System for Processing an Object
    2.
    发明申请
    System for Processing an Object 有权
    处理对象的系统

    公开(公告)号:US20090152460A1

    公开(公告)日:2009-06-18

    申请号:US12268822

    申请日:2008-11-11

    IPC分类号: G01N23/00

    摘要: A processing system comprises a gas supply apparatus with which process gas is supplied to an object. An activation beam activates the gas thereby inducing a chemical reaction between material at the surface of the object and the process gas causing ablation of material from the surface or deposition of material at the surface. The gas supply apparatus is formed from a stack of plates providing a gas conduit system between at least one gas inlet and at least one gas outlet.

    摘要翻译: 一种处理系统包括:气体供给装置,通过该气体供给装置向处理对象物供给处理气体。 激活光束激活气体,从而导致物体表面的材料与处理气体之间的化学反应,导致材料从表面烧蚀或在表面沉积材料。 气体供应装置由一堆板形成,其在至少一个气体入口和至少一个气体出口之间提供气体导管系统。