公开(公告)号：US06881966B2

公开(公告)日：2005-04-19

申请号：US10461702

申请日：2003-06-13

申请人： Victor M. Benveniste ,  Robert D. Rathmell ,  Yongzhang Huang

发明人： Victor M. Benveniste ,  Robert D. Rathmell ,  Yongzhang Huang

IPC分类号： H01J27/18 ,  H01J37/00 ,  H01J37/05 ,  H01J37/147 ,  H01J37/30 ,  H01J37/317

CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J37/147 ,  H01J2237/057

摘要： A magnetic deflector for an ion beam is disclosed and comprises first and second coils. The coils are positioned above and below the beam, respectively, and extend along a width of the beam. Current passes through the coils to generate a magnetic field therebetween that is generally perpendicular to a direction of travel of the beam along substantially the entire width thereof. In another aspect of the invention, a method of deflecting a beam prior to implantation into a workpiece is disclosed. The method includes determining one or more properties associated with the beam and selectively activating one of a magnetic deflection module and an electrostatic deflection module based on the determination.

摘要翻译： 公开了用于离子束的磁偏转器，并且包括第一和第二线圈。 线圈分别位于梁的上方和下方，并沿着梁的宽度延伸。 电流通过线圈以产生它们之间的磁场，其大致垂直于梁的大致整个宽度的行进方向。 在本发明的另一方面，公开了一种在植入植入工件之前偏转光束的方法。 该方法包括确定与光束相关联的一个或多个属性，并且基于该确定选择性地激活磁偏转模块和静电偏转模块中的一个。

公开(公告)号：US06534775B1

公开(公告)日：2003-03-18

申请号：US09654380

申请日：2000-09-01

申请人： Eric R. Harrington ,  Victor M. Benveniste ,  Michael A. Graf ,  Robert D. Rathmell

发明人： Eric R. Harrington ,  Victor M. Benveniste ,  Michael A. Graf ,  Robert D. Rathmell

IPC分类号： H01J3730

CPC分类号： H01J37/3171 ,  H01J3/40 ,  H01J37/026 ,  H01J37/3002 ,  H01J2237/004 ,  H01J2237/022 ,  H01J2237/31705

摘要： A system for inhibiting the transport of contaminant particles with an ion beam includes a pair of electrodes that provide opposite electric fields through which the ion beam travels. A particle entrained in the ion beam is charged to a polarity matching the polarity of ion beam when traveling through a first of the electric fields. The downstream electrode provides another electric field for repelling the positively charged particle away from the direction of beam travel.

摘要翻译： 用于抑制用离子束输送污染物颗粒的系统包括一对电极，其提供相反的电场，离子束通过该电场传播。 夹带在离子束中的颗粒在穿过第一电场时被充电到与离子束的极性相匹配的极性。 下游电极提供另一个电场，用于驱除带正电的粒子远离光束移动的方向。

公开(公告)号：US06476399B1

公开(公告)日：2002-11-05

申请号：US09654379

申请日：2000-09-01

申请人： Eric R. Harrington ,  Victor M. Benveniste ,  Michael A. Graf ,  Robert D. Rathmell

发明人： Eric R. Harrington ,  Victor M. Benveniste ,  Michael A. Graf ,  Robert D. Rathmell

IPC分类号： H01J3730

CPC分类号： H01J37/026 ,  H01J37/3002 ,  H01J37/3171 ,  H01J2237/004 ,  H01J2237/022 ,  H01J2237/31705

摘要： A system for inhibiting the transport of contaminant particles with an ion beam includes a particle charging system for charging particles within a region through which the ion beam travels. An electric field is generated downstream relative to the charged region so as to urge charged particles away from a direction of travel for the ion beam.

摘要翻译： 用于抑制用离子束输送污染物颗粒的系统包括用于在离子束行进的区域内填充颗粒的颗粒装料系统。 在相对于带电区域的下游产生电场，以便使带电粒子远离离子束的行进方向。

公开(公告)号：US06774377B1

公开(公告)日：2004-08-10

申请号：US10607239

申请日：2003-06-26

申请人： Robert D. Rathmell ,  Victor M. Benveniste

发明人： Robert D. Rathmell ,  Victor M. Benveniste

IPC分类号： H01J37317

CPC分类号： H01J37/3171 ,  H01J37/12

摘要： A lens structure for use with an ion beam implanter. The lens structure includes first and second electrodes spaced apart along a direction of ion movement. The lens structure extends on opposite sides of a beam path across a width of the ion beam for deflecting ions entering the lens structure. The lens structure include a first electrode for decelerating ions and a second electrode for accelerating the ions to cause ions entering the lens structure to exit said lens structure with approximately the same exit trajectory regardless of the trajectory ions enter the lens structure. In an alternate construction the lens structure can include a first electrode for accelerating ions and a second electrode for decelerating ions.

摘要翻译： 用于离子束注入机的透镜结构。 透镜结构包括沿离子运动方向间隔开的第一和第二电极。 透镜结构在离子束的宽度上的光束路径的相对侧上延伸，用于偏转进入透镜结构。 透镜结构包括用于减速离子的第一电极和用于加速离子的第二电极，使离子进入透镜结构以离开所述透镜结构以大致相同的出射轨迹，而与轨迹离子进入透镜结构无关。 在替代结构中，透镜结构可以包括用于加速离子的第一电极和用于减速离子的第二电极。

公开(公告)号：US07112809B2

公开(公告)日：2006-09-26

申请号：US10894209

申请日：2004-07-19

申请人： Robert D. Rathmell ,  Victor M. Benveniste

发明人： Robert D. Rathmell ,  Victor M. Benveniste

IPC分类号： H01J37/317

CPC分类号： H01J37/12 ,  H01J37/3171

摘要： A lens structure for use with an ion beam implanter. The lens structure includes first and second electrodes spaced apart along a direction of ion movement. The lens structure extends across a width of the ion beam for deflecting ions entering the lens structure. The lens structure includes a first electrode for decelerating ions and a second electrode for accelerating the ions. A lens structure mode controller selectively activates either the accelerating or decelerating electrode to to cause ions entering the lens structure to exit said lens structure with a desired trajectory regardless of the trajectory ions enter the lens structure.

摘要翻译： 用于离子束注入机的透镜结构。 透镜结构包括沿离子运动方向间隔开的第一和第二电极。 透镜结构横跨离子束的宽度延伸，用于偏离进入透镜结构的离子。 透镜结构包括用于减速的第一电极和用于加速离子的第二电极。 透镜结构模式控制器选择性地激活加速或减速电极以使离子进入透镜结构以期望的轨迹离开所述透镜结构，而不管轨迹离子进入透镜结构。

公开(公告)号：US06835930B2

公开(公告)日：2004-12-28

申请号：US10753731

申请日：2004-01-08

申请人： Victor M. Benveniste ,  Yongzhang Huang

发明人： Victor M. Benveniste ,  Yongzhang Huang

IPC分类号： H01J4930

CPC分类号： H01J37/32082 ,  H01J37/05 ,  H01J37/3171 ,  H01J37/3266 ,  H01J2237/0041

摘要： A mass analyzer for a ribbon shaped ion beam is disclosed. The mass analyzer comprises a pair of coils that define an entrance end and an exit end of the analyzer. Field clamps are employed at or proximate to one or more of the entrance and exit ends of the mass analyzer. The field clamps operate to terminate fringing fields close to the entrance and exit ends of the mass analyzer, thereby reducing the impact of such fringing fields on the ribbon beam and improving beam uniformity.

公开(公告)号：US06770888B1

公开(公告)日：2004-08-03

申请号：US10606087

申请日：2003-06-25

申请人： Victor M. Benveniste ,  Yongzhang Huang

发明人： Victor M. Benveniste ,  Yongzhang Huang

IPC分类号： H01J37147

CPC分类号： H01J37/32082 ,  H01J37/05 ,  H01J37/3171 ,  H01J37/3266 ,  H01J2237/0041

摘要： A mass analyzer for a ribbon shaped ion beam is disclosed. The mass analyzer comprises a pair of coils that define an entrance end and an exit end of the analyzer. Field clamps are employed at or proximate to one or more of the entrance and exit ends of the mass analyzer. The field clamps operate to terminate fringing fields close to the entrance and exit ends of the mass analyzer, thereby reducing the impact of such fringing fields on the ribbon beam and improving beam uniformity.

摘要翻译： 公开了一种用于带状离子束的质量分析器。 质量分析器包括限定分析器的入口端和出口端的一对线圈。 场夹具用于质量分析器的入口和出口端中的一个或多个处或其附近。 场夹具用于终止接近质量分析器入口和出口端的边缘场，从而减少这种边缘场对带状束的影响，并提高光束的均匀性。

公开(公告)号：US08471476B2

公开(公告)日：2013-06-25

申请号：US12901198

申请日：2010-10-08

申请人： Peter F. Kurunczi ,  Victor M. Benveniste ,  Oliver V. Naumovski

发明人： Peter F. Kurunczi ,  Victor M. Benveniste ,  Oliver V. Naumovski

IPC分类号： H05B31/26 ,  H01J37/317

CPC分类号： H01J37/3211 ,  H01J37/026 ,  H01J37/3171 ,  H01J37/32688 ,  H01J2237/03

摘要： A device is disclosed for providing an inductively coupled radio frequency plasma flood gun. In one particular exemplary embodiment, the device is a plasma flood gun in an ion implantation system. The plasma flood gun may comprise a plasma chamber having one or more apertures; a gas source capable of supplying at least one gaseous substance to the plasma chamber; a single-turn coil disposed within the plasma chamber, and a power source coupled to the coil for inductively coupling radio frequency electrical power to excite the at least one gaseous substance in the plasma chamber to generate a plasma. The inner surface of the plasma chamber may be free of metal-containing material and the plasma may not be exposed to any metal-containing component within the plasma chamber. The plasma chamber may include a plurality of magnets for controlling the plasma. An exit aperture may be provided in the plasma chamber to enable negatively charged particles of the resulting plasma to engage an ion beam that is part of the associated ion implantation system. In one embodiment, magnets are disposed on opposite sides of the aperture and are used to manipulate the electrons of the plasma.

摘要翻译： 公开了一种用于提供电感耦合的射频等离子体喷枪的装置。 在一个特定的示例性实施例中，该装置是离子注入系统中的等离子体喷枪。 等离子体喷枪可以包括具有一个或多个孔的等离子体室; 能够向所述等离子体室供给至少一种气态物质的气体源; 设置在等离子体室内的单匝线圈和耦合到线圈的电源，用于感应耦合射频电力以激发等离子体室中的至少一种气态物质以产生等离子体。 等离子体室的内表面可以不含含金属的材料，并且等离子体可能不暴露于等离子体室内的任何含金属的组分。 等离子体室可以包括用于控制等离子体的多个磁体。 可以在等离子体室中设置出口孔，以使所得到的等离子体的带负电粒子能够接合作为相关离子注入系统的一部分的离子束。 在一个实施例中，磁体设置在孔的相对侧上，并用于操纵等离子体的电子。

公开(公告)号：US20120085917A1

公开(公告)日：2012-04-12

申请号：US12901198

申请日：2010-10-08

申请人： Peter F. Kurunczi ,  Victor M. Benveniste ,  Oliver V. Naumovski

发明人： Peter F. Kurunczi ,  Victor M. Benveniste ,  Oliver V. Naumovski

IPC分类号： H01J1/50 ,  H01J3/14

CPC分类号： H01J37/3211 ,  H01J37/026 ,  H01J37/3171 ,  H01J37/32688 ,  H01J2237/03

摘要： A device is disclosed for providing an inductively coupled radio frequency plasma flood gun. In one particular exemplary embodiment, the device is a plasma flood gun in an ion implantation system. The plasma flood gun may comprise a plasma chamber having one or more apertures; a gas source capable of supplying at least one gaseous substance to the plasma chamber; a single-turn coil disposed within the plasma chamber, and a power source coupled to the coil for inductively coupling radio frequency electrical power to excite the at least one gaseous substance in the plasma chamber to generate a plasma. The inner surface of the plasma chamber may be free of metal-containing material and the plasma may not be exposed to any metal-containing component within the plasma chamber. The plasma chamber may include a plurality of magnets for controlling the plasma. An exit aperture may be provided in the plasma chamber to enable negatively charged particles of the resulting plasma to engage an ion beam that is part of the associated ion implantation system. In one embodiment, magnets are disposed on opposite sides of the aperture and are used to manipulate the electrons of the plasma.

摘要翻译： 公开了一种用于提供电感耦合的射频等离子体喷枪的装置。 在一个特定的示例性实施例中，该装置是离子注入系统中的等离子体喷枪。 等离子体喷枪可以包括具有一个或多个孔的等离子体室; 能够向所述等离子体室供给至少一种气态物质的气体源; 设置在等离子体室内的单匝线圈和耦合到线圈的电源，用于感应耦合射频电力以激发等离子体室中的至少一种气态物质以产生等离子体。 等离子体室的内表面可以不含含金属的材料，并且等离子体可能不暴露于等离子体室内的任何含金属的组分。 等离子体室可以包括用于控制等离子体的多个磁体。 可以在等离子体室中设置出口孔，以使所得到的等离子体的带负电粒子能够接合作为相关离子注入系统的一部分的离子束。 在一个实施例中，磁体设置在孔的相对侧上，并用于操纵等离子体的电子。

公开(公告)号：US07888653B2

公开(公告)日：2011-02-15

申请号：US12348091

申请日：2009-01-02

申请人： Peter L. Kellerman ,  Svetlana Radovanov ,  Frank Sinclair ,  Victor M. Benveniste

发明人： Peter L. Kellerman ,  Svetlana Radovanov ,  Frank Sinclair ,  Victor M. Benveniste

IPC分类号： H01J3/14 ,  H01J49/22 ,  H01J23/083

CPC分类号： H01J37/1471 ,  H01J37/12 ,  H01J37/3171

摘要： Techniques for independently controlling deflection, deceleration, and focus of an ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for independently controlling deflection, deceleration, and focus of an ion beam. The apparatus may comprise an electrode configuration comprising a set of upper electrodes disposed above an ion beam and a set of lower electrodes disposed below the ion beam. The set of upper electrodes and the set of lower electrodes may be positioned symmetrically about a central ray trajectory of the ion beam. A difference in potentials between the set of upper electrodes and the set of lower electrodes may also be varied along the central ray trajectory to reflect an energy of the ion beam at each point along the central ray trajectory for independently controlling deflection, deceleration, and focus of an ion beam.

摘要翻译： 公开了用于独立地控制离子束的偏转，减速和聚焦的技术。 在一个特定的示例性实施例中，这些技术可以被实现为用于独立地控制离子束的偏转，减速和聚焦的装置。 该装置可以包括电极配置，其包括设置在离子束上方的一组上电极和设置在离子束下方的一组下电极。 所述上电极组和下电极组可以围绕离子束的中心射线轨迹对称地定位。 上部电极组和下部电极组之间的电位差也可以沿着中心射线轨迹变化，以反映沿着中心射线轨迹的每个点处的离子束的能量，以独立地控制偏转，减速和聚焦 的离子束。