摘要:
New compositions and methods of using those compositions as bonding compositions are provided. The compositions are preferably thermoplastic and comprise imides, amideimides, and/or amideimide-siloxanes (either in polymeric or oligomeric form) dispersed or dissolved in a solvent system, and can be used to bond an active wafer to a carrier wafer or substrate to assist in protecting the active wafer and its active sites during subsequent processing and handling. The compositions form bonding layers that are chemically and thermally resistant, but that can also be softened to allow the wafers to slide apart at the appropriate stage in the fabrication process.
摘要:
New compositions and methods of using those compositions as bonding compositions are provided. The compositions are preferably thermoplastic and comprise imides, amideimides, and/or amideimide-siloxanes (either in polymeric or oligomeric form) dispersed or dissolved in a solvent system, and can be used to bond an active wafer to a carrier wafer or substrate to assist in protecting the active wafer and its active sites during subsequent processing and handling. The compositions form bonding layers that are chemically and thermally resistant, but that can also be softened to allow the wafers to slide apart at the appropriate stage in the fabrication process.
摘要:
New compositions and methods of using those compositions as bonding compositions are provided. The compositions are preferably thermoplastic and comprise imides, amideimides, and/or amideimide-siloxanes (either in polymeric or oligomeric form) dispersed or dissolved in a solvent system, and can be used to bond an active wafer to a carrier wafer or substrate to assist in protecting the active wafer and its active sites during subsequent processing and handling. The compositions form bonding layers that are chemically and thermally resistant, but that can also be softened to allow the wafers to slide apart at the appropriate stage in the fabrication process.
摘要:
New compositions and methods of using those compositions as bonding compositions are provided. The compositions are preferably thermoplastic and comprise imides, amideimides, and/or amideimide-siloxanes (either in polymeric or oligomeric form) dispersed or dissolved in a solvent system, and can be used to bond an active wafer to a carrier wafer or substrate to assist in protecting the active wafer and its active sites during subsequent processing and handling. The compositions form bonding layers that are chemically and thermally resistant, but that can also be softened to allow the wafers to slide apart at the appropriate stage in the fabrication process.
摘要:
The present invention provides new polyimide materials suitable for use in optically transparent fiber composites, ribbon composites, and optical communications applications. The polyimide compounds include monomeric repeat units comprising a fluorinated moiety and a fluorene cardo structure. The polyimides exhibit good optical transparency and have a low absolute thermo-optic coefficient (|dn/dT|).
摘要:
A molding method of blow-molding a hollow tank body with a built-in component is provided. The method molds the hollow tank body by molding the sheet parisons in the half molds. After the moving cooperation of the half molds, an expanding mechanism of a pre-molding template device, the template half plates and the bases, the half molds are respectively leaned against the closed template half plates, and the sheet parisons are leaned against the half molds by blowing and/or sucking so as to be pre-molded. The tank body is molded after placing the component into it. A pre-molding template device is also provided. An expanding mechanism and the template half plates are mounted on the bases, and the bases are mounted on a rail bracket, the bases are driven by a power device to move on the rail bracket.
摘要:
New compositions and methods of using those compositions as protective layers during the production of semiconductor and MEMS devices are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to form layers that protect a substrate during acid etching and other processing and handling. The protective layer can be photosensitive or non-photosensitive, and can be used with or without a primer layer beneath the protective layer. Preferred primer layers comprise a basic polymer in a solvent system.
摘要:
An organic-inorganic hydrophilic polymer-oxide hybrid proton conducting membrane (PCM) is produced from a host organic polymer, a filler inorganic oxide, and a proton-source with a pKa less than about 5. Usually, the subject invention comprises PCMs containing host polymer-x-strong acid-y-filler oxide, wherein x is between about 1 and about 10 (with “x” as the molar ratio of acid anion to polymer repeat unit) and y≦about 50% (with “y” the weight percentage of filler oxide in the composite).
摘要:
An organic-inorganic hydrophilic polymer-oxide hybrid proton conducting membrane (PCM) is produced from a host organic polymer, a filler inorganic oxide, and a proton-source with a pKa less than about 5. Usually, the subject invention comprises PCMs containing host polymer-x-strong acid-y-filler oxide, wherein x is between about 1 and about 10 (with “x” as the molar ratio of acid anion to polymer repeat unit) and y≦ about 50% (with “y” the weight percentage of filler oxide in the composite).
摘要:
New compositions and methods of using those compositions as bonding compositions for temporary wafer bonding are provided. The compositions are used to temporarily bond an active wafer to a carrier wafer or substrate in microelectronic fabrication using an in situ polymerization reaction of the components of the bonding composition to yield the bonding layer. The compositions form polymerized bonding layers that are mechanically strong and thermally resistant, but allow the wafers to be separated at the appropriate stage in the fabrication process. The bonding layer also retains its solubility so that residue can be cleaned from the debonded wafers using simple wet methods rather than etching or other harsh treatments.