Gallium nitride material structures including substrates and methods associated with the same
    7.
    发明授权
    Gallium nitride material structures including substrates and methods associated with the same 有权
    氮化镓材料结构,包括与其相关的衬底和方法

    公开(公告)号:US07365374B2

    公开(公告)日:2008-04-29

    申请号:US11121793

    申请日:2005-05-03

    IPC分类号: H01L31/0328

    摘要: Gallium nitride material-based semiconductor structures are provided. In some embodiments, the structures include a composite substrate over which a gallium nitride material region is formed. The gallium nitride material structures may include additional features, such as strain-absorbing layers and/or transition layers, which also promote favorable stress conditions. The reduction in stresses may reduce defect formation and cracking in the gallium nitride material region, as well as reducing warpage of the overall structure. The gallium nitride material-based semiconductor structures may be used in a variety of applications such as transistors (e.g. FETs) Schottky diodes, light emitting diodes, laser diodes, SAW devices, and sensors, amongst others devices.

    摘要翻译: 提供了氮化镓材料基半导体结构。 在一些实施例中,结构包括复合衬底,氮化镓材料区域形成在复合衬底上。 氮化镓材料结构可以包括另外的特征,例如应变吸收层和/或过渡层,其也促进有利的应力条件。 应力的降低可以减少氮化镓材料区域中的缺陷形成和开裂,同时​​减少整个结构的翘曲。 氮化镓材料基半导体结构可用于诸如晶体管(例如FET)肖特基二极管,发光二极管,激光二极管,SAW器件和传感器等各种应用中。

    Gallium nitride material structures including substrates and methods associated with the same
    8.
    发明授权
    Gallium nitride material structures including substrates and methods associated with the same 有权
    氮化镓材料结构,包括与其相关的衬底和方法

    公开(公告)号:US07791106B2

    公开(公告)日:2010-09-07

    申请号:US12024313

    申请日:2008-02-01

    IPC分类号: H01L29/06

    摘要: Gallium nitride material-based semiconductor structures are provided. In some embodiments, the structures include a composite substrate over which a gallium nitride material region is formed. The gallium nitride material structures may include additional features, such as strain-absorbing layers and/or transition layers, which also promote favorable stress conditions. The reduction in stresses may reduce defect formation and cracking in the gallium nitride material region, as well as reducing warpage of the overall structure. The gallium nitride material-based semiconductor structures may be used in a variety of applications such as transistors (e.g. FETs) Schottky diodes, light emitting diodes, laser diodes, SAW devices, and sensors, amongst others devices.

    摘要翻译: 提供了氮化镓材料基半导体结构。 在一些实施例中,结构包括复合衬底,氮化镓材料区域形成在复合衬底上。 氮化镓材料结构可以包括另外的特征,例如应变吸收层和/或过渡层,其也促进有利的应力条件。 应力的降低可以减少氮化镓材料区域中的缺陷形成和开裂,同时​​减少整个结构的翘曲。 氮化镓材料基半导体结构可用于诸如晶体管(例如FET)肖特基二极管,发光二极管,激光二极管,SAW器件和传感器等各种应用中。