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公开(公告)号：US20050269300A1
公开(公告)日：2005-12-08
申请号：US11201877
申请日：2005-08-11
申请人： William Partlo , Palash Das , Russell Hudyma , Michael Thomas
发明人： William Partlo , Palash Das , Russell Hudyma , Michael Thomas
IPC分类号： B23K26/06 , B23K26/073 , C30B1/02 , C30B13/24 , H01L21/20 , H01S3/22 , H01S3/223 , B23K26/00
CPC分类号： B23K26/0732 , B23K26/0622 , B23K26/0738 , C30B1/023 , C30B13/24 , H01L21/02686 , H01L21/2026
摘要： A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may comprise a pulsed XeF laser operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output light pulse beam to less than 20 μm in a short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis; the optical system including a field stop intermediate the laser and the workpiece; the workpiece comprising a layer to be heated; wherein the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece without blocking the beam profile at too high an intensity level. 2. The apparatus may also have a high average power in the laser output light pulse beam as delivered to the workpiece and a a line bow correction mechanism in a short axis optical assembly. The line bow correction mechanism may comprise a plurality of weak cross cylinders. The system may comprise a catadioptric projection system. The linewidth due to laser diffraction and divergence may be less than geometric limitations. The system may project adjacent peaks of the nominal XeF spectrum to improve overall depth of focus through the separate center wavelengths of each respective adjacent peak having a different focal plane at the workpiece. The system may comprise a line bow is correction mechanism within a field stop optical assembly correcting line bow at the field stop plane and within a workpiece projection optical assembly correcting line bow at the workpiece plane.
摘要翻译： 公开了一种高能量，高重复率的工件表面加热方法和装置，其可以包括在4000Hz以上工作的脉冲XeF激光器，并在约351nm的中心波长处产生激光输出光脉冲光束; 光学系统将激光输出光脉冲光束在激光输出光脉冲光束的短轴上变窄到小于20μm，并且扩大激光输出光脉冲光束，以在光束的长轴上形成工件覆盖长度 轴; 该光学系统包括在激光和工件之间的中止场; 所述工件包括待加热层; 其中所述光学系统将所述激光输出光脉冲光束在场停止处以足以保持具有足够陡峭侧壁的强度分布的放大倍数以允许所述场停止在所述工件处保持足够陡峭的光束轮廓而不阻塞所述光束轮廓 强度水平太高 该装置还可以在输送到工件的激光输出光脉冲光束中具有高的平均功率，以及在短轴光学组件中具有线弯曲校正机构。 线弯曲校正机构可以包括多个弱交叉圆筒。 该系统可以包括反折射投影系统。 由激光衍射和发散引起的线宽可能小于几何限制。 该系统可以投射标称XeF谱的相邻峰值，以通过在工件处具有不同焦平面的各个相邻峰值的分开的中心波长来提高整体焦深。 系统可以包括在场停止光学组件中的线弓形校正机构，其在场停止平面处以及在工件投影光学组件中校正线弓在工件平面处的校正线弓。
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公开(公告)号：US20050141580A1
公开(公告)日：2005-06-30
申请号：US10884547
申请日：2004-07-01
申请人： William Partlo , Palash Das , Russell Hudyma , Michael Thomas
发明人： William Partlo , Palash Das , Russell Hudyma , Michael Thomas
IPC分类号： B23K26/06 , G03F20060101 , H01L21/20 , H01S3/081 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/0818 , B23K26/042 , B23K26/0622 , B23K26/0738 , B23K26/705 , H01L21/02532 , H01L21/02675 , H01S3/225 , H01S3/2255 , H01S3/2308 , H01S3/2366
摘要： A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier configured XeF laser system producing a laser output light pulse beam at a high repetition rate and high power with a pulse to pulse dose control; an optical system producing an elongated thin pulsed working beam from the laser output light pulse beam. The apparatus may further comprise the laser system is configured as a POPA laser system and further comprising: relay optics operative to direct a first output laser light pulse beam from a first laser PO unit into a second laser PA unit; and, a timing and control module timing the creation of a gas discharge in the first and second laser units within plus or minus 3 ns, to produce the a second laser output light pulse beam as an amplification of the first laser output light pulse beam. The system may comprise divergence control in the oscillator laser unit. Divergence control may comprise an unstable resonator arrangement. The system may further comprise a beam pointing control mechanism intermediate the laser and the workpiece and a beam position control mechanism intermediate the laser and the workpiece. Beam parameter metrology may provide active feedback control to the beam pointing mechanism and active feedback control to the beam position control mechanism.
摘要翻译： 公开了一种气体放电激光结晶装置和方法，用于在工件上的膜中进行晶体补偿或取向的变换，其可以包括主振荡器功率放大器MOPA或功率振荡器功率放大器，配置XeF激光系统，产生激光输出光 脉冲束以高重复率和高功率脉冲到脉冲剂量控制; 从激光输出光脉冲光束产生细长脉冲工作光束的光学系统。 该装置还可以包括激光系统被配置为POPA激光系统，并且还包括：可操作地将来自第一激光PO单元的第一输出激光束脉冲光束引导到第二激光器PA单元中的中继光学器件; 并且定时和控制模块定时在正或负3ns内在第一和第二激光单元中产生气体放电，以产生第二激光输出光脉冲束作为第一激光输出光脉冲光束的放大。 该系统可以包括振荡器激光单元中的发散控制。 发散控制可以包括不稳定的谐振器装置。 该系统还可以包括在激光和工件之间的光束指向控制机构和在激光和工件之间的光束位置控制机构。 光束参数测量可以向光束指向机构提供主动反馈控制，并向光束位置控制机构提供主动反馈控制。
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公开(公告)号：US20050035103A1
公开(公告)日：2005-02-17
申请号：US10884101
申请日：2004-07-01
申请人： William Partlo , Palash Das , Russell Hudyma , Michael Thomas
发明人： William Partlo , Palash Das , Russell Hudyma , Michael Thomas
CPC分类号： B23K26/0732 , B23K26/0622 , B23K26/0738 , C30B1/023 , C30B13/24 , H01L21/02686 , H01L21/2026
摘要： A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may cmprise a pulsed XeF laser operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output light pulse beam to less than 20 μm in a short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of teh long axis; the optical system including a field stop intermediate the laser and the workpiece; the workpiece comprising a layer to be heated; wherein the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece without blocking the beam profile at too high an intensity level. 2. The apparatus may also have a high average power in the laser ouput light pulse beam as delivered to the workpiece and a a linebow correction mechanism in a short axis optical assembly. The linebow correction mechanism may comprise a plurality of weak cross cylinders. The system may comprise a catadioptric projection system. The linewidth due to laser diffraction and divergence may be less than geometric limitations. The system may project adjacent peaks of the nominal XeF spectrum to improve overall depth of focus through the separate center wavelengths of each respective adjacent peak having a different focal plane at the workpiece. The system may comprise a linebow is correction mechanism within a field stop optical assembly correcting linebow at the field stop plane and within a workpiece projection optical assembly correcting linebow at the workpiece plane.
摘要翻译： 公开了一种高能量，高重复率的工件表面加热方法和装置，其可以使在等于或高于4000Hz的工作的脉冲XeF激光器产生在约351nm的中心波长的激光输出光脉冲光束; 光学系统将激光输出光脉冲光束在激光输出光脉冲光束的短轴上变窄到小于20um，并且扩大激光输出光脉冲光束以在光束的长轴上形成工件覆盖的长度 轴; 该光学系统包括在激光和工件之间的中止场; 所述工件包括待加热层; 其中所述光学系统将所述激光输出光脉冲光束在场停止处以足以保持具有足够陡峭侧壁的强度分布的放大倍数以允许所述场停止在所述工件处保持足够陡峭的光束轮廓而不阻塞所述光束轮廓 强度水平太高 该装置还可以在输送到工件的激光输出光脉冲光束中具有高的平均功率，以及在短轴光学组件中具有弯管校正机构。 弯管矫正机构可以包括多个弱交叉圆筒。 该系统可以包括反折射投影系统。 由激光衍射和发散引起的线宽可能小于几何限制。 该系统可以投射标称XeF谱的相邻峰值，以通过在工件处具有不同焦平面的各个相邻峰值的分开的中心波长来提高整体焦深。 系统可以包括在场停止光学组件中的弯头矫正机构，其在场停止平面处以及工件投影光学组件中在工件平面处校正弯头。
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公开(公告)号：US08362391B2
公开(公告)日：2013-01-29
申请号：US12979292
申请日：2010-12-27
IPC分类号： B23K26/00
CPC分类号： B23K26/0732 , B23K26/0622 , B23K26/0738 , C30B1/023 , C30B13/24 , H01L21/02686 , H01L21/2026
摘要： A high energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.
摘要翻译： 公开了一种高能量，高重复率的工件表面加热装置，其包括产生激光输出光脉冲光束的XeF激光器，使激光输出光脉冲光束在短轴上使激光输出光脉冲光束变窄的光学系统， 激光输出光脉冲光束在光束的长轴上形成工件覆盖长轴的范围，光学系统将激光输出光脉冲光束在场停止处以足以保持足够陡峭的强度分布的放大倍数 侧壁允许场停止在工件处保持足够陡峭的梁轮廓。
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公开(公告)号：US20110163077A1
公开(公告)日：2011-07-07
申请号：US12979292
申请日：2010-12-27
CPC分类号： B23K26/0732 , B23K26/0622 , B23K26/0738 , C30B1/023 , C30B13/24 , H01L21/02686 , H01L21/2026
摘要： A high energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.
摘要翻译： 公开了一种高能量，高重复率的工件表面加热装置，其包括产生激光输出光脉冲光束的XeF激光器，使激光输出光脉冲光束在短轴上使激光输出光脉冲光束变窄的光学系统， 激光输出光脉冲光束在光束的长轴上形成工件覆盖长轴的范围，光学系统将激光输出光脉冲光束在场停止处以足以保持足够陡峭的强度分布的放大倍数 侧壁允许场停止在工件处保持足够陡峭的梁轮廓。
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公开(公告)号：US20070058229A1
公开(公告)日：2007-03-15
申请号：US11470397
申请日：2006-09-06
申请人： Russell Hudyma , Michael Thomas , Paul Rose , Rick Dorval
发明人： Russell Hudyma , Michael Thomas , Paul Rose , Rick Dorval
IPC分类号： G02B26/08
CPC分类号： G02B27/2285 , G02B27/0025 , G03B21/147 , G03B21/28 , G03B21/562 , G03B35/16 , H04N13/324 , H04N13/363 , H04N13/365 , H04N13/393
摘要： The invention features a volumetric display system. A light beam representing an image is provided from a stationary source. A projection screen is rotated, relative to the stationary source, about a rotation axis. The light beam is projected onto the projection screen at a non-normal angle of incidence. The light beam is manipulated to reduce distortion in the image caused by projection of the light beam onto the projection screen.
摘要翻译： 本发明具有体积显示系统。 从固定源提供表示图像的光束。 投影屏相对于固定源绕旋转轴线旋转。 光束以非正常入射角投影到投影屏幕上。 操纵光束以减少由投影屏幕上的光束引起的图像失真。
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公开(公告)号：US07009140B2
公开(公告)日：2006-03-07
申请号：US10884101
申请日：2004-07-01
IPC分类号： B23K26/00
CPC分类号： B23K26/0732 , B23K26/0622 , B23K26/0738 , C30B1/023 , C30B13/24 , H01L21/02686 , H01L21/2026
摘要： A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may cmprise a pulsed XeF laser operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output light pulse beam to less than 20 μm in a short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of teh long axis; the optical system including a field stop intermediate the laser and the workpiece; the workpiece comprising a layer to be heated; wherein the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece without blocking the beam profile at too high an intensity level. 2. The apparatus may also have a high average power in the laser ouput light pulse beam as delivered to the workpiece and a a linebow correction mechanism in a short axis optical assembly. The linebow correction mechanism may comprise a plurality of weak cross cylinders. The system may comprise a catadioptric projection system. The linewidth due to laser diffraction and divergence may be less than geometric limitations. The system may project adjacent peaks of the nominal XeF spectrum to improve overall depth of focus through the separate center wavelengths of each respective adjacent peak having a different focal plane at the workpiece. The system may comprise a linebow is correction mechanism within a field stop optical assembly correcting linebow at the field stop plane and within a workpiece projection optical assembly correcting linebow at the workpiece plane.
摘要翻译： 公开了一种高能量，高重复率的工件表面加热方法和装置，其可以使在等于或高于4000Hz的工作的脉冲XeF激光器产生在约351nm的中心波长的激光输出光脉冲光束; 光学系统将激光输出光脉冲光束在激光输出光脉冲光束的短轴上变窄到小于20um，并且扩大激光输出光脉冲光束以在光束的长轴上形成工件覆盖的长度 轴; 该光学系统包括在激光和工件之间的中止场; 所述工件包括待加热层; 其中所述光学系统将所述激光输出光脉冲光束在场停止处以足以保持具有足够陡峭侧壁的强度分布的放大倍数以允许所述场停止在所述工件处保持足够陡峭的光束轮廓而不阻塞所述光束轮廓 强度水平太高 该装置还可以在输送到工件的激光输出光脉冲光束中具有高的平均功率，以及在短轴光学组件中具有弯管校正机构。 弯管矫正机构可以包括多个弱交叉圆筒。 该系统可以包括反折射投影系统。 由激光衍射和发散引起的线宽可能小于几何限制。 该系统可以投射标称XeF谱的相邻峰值，以通过在工件处具有不同焦平面的各个相邻峰值的分开的中心波长来提高整体焦深。 系统可以包括在场停止光学组件中的弯头矫正机构，其在场停止平面处以及工件投影光学组件中在工件平面处校正弯头。
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公开(公告)号：US07884303B2
公开(公告)日：2011-02-08
申请号：US11201877
申请日：2005-08-11
IPC分类号： B23K26/00
CPC分类号： B23K26/0732 , B23K26/0622 , B23K26/0738 , C30B1/023 , C30B13/24 , H01L21/02686 , H01L21/2026
摘要： A high, energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.
摘要翻译： 公开了一种高能量，高重复率的工件表面加热装置，其包括产生激光输出光脉冲光束的XeF激光器，使激光输出光脉冲光束在短轴上使激光输出光脉冲光束变窄的光学系统，并且扩展 激光输出光脉冲光束在光束的长轴上形成工件覆盖长轴的范围，光学系统将激光输出光脉冲光束在场停止处以足以保持足够的强度分布的倍率 陡峭的侧壁允许现场停止在工件处保持足够陡峭的梁轮廓。
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公开(公告)号：US07061959B2
公开(公告)日：2006-06-13
申请号：US10884547
申请日：2004-07-01
IPC分类号： H01S3/22
CPC分类号： H01S3/0818 , B23K26/042 , B23K26/0622 , B23K26/0738 , B23K26/705 , H01L21/02532 , H01L21/02675 , H01S3/225 , H01S3/2255 , H01S3/2308 , H01S3/2366
摘要： A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier configured XeF laser system producing a laser output light pulse beam at a high repetition rate and high power with a pulse to pulse dose control; an optical system producing an elongated thin pulsed working beam from the laser output light pulse beam. The apparatus may further comprise the laser system is configured as a POPA laser system and further comprising: relay optics operative to direct a first output laser light pulse beam from a first laser PO unit into a second laser PA unit; and, a timing and control module timing the creation of a gas discharge in the first and second laser units within plus or minus 3 ns, to produce the a second laser output light pulse beam as an amplification of the first laser output light pulse beam. The system may comprise divergence control in the oscillator laser unit. Divergence control may comprise an unstable resonator arrangement. The system may further comprise a beam pointing control mechanism intermediate the laser and the workpiece and a beam position control mechanism intermediate the laser and the workpiece. Beam parameter metrology may provide active feedback control to the beam pointing mechanism and active feedback control to the beam position control mechanism.
摘要翻译： 公开了一种气体放电激光结晶装置和方法，用于在工件上的膜中进行晶体补偿或取向的变换，其可以包括主振荡器功率放大器MOPA或功率振荡器功率放大器，配置XeF激光系统，产生激光输出光 脉冲束以高重复率和高功率脉冲到脉冲剂量控制; 从激光输出光脉冲光束产生细长脉冲工作光束的光学系统。 该装置还可以包括激光系统被配置为POPA激光系统，并且还包括：可操作地将来自第一激光PO单元的第一输出激光束脉冲光束引导到第二激光器PA单元中的中继光学器件; 并且定时和控制模块定时在正或负3ns内在第一和第二激光单元中产生气体放电，以产生第二激光输出光脉冲束作为第一激光输出光脉冲光束的放大。 该系统可以包括振荡器激光单元中的发散控制。 发散控制可以包括不稳定的谐振器装置。 该系统还可以包括在激光和工件之间的光束指向控制机构和在激光和工件之间的光束位置控制机构。 光束参数测量可以向光束指向机构提供主动反馈控制，并向光束位置控制机构提供主动反馈控制。
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公开(公告)号：US07382540B2
公开(公告)日：2008-06-03
申请号：US11716679
申请日：2007-03-12
CPC分类号： G03F7/70241 , G02B13/143 , G02B13/24
摘要： Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8
摘要翻译： 具有大于0.7的数值孔径的折射投影物镜，由设置在两个凸部之间的第一凸面，第二凸面和腰部组成。 第一凸度具有由D1表示的最大直径，并且第二凸度具有由D2表示的最大直径和0.8
2 <1.1。
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