公开(公告)号：US5468576A

公开(公告)日：1995-11-21

申请号：US853436

申请日：1992-03-18

申请人： Tsuyoshi Shibata ,  Koji Hashimoto ,  Katsuhiko Hieda

发明人： Tsuyoshi Shibata ,  Koji Hashimoto ,  Katsuhiko Hieda

IPC分类号： G03F1/29 ,  G03F1/34 ,  G03F1/68 ,  G03F1/80 ,  H01L21/027 ,  H01L21/30 ,  G03F9/00

CPC分类号： G03F1/30 ,  G03F1/29

摘要： A method for manufacturing an exposure mask provided with a substrate for transmitting an exposure light and with phase shifters arranged at prescribed intervals on the substrate for shifting the phase of the exposure light transmitted through the substrate by a half wavelength as compared with the phase of the exposure light transmitted through both the substrate and an opening between the phase shifters consists of the steps of preparing a solution containing a phase shifter material, arranging resist layers at the prescribed intervals on the substrate, immersing the substrate with the resist layers in the solution, forming the phase shifters on the substrate between the resist layers by a prescribed thickness by depositing the material of the phase shifter from the solution, and removing the resist layers from the substrate to form the openings.

摘要翻译： 一种制造曝光掩模的方法，该曝光掩模具有用于透射曝光光的基板和在基板上以规定间隔布置的移相器，用于将透过该基板的曝光光的相位与第二波长的相位相比移动一半波长 透过基板和移相器之间的开口的曝光光由以下步骤组成：制备含有移相材料的溶液，在基板上以规定的间隔配置抗蚀剂层，将基板与抗蚀剂层浸入溶液中， 通过从溶液中沉积移相器的材料，在基板上形成位于抗蚀剂层之间的相移规定厚度的移相器，以及从基板去除抗蚀剂层以形成开口。

公开(公告)号：US5543252A

公开(公告)日：1996-08-06

申请号：US228504

申请日：1994-04-15

申请人： Tsuyoshi Shibata ,  Koji Hashimoto ,  Katsuhiko Heida ,  Kenji Kawano ,  Shinichi Ito ,  Keiji Horioka

发明人： Tsuyoshi Shibata ,  Koji Hashimoto ,  Katsuhiko Heida ,  Kenji Kawano ,  Shinichi Ito ,  Keiji Horioka

IPC分类号： G03F1/29 ,  G03F1/30 ,  G03F1/34 ,  G03F9/00

CPC分类号： G03F1/30 ,  G03F1/29 ,  G03F1/34

摘要： A method for manufacturing an exposure mask provided with a substrate for transmitting an exposure light and with phase shifters arranged at prescribed intervals on the substrate for shifting the phase of the exposure light transmitted through the substrate by a half wavelength as compared with the phase of the exposure light transmitted through both the substrate and an opening between the phase shifters consists of the steps of preparing a solution containing a phase shifter material, arranging resist layers at the prescribed intervals on the substrate, immersing the substrate with the resist layers in the solution, forming the phase shifters on the substrate between the resist layers by a prescribed thickness by depositing the material of the phase shifter from the solution, and removing the resist layers from the substrate to form the openings.

摘要翻译： 一种制造曝光掩模的方法，该曝光掩模具有用于透射曝光光的基板和在基板上以规定间隔布置的移相器，用于将透过该基板的曝光光的相位与第二波长的相位相比移动一半波长 透过基板和移相器之间的开口的曝光光由以下步骤组成：制备含有移相材料的溶液，在基板上以规定的间隔配置抗蚀剂层，将基板与抗蚀剂层浸入溶液中， 通过从溶液中沉积移相器的材料，在基板上形成位于抗蚀剂层之间的相移规定厚度的移相器，以及从基板去除抗蚀剂层以形成开口。

公开(公告)号：US07000215B2

公开(公告)日：2006-02-14

申请号：US10642266

申请日：2003-08-18

申请人： Ayako Nakano ,  Koji Hashimoto ,  Takashi Sato ,  Tsuyoshi Shibata ,  Yuji Kobayashi

发明人： Ayako Nakano ,  Koji Hashimoto ,  Takashi Sato ,  Tsuyoshi Shibata ,  Yuji Kobayashi

IPC分类号： G06F17/50

CPC分类号： G03F1/36 ,  G03F7/70433 ,  G03F7/705

摘要： A method of designing patterns has preparing a mask pattern used in a lithography process for transferring a circuit pattern intersecting with a step pattern on a substrate which has the step pattern designed thereon, and applying correction patterns to the mask pattern in accordance with correction rules considering a shape of the step pattern, the correction patterns being applied at intersections of edges of the circuit pattern and the step pattern and in the vicinity of the intersections.

摘要翻译： 设计图案的方法制备了在光刻工艺中使用的掩模图案，用于将具有阶梯图案的台阶图案相交的电路图案转印到具有设计在其上的台阶图案的基板上，并且根据考虑到的校正规则将校正图案应用于掩模图案 台阶图案的形状，校正图案被应用在电路图案和台阶图案的边缘的交点处和交叉点附近。

公开(公告)号：US09601357B2

公开(公告)日：2017-03-21

申请号：US14383817

申请日：2012-09-07

申请人： Koji Hashimoto ,  Masahiro Miyagi ,  Mitsukazu Takahashi

发明人： Koji Hashimoto ,  Masahiro Miyagi ,  Mitsukazu Takahashi

IPC分类号： C03C15/00 ,  H01L21/67 ,  H01L21/677

CPC分类号： H01L21/6704 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/67751

摘要： A substrate processing apparatus and method includes, a plate that has a size equal to or larger than a principal face of the substrate, and has a horizontal and flat liquid holding face opposing the principal face of the substrate from below. A processing liquid supply unit supplies a processing liquid to the liquid holding face. A control unit controls the processing liquid supply unit and a movement unit to supply the processing liquid to the liquid holding face to form a processing liquid film, a contact step of bringing the principal face of the substrate and the liquid holding face close to each other to bring the principal face of the substrate into contact with the processing liquid film, and a liquid contact maintenance step of maintaining the processing liquid in contact with the principal face of the substrate.

公开(公告)号：US09101066B2

公开(公告)日：2015-08-04

申请号：US13788855

申请日：2013-03-07

申请人： Isao Azumi ,  Koji Hashimoto

发明人： Isao Azumi ,  Koji Hashimoto

IPC分类号： H05K7/00 ,  H05K5/06 ,  H05K5/00

CPC分类号： H05K5/069 ,  H05K5/0052 ,  H05K5/062 ,  Y10T29/49213

摘要： An outer circumferential groove filled with a seal material and an opposing surface portion are provided to a fit portion of a case. A tray portion opposing the opposing surface portion and an outer circumferential protruding portion entering the outer circumferential groove are provided to the fit portion of a cover. Master dimensions are set so that an outer clearance A0 between the outer circumferential groove and the outer circumferential protruding portion is always larger than an inner clearance C0 between the former and the latter when center positions of the cover and the case coincide with each other.

摘要翻译： 填充有密封材料的外周槽和相对的表面部分设置在壳体的配合部分。 在盖的配合部分设置有与相对表面部分相对的托盘部分和进入外周槽的外周突出部分。 设定主尺寸，使得当外壳和外周突出部之间的外部间隙A0总是大于前者与后者之间的内部间隙C0时，盖和壳体的中心位置彼此重合。

公开(公告)号：US08994220B2

公开(公告)日：2015-03-31

申请号：US13343804

申请日：2012-01-05

申请人： Yuki Iwagami ,  Koji Hashimoto ,  Manabu Yamashita ,  Yuji Zushi ,  Mitsunori Nishida

发明人： Yuki Iwagami ,  Koji Hashimoto ,  Manabu Yamashita ,  Yuji Zushi ,  Mitsunori Nishida

IPC分类号： H04B3/00 ,  B60R16/00

CPC分类号： B60R16/00

摘要： In a vehicle-mounted electronic control device having a switching power supply in which a switching element is controlled to obtain a predetermined intermediate voltage Va stepped down from a vehicle-mounted battery, and to which a downstream side coil, a flywheel diode, and an output capacitor are connected to suppress a pulsating voltage, a circuit for suppressing reverse conduction for the switching element is provided in order to prevent that the switching element is reversely conducted and thus a charging voltage of the output capacitor is abnormally lowered when a power supply voltage Vb of the vehicle-mounted battery is abnormally lowered.

摘要翻译： 在具有开关电源的车载电子控制装置中，其中开关元件被控制以获得从车载电池下降的预定中间电压Va，并且下游侧线圈，续流二极管和 连接输出电容器以抑制脉动电压，为了防止开关元件反向导通，设置用于抑制反向导通的电路，因此当电源电压为0V时，输出电容器的充电电压异常降低 车载电池的Vb异常地下降。

公开(公告)号：US08963031B2

公开(公告)日：2015-02-24

申请号：US13635794

申请日：2011-02-07

申请人： Takeyoshi Fujimoto ,  Yasuo Motohashi ,  Koji Hashimoto

发明人： Takeyoshi Fujimoto ,  Yasuo Motohashi ,  Koji Hashimoto

IPC分类号： H01H9/04 ,  H01H23/06 ,  H01H21/24 ,  H01H21/22 ,  H01H21/08

CPC分类号： H01H9/047 ,  H01H21/08 ,  H01H21/24 ,  H01H23/06 ,  H01H2021/225 ,  H01H2223/004 ,  H01H2300/01

摘要： A switch unit includes an upper case that has an operation portion attached therein; a circuit board that has a switch attached thereto that is able to switch contact points by operation of the operation portion; and a lower case that fits into the upper case such that the lower case is surrounded by the upper case, and that accommodates the circuit board between the upper case and the lower case. A draining portion is provided at a side surface of the upper case, and the draining portion is integrally formed with a sidewall forming the side surface and protrudes downward, and has a width that gradually narrows from the top to the bottom thereof.

摘要翻译： 一种开关单元包括：一个具有附接在其中的操作部分的上壳体; 电路板，其具有附接到其上的开关，其能够通过操作部的操作来切换接触点; 以及下壳体，其适合于上壳体，使得下壳体被上壳体包围，并且将电路板容纳在上壳体和下壳体之间。 排水部设置在上壳体的侧面，排水部与形成侧面的侧壁一体形成，向下方突出，宽度从顶部到底部逐渐变窄。

公开(公告)号：US20140317560A1

公开(公告)日：2014-10-23

申请号：US14357357

申请日：2012-01-05

申请人： Koji Hashimoto

发明人： Koji Hashimoto

IPC分类号： G06F3/0484

CPC分类号： G06F3/04847 ,  G01C21/367 ,  G01C21/3676 ,  G01C21/3682 ,  G09B29/005 ,  G09B29/007 ,  G09B29/10

摘要： A map display control device includes an instruction input unit capable of receiving input of a user instruction including an instruction to change display to a map according to purpose, an information drawing unit that acquires a map information including map display information to be displayed on a display, is capable of automatically setting a density of the map display information according to the purpose of the map, and processing the map information in accordance with the map and the density of the map display information set according to the purpose of the map, on the basis of the instruction to change display, and a display controller outputting an instruction signal on the basis of an instruction from the information drawing unit to display the map as changed on the display at the density of the map display information that is set according to the purpose of the map.

摘要翻译： 地图显示控制装置包括：指示输入单元，其能够根据目的接收包括将显示改变为地图的指令的用户指令的输入;信息绘制单元，其获取包括要在显示器上显示的地图显示信息的地图信息 能够根据地图的目的自动设置地图显示信息的浓度，并根据地图的目的设置的地图显示信息的密度和地图信息的处理，在 基于改变显示的指令的基础;以及显示控制器，根据来自信息描绘单元的指令，输出指令信号，以显示器上的地图显示信息的浓度显示出根据 地图的目的。

公开(公告)号：US08583007B2

公开(公告)日：2013-11-12

申请号：US13435678

申请日：2012-03-30

申请人： Kazuo Chadani ,  Tomonori Mori ,  Koji Hashimoto

发明人： Kazuo Chadani ,  Tomonori Mori ,  Koji Hashimoto

IPC分类号： G03G21/16 ,  G03G15/00

CPC分类号： G03G21/1821 ,  G03G21/1609 ,  G03G21/1839 ,  G03G21/186 ,  G03G2221/1657 ,  G03G2221/1853 ,  G03G2221/1884

摘要： A process cartridge comprises a photosensitive drum and a developing roller. A coupling member is provided adjacent to one axial end of the developing roller. The coupling member includes a driven portion, and an intermediary portion configured and positioned to engage with the driven portion. The intermediary portion is also configured to be movable relative to the driven portion in a direction crossing the axis of the developing roller while maintaining engagement with the driven portion. The coupling member further includes a driving portion configured and positioned to receive a driving force for rotating the developing roller. The driving portion is also configured to engage with the intermediary portion, and to be movable relative to the intermediary portion in a direction crossing the axis of the developing roller while maintaining engagement with the intermediary portion.

公开(公告)号：US20130248060A1

公开(公告)日：2013-09-26

申请号：US13988513

申请日：2011-06-22

申请人： Naoki Maruyama ,  Koji Hashimoto ,  Masaharu Kameda

发明人： Naoki Maruyama ,  Koji Hashimoto ,  Masaharu Kameda

IPC分类号： C22C38/50 ,  C22C38/48 ,  C22C38/44 ,  C22C38/32 ,  C22C38/28 ,  C22C38/24 ,  C22C38/22 ,  C22C38/20 ,  C22C38/04 ,  C22C38/02 ,  C22C38/00 ,  C21D8/02 ,  C22C38/26

CPC分类号： C22C38/50 ,  C21D8/0263 ,  C21D9/46 ,  C21D2211/005 ,  C22C1/02 ,  C22C38/001 ,  C22C38/002 ,  C22C38/004 ,  C22C38/005 ,  C22C38/008 ,  C22C38/02 ,  C22C38/04 ,  C22C38/06 ,  C22C38/20 ,  C22C38/22 ,  C22C38/24 ,  C22C38/26 ,  C22C38/28 ,  C22C38/32 ,  C22C38/44 ,  C22C38/48

摘要： A strain aging hardening type steel sheet excellent in aging resistance, and manufacturing method thereof, said steel sheet comprises: in mass %, C: 0.0010 to 0.010%; Si: 0.005 to 1.0%; Mn: 0.08 to 1.0%; P: 0.003 to 0.10%; S: 0.0005 to 0.020%; Al: 0.010 to 0.10%; Cr: 0.005 to 0.20%; Mo: 0.005 to 0.20%; Ti: 0.002 to 0.10%; Nb: 0.002 to 0.10%; N: 0.001 to 0.005%; and a balance being composed of Fe and inevitable impurities, in which a ferrite fraction is 98% or more, an average grain diameter of ferrite is 5 to 30 μm, a minimum value of dislocation density in a portion having a ½ thickness of a sheet thickness and a minimum value of dislocation density in a surface layer portion are each 5×1012/m2 or more, and an average dislocation density falls within a range of 5×1012 to 1×1015/m2.

摘要翻译： 耐老化性优异的应变时效硬化型钢板及其制造方法，所述钢板以质量％计含有C：0.0010〜0.010％ Si：0.005〜1.0％ Mn：0.08〜1.0％ P：0.003〜0.10％ S：0.0005〜0.020％ Al：0.010〜0.10％ Cr：0.005〜0.20％ Mo：0.005〜0.20％ Ti：0.002〜0.10％ Nb：0.002〜0.10％ N：0.001〜0.005％ 余量由Fe和不可避免的杂质组成，其中铁素体部分为98％以上，铁素体的平均粒径为5〜30μm，片材的1/2厚度部分的位错密度的最小值 表面层部的厚度和位错密度的最小值分别为5×10 12 / m 2以上，平均位错密度在5×10 12〜1×10 15个/ m 2的范围内。