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    Process for producing abrasive particles and abrasive particles produced by the process
    3.
    发明授权
    Process for producing abrasive particles and abrasive particles produced by the process 有权
    用于生产由该方法生产的磨料颗粒和磨料颗粒的方法

    公开(公告)号：US06818030B2

    公开(公告)日：2004-11-16

    申请号：US10255136

    申请日：2002-09-25

    申请人： Xiangdong Feng ,  Yie-Shein Her

    发明人： Xiangdong Feng ,  Yie-Shein Her

    IPC分类号： C09K314

    CPC分类号： B82Y30/00 ,  C01F17/0043 ,  C01G23/04 ,  C01G23/053 ,  C01P2002/54 ,  C01P2002/60 ,  C01P2002/76 ,  C01P2004/51 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/90 ,  C03C19/00 ,  C09C1/3653 ,  C09K3/1409

    摘要： The present invention provides a process for producing particles suitable for use as abrasives in chemical-mechanical polishing slurries. The process according to the invention includes mixing at least one crystallization promoter such as Ti[OCH(CH3)2)]4 with at least one cerium compound and at least one solvent, and subjecting said mixture to hydrothermal treatment at a temperature of from about 60° C. to about 700° C. to produce the particles. Particles formed in accordance with the present invention exhibit a large crystallite size, and can be used to polish silicon-containing substrates to a high degree of planarity at a relatively high rate.

    摘要翻译： 本发明提供一种生产适用于化学机械研磨浆料中的研磨剂的颗粒的方法。 根据本发明的方法包括将至少一种结晶促进剂如Ti [OCH（CH 3）2）] 4与至少一种铈化合物和至少一种溶剂混合，并将所述混合物在约 60℃至约700℃以产生颗粒。 根据本发明形成的颗粒显示出大的微晶尺寸，并且可以用于以相对高的速率抛光含硅基板以达到高平坦度。

    Hydrothermal synthesis of cerium-titanium oxide for use in CMP
    5.
    发明申请
    Hydrothermal synthesis of cerium-titanium oxide for use in CMP 有权
    用于CMP的铈钛氧化物的水热合成

    公开(公告)号：US20060112649A1

    公开(公告)日：2006-06-01

    申请号：US11283530

    申请日：2005-11-18

    申请人： Xiangdong Feng ,  Yie-Shein Her ,  Yi Yang

    发明人： Xiangdong Feng ,  Yie-Shein Her ,  Yi Yang

    IPC分类号： C09K3/14

    CPC分类号： C03C19/00 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1463 ,  H01L21/31053 ,  H01L21/3212

    摘要： The present invention provides a method of synthesizing abrasive particles and methods of using the same in chemical mechanical polishing slurry applications. The nanosized abrasive particles according to the invention are produced by hydrothermal synthesis using an insoluble source of cerium. The crystallites of the particles include cerium ions and titanium ions.

    摘要翻译： 本发明提供了一种合成磨粒的方法及其在化学机械抛光浆中的应用。 根据本发明的纳米尺寸的磨料颗粒是通过使用不溶的铈源的水热合成制备的。 颗粒的微晶包括铈离子和钛离子。

    Ferrocenyl ligands, production and use thereof
    10.
    发明申请
    Ferrocenyl ligands, production and use thereof 审中-公开
    二茂铁基配体，其生产和使用

    公开(公告)号：US20090082581A1

    公开(公告)日：2009-03-26

    申请号：US11919762

    申请日：2006-05-02

    申请人： Benoit Pugin ,  Xiangdong Feng

    发明人： Benoit Pugin ,  Xiangdong Feng

    IPC分类号： C07F17/02

    CPC分类号： C07F17/02

    摘要： The invention relates to the compounds of formula (I) in the form of enantiomer-pure diastereomers or a mixture of diastereomers, wherein R′1 represents C1-C4 alkyl, C6-C10 aryl, C7-C10 alkyl or C7-C12 alkaralkyl and n is 0 or an integer of from 1 to 5; R1 represents a hydrogen atom, halogen, a hydrocarbon group with 1 to 20 C atoms that is either unsubstituted or substituted with —SC1-C4 alkyl, —OC1-C4 alkyl, —OC6-C10 aryl or —Si(C1C4 alkyl)3, or a silyl group with 3 C1-C12 hydrocarbon groups; Y represents vinyl, methyl, ethyl, —CH2—OR, —CH2—N(C1-C4 alkyl)2, a C-bound chiral group that directs metals of metallation reagents to the ortho position X1, or Y is a group —CHR2—OR′2; R2 represents C1-C8 alkyl, C5-C8 cycloalkyl, C6-C10 aryl, C7-C12 aralkyl or C7-C12 alkaralkyl; R′2 represents hydrogen or C1-C18 acyl; X1 and X2 independently represent a P-bound P(III) substituent, —SH or an S-bound group of mercaptan; and R represents hydrogen, a silyl group or an aliphatic, cycloaliphatic, aromatic or aromatic-aliphatic hydrocarbon group with 1 to 18 C atoms which is unsubstituted or substituted with C1-C4 alkyl, C1-C4 alkoxy, F or CF3. The inventive compounds are ligands for metal complexes of transition metals such as Ru, Rh or Ir which are catalysts for especially the enantioselective hydration of prochiral unsaturated compounds. Use of these compounds allows to achieve high catalyst activities and an excellent stereoselectivity.

    摘要翻译： 本发明涉及对映异构体纯的非对映异构体形式的式（I）化合物或非对映异构体的混合物，其中R'1代表C1-C4烷基，C6-C10芳基，C7-C10烷基或C7-C12烷基烷基， n为0或1〜5的整数， R 1表示氢原子，卤素，未取代或被-SC 1 -C 4烷基，-OC 1 -C 4烷基，-OC 6 -C 10芳基或-Si（C 1 -C 4烷基）3取代的具有1至20个碳原子的烃基， 或具有3个C 1 -C 12烃基的甲硅烷基; Y表示乙烯基，甲基，乙基，-CH 2 -OR，-CH 2 -N（C 1 -C 4烷基）2，将金属化试剂的金属引导至邻位X1的C-键手性基团，或Y为基团-CHR2 -OR'2; R2代表C1-C8烷基，C5-C8环烷基，C6-C10芳基，C7-C12芳烷基或C7-C12烷基烷基; R'2表示氢或C 1 -C 18酰基; X 1和X 2独立地表示P键的P（III）取代基-SH或S结合的硫醇基团; 并且R表示氢，具有未取代的或被C 1 -C 4烷基，C 1 -C 4烷氧基，F或CF 3取代的具有1至18个C原子的脂族，脂环族，芳族或芳族 - 脂族烃基的甲硅烷基或脂族，脂环族，芳族或芳族 - 脂族烃基。 本发明化合物是过渡金属如Ru，Rh或Ir的金属络合物的配体，其是用于特别是前手性不饱和化合物的对映选择性水合的催化剂。 使用这些化合物可以实现高催化剂活性和优异的立体选择性。