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公开(公告)号：US4810967A
公开(公告)日：1989-03-07
申请号：US27833
申请日：1987-03-19
申请人： Toshio Yokoyama , Iwao Shimane , Tsuneo Konno
发明人： Toshio Yokoyama , Iwao Shimane , Tsuneo Konno
CPC分类号： G01D5/2497 , F02D41/009 , F02P7/067 , H03M1/245
摘要： A light, compact angle-of-rotation sensor is provided that is comprised of a magnetic ring bonded to a shaft by means of resin. The magnetic ring is provided around its periphery with a number of magnetized zones, with each such magnetized zone having a different number of magnetic poles, and magnetic interference between magnetized zones is prevented by leaving non-magnetized spaces between the magnetized zones. The prevention of magnetic interference can be further enhanced by the provision of non-magnetized portions between the magnetic poles of the magnetized zones.
摘要翻译： 提供了一种轻巧，紧凑的旋转旋转传感器，其包括通过树脂粘合到轴上的磁环。 磁环围绕其周边设置有多个磁化区域，每个这样的磁化区域具有不同数量的磁极，并且通过在磁化区域之间留下非磁化空间来防止磁化区域之间的磁干扰。 通过在磁化区的磁极之间设置非磁化部分，能够进一步提高防止磁干扰。
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公开(公告)号：US4808934A
公开(公告)日：1989-02-28
申请号：US27831
申请日：1987-03-19
申请人： Toshio Yokoyama , Iwao Shimane , Tsuneo Konno
发明人： Toshio Yokoyama , Iwao Shimane , Tsuneo Konno
CPC分类号： F02P7/0677 , G01D5/14
摘要： A light, compact angle-of-rotation sensor is comprised of a magnetic ring within which resin is used to fix the ring to the periphery of a shaft. Formed on the magnetic ring are insets into which the resin enters, providing a strong bond between the resin and the magnetic ring. In addition, a key inset into the shaft provides a strong bond between the resin and the shaft. Magnetized zones are formed on the outer surface of the magnetic ring, and magneto electric transducer means are arranged in the proximity of these zones to face said zones, and the angle of rotation is detected from the changes in magnetism that accompany the rotation.
摘要翻译： 一个轻巧紧凑的转角传感器由一个磁环组成，在该环内使用树脂将环固定在轴的周边。 在磁环上形成有树脂进入的插入件，树脂和磁环之间形成牢固的结合。 此外，轴中的一个关键插入物提供了树脂和轴之间的牢固结合。 磁性区域形成在磁环的外表面上，并且磁电换能器装置布置在这些区域附近以面对所述区域，并且根据伴随旋转的磁力变化来检测旋转角度。
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3.发明授权
公开(公告)号：US4796354A
公开(公告)日：1989-01-10
申请号：US27832
申请日：1987-03-19
申请人： Toshio Yokoyama , Iwao Shimane , Tsuneo Konno
发明人： Toshio Yokoyama , Iwao Shimane , Tsuneo Konno
CPC分类号： H03M1/245 , B29C45/14491 , B29C70/84 , B29C45/14622 , Y10T29/49012 , Y10T29/49075 , Y10T29/49076
摘要： A method of manufacturing an angle-of-rotation sensor comprises fabricating a rotating member by providing a shaft coaxially inside a magnetic ring made of ferrite magnetic material or the like, and filling the space between shaft and ring with resin. As the resin is first provided on the outer surface of the magnetic ring, then in the interior, a balance is achieved between tensile stress from within the ring and compressive stress from the outside of the ring, and as a result the ring is not broken or cracked. Thus, with this method it is possible to make the angle-of-rotation sensor small and light.
摘要翻译： 制造旋转角度传感器的方法包括通过在由铁氧体磁性材料等制成的磁环内同轴地设置轴并且用树脂填充轴和环之间的空间来制造旋转构件。 由于首先将树脂设置在磁环的外表面上，所以在内部，在环内的拉伸应力与来自环外部的压缩应力之间达到平衡，结果环不破裂 或破裂。 因此，通过这种方法，可以使旋转角度传感器变小和变小。
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公开(公告)号：US5132604A
公开(公告)日：1992-07-21
申请号：US498050
申请日：1990-03-22
申请人： Iwao Shimane , Yoshio Kojima , Toshio Yokoyama , Sadao Shinohara
发明人： Iwao Shimane , Yoshio Kojima , Toshio Yokoyama , Sadao Shinohara
IPC分类号： F02N11/04
CPC分类号： F02N11/04 , F02N15/046
摘要： An engine starter and electric generator system transmits rotative power to a crankshaft to start an engine and generates electric power based on rotative power from the crankshaft after the engine has started. The engine starter and electric generator system includes a starter/generator operable selectively as a starter motor to produce the rotative power and a generator for generating the electric power, and an electric power supply device for supplying electric power to the starter motor. A power transmitting mechanism operatively interconnects the crankshaft and the starter/generator, for bidirectionally transmitting the rotative power between the crankshaft and the starter/generator. A transmission mechanism is disposed in the power transmitting mechanism, for changing the speed of rotation transmitted between the crankshaft and the starter/generator. The system also has a control device for controlling operation of the starter/generator and establishing different speed-reduction ratios for the transmission mechanism when the starter/generator operates as the generator and when the starter/generator operates as the starter motor.
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公开(公告)号：US4719883A
公开(公告)日：1988-01-19
申请号：US39008
申请日：1987-04-15
申请人： Toshio Yokoyama , Iwao Shimane
发明人： Toshio Yokoyama , Iwao Shimane
摘要： A distributor accommodates an angle-of-rotation sensor having a magnetic rotating member which is provided to detect the crank angles in an internal combustion engine. The air vent of the distributor is provided with a magnetic trap means that collects any ferrous particles and other such dust in air drawn into the distributor from the outside, preventing such particles adhering to the magnetic rotating member and producing otherwise detection output errors.
摘要翻译： 分配器容纳旋转角度传感器，其具有设置用于检测内燃机中的曲柄角的磁旋转部件。 分配器的通风口设置有磁捕集装置，其从外部收集从分配器吸入的空气中的任何铁质颗粒和其它这样的灰尘，防止这些颗粒粘附到磁性旋转构件并产生另外的检测输出误差。
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公开(公告)号：US08225803B2
公开(公告)日：2012-07-24
申请号：US13100484
申请日：2011-05-04
申请人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motojima
发明人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motojima
IPC分类号： B08B13/00
CPC分类号： H01L21/68721 , C23C18/163 , C23C18/1632 , C23C18/1886 , C25D7/123 , C25D17/001 , H01L21/67126 , H01L21/67766 , Y10S134/901
摘要： A substrate processing method and apparatus can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method carries out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments and then electroless plates a metal film on the catalyst-imparted surface of the substrate. The cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment.
摘要翻译： 基板处理方法和装置可以可靠地执行能够在基板的表面的必要区域中均匀镀覆的预镀处理。 基板处理方法对作为预镀处理的基板的表面进行清洗处理和催化剂赋予处理，然后在基板的赋予催化剂的表面上化学镀金属膜。 在通过催化剂赋予处理赋予催化剂的区域的基板的表面的更宽的区域中进行清洗处理。
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公开(公告)号：US07575636B2
公开(公告)日：2009-08-18
申请号：US11455777
申请日：2006-06-20
申请人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motoshima , Akira Owatari , Naoki Dai
发明人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motoshima , Akira Owatari , Naoki Dai
IPC分类号： B05C3/02
CPC分类号： H01L21/67161 , C23C18/1628 , C23C18/1893 , C25D7/123 , C25D17/001 , C25D17/08 , H01L21/67051 , H01L21/67126 , H01L21/67173 , H01L21/6719 , H01L21/67196 , H01L21/6723 , H01L21/67742 , H01L21/67751 , H01L21/67766 , H01L21/67781 , H01L21/68707 , H01L21/68721 , Y10S134/902 , Y10T279/11
摘要： The present invention relates to a substrate processing apparatus useful for plating a substrate or processing a substrate by dipping a substrate in a processing liquid. A substrate processing apparatus of the present invention includes: a loading/unloading area for carrying in and out a substrate; a cleaning area for cleaning the substrate; and a plating area for plating the substrate. The loading/unloading area is provided with a substrate transfer robot having a plurality of hands of dry-use design, a loading port mounted with a cassette for housing substrates, and a reversing machine of dry-use design for reversing the substrate from face up to face down.
摘要翻译： 本发明涉及通过将基板浸渍在处理液中而用于电镀基板或加工基板的基板处理装置。 本发明的基板处理装置包括：用于搬入和取出基板的装载/卸载区域; 用于清洁衬底的清洁区域; 以及用于电镀基板的电镀区域。 装载/卸载区域设置有具有多个干用设计的手的基板传送机器人，安装有用于容纳基板的盒的装载端口和用于将基板从面朝上翻转的干式设计的反转机 面对下来
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公开(公告)号：US20060243205A1
公开(公告)日：2006-11-02
申请号：US11455777
申请日：2006-06-20
申请人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motoshima , Akira Owatari , Naoki Daj
发明人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motoshima , Akira Owatari , Naoki Daj
CPC分类号： H01L21/67161 , C23C18/1628 , C23C18/1893 , C25D7/123 , C25D17/001 , C25D17/08 , H01L21/67051 , H01L21/67126 , H01L21/67173 , H01L21/6719 , H01L21/67196 , H01L21/6723 , H01L21/67742 , H01L21/67751 , H01L21/67766 , H01L21/67781 , H01L21/68707 , H01L21/68721 , Y10S134/902 , Y10T279/11
摘要： The present invention relates to a substrate processing apparatus useful for plating a substrate or processing a substrate by dipping a substrate in a processing liquid. A substrate processing apparatus of the present invention includes: a loading/unloading area for carrying in and out a substrate; a cleaning area for cleaning the substrate; and a plating area for plating the substrate. The loading/unloading area is provided with a substrate transfer robot having a plurality of hands of dry-use design, a loading port mounted with a cassette for housing substrates, and a reversing machine of dry-use design for reversing the substrate from face up to face down.
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公开(公告)号：US07087117B2
公开(公告)日：2006-08-08
申请号：US10712348
申请日：2003-11-14
申请人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motoshima , Akira Owatari , Naoki Dai
发明人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motoshima , Akira Owatari , Naoki Dai
CPC分类号： H01L21/67161 , C23C18/1628 , C23C18/1893 , C25D7/123 , C25D17/001 , C25D17/08 , H01L21/67051 , H01L21/67126 , H01L21/67173 , H01L21/6719 , H01L21/67196 , H01L21/6723 , H01L21/67742 , H01L21/67751 , H01L21/67766 , H01L21/67781 , H01L21/68707 , H01L21/68721 , Y10S134/902 , Y10T279/11
摘要： The present invention relates to a substrate processing apparatus useful for plating a substrate or processing a substrate by dipping a substrate in a processing liquid. A substrate processing apparatus of the present invention includes: a loading/unloading area for carrying in and out a substrate; a cleaning area for cleaning the substrate; and a plating area for plating the substrate. The loading/unloading area is provided with a substrate transfer robot having a plurality of hands of dry-use design, a loading port mounted with a cassette for housing substrates, and a reversing machine of dry-use design for reversing the substrate from face up to face down.
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公开(公告)号：US06824613B2
公开(公告)日：2004-11-30
申请号：US10156791
申请日：2002-05-30
申请人： Naoki Dai , Masaya Seki , Akihiro Yazawa , Toshio Yokoyama , Akira Owatari
发明人： Naoki Dai , Masaya Seki , Akihiro Yazawa , Toshio Yokoyama , Akira Owatari
IPC分类号： B05C1102
CPC分类号： H01L21/67051 , C23C18/1632 , H01L21/67046 , H01L21/67742 , Y10S134/902 , Y10S414/137 , Y10S414/141
摘要： A substrate processing apparatus can efficiently form, e.g. by electroless plating, an interconnects-protective layer on the surface of a substrate at a low initial cost for the apparatus and a low running cost without the need for a wide installation space. The substrate processing apparatus includes a loading/unloading and cleaning area accommodating a first transfer robot which has a hand adapted for handling a dry substrate and a hand adapted for handling a wet substrate, a loading port which loads a substrate cassette that houses a substrate, and a cleaning unit for cleaning a substrate. A plating treatment area accommodates a second transfer robot which has a back surface-attracting type of hand provided with a reversing mechanism, a pretreatment unit for carrying out pretreatment of a substrate before plating, and a plating treatment unit for carrying out plating treatment of the substrate.
摘要翻译： 基板处理装置可以有效地形成，例如， 通过化学镀，在基板的表面上以设备的初始成本低的布线保护层和低的运行成本，而不需要宽的安装空间。 基板处理装置包括容纳第一传送机器人的装载/卸载和清洁区域，第一传送机器人具有适于处理干燥基板的手和适于处理湿基板的手，装载容纳基板的基板盒的装载口， 以及用于清洁基板的清洁单元。 电镀处理区域容纳具有设置有反转机构的背面吸引型手的第二传送机器人，用于在电镀之前进行基板的预处理的预处理单元和用于对电镀处理进行电镀处理的电镀处理单元 基质。
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