B反射的照明光，因此可以避免减少 在光利用效率上。 反射层可以比遮光层更窄或更宽，或者在需要时可以与遮光层的宽度相等。 反射表面和遮光层也可以形成在其它部件上。

公开(公告)号：US5957561A

公开(公告)日：1999-09-28

申请号：US944551

申请日：1997-10-07

申请人： Toshiaki Ono ,  Manabu Takashio ,  Tsuyoshi Ishikawa

发明人： Toshiaki Ono ,  Manabu Takashio ,  Tsuyoshi Ishikawa

IPC分类号： G02B6/00 ,  F21V8/00 ,  G02F1/1335 ,  G02F1/13357 ,  F21V13/12

CPC分类号： G02B6/0055 ,  G02B6/0061 ,  G02B6/005

摘要： In a surface light source device of side light type and a display employing the same, illumination light of high grade is allowed to emit by reducing irregularities in luminance caused along a muntin of a support member to support components such as a light guide plate 2 and a reflection sheet 21. A light quantity correction surface 21A is formed between the reflection member 21 and a support member 11. Otherwise, a member providing the light quantity correction surface is arranged on the rear of the support member. A quantity of illumination light in a portion of a muntin 11B of the support member 11 is made approximately equal to that in a portion of an aperture 11C, and the irregularities in luminance caused correspondingly to the muntin are reduced. The light quantity correction surface may be provided by a surface of the muntin itself or ink coated on the muntin by means of printing. Further, a member providing the light quantity correction surface may be arranged between the muntin and the reflection member 21. This member may be an additional reflection sheet.

摘要翻译： 在侧光型的面光源装置和使用其的显示器中，通过减少沿着支撑构件的柔性引起的亮度的不规则性，允许高等级的照明光发射，以支撑诸如导光板2和 反射片21.在反射构件21和支撑构件11之间形成有光量校正表面21A。另外，提供光量校正表面的构件设置在支撑构件的后部。 支撑构件11的一部分的照明光量大致等于孔11C的一部分，并且相应地降低了与亮度相关的亮度不均匀性。 光量校正表面可以通过本身的表面或通过印刷涂覆在柔版上的油墨来提供。 此外，提供光量校正表面的构件可以布置在柔版和反射构件21之间。该构件可以是附加的反射片。

公开(公告)号：US6123430A

公开(公告)日：2000-09-26

申请号：US940374

申请日：1997-09-30

申请人： Toshiaki Ono ,  Shingo Ohkawa ,  Manabu Takashio

发明人： Toshiaki Ono ,  Shingo Ohkawa ,  Manabu Takashio

IPC分类号： G02B6/00 ,  F21V8/00 ,  G02F1/1335 ,  G02F1/13357 ,  F21V7/04

CPC分类号： G02B6/0055 ,  G02B6/0031 ,  G02B6/005

摘要： Local irregularities in luminance are removed from a surface light source device of side light type 20 applied to a liquid crystal display or the like. In assembly, a reflection sheet 4 and a primary light source 23 are mounted on a light guide plate 2, and these components are housed at a predetermined position in a frame 21. The primary light source 23 has a fluorescent lamp 25 and a reflector 26, and supplied illumination light to an end surface (an incidence surface) 2A of the light guide plate 2. The reflector 26 presses the reflection sheet 4 against the light guide plate 2 and supports the reflection sheet. A support member 24 has a claw 24C engageable with a claw 21C of the frame 21. A light absorbable layer 27 is formed on an end portion of the reflection sheet 4. Since the reflection sheet 4 projects toward the primary light source and is pressed against the light guide plate 2 by the reflector 26, there is less quantity of light actually incident onto a lower edge ED, even if the illumination light makes a propagation toward the edge ED. Thus, it is possible to prevent the phenomenon that the edge ED on the side of the reflection sheet 4 is brightly illuminated with illumination light from occurring in the vicinity of the end surface (the incidence surface) 2A of the light guide plate 2 to which the light is supplied.

摘要翻译： 从应用于液晶显示器等的侧光型20的面光源装置中去除亮度的局部不规则。 在组装中，反射片4和初级光源23安装在导光板2上，这些部件容纳在框架21中的预定位置。初级光源23具有荧光灯25和反射器26 并且向导光板2的端面（入射面）2A供给照明光。反射体26将反射片4按压在导光板2上并支撑反射片。 支撑构件24具有可与框架21的爪21C接合的爪24C。在反射片4的端部上形成有光吸收层27.由于反射片4向主光源突出并被压靠 通过反射器26导光板2，即使照明光朝向边缘ED传播，实际入射到下边缘ED上的光量也较少。 因此，可以防止发生在导光板2的端面（入射面）2A附近的照明光使反射片4一侧的边缘ED发光的现象， 灯被供应。

公开(公告)号：US08419001B2

公开(公告)日：2013-04-16

申请号：US12311747

申请日：2007-10-12

申请人： Toshiaki Ono ,  Yumi Hoshino

发明人： Toshiaki Ono ,  Yumi Hoshino

IPC分类号： H01L21/683 ,  B24B41/06

CPC分类号： H01L21/683 ,  C30B25/12 ,  C30B29/06 ,  C30B31/14 ,  C30B33/02 ,  H01L21/6875

摘要： Provided are a method and a jig for holding a silicon wafer, which are applied to the production of the silicon wafer having {110} or {100} plane as its principal surface, in which the silicon wafer is held while a silicon wafer holding positions are properly defined at wafer edge regions relative to the reference direction as being from the center of the silicon wafer toward in crystal orientation in parallel to the wafer surface. In handling the silicon wafer, generation of contact scratches is suppressed as little as possible, and a fracture which is caused by development of the crack initiating from easily generated contact scratches can be prevented in the silicon wafer, particularly in the silicon wafer having {110} plane as its principal surface.

摘要翻译： 提供了一种用于保持硅晶片的方法和夹具，其用于生产具有{110}或{100}面作为其主表面的硅晶片，其中保持硅晶片，而硅晶片保持位置 在与晶片表面平行的晶片方向上相对于参考方向的晶片边缘区域适当地定义为从晶片朝向朝向<110>的中心。 在处理硅晶片时，尽可能少地抑制接触划痕的产生，并且可以防止在硅晶片中，特别是在具有{110的硅晶片的硅晶片中，由容易产生的接触划痕引起的裂纹的发展引起的断裂 }平面作为其主面。

公开(公告)号：US20120249352A1

公开(公告)日：2012-10-04

申请号：US13526405

申请日：2012-06-18

申请人： Toshiaki Ono

发明人： Toshiaki Ono

IPC分类号： H03M1/00

CPC分类号： H03M1/0607 ,  H03M1/12

摘要： A switched-capacitor input circuit which receives an analog input signal, and samples and holds the analog input signal, comprising a differential amplifier, a first capacitor, one terminal of the first capacitor being connected to a non-inverting input terminal of the differential amplifier, a second capacitor, one terminal of the second capacitor being connected to an inverting input terminal of the differential amplifier, a first switch configured to connect the other terminal of the first capacitor to one of a first reference voltage and a second reference voltage, a second switch configured to connect the other terminal of the second capacitor to one of the first reference voltage and the second reference voltage, and a third switch configured to connect the other terminal of the first capacitor to the other terminal of the second capacitor.

摘要翻译： 一种接收模拟输入信号并采样并保持模拟输入信号的开关电容器输入电路，包括差分放大器，第一电容器，第一电容器的一个端子连接到差分放大器的非反相输入端子 第二电容器，第二电容器的一个端子连接到差分放大器的反相输入端子，第一开关被配置为将第一电容器的另一端子连接到第一参考电压和第二参考电压之一， 第二开关，被配置为将第二电容器的另一端子连接到第一参考电压和第二参考电压之一;以及第三开关，被配置为将第一电容器的另一端子连接到第二电容器的另一端子。

公开(公告)号：US20120043644A1

公开(公告)日：2012-02-23

申请号：US13258962

申请日：2010-03-25

申请人： Toshiaki Ono ,  Wataru Ito ,  Jun Fujise

发明人： Toshiaki Ono ,  Wataru Ito ,  Jun Fujise

IPC分类号： H01L29/36 ,  C30B25/10 ,  C30B19/08 ,  C30B23/06 ,  H01L29/32 ,  H01L21/20

CPC分类号： C30B33/02 ,  C30B23/025 ,  C30B25/186 ,  C30B29/06 ,  H01L21/3225 ,  H01L21/67115 ,  H01L21/68735 ,  H01L29/16 ,  H01L29/167 ,  H01L29/36 ,  Y10S438/918

摘要： A method of manufacturing a silicon wafer provides a silicon wafer which can reduce the precipitation of oxygen to prevent a wafer deformation from being generated and can prevent a slip extension due to boat scratches and transfer scratches serving as a reason for a decrease in wafer strength, even when the wafer is provided to a rapid temperature-rising-and-falling thermal treatment process.

摘要翻译： 硅晶片的制造方法提供了可以减少氧沉淀以防止晶片变形产生的硅晶片，并且可以防止由于舟状划痕引起的滑移延伸和作为晶片强度降低的原因的转印划痕， 即使将晶片提供到快速升温和降温热处理工艺。

公开(公告)号：US07978243B2

公开(公告)日：2011-07-12

申请号：US12032217

申请日：2008-02-15

申请人： Toshiaki Ono ,  Tomoyuki Noda ,  Hidekazu Takahashi

发明人： Toshiaki Ono ,  Tomoyuki Noda ,  Hidekazu Takahashi

IPC分类号： H04N3/14

CPC分类号： H04N5/343 ,  H04N5/3454 ,  H04N5/374 ,  H04N5/3765

摘要： In an imaging apparatus according to the present invention, the driving unit drives each of the pixels in the non-readout region in the first mode such that the setting unit sets the input unit to a third electric potential with the transfer unit being ready to transfer the electric charge to reset the photoelectric conversion unit in a first period and that the setting unit sets the input unit to a fourth electric potential for the pixel to be deselected in a second period later than the first period.

摘要翻译： 在根据本发明的成像装置中，驱动单元以第一模式驱动非读出区域中的每个像素，使得设置单元将输入单元设置为第三电位，转印单元准备传送 所述电荷在第一时间段内复位所述光电转换单元，并且所述设定单元将所述输入单元设置为比所述第一周期晚的第二周期中将被取消选择的像素的第四电位。

公开(公告)号：US20090190017A1

公开(公告)日：2009-07-30

申请号：US12354442

申请日：2009-01-15

申请人： Toshiaki Ono

发明人： Toshiaki Ono

IPC分类号： H04N5/335

CPC分类号： H04N5/361 ,  H01L27/14603 ,  H01L27/14609 ,  H01L27/14612

摘要： An image sensing apparatus includes a pixel array including a light-shielded area where light-shielded pixels are arranged, and an effective area where non-light-shielded pixels are arranged. Each of the light-shielded pixels includes a first photoelectric conversion unit, a first charge-voltage converter which converts charges generated in the first photoelectric conversion unit into a voltage, and a first amplification transistor functioning as a MOS transistor which receives, at the gate, the voltage converted by the first charge-voltage converter. Each of the non-light-shielded pixels includes a second photoelectric conversion unit, a second charge-voltage converter which converts charges generated in the second photoelectric conversion unit into a voltage, and a second amplification transistor functioning as a MOS transistor which receives, at the gate, the voltage converted by the second charge-voltage converter. The gate capacitance of the first amplification transistor is larger than that of the second amplification transistor.

摘要翻译： 一种图像感测装置包括：像素阵列，其包括配置有遮光像素的遮光区域，以及配置非遮光像素的有效区域。 每个遮光像素包括第一光电转换单元，将在第一光电转换单元中产生的电荷转换为电压的第一电荷 - 电压转换器，以及用作MOS晶体管的第一放大晶体管，其在栅极处接收 ，由第一充电电压转换器转换的电压。 每个非遮光像素包括第二光电转换单元，将在第二光电转换单元中产生的电荷转换为电压的第二电荷电压转换器，以及用作MOS晶体管的第二放大晶体管，其接收 门，由第二充电电压转换器转换的电压。 第一放大晶体管的栅极电容大于第二放大晶体管的栅极电容。

公开(公告)号：US20080257746A1

公开(公告)日：2008-10-23

申请号：US12096519

申请日：2006-12-08

申请人： Toshiaki Ono ,  Yasuo Komoda

发明人： Toshiaki Ono ,  Yasuo Komoda

IPC分类号： C25D3/00

CPC分类号： C25D1/04 ,  C25D3/02 ,  C25D3/38 ,  H05K1/09 ,  H05K3/241

摘要： A method for producing a metal thin body by electroplating, in which the relative integrated intensity of the (111) plane of the metal thin body can be increased to 65% or greater. By carrying out electroplating using an electrolytic solution (plating solution) containing 5% in volume or greater of acetonitrile and water, in particular, using an electrolytic solution (plating solution) containing 10% in volume or greater of acetonitrile and water, the relative integrated intensity of the (111) plane can be increased to 65% or greater.

摘要翻译： 通过电镀制造金属薄体的方法，其中金属薄体的（111）面的相对集成强度可以提高到65％以上。 通过使用含有5体积％以上的乙腈和水的电解液（电镀液）进行电镀，特别是使用含有10体积％以上的乙腈和水的电解液（电镀液），相对集成 （111）面的强度可以提高到65％以上。

公开(公告)号：US20080211950A1

公开(公告)日：2008-09-04

申请号：US12033924

申请日：2008-02-20

申请人： Toshiaki Ono ,  Tomoyuki Noda ,  Hidekazu Takahashi

发明人： Toshiaki Ono ,  Tomoyuki Noda ,  Hidekazu Takahashi

IPC分类号： H04N5/335

CPC分类号： H04N5/37457 ,  H04N5/3741

摘要： An imaging apparatus includes a pixel unit array and a driving unit. Each pixel unit includes a plurality of photoelectric conversion units, a charge-voltage converter common to the plurality of photoelectric conversion units, a plurality of transfer units which transfer electric charges generated by the plurality of photoelectric conversion units to the charge-voltage converter, an output unit which outputs a signal based on the electric charges to a signal line, and a setting unit which sets the electric potential of the charge-voltage converter. Each pixel unit is selected or deselected in accordance with the electric potential set in the charge-voltage converter. The driving unit drives the pixel unit array so that the output unit continuously outputs, to the signal line, the signal based on the electric charges generated by the plurality of photoelectric conversion units in the selected pixel unit without performing an operation of deselecting the selected pixel unit.

摘要翻译： 成像装置包括像素单元阵列和驱动单元。 每个像素单元包括多个光电转换单元，多个光电转换单元共用的电荷 - 电压转换器，将由多个光电转换单元产生的电荷传送到电荷 - 电压转换器的多个转移单元， 输出单元，其将基于电荷的信号输出到信号线;以及设定单元，其设定电荷电压转换器的电位。 根据在电荷 - 电压转换器中设置的电位来选择或取消选择每个像素单元。 驱动单元驱动像素单元阵列，使得输出单元基于由所选择的像素单元中的多个光电转换单元产生的电荷，向信号线连续输出信号，而不执行取消选择所选择的像素的操作 单元。