摘要:
A printing medium comprising a substrate having at least one surface and a coating on the surface wherein the coating comprises: (a) binder comprising: (1) organic polymer which is substantially free of ammonium groups, (2) first cationic addition polymer consisting essentially of quaternary ammonium-containing mer units derived from addition monomer and ammonium-free mer units derived from addition monomer, and (3) second cationic addition polymer consisting essentially of secondary, tertiary, or both secondary and tertiary ammonium-containing mer units derived from addition monomer and ammonium-free mer units derived from addition monomer, wherein the binder constitutes from 20 to 90 percent by weight of the coating; and (b) finely divided substantially water-insoluble filler particles which have a maximum dimension of less than 500 nanometers, are distributed throughout the binder, and constitute from 10 to 80 percent by weight of coating.
摘要:
A printing medium comprising a substrate having at least one surface and a coating on the surface wherein the coating comprises: (a) binder comprising: (1) organic polymer which is substantially free of onium groups, and (2) onium addition polymer consisting essentially of onium-containing mer units derived from addition monomer and onium-free mer units derived from addition monomer of which from 20 to 100 percent by weight is hydrophobic addition monomer, wherein the binder constitutes from 20 to 90 percent by weight of the coating; and (b) finely divided substantially water-insoluble pseudoboehmite particles which have a maximum dimension of less than 500 nanometers, are distributed throughout the binder, and constitute from 10 to 80 percent by weight of the coating.
摘要:
Described are detergent compositions that exhibit reduced skin irritation properties while providing excellent cleaning and detergent characteristics. The detergent composition contains anionic and/or nonionic surface active materials that are at least mildly irritating to the skin and an amount of alkyl poly(ethyleneoxy)sulfonate sufficient to reduce the primary skin irritation potential of the detergent composition. The aliphatic poly(ethyleneoxy)sulfonate typically has a hydrophobe containing from 12 to about 22 carbon atoms and an average of from about 10 to about 30 ethyleneoxy groups, and is present in the detergent composition in amounts of from about 5 to about 50 percent of the total amount of surface active material in the detergent composition.
摘要:
A printing medium comprising a substrate having at least one surface and a coating on the surface wherein the coating comprises: (a) binder comprising: (1) organic polymer which is substantially free of ammonium groups, (2) first cationic addition polymer consisting essentially of quaternary ammonium-containing mer units derived from addition monomer and ammonium-free mer units derived from addition monomer, and (3) second cationic addition polymer consisting essentially of secondary, tertiary, or both secondary and tertiary ammonium-containing mer units derived from addition monomer and ammonium-free mer units derived from addition monomer, wherein the binder constitutes from 20 to 90 percent by weight of the coating; and (b) finely divided substantially water-insoluble filler particles which have a maximum dimension of less than 500 nanometers, are distributed throughout the binder, and constitute from 10 to 80 percent by weight of coating.
摘要:
Polishing pads with a polishing surface layer having an aperture or opening above a transparent foundation layer are described. In an example, a polishing pad for polishing a substrate includes a foundation layer having a global top surface and a transparent region. A polishing surface layer is attached to the global top surface of the foundation layer. The polishing surface layer has a polishing surface and a back surface. An aperture is disposed in the polishing pad from the back surface through to the polishing surface of the polishing surface layer, and aligned with the transparent region of the foundation layer. The foundation layer provides an impermeable seal for the aperture at the back surface of the polishing surface layer. Methods of fabricating such polishing pads are also described.
摘要:
Homogeneous polishing pads for polishing semiconductor substrates using eddy current end-point detection are described. Methods of fabricating homogeneous polishing pads for polishing semiconductor substrates using eddy current end-point detection are also described.
摘要:
The present invention relates to an article for altering a surface of a workpiece, or a polishing pad having a window. In particular, the polishing pad includes a polyurethane urea material wherein the polyurethane urea material contains cells which are at least partially filled with gas. The polyurethane urea material can be prepared by combining polyisocyanate and/or polyurethane prepolymer, hydroxyl-containing material, amine-containing material and blowing agent. The polishing pad according to the present invention is useful for polishing articles, and is especially useful for chemical mechanical polishing or planarization of microelectronic and optical electronic devices such as but not limited to semiconductor wafers. The window of the polishing pad is at least partially transparent and thus, can be particularly useful with polishing or planarizing tools that are equipped with through-the-platen wafer metrology.
摘要:
Described are novel synthetic detergent base materials having a pH from 5 to 8 and consisting essentially of from 45 to 70 weight percent of mild synthetic surfactant, salts thereof, or a mixture of the mild synthetic surfactant and salts thereof; from 20 to 30 weight percent of C8-C22 fatty acid; from 1.5 to 10 weight percent of C8-C22 n-acyl sarcosine, salts thereof, or a mixture of the sarcosine and salts thereof; from 0.5 to 5 weight percent of C1-C22 alkyl aryl sulfonic acid, salts thereof, or a mixture of the sulfonic acid and salts thereof; and from 1 to 5 weight percent soap, e.g., salts of C8-C22 fatty acid. Also described are syndet bars prepared from the synthetic detergent base material.
摘要:
Low density polishing pads and methods of fabricating low density polishing pads are described. In an example, a polishing pad for polishing a substrate includes a polishing body having a density approximately in the range of 0.4-0.55 g/cc. The polishing body includes a thermoset polyurethane material and a plurality of closed cell pores dispersed in the thermoset polyurethane material. Each of the plurality of closed cell pores has a shell composed of an acrylic co-polymer.