公开(公告)号：US07894265B2

公开(公告)日：2011-02-22

申请号：US12081679

申请日：2008-04-18

申请人： Tae-hee Lee ,  Won-joo Kim ,  Yoon-dong Park ,  June-mo Koo ,  Suk-pil Kim ,  Tae-eung Yoon

发明人： Tae-hee Lee ,  Won-joo Kim ,  Yoon-dong Park ,  June-mo Koo ,  Suk-pil Kim ,  Tae-eung Yoon

IPC分类号： G11C5/06 ,  G11C16/04 ,  G11C16/10 ,  G11C16/26

CPC分类号： G11C16/0483 ,  H01L27/11521 ,  H01L27/11568

摘要： The non-volatile memory device may include one or more main strings each of which may include first and second substrings which may separately include a plurality of memory cell transistors; and a charge supply line which may be configured to provide charges to or block charges from the first and second substrings of each of the main strings, wherein each of the main strings may include a first ground selection transistor which may be connected to the first substring; a first substring selection transistor which may be connected to the first ground selection transistor; a second ground selection transistor which may be connected to the second substring; and a second substring selection transistor which may be connected to the second ground selection transistor. A method of programming a target cell of the memory device includes activating selection transistors connected to a main string and substring of the target cell.

摘要翻译： 非易失性存储器件可以包括一个或多个主串，每个主弦可以包括可以分别包括多个存储单元晶体管的第一和第二子串; 以及电荷供给线，其可以被配置为向每个主串的第一和第二子串提供电荷或阻止电荷，其中每个主串可以包括第一接地选择晶体管，其可以连接到第一子串 ; 可以连接到第一接地选择晶体管的第一子串选择晶体管; 可以连接到第二子串的第二接地选择晶体管; 以及可以连接到第二接地选择晶体管的第二子串选择晶体管。 编程存储器件的目标单元的方法包括激活连接到目标单元的主串和子串的选择晶体管。

公开(公告)号：US20090122613A1

公开(公告)日：2009-05-14

申请号：US12149213

申请日：2008-04-29

申请人： Won-joo Kim ,  Yoon-dong Park ,  June-mo Koo ,  Suk-pil Kim ,  Tae-eung Yoon ,  Tae-hee Lee

发明人： Won-joo Kim ,  Yoon-dong Park ,  June-mo Koo ,  Suk-pil Kim ,  Tae-eung Yoon ,  Tae-hee Lee

IPC分类号： G11C16/06 ,  G11C11/34

CPC分类号： G11C16/10 ,  G11C2213/71

摘要： A non-volatile memory device may include a plurality of stacked semiconductor layers, a plurality of NAND strings, a common bit line, a common source line, and/or a plurality of string selection lines. The plurality of NAND strings may be on the plurality of semiconductor layers. Each of the plurality of NAND strings may include a plurality of memory cells and/or at least one string selection transistor arranged in a NAND-cell array. The common bit line may be commonly connected to each of the NAND strings at a first end of the memory cells. The common source line may be commonly connected to each of the NAND strings at a second end of the memory cells. The plurality of string selection lines may be coupled to the at least one string selection transistor included in each of the NAND strings such that a signal applied to the common bit line is selectively applied to the NAND strings.

摘要翻译： 非易失性存储器件可以包括多个堆叠半导体层，多个NAND串，公共位线，公共源极线和/或多个串选择线。 多个NAND串可以在多个半导体层上。 多个NAND串中的每一个可以包括布置在NAND单元阵列中的多个存储单元和/或至少一个串选择晶体管。 公共位线可以在存储器单元的第一端处共同连接到每个NAND串。 公共源极线可以在存储器单元的第二端处共同连接到每个NAND串。 多个串选择线可以耦合到包括在每个NAND串中的至少一个串选择晶体管，使得施加到公共位线的信号被选择性地施加到NAND串。

公开(公告)号：US20080191264A1

公开(公告)日：2008-08-14

申请号：US12010139

申请日：2008-01-22

申请人： Won-Joo Kim ,  Yoon-dong Park ,  June-mo Koo ,  Suk-pil Kim ,  Tae-hee Lee

发明人： Won-Joo Kim ,  Yoon-dong Park ,  June-mo Koo ,  Suk-pil Kim ,  Tae-hee Lee

IPC分类号： H01L29/00 ,  H01L21/3205

CPC分类号： H01L27/115 ,  H01L27/11521

摘要： Non-volatile memory devices highly integrated using an oxide based compound semiconductor and methods of operating and fabricating the same are provided. A non-volatile memory device may include one or more oxide based compound semiconductor layers. A plurality of auxiliary gate electrodes may be arranged to be insulated from the one or more oxide based compound semiconductor layers. A plurality of control gate electrodes may be positioned between adjacent pairs of the plurality of auxiliary gate electrodes at a different level from the plurality of auxiliary gate electrodes. The plurality of control gate electrodes may be insulated from the one or more oxide based compound semiconductor layers. A plurality of charge storing layers may be interposed between the one or more oxide based compound semiconductor layers and the plurality of control gate electrodes.

摘要翻译： 提供了使用基于氧化物的化合物半导体高度集成的非易失性存储器件及其操作和制造方法。 非易失性存储器件可以包括一个或多个基于氧化物的化合物半导体层。 多个辅助栅极电极可以布置成与一个或多个氧化物基化合物半导体层绝缘。 多个控制栅电极可以位于与多个辅助栅极电极不同的多个辅助栅电极的相邻对之间。 多个控制栅电极可以与一个或多个氧化物基化合物半导体层绝缘。 可以在一个或多个氧化物基化合物半导体层和多个控制栅电极之间插入多个电荷存储层。

公开(公告)号：US20090091975A1

公开(公告)日：2009-04-09

申请号：US12081679

申请日：2008-04-18

申请人： Tae-hee Lee ,  Won-joo Kim ,  Yoon-dong Park ,  June-mo Koo ,  Suk-pil Kim ,  Tae-eung Yoon

发明人： Tae-hee Lee ,  Won-joo Kim ,  Yoon-dong Park ,  June-mo Koo ,  Suk-pil Kim ,  Tae-eung Yoon

IPC分类号： G11C16/06

CPC分类号： G11C16/0483 ,  H01L27/11521 ,  H01L27/11568

摘要： Provided are a non-volatile memory device and an operation method of the same. The non-volatile memory device may include one or more main strings each of which may include first and second substrings which may separately include a plurality of memory cell transistors; and a charge supply line which may be configured to provide charges to or block charges from the first and second substrings of each of the main strings, wherein each of the main strings may include a first ground selection transistor which may be connected to the first substring; a first substring selection transistor which may be connected to the first ground selection transistor; a second ground selection transistor which may be connected to the second substring; and a second substring selection transistor which may be connected to the second ground selection transistor.

摘要翻译： 提供了一种非易失性存储器件及其操作方法。 非易失性存储器件可以包括一个或多个主串，每个主弦可以包括可以分别包括多个存储单元晶体管的第一和第二子串; 以及电荷供给线，其可以被配置为向每个主串的第一和第二子串提供电荷或阻止电荷，其中每个主串可以包括第一接地选择晶体管，其可以连接到第一子串 ; 可以连接到第一接地选择晶体管的第一子串选择晶体管; 可以连接到第二子串的第二接地选择晶体管; 以及可以连接到第二接地选择晶体管的第二子串选择晶体管。

公开(公告)号：US07796432B2

公开(公告)日：2010-09-14

申请号：US12149213

申请日：2008-04-29

申请人： Won-joo Kim ,  Yoon-dong Park ,  June-mo Koo ,  Suk-pil Kim ,  Tae-eung Yoon ,  Tae-hee Lee

发明人： Won-joo Kim ,  Yoon-dong Park ,  June-mo Koo ,  Suk-pil Kim ,  Tae-eung Yoon ,  Tae-hee Lee

IPC分类号： G11C16/04

CPC分类号： G11C16/10 ,  G11C2213/71

摘要： A non-volatile memory device may include a plurality of stacked semiconductor layers, a plurality of NAND strings, a common bit line, a common source line, and/or a plurality of string selection lines. The plurality of NAND strings may be on the plurality of semiconductor layers. Each of the plurality of NAND strings may include a plurality of memory cells and/or at least one string selection transistor arranged in a NAND-cell array. The common bit line may be commonly connected to each of the NAND strings at a first end of the memory cells. The common source line may be commonly connected to each of the NAND strings at a second end of the memory cells. The plurality of string selection lines may be coupled to the at least one string selection transistor included in each of the NAND strings such that a signal applied to the common bit line is selectively applied to the NAND strings.

摘要翻译： 非易失性存储器件可以包括多个堆叠半导体层，多个NAND串，公共位线，公共源极线和/或多个串选择线。 多个NAND串可以在多个半导体层上。 多个NAND串中的每一个可以包括布置在NAND单元阵列中的多个存储单元和/或至少一个串选择晶体管。 公共位线可以在存储器单元的第一端处共同连接到每个NAND串。 公共源极线可以在存储器单元的第二端处共同连接到每个NAND串。 多个串选择线可以耦合到包括在每个NAND串中的至少一个串选择晶体管，使得施加到公共位线的信号被选择性地施加到NAND串。

公开(公告)号：US07813180B2

公开(公告)日：2010-10-12

申请号：US12005376

申请日：2007-12-27

申请人： Won-joo Kim ,  Yoon-dong Park ,  June-mo Koo ,  Suk-pil Kim ,  Tae-hee Lee

发明人： Won-joo Kim ,  Yoon-dong Park ,  June-mo Koo ,  Suk-pil Kim ,  Tae-hee Lee

IPC分类号： G11C7/00

CPC分类号： H01L29/7881 ,  G11C16/3418 ,  H01L27/115 ,  H01L27/11521 ,  H01L29/42328 ,  H01L29/42336 ,  H01L29/66825

摘要： Example embodiment non-volatile memory devices may be capable of increased integration and reliability and may provide example methods of operating non-volatile memory devices. Example embodiment non-volatile memory devices may include a first control gate electrode on a semiconductor substrate. A first charge storing layer may be between the semiconductor substrate and the first control gate electrode. A source region may be defined in the semiconductor substrate at one side of the first control gate electrode. A first auxiliary gate electrode may be at the other side of the first control gate electrode and may be recessed into the semiconductor substrate. A first drain region may be defined in the semiconductor substrate at one side of the first auxiliary gate electrode opposite to the first control gate electrode. A bit line may be connected to the first drain region.

摘要翻译： 示例性实施例非易失性存储器设备可能能够提高集成度和可靠性，并且可以提供操作非易失性存储器设备的示例性方法。 示例性实施例非易失性存储器件可以包括半导体衬底上的第一控制栅电极。 第一电荷存储层可以在半导体衬底和第一控制栅电极之间。 源区域可以在第一控制栅电极的一侧的半导体衬底中限定。 第一辅助栅电极可以在第一控制栅电极的另一侧，并且可以凹入到半导体衬底中。 第一漏极区域可以在第一辅助栅电极的与第一控制栅电极相对的一侧的半导体衬底中限定。 位线可以连接到第一漏区。

公开(公告)号：US20080175061A1

公开(公告)日：2008-07-24

申请号：US12005376

申请日：2007-12-27

申请人： Won-joo Kim ,  Yoon-dong Park ,  June-mo Koo ,  Suk-pil Kim ,  Tae-hee Lee

发明人： Won-joo Kim ,  Yoon-dong Park ,  June-mo Koo ,  Suk-pil Kim ,  Tae-hee Lee

IPC分类号： G11C16/06 ,  H01L29/788

CPC分类号： H01L29/7881 ,  G11C16/3418 ,  H01L27/115 ,  H01L27/11521 ,  H01L29/42328 ,  H01L29/42336 ,  H01L29/66825

摘要： Example embodiment non-volatile memory devices may be capable of increased integration and reliability and may provide example methods of operating non-volatile memory devices. Example embodiment non-volatile memory devices may include a first control gate electrode on a semiconductor substrate. A first charge storing layer may be between the semiconductor substrate and the first control gate electrode. A source region may be defined in the semiconductor substrate at one side of the first control gate electrode. A first auxiliary gate electrode may be at the other side of the first control gate electrode and may be recessed into the semiconductor substrate. A first drain region may be defined in the semiconductor substrate at one side of the first auxiliary gate electrode opposite to the first control gate electrode. A bit line may be connected to the first drain region.

摘要翻译： 示例性实施例非易失性存储器设备可能能够提高集成度和可靠性，并且可以提供操作非易失性存储器设备的示例性方法。 示例性实施例非易失性存储器件可以包括半导体衬底上的第一控制栅电极。 第一电荷存储层可以在半导体衬底和第一控制栅电极之间。 源区域可以在第一控制栅电极的一侧的半导体衬底中限定。 第一辅助栅电极可以在第一控制栅电极的另一侧，并且可以凹入到半导体衬底中。 第一漏极区域可以在第一辅助栅电极的与第一控制栅电极相对的一侧的半导体衬底中限定。 位线可以连接到第一漏区。

公开(公告)号：US07833890B2

公开(公告)日：2010-11-16

申请号：US12457366

申请日：2009-06-09

申请人： Won-joo Kim ,  June-mo Koo ,  Seung-hwan Song ,  Suk-pil Kim ,  Yoon-dong Park ,  Jong-jin Lee

发明人： Won-joo Kim ,  June-mo Koo ,  Seung-hwan Song ,  Suk-pil Kim ,  Yoon-dong Park ,  Jong-jin Lee

IPC分类号： H01L21/4763

CPC分类号： H01L21/28273 ,  H01L21/28282 ,  H01L29/66795 ,  H01L29/66825 ,  H01L29/66833 ,  H01L29/785 ,  H01L29/7881 ,  H01L29/792

摘要： Example embodiments relate to a semiconductor device and a method of manufacturing the same. A semiconductor device according to example embodiments may have reduced disturbances during reading operations and a reduced short channel effect. The semiconductor device may include a semiconductor substrate having a body and a pair of fins protruding from the body. Inner spacer insulating layers may be formed on an upper portion of an inner sidewall of the pair of fins so as to reduce the entrance to the region between the pair of fins. A gate electrode may cover a portion of the external sidewalls of the pair of fins and may extend across the inner spacer insulating layers so as to define a void between the pair of fins. Gate insulating layers may be interposed between the gate electrode and the pair of fins.

摘要翻译： 示例性实施例涉及半导体器件及其制造方法。 根据示例实施例的半导体器件可以在读取操作期间具有减小的干扰，并且减少短信道效应。 半导体器件可以包括具有主体和从主体突出的一对鳍片的半导体衬底。 可以在一对翅片的内侧壁的上部形成内隔离层绝缘层，以减少对一对翅片之间的区域的入口。 栅极电极可以覆盖一对鳍片的外部侧壁的一部分，并且可以跨越内部间隔物绝缘层延伸，以便在一对鳍片之间限定空隙。 栅绝缘层可以插入在栅电极和一对鳍之间。

公开(公告)号：US20090253255A1

公开(公告)日：2009-10-08

申请号：US12457366

申请日：2009-06-09

申请人： Won-joo Kim ,  June-mo Koo ,  Seung-hwan Song ,  Suk-pil Kim ,  Yoon-dong Park ,  Jong-jin Lee

发明人： Won-joo Kim ,  June-mo Koo ,  Seung-hwan Song ,  Suk-pil Kim ,  Yoon-dong Park ,  Jong-jin Lee

IPC分类号： H01L21/28

CPC分类号： H01L21/28273 ,  H01L21/28282 ,  H01L29/66795 ,  H01L29/66825 ,  H01L29/66833 ,  H01L29/785 ,  H01L29/7881 ,  H01L29/792

摘要： Example embodiments relate to a semiconductor device and a method of manufacturing the same. A semiconductor device according to example embodiments may have reduced disturbances during reading operations and a reduced short channel effect. The semiconductor device may include a semiconductor substrate having a body and a pair of fins protruding from the body. Inner spacer insulating layers may be formed on an upper portion of an inner sidewall of the pair of fins so as to reduce the entrance to the region between the pair of fins. A gate electrode may cover a portion of the external sidewalls of the pair of fins and may extend across the inner spacer insulating layers so as to define a void between the pair of fins. Gate insulating layers may be interposed between the gate electrode and the pair of fins.

摘要翻译： 示例性实施例涉及半导体器件及其制造方法。 根据示例实施例的半导体器件可以在读取操作期间具有减小的干扰，并且减少短信道效应。 半导体器件可以包括具有主体和从主体突出的一对鳍片的半导体衬底。 可以在一对翅片的内侧壁的上部形成内隔离层绝缘层，以减少对一对翅片之间的区域的入口。 栅极电极可以覆盖一对鳍片的外部侧壁的一部分，并且可以跨越内部间隔物绝缘层延伸，以便在一对鳍片之间限定空隙。 栅绝缘层可以插入在栅电极和一对鳍之间。

公开(公告)号：US07551491B2

公开(公告)日：2009-06-23

申请号：US11715404

申请日：2007-03-08

申请人： Won-joo Kim ,  Suk-pil Kim ,  Jae-woong Hyun ,  Yoon-dong Park ,  June-mo Koo

发明人： Won-joo Kim ,  Suk-pil Kim ,  Jae-woong Hyun ,  Yoon-dong Park ,  June-mo Koo

IPC分类号： G11C11/34

CPC分类号： G11C16/0433 ,  G11C16/0491 ,  G11C16/10 ,  H01L27/115 ,  H01L27/11521 ,  H01L27/11524 ,  H01L27/11568

摘要： Unit cells of a non-volatile memory device and a method thereof are provided. In an example, the unit cell may include a first memory transistor and a second memory transistor connected to each other in series and further connected in common to a word line, the first and second memory transistors including first and second storage nodes, respectively, the first and second storage nodes configured to execute concurrent memory operations. In another example, the unit cell may include a semiconductor substrate in which first and second bit line regions are defined, first and second storage node layers respectively formed on the semiconductor substrate between the first and second bit line regions, a first pass gate electrode formed on the semiconductor substrate between the first bit line region and the first storage node layer, a second pass gate electrode formed on the semiconductor substrate between the second bit line region and the second storage node layer, a third pass gate electrode formed on the semiconductor substrate between the first and second storage node layers, a third bit line region formed in a portion of the semiconductor substrate under the third pass gate electrode and a control gate electrode extending across the first and second storage node layers. The example unit cells may be implemented within a non-volatile memory device (e.g., a flash memory device), such that the non-volatile memory device may include a plurality of example unit cells.

摘要翻译： 提供非易失性存储器件的单元电池及其方法。 在一个示例中，单元可以包括串联连接并进一步连接到字线的第一存储晶体管和第二存储晶体管，第一和第二存储晶体管分别包括第一和第二存储节点， 配置为执行并发存储器操作的第一和第二存储节点。 在另一示例中，单元可以包括其中限定了第一和第二位线区域的半导体衬底，分别形成在第一和第二位线区域之间的半导体衬底上的第一和第二存储节点层，形成的第一遍栅极电极 在第一位线区域和第一存储节点层之间的半导体衬底上，形成在第二位线区域和第二存储节点层之间的半导体衬底上的第二遍栅极电极，形成在半导体衬底上的第三栅极电极 在所述第一和第二存储节点层之间形成第三位线区域，所述第三位线区域形成在所述第三栅极电极下方的所述半导体衬底的一部分中，以及跨越所述第一和第二存储节点层延伸的控制栅电极。 示例性单元单元可以在非易失性存储器件（例如，闪存器件）内实现，使得非易失性存储器件可以包括多个示例单位单元。