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22 条记录 (耗时 0.019 秒)

    RADIATION SOURCES AND METHODS OF GENERATING RADIATION
    1.
    发明申请
    RADIATION SOURCES AND METHODS OF GENERATING RADIATION 有权
    辐射源和辐射发生方法

    公开(公告)号：US20100039631A1

    公开(公告)日：2010-02-18

    申请号：US12540596

    申请日：2009-08-13

    申请人： Erik Roelof LOOPSTRA ,  Hendrikus Gijsbertus Schimmel

    发明人： Erik Roelof LOOPSTRA ,  Hendrikus Gijsbertus Schimmel

    IPC分类号： G21K5/00 ,  G21K1/00 ,  G03B27/52

    CPC分类号： G03F7/70175 ,  G03F7/70033 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    摘要： A radiation source is configured to generate radiation. The radiation source includes a fuel droplet generator constructed and arranged to generate a stream of droplets of fuel that are directed to a plasma generation site; a laser constructed and arranged to generate a laser beam that is directed to the plasma generation site, an angle between the direction of movement of the stream of droplets and the direction of the laser beam being less than about 90°; and a collector constructed and arranged to collect radiation generated by a plasma formed at the plasma formation site when the beam of radiation and a droplet collide. The collector is configured to reflect the radiation substantially along an optical axis of the radiation source. The laser beam is directed to the plasma generation site through an aperture provided in the collector.

    摘要翻译： 辐射源被配置成产生辐射。 辐射源包括燃料液滴发生器，其被构造和布置成产生引导到等离子体产生位置的燃料液滴流; 激光器被构造和布置成产生被引导到等离子体产生位置的激光束，液滴流的移动方向与激光束的方向之间的角度小于约90°; 以及收集器，其被构造和布置成当辐射束和液滴碰撞时收集由等离子体形成部位形成的等离子体产生的辐射。 收集器被配置为基本上沿辐射源的光轴反射辐射。 激光束通过设置在收集器中的孔引导到等离子体产生位置。

    Lithographic System, Lithographic Apparatus and Device Manufacturing Method
    7.
    发明申请
    Lithographic System, Lithographic Apparatus and Device Manufacturing Method 审中-公开
    光刻系统，平版印刷设备和器件制造方法

    公开(公告)号：US20090208878A1

    公开(公告)日：2009-08-20

    申请号：US12212163

    申请日：2008-09-17

    申请人： Erik Roelof LOOPSTRA ,  Donis George Flagello

    发明人： Erik Roelof LOOPSTRA ,  Donis George Flagello

    IPC分类号： G03B27/54 ,  G03F7/20

    CPC分类号： G03F7/70408

    摘要： A lithographic system includes two lithographic apparatus. A first lithographic apparatus is configured to project a patterned radiation beam onto a first target portion of a substrate. The second lithographic apparatus includes an interferometric arrangement configured to split the radiation beam and to recombine the split beams so as to produce an interference pattern. A masking arrangement is configured to selectively transmit a portion of the interference pattern and a projection system is configured to project the selectively transmitted portion of the interference pattern onto a second target portion of the substrate.

    摘要翻译： 光刻系统包括两个光刻设备。 第一光刻设备被配置为将图案化的辐射束投影到衬底的第一目标部分上。 第二光刻设备包括被配置为分离辐射束并且将分束束复合以产生干涉图案的干涉布置。 掩模布置被配置为选择性地传送干涉图案的一部分，并且投影系统被配置为将干涉图案的选择性地发送的部分投影到基板的第二目标部分上。

    Lithographic Projection Apparatus and Method for Controlling a Support Structure
    8.
    发明申请
    Lithographic Projection Apparatus and Method for Controlling a Support Structure 有权
    光刻投影装置及控制支撑结构的方法

    公开(公告)号：US20080319569A1

    公开(公告)日：2008-12-25

    申请号：US12142271

    申请日：2008-06-19

    申请人： Erik Roelof LOOPSTRA ,  Emiel Jozef Melanie EUSSEN ,  Willem Herman Gertruda Anna KOENEN ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Marc Wilhelmus Maria VAN DER WIJST

    发明人： Erik Roelof LOOPSTRA ,  Emiel Jozef Melanie EUSSEN ,  Willem Herman Gertruda Anna KOENEN ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Marc Wilhelmus Maria VAN DER WIJST

    IPC分类号： G06F19/00

    CPC分类号： G03F7/709 ,  G03F7/70775 ,  G03F7/70858 ,  G03F9/7096

    摘要： A control system controls a support structure of a lithographic apparatus. A first measurement system measures the position of a substrate supported by the support structure, in a first coordinate system. A second measurement system measures the position of the support structure in a second coordinate system, the first measurement system having a presumed position in the second coordinate system. A controller controls the position of the support structure based on measurements by the second measurement system, to convert the measured position of the substrate into a converted position of the support structure in the second coordinate system, to position the support structure based on the converted position, to receive a position error signal indicative of a difference between the presumed position and an actual position of the first measurement system in the second coordinate system, and to position the support structure dependent upon the position error signal.

    摘要翻译： 控制系统控制光刻设备的支撑结构。 第一测量系统在第一坐标系中测量由支撑结构支撑的基板的位置。 第二测量系统测量支撑结构在第二坐标系中的位置，第一测量系统在第二坐标系中具有推测位置。 控制器基于第二测量系统的测量来控制支撑结构的位置，将基板的测量位置转换成第二坐标系中的支撑结构的转换位置，以基于转换位置定位支撑结构 以接收表示第二坐标系中的第一测量系统的推定位置与实际位置之间的差异的位置误差信号，并且依赖于位置误差信号定位支撑结构。

    Lithographic Apparatus and A Method to Compensate for the Effect of Disturbances on the Projection System of a Lithographic Apparatus
    9.
    发明申请
    Lithographic Apparatus and A Method to Compensate for the Effect of Disturbances on the Projection System of a Lithographic Apparatus 有权
    平版印刷设备和补偿干涉影响光刻设备投影系统的方法

    公开(公告)号：US20100149516A1

    公开(公告)日：2010-06-17

    申请号：US12616312

    申请日：2009-11-11

    申请人： Erik Roelof LOOPSTRA ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Adrianus Hendrik Koevoets

    发明人： Erik Roelof LOOPSTRA ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Adrianus Hendrik Koevoets

    IPC分类号： G03B27/58

    CPC分类号： G03F7/709 ,  G03F7/70525 ,  G03F7/70758 ,  G03F7/70766

    摘要： Embodiments of the invention provide a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an active air mount to support the projection system, the active air mount including at least one actuator, and a feed-forward device, the feed-forward device being configured to provide on the basis of a set-point signal of a movable object, a feed-forward signal to the at least one actuator, wherein the feed-forward signal is designed to decrease a disturbance effect on the projection system due to movement of the movable object.

    摘要翻译： 本发明的实施例提供了一种光刻设备，其包括配置成调节辐射束的照明系统，构造成支撑图案形成装置的图案形成装置支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成 图案化的辐射束，被构造成保持衬底的衬底台，配置成将图案化的辐射束投影到衬底的目标部分上的投影系统，用于支撑投影系统的主动空气支架，主动空气支架包括至少一个 致动器和前馈装置，所述前馈装置被配置为基于可移动物体的设定点信号提供到所述至少一个致动器的前馈信号，其中所述前馈信号 被设计成由于可移动物体的移动而减小对投影系统的干扰效应。