公开(公告)号：US07105074B2

公开(公告)日：2006-09-12

申请号：US10202279

申请日：2002-07-22

申请人： Osamu Tamada ,  Tsuyoshi Mitsuhashi ,  Minobu Matsunaga ,  Katsushi Yoshioka ,  Kenji Sugimoto ,  Kaoru Aoki ,  Moritaka Yano ,  Satoshi Yamamoto ,  Masakazu Sanada ,  Takashi Nagao ,  Mitsumasa Kodama

发明人： Osamu Tamada ,  Tsuyoshi Mitsuhashi ,  Minobu Matsunaga ,  Katsushi Yoshioka ,  Kenji Sugimoto ,  Kaoru Aoki ,  Moritaka Yano ,  Satoshi Yamamoto ,  Masakazu Sanada ,  Takashi Nagao ,  Mitsumasa Kodama

IPC分类号： B05B3/00 ,  B08B3/00

CPC分类号： H01L21/6715 ,  H01L21/31133

摘要： A substrate treating apparatus is provided for eliminating wasteful consumption of a treating solution in a treating mode in which the treating solution is delivered in a strip form to a substrate from a treating solution delivery nozzle sweeping over the substrate. In a first aspect of the invention, collecting vessels are arranged around a developing cup surrounding a wafer supported by a wafer holder. The collecting vessels collect part of a developer delivered from a discharge opening of a developer delivery nozzle outwardly of a surface of the wafer. In a second aspect of the invention, collecting vessels are arranged below a developer delivery nozzle, with collecting openings of the collecting vessels opposed to a discharge opening or openings of the delivery nozzle. The collecting vessels are moved longitudinally of the discharge openings according to a position of the developer delivery nozzle relative to the wafer.

公开(公告)号：US06963789B2

公开(公告)日：2005-11-08

申请号：US10253010

申请日：2002-09-23

申请人： Tamihiro Bun ,  Kinya Murata ,  Kenji Hashinoki ,  Kenji Kamei ,  Noriaki Yokono ,  Kenji Sugimoto ,  Tsuyoshi Mitsuhashi

发明人： Tamihiro Bun ,  Kinya Murata ,  Kenji Hashinoki ,  Kenji Kamei ,  Noriaki Yokono ,  Kenji Sugimoto ,  Tsuyoshi Mitsuhashi

IPC分类号： H01L21/66 ,  H01L21/00 ,  G06F19/00

CPC分类号： H01L21/67253

摘要： A controller is connected to a substrate processing apparatus and an exposure apparatus. A pilot substrate subjected to a series of processing as preprocessing is transported to an inspection unit. An inspection result determination part compares inspection results received from the inspection unit with substrate condition data so that a condition change instruction part changes the processing condition of each processing unit when no requirement is satisfied. This operation is so repeated that a processing control part executes actual processing according to recipe data when the inspection results satisfy the requirement. Thus, the efficiency a step of changing the processing condition of each processing part in response to the inspection results in the inspection part is improved in preprocessing executed in the substrate processing apparatus.

摘要翻译： 控制器连接到基板处理装置和曝光装置。 经过一系列处理作为预处理的先导基板被输送到检查单元。 检查结果确定部分将从检查单元接收的检查结果与基板条件数据进行比较，使得条件改变指示部分在不要求满足时改变每个处理单元的处理条件。 该操作如此重复，使得当检查结果满足要求时，处理控制部分根据配方数据执行实际处理。 因此，在基板处理装置中执行的预处理中，提高了响应于检查结果的检查结果改变各处理部的处理条件的效率。

公开(公告)号：US5677000A

公开(公告)日：1997-10-14

申请号：US699728

申请日：1996-08-19

申请人： Katsushi Yoshioka ,  Yoshiteru Fukutomi ,  Tsuyoshi Mitsuhashi ,  Kenji Sugimoto

发明人： Katsushi Yoshioka ,  Yoshiteru Fukutomi ,  Tsuyoshi Mitsuhashi ,  Kenji Sugimoto

IPC分类号： B05C11/08 ,  G03F7/16 ,  H01L21/00 ,  H01L21/027 ,  H01L21/304 ,  B05D3/12 ,  B05C11/00

CPC分类号： H01L21/6715 ,  G03F7/162

摘要： A substrate spin treating method and apparatus having a cup cleaner device for cleaning a scatter preventive cup, which cleaner device does not require attaching and/or detaching of a cleaning jig. The cleaner device is driven through engagement with a spin chuck which operates at a low torque that is provided for normal substrate spin treating operation. During the normal spin treating operation, only the spin chuck is driven by a rotary shaft, with the cup cleaner device being disengaged from the spin chuck and its driving rotary shaft. For a cup cleaning operation, the spin chuck and scatter preventive cup are vertically moved relative to each other to place the cup cleaner device at a cup cleaning height and to drivingly connect the cup cleaner device to the rotary shaft through a torque transmitter. In this state, the cup cleaner device is rotated to establish a centrifugal force that scatters a cleaning solution supplied to a cleaning solution guide of the cup cleaner device from cleaning solution supply nozzles, thereby cleaning inner surfaces of the scatter preventive cup.

摘要翻译： 一种具有用于清洁散射防止杯的杯子清洁器装置的衬底旋转处理方法和装置，该清洁装置不需要附着和/或拆卸清洁夹具。 清洁器装置通过与旋转卡盘啮合而被驱动，旋转卡盘以为正常的基底旋转处理操作提供的低扭矩操作。 在正常的旋转处理操作期间，只有旋转卡盘由旋转轴驱动，杯子清洁器装置与旋转卡盘及其驱动旋转轴脱离。 对于杯子清洁操作，旋转卡盘和防散射杯相对于彼此垂直移动，以将杯清洁器设备放置在杯清洁高度处，并且通过扭矩传递器驱动地将杯清洁器装置连接到旋转轴。 在这种状态下，杯子清洁器装置被旋转以建立离心力，该离心力将供应到杯清洁器装置的清洁溶液引导件的清洁溶液从清洁溶液供应喷嘴分散，从而清洁防散射杯的内表面。

公开(公告)号：US20070183775A1

公开(公告)日：2007-08-09

申请号：US11671581

申请日：2007-02-06

申请人： Tsuyoshi Mitsuhashi ,  Kenji Sugimoto

发明人： Tsuyoshi Mitsuhashi ,  Kenji Sugimoto

IPC分类号： G03D5/00

CPC分类号： G03F7/3021 ,  H01L21/67051 ,  H01L21/67253

摘要： A joint nozzle that delivers a developer, a rinsing liquid and nitrogen gas is disposed adjacent the spin center of a substrate in plan view. A controller operates electromagnetic switch valves to continue supply of the developer, while spinning the substrate, in a developing process, and to start supply of the rinsing liquid in a rinsing process, immediately after the supply of the developer ends, thereby achieving a shortened period of the developing process. A switching is made to a drying process by starting supply of the nitrogen gas immediately after completion of the rinsing process. Thus, even if the substrate has a large angle of contact, formation of droplets of the rinsing liquid is inhibited to prevent post-develop defects.

摘要翻译： 在平面图中，与基板的旋转中心相邻地设置输送显影剂，冲洗液和氮气的接合喷嘴。 控制器在显影过程中操作电磁切换阀以继续供应显影剂，同时旋转基底，并且在显影剂供应结束后立即在漂洗过程中开始供应冲洗液，从而实现缩短的周期 的发展过程。 通过在完成漂洗处理之后立即开始供应氮气，进行干燥过程的切换。 因此，即使基板具有大的接触角，也可以抑制漂洗液的液滴的形成，防止显影后的缺陷。

公开(公告)号：US06893171B2

公开(公告)日：2005-05-17

申请号：US10417460

申请日：2003-04-16

申请人： Yoshiteru Fukutomi ,  Kenji Sugimoto ,  Takashi Ito ,  Takeo Okamoto ,  Yukihiko Inagaki ,  Katsushi Yoshioka ,  Tsuyoshi Mitsuhashi

发明人： Yoshiteru Fukutomi ,  Kenji Sugimoto ,  Takashi Ito ,  Takeo Okamoto ,  Yukihiko Inagaki ,  Katsushi Yoshioka ,  Tsuyoshi Mitsuhashi

IPC分类号： G03F7/30 ,  B05C9/14 ,  B05C13/00 ,  B65G1/00 ,  H01L21/00 ,  H01L21/027 ,  H01L21/67 ,  H01L21/677 ,  G03D5/00 ,  B65G49/07 ,  B65H1/00 ,  G03B27/32

CPC分类号： H01L21/67173 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67276 ,  H01L21/67778 ,  Y10S414/135

摘要： A substrate treating apparatus disclosed herein realizes improved throughput. The substrate treating apparatus according to this invention includes an antireflection film forming block, a resist film forming block and a developing block arranged in juxtaposition. Each block includes chemical treating modules, heat-treating modules and a single main transport mechanism. The main transport mechanism transports substrates within each block. Transfer of the substrates between adjacent blocks is carried out through substrate rests. The main transport mechanism of each block is not affected by movement of the main transport mechanisms of the adjoining blocks. Consequently, the substrates may be transported efficiently to improve the throughput of the substrate treating apparatus.

摘要翻译： 本文公开的基板处理装置实现了改善的生产量。 根据本发明的基板处理装置包括并列布置的防反射膜形成块，抗蚀剂膜形成块和显影块。 每个块包括化学处理模块，热处理模块和单个主要输送机构。 主要运输机构在每个区块内运输基材。 通过基板支架进行相邻块之间的基板的转移。 每个块的主要运输机构不受邻接块主运输机构的运动的影响。 因此，可以有效地输送基板，以提高基板处理装置的通过量。

公开(公告)号：US07922405B2

公开(公告)日：2011-04-12

申请号：US11671581

申请日：2007-02-06

申请人： Tsuyoshi Mitsuhashi ,  Kenji Sugimoto

发明人： Tsuyoshi Mitsuhashi ,  Kenji Sugimoto

IPC分类号： G03D5/00

CPC分类号： G03F7/3021 ,  H01L21/67051 ,  H01L21/67253

摘要： A joint nozzle that delivers a developer, a rinsing liquid and nitrogen gas is disposed adjacent the spin center of a substrate in plan view. A controller operates electromagnetic switch valves to continue supply of the developer, while spinning the substrate, in a developing process, and to start supply of the rinsing liquid in a rinsing process, immediately after the supply of the developer ends, thereby achieving a shortened period of the developing process. A switching is made to a drying process by starting supply of the nitrogen gas immediately after completion of the rinsing process. Thus, even if the substrate has a large angle of contact, formation of droplets of the rinsing liquid is inhibited to prevent post-develop defects.

摘要翻译： 在平面图中，与基板的旋转中心相邻地设置输送显影剂，冲洗液和氮气的接合喷嘴。 控制器在显影过程中操作电磁切换阀以继续供应显影剂，同时旋转基底，并且在显影剂供应结束后立即在漂洗过程中开始供应冲洗液，从而实现缩短的周期 的发展过程。 通过在完成漂洗处理之后立即开始供应氮气，进行干燥过程的切换。 因此，即使基板具有大的接触角，也可以抑制漂洗液的液滴的形成，防止显影后的缺陷。

公开(公告)号：US06832863B2

公开(公告)日：2004-12-21

申请号：US10458719

申请日：2003-06-09

申请人： Kenji Sugimoto ,  Minobu Matsunaga ,  Masakazu Sanada ,  Katsushi Yoshioka ,  Kaoru Aoki ,  Moritaka Yano ,  Satoshi Yamamoto ,  Tsuyoshi Mitsuhashi ,  Takashi Nagao ,  Mitsumasa Kodama

发明人： Kenji Sugimoto ,  Minobu Matsunaga ,  Masakazu Sanada ,  Katsushi Yoshioka ,  Kaoru Aoki ,  Moritaka Yano ,  Satoshi Yamamoto ,  Tsuyoshi Mitsuhashi ,  Takashi Nagao ,  Mitsumasa Kodama

IPC分类号： G03D500

CPC分类号： H01L21/67173 ,  G03F7/70691 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67276 ,  Y10S414/135 ,  Y10S414/14

摘要： A series of substrate transport paths for transporting substrates is arranged on upper and lower stories. Substrates are transferable between the substrate transport path on the first story and the substrate transport path on the second story. The paths include a going-only path for transporting the substrates forward, and a return-only path for transporting the substrates in the opposite direction, these paths being arranged on the upper and lower stories. An indexer connects one end of the substrate transport path on one story to one end of the substrate transport path on the other story. An interface connects the other end of the substrate transport path on one story to the other end of the substrate transport path on the other story. This construction efficiently reduces a waiting time due to interference between the substrates transported along the going-only path and the substrates transported along the return-only path.

摘要翻译： 用于传送基板的一系列基板传送路径被布置在上层和下层。 基底可以在第一层的基底输送路径和第二层的基底输送路径之间转移。 这些路径包括用于向前传送基板的唯一路径，以及用于沿相反方向传送基板的返回路径，这些路径布置在上部和下部故事物上。 分度器将另一个故事的基底传送路径的一端连接到基底传送路径的一端。 一个界面将一个故事的基板传送路径的另一端连接到另一个故事的基板传送路径的另一端。 这种构造有效地减少了由沿着仅路径传送的基板与沿着返回路径传送的基板之间的干涉导致的等待时间。

公开(公告)号：US09195140B2

公开(公告)日：2015-11-24

申请号：US13053946

申请日：2011-03-22

申请人： Tsuyoshi Mitsuhashi ,  Kenji Sugimoto

发明人： Tsuyoshi Mitsuhashi ,  Kenji Sugimoto

IPC分类号： G03D5/00 ,  G03F7/30 ,  H01L21/67

CPC分类号： G03F7/3021 ,  H01L21/67051 ,  H01L21/67253

摘要： A joint nozzle that delivers a developer, a rinsing liquid and nitrogen gas is disposed adjacent the spin center of a substrate in plan view. A controller operates electromagnetic switch valves to continue supply of the developer, while spinning the substrate, in a developing process, and to start supply of the rinsing liquid in a rinsing process, immediately after the supply of the developer ends, thereby achieving a shortened period of the developing process. A switching is made to a drying process by starting supply of the nitrogen gas immediately after completion of the rinsing process. Thus, even if the substrate has a large angle of contact, formation of droplets of the rinsing liquid is inhibited to prevent post-develop defects.

摘要翻译： 在平面图中，与基板的旋转中心相邻地设置输送显影剂，冲洗液和氮气的接合喷嘴。 控制器在显影过程中操作电磁切换阀以继续供应显影剂，同时旋转基底，并且在显影剂供应结束后立即在漂洗过程中开始供应冲洗液，从而实现缩短的周期 的发展过程。 通过在完成漂洗处理之后立即开始供应氮气，进行干燥过程的切换。 因此，即使基板具有大的接触角，也可以抑制漂洗液的液滴的形成，防止显影后的缺陷。

公开(公告)号：US06558053B2

公开(公告)日：2003-05-06

申请号：US10125229

申请日：2002-04-18

申请人： Kazuhito Shigemori ,  Masakazu Sanada ,  Minobu Matsunaga ,  Katsushi Yoshioka ,  Kenji Sugimoto ,  Kaoru Aoki ,  Moritaka Yano ,  Satoshi Yamamoto ,  Tsuyoshi Mitsuhashi ,  Takashi Nagao ,  Mitsumasa Kodama ,  Yukihiko Inagaki ,  Yoshihisa Yamada

发明人： Kazuhito Shigemori ,  Masakazu Sanada ,  Minobu Matsunaga ,  Katsushi Yoshioka ,  Kenji Sugimoto ,  Kaoru Aoki ,  Moritaka Yano ,  Satoshi Yamamoto ,  Tsuyoshi Mitsuhashi ,  Takashi Nagao ,  Mitsumasa Kodama ,  Yukihiko Inagaki ,  Yoshihisa Yamada

IPC分类号： G03D500

CPC分类号： H01L21/67161 ,  H01L21/6715 ,  H01L21/67167 ,  H01L21/67178

摘要： A substrate processing apparatus includes a coating section, a developing section, a heat-treating section and a transport mechanism. The coating section has first processing units each for performing a coverage process to supply a photoresist solution to a substrate and cover a surface of the substrate with the photoresist solution, a second processing unit for spinning the substrate, after the coverage process, at high speed to make the photoresist solution into a film, dry the photoresist film, and clean the substrate. All substrates are processed with the same coating conditions to suppress differences in quality among the substrates. The first and second processing units perform the respective processes concurrently to improve the throughput of substrate processing.

公开(公告)号：US5762709A

公开(公告)日：1998-06-09

申请号：US680983

申请日：1996-07-16

申请人： Kenji Sugimoto ,  Katsushi Yoshioka ,  Seiichiro Okuda ,  Tsuyoshi Mitsuhashi

发明人： Kenji Sugimoto ,  Katsushi Yoshioka ,  Seiichiro Okuda ,  Tsuyoshi Mitsuhashi

IPC分类号： G03F7/16 ,  B05C11/08 ,  B05D1/40 ,  H01L21/00 ,  H01L21/027 ,  B05C11/02

CPC分类号： H01L21/6715 ,  B05C11/08

摘要： A substrate spin coating apparatus for forming a coating film on the upper surface of a spinning substrate includes a spin chuck for supporting and spinning the substrate while holding same substantially in horizontal posture. A scatter preventive cup surrounds lateral and lower regions of the spin chuck, and defines an opening in an upper central region thereof for allowing entry of air flows. An exhaust vent is provided for downwardly exhausting the air flows, and a nozzle is provided for supplying a coating solution through the opening of the scatter preventive cup to the upper surface of the substrate. The scatter preventive cup includes an air passage formed in a bottom region thereof and opening toward a lower surface of the substrate. An air flow adjusting unit is connected to the air passage for adjusting an air flow to a predetermined temperature and supplying the adjusted air flow to the air passage.

摘要翻译： 用于在纺丝基材的上表面上形成涂膜的基材旋涂装置包括：旋转卡盘，用于支撑和旋转基材，同时基本保持水平姿势。 散射防止杯围绕旋转卡盘的横向和下部区域，并且在其上部中心区域中限定开口以允许空气流进入。 设置有用于向下排出空气流的排气口，并且设置有用于通过散射防止杯的开口将涂布溶液供给到基板的上表面的喷嘴。 散射防止杯包括形成在其底部区域中并且朝向基板的下表面开口的空气通道。 气流调节单元连接到空气通道，用于将空气流调节到预定温度，并将经调节的空气流供应到空气通道。