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公开(公告)号：US07666575B2
公开(公告)日：2010-02-23
申请号：US11550459
申请日：2006-10-18
申请人： Woo-Kyu Kim , Hengpeng Wu , David Abdallah , Mark Neisser , PingHung Lu , Ruzhi Zhang , M. Dalil Rahman
发明人： Woo-Kyu Kim , Hengpeng Wu , David Abdallah , Mark Neisser , PingHung Lu , Ruzhi Zhang , M. Dalil Rahman
CPC分类号： G03F7/091 , Y10S438/952
摘要： The present invention relates to an antireflective coating composition comprising, (i) a thermal acid generator; (ii) a crosslinkable polymer comprising at least one aromatic group; and, (iii) a polymeric crosslinker comprising at least one unit of structure (6), where R11 to R13 is independently selected from H, (C1-C6) alkyl and aromatic group, R14 and R15 are independently (C1-C10) alkyl. The invention also relates to a process for imaging the antireflective coating composition of the present invention.
摘要翻译： 本发明涉及一种抗反射涂料组合物，其包含：（i）热酸发生剂; （ii）包含至少一个芳族基团的可交联聚合物; 和（iii）包含至少一个结构单元（6）的聚合物交联剂，其中R 11至R 13独立地选自H，（C 1 -C 6）烷基和芳族基团，R 14和R 15独立地为（C 1 -C 10）烷基 。 本发明还涉及一种用于对本发明的抗反射涂料组合物进行成像的方法。
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公开(公告)号：US20080096125A1
公开(公告)日：2008-04-24
申请号：US11550459
申请日：2006-10-18
申请人： Woo-Kyu Kim , Hengpeng Wu , David Abdallah , Mark Neisser , PingHung Lu , Ruzhi Zhang , M. Dalil Rahman
发明人： Woo-Kyu Kim , Hengpeng Wu , David Abdallah , Mark Neisser , PingHung Lu , Ruzhi Zhang , M. Dalil Rahman
IPC分类号： G03C1/00
CPC分类号： G03F7/091 , Y10S438/952
摘要： The present invention relates to an antireflective coating composition comprising, (i) a thermal acid generator; (ii) a crosslinkable polymer comprising at least one aromatic group; and, (iii) a polymeric crosslinker comprising at least one unit of structure (6), where R11 to R13 is independently selected from H, (C1-C6) alkyl and aromatic group, R14 and R15 are independently (C1-C10) alkyl. The invention also relates to a process for imaging the antireflective coating composition of the present invention.
摘要翻译： 本发明涉及一种抗反射涂料组合物，其包含：（i）热酸发生剂; （ii）包含至少一个芳族基团的可交联聚合物; 和（iii）包含结构（6）的至少一个单元的聚合物交联剂，其中R 11至R 13独立地选自H，（C 1 -C 6） C 1 -C 6烷基和芳基，R 14和R 15独立地是（C 1 -C 6）烷基和芳基， C 1 -C 10烷基。 本发明还涉及一种用于对本发明的抗反射涂料组合物进行成像的方法。
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公开(公告)号：US08026040B2
公开(公告)日：2011-09-27
申请号：US11676673
申请日：2007-02-20
申请人： Hengpeng Wu , WooKyu Kim , Hong Zhuang , PingHung Lu , Mark Neisser , David Abdallah , Ruzhi Zhang
发明人： Hengpeng Wu , WooKyu Kim , Hong Zhuang , PingHung Lu , Mark Neisser , David Abdallah , Ruzhi Zhang
CPC分类号： C09D183/04 , C08G77/06
摘要： The present invention relates to a composition comprising: (a) a polymer having at least one repeating unit of formula where R1 is a non-hydrolysable group and n is an integer ranging from 1 to 3; and (b) a crosslinking catalyst. The composition is useful in forming low k dielectric constant materials and as well as hard mask and underlayer materials with anti-reflective properties for the photolithography industry.
摘要翻译： 本发明涉及一种组合物，其包含：（a）具有至少一个下式的重复单元的聚合物，其中R 1是不可水解基团，n是1至3的整数; 和（b）交联催化剂。 该组合物可用于形成低k介电常数材料，以及具有用于光刻工业的抗反射特性的硬掩模和底层材料。
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公开(公告)号：US20080196626A1
公开(公告)日：2008-08-21
申请号：US11676673
申请日：2007-02-20
申请人： Hengpeng Wu , WooKyu Kim , Hong Zhuang , PingHung Lu , Mark Neisser , David Abdallah , Ruzhi Zhang
发明人： Hengpeng Wu , WooKyu Kim , Hong Zhuang , PingHung Lu , Mark Neisser , David Abdallah , Ruzhi Zhang
CPC分类号： C09D183/04 , C08G77/06
摘要： The present invention relates to a composition comprising: (a) a polymer having at least one repeating unit of formula where R1 is a non-hydrolysable group and n is an integer ranging from 1 to 3; and (b) a crosslinking catalyst. The composition is useful in forming low k dielectric constant materials and as well as hard mask and underlayer materials with anti-reflective properties for the photolithography industry.
摘要翻译： 本发明涉及一种组合物，其包含：（a）具有至少一个下式的重复单元的聚合物，其中R 1是不可水解基团，n是1至3的整数; 和（b）交联催化剂。 该组合物可用于形成低k介电常数材料，以及具有用于光刻工业的抗反射特性的硬掩模和底层材料。
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公开(公告)号：US20100093969A1
公开(公告)日：2010-04-15
申请号：US12449750
申请日：2008-02-25
申请人： Ruzhi Zhang , David Abdallah , PingHung Lu , Mark Neisser
发明人： Ruzhi Zhang , David Abdallah , PingHung Lu , Mark Neisser
IPC分类号： C08G77/06
CPC分类号： C09D183/06 , C08G77/06 , G03F7/0752 , G03F7/091 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3122
摘要： The present invention relates to process for making a siloxane polymer which comprises at least one Si—OH group and at least one Si—OR group, where R is a moiety other than hydrogen, comprising reacting one or more silane reactants together in the presence of a hydrolysis catalyst in either a water/alcohol mixture or in one or more alcohols to form the siloxane polymer; and separating the siloxane polymer from the water/alcohol mixture or the alcohol(s).
摘要翻译： 本发明涉及制备硅氧烷聚合物的方法，其包含至少一个Si-OH基团和至少一个Si-OR基团，其中R是不同于氢的部分，包括使一种或多种硅烷反应物在一起存在下反应 在水/醇混合物中或在一种或多种醇中的水解催化剂以形成硅氧烷聚合物; 以及从水/醇混合物或醇分离硅氧烷聚合物。
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公开(公告)号：US08017296B2
公开(公告)日：2011-09-13
申请号：US11872962
申请日：2007-10-16
申请人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , WooKyu Kim , Ping-Hung Lu
发明人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , WooKyu Kim , Ping-Hung Lu
IPC分类号： G03F7/04
CPC分类号： C09D165/00 , G03F7/091 , H01L21/0276
摘要： The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.
摘要翻译： 本发明涉及一种有机可旋涂的抗反射涂料组合物，其包含聚合物，该聚合物包含至少一个在聚合物主链中具有3个或更多个稠合芳环的单元和至少一个在聚合物主链中具有脂族摩尔的单元。 本发明还涉及用于对本发明组合物进行成像的方法。
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公开(公告)号：US20080292995A1
公开(公告)日：2008-11-27
申请号：US11872962
申请日：2007-10-16
申请人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , Wookyu Kim , Ping-Hung Lu
发明人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , Wookyu Kim , Ping-Hung Lu
CPC分类号： C09D165/00 , G03F7/091 , H01L21/0276
摘要： The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.
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公开(公告)号：US20080292987A1
公开(公告)日：2008-11-27
申请号：US11752040
申请日：2007-05-22
CPC分类号： G03F7/091
摘要： The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.
摘要翻译： 本发明涉及一种有机可旋涂的抗反射涂料组合物，其包含聚合物，该聚合物包含至少一个在聚合物主链中具有3个或更多个稠合芳环的单元和至少一个在聚合物主链中具有脂族摩尔的单元。 本发明还涉及用于对本发明组合物进行成像的方法。
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公开(公告)号：US20090246691A1
公开(公告)日：2009-10-01
申请号：US12060307
申请日：2008-04-01
申请人： M. Dalil Rahman , David Abdallah , Rhuzi Zhang , Douglas McKenzie
发明人： M. Dalil Rahman , David Abdallah , Rhuzi Zhang , Douglas McKenzie
CPC分类号： G03F7/091
摘要： The present invention relates to an antireflective composition comprising a thermal acid generator and an epoxy polymer comprising at least one unit of structure 1, at least one unit of structure 2. where, R1 to R12 are independently selected from hydrogen and C1-C4 alkyl, structure. 1 has a configuration selected from cis, trans or mixture thereof, and x and y are the mole % of the monomeric units in the polymer. The invention also relates to a process for manufacturing a microelectronic device.
摘要翻译： 本发明涉及一种抗反射组合物，其包含热酸产生剂和环氧聚合物，其包含至少一个结构单元1，至少一个结构单元，其中R1至R12独立地选自氢和C1-C4烷基， 结构体。 1具有选自顺式，反式或其混合物的构型，x和y是聚合物中单体单元的摩尔％。 本发明还涉及一种用于制造微电子器件的方法。
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公开(公告)号：US07989144B2
公开(公告)日：2011-08-02
申请号：US12060307
申请日：2008-04-01
申请人： M. Dalil Rahman , David Abdallah , Rhuzi Zhang , Douglas McKenzie
发明人： M. Dalil Rahman , David Abdallah , Rhuzi Zhang , Douglas McKenzie
IPC分类号： G03F7/11 , G03F7/30 , B29C59/16 , C08F291/02
CPC分类号： G03F7/091
摘要： The present invention relates to an antireflective composition comprising a thermal acid generator and an epoxy polymer comprising at least one unit of structure 1, at least one unit of structure 2, where, R1 to R12 are independently selected from hydrogen and C1-C4 alkyl, structure 1 has a configuration selected from cis, trans or mixture thereof, and x and y are the mole % of the monomeric units in the polymer. The invention also relates to a process for manufacturing a microelectronic device.
摘要翻译： 本发明涉及包含热酸产生剂和环氧聚合物的抗反射组合物，其包含至少一个结构单元1，至少一个结构单元2，其中R 1至R 12独立地选自氢和C 1 -C 4烷基， 结构1具有选自顺式，反式或其混合物的构型，x和y是聚合物中单体单元的摩尔％。 本发明还涉及一种用于制造微电子器件的方法。
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