利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

8 条记录 (耗时 0.026 秒)

    Backfilled, self-assembled monolayers and methods of making same
    3.
    发明授权
    Backfilled, self-assembled monolayers and methods of making same 失效
    回填，自组装单层及其制备方法

    公开(公告)号：US07553547B2

    公开(公告)日：2009-06-30

    申请号：US11315646

    申请日：2005-12-21

    申请人： Glen E. Fryxell ,  Thomas S. Zemanian ,  R. Shane Addleman ,  Christopher L. Aardahl ,  Feng Zheng ,  Brad Busche ,  Oleg B. Egorov

    发明人： Glen E. Fryxell ,  Thomas S. Zemanian ,  R. Shane Addleman ,  Christopher L. Aardahl ,  Feng Zheng ,  Brad Busche ,  Oleg B. Egorov

    IPC分类号： B32B25/20

    CPC分类号： B01J20/3257 ,  B01J20/3225 ,  B82Y30/00 ,  Y10T428/31663

    摘要： Backfilled, self-assembled monolayers and methods of making the same are disclosed. The self-assembled monolayer comprises at least one functional organosilane species and a substantially random dispersion of at least one backfilling organosilane species among the functional organosilane species, wherein the functional and backfilling organosilane species have been sequentially deposited on a substrate. The method comprises depositing sequentially a first organosilane species followed by a backfilling organosilane species, and employing a relaxation agent before or during deposition of the backfilling organosilane species, wherein the first and backfilling organosilane species are substantially randomly dispersed on a substrate.

    摘要翻译： 公开了回填的自组装单层及其制备方法。 所述自组装单层在所述功能性有机硅烷物质中包含至少一种功能性有机硅烷物质和至少一种回填有机硅烷物质的基本无规分散体，其中所述功能性和回填有机硅烷物质已经顺序地沉积在基材上。 该方法包括依次沉积第一有机硅烷物质，然后沉积有机硅烷物质，并在回填有机硅烷物质沉积之前或期间使用松弛剂，其中第一和回填的有机硅烷物质基本上随机分散在基材上。

    Method and system for the combination of non-thermal plasma and metal/metal oxide doped γ-alumina catalysts for diesel engine exhaust aftertreatment system
    4.
    发明授权
    Method and system for the combination of non-thermal plasma and metal/metal oxide doped γ-alumina catalysts for diesel engine exhaust aftertreatment system 失效
    用于柴油发动机排气后处理系统的非热等离子体和金属/金属氧化物掺杂的γ-氧化铝催化剂的组合方法和系统

    公开(公告)号：US07081231B1

    公开(公告)日：2006-07-25

    申请号：US09708863

    申请日：2000-11-08

    申请人： Christopher L. Aardahl ,  Mari Lou Balmer-Miller ,  Ashok Chanda ,  Craig F. Habeger ,  Kent A. Koshkarian ,  Paul W. Park

    发明人： Christopher L. Aardahl ,  Mari Lou Balmer-Miller ,  Ashok Chanda ,  Craig F. Habeger ,  Kent A. Koshkarian ,  Paul W. Park

    IPC分类号： B01D50/00 ,  F01N3/10

    CPC分类号： B01D53/9445 ,  B01D53/9409 ,  Y02T10/22

    摘要： The present disclosure pertains to a system and method for treatment of oxygen rich exhaust and more specifically to a method and system that combines non-thermal plasma with a metal doped γ-alumina catalyst. Current catalyst systems for the treatment of oxygen rich exhaust are capable of achieving only approximately 7 to 12% NOx reduction as a passive system and only 25–40% reduction when a supplemental hydrocarbon reductant is injected into the exhaust stream. It has been found that treatment of an oxygen rich exhaust initially with a non-thermal plasma and followed by subsequent treatment with a metal doped γ-alumina prepared by the sol gel method is capable of increasing the NOx reduction to a level of approximately 90% in the absence of SO2 and 80% in the presence of 20 ppm of SO2. Especially useful metals have been found to be indium, gallium, and tin.

    摘要翻译： 本公开涉及用于处理富氧排气的系统和方法，更具体地涉及将非热等离子体与金属掺杂的γ-氧化铝催化剂组合的方法和系统。 用于处理富氧排气的当前催化剂体系能够仅实现约7-12％的NO x x还原作为被动体系，并且当补充的烃还原剂注入到惰性体系中时仅减少25-40％ 排气流。 已经发现，首先用非热等离子体处理富氧废气，随后用溶胶凝胶法制备的掺杂金属的γ-氧化铝进行后处理，可以增加NO x 在20ppm的SO 2存在下，在不存在SO 2的情况下还原至约90％的水平和80％的水平。 已经发现特别有用的金属是铟，镓和锡。

    Vapor purification with self-cleaning filter
    5.
    发明授权
    Vapor purification with self-cleaning filter 失效
    蒸气净化带自清洁过滤器

    公开(公告)号：US06660061B2

    公开(公告)日：2003-12-09

    申请号：US10013010

    申请日：2001-10-26

    申请人： Gary B. Josephson ,  William O. Heath ,  Christopher L. Aardahl

    发明人： Gary B. Josephson ,  William O. Heath ,  Christopher L. Aardahl

    IPC分类号： B03C374

    CPC分类号： B01D46/30 ,  B01D46/2451 ,  B01D46/2466 ,  B01D46/44 ,  B01D46/50 ,  B01D2046/2492 ,  Y10S55/10

    摘要： A vapor filtration device including a first electrode, a second electrode, and a filter between the first and second electrodes is disclosed. The filter is formed of dielectric material and the device is operated by applying a first electric potential between the electrodes to polarize the dielectric material such that upon passing a vapor stream through the filter, particles from the vapor stream are deposited onto the filter. After depositing the particles a second higher voltage is applied between the electrodes to form a nonthermal plasma around the filter to vaporize the collected particles thereby cleaning the filter. The filter can be a packed bed or serpentine filter mat, and an optional upstream corona wire can be utilized to charge airborne particles prior to their deposition on the filter.

    摘要翻译： 公开了一种在第一和第二电极之间包括第一电极，第二电极和滤波器的蒸汽过滤装置。 过滤器由电介质材料形成，并且通过在电极之间施加第一电位来操作该器件，以使电介质材料极化，使得当蒸汽流通过过滤器时，来自蒸汽流的颗粒沉积在过滤器上。 在沉积颗粒之后，在电极之间施加第二较高的电压以在过滤器周围形成非热等离子体，以蒸发收集的颗粒，从而清洁过滤器。 过滤器可以是填充床或蛇形过滤垫，并且可选的上游电晕丝可以在其沉积在过滤器上之前对空气中的颗粒进行充电。

    Processes for treating halogen-containing gases
    7.
    发明授权
    Processes for treating halogen-containing gases 失效
    用于处理含卤素气体的方法

    公开(公告)号：US07220396B2

    公开(公告)日：2007-05-22

    申请号：US10341783

    申请日：2003-01-13

    申请人： Christopher L. Aardahl ,  Rick J. Orth ,  Kenneth G. Rappé ,  Delbert L. Lessor ,  Gary B. Josephson

    发明人： Christopher L. Aardahl ,  Rick J. Orth ,  Kenneth G. Rappé ,  Delbert L. Lessor ,  Gary B. Josephson

    IPC分类号： B01D53/50

    CPC分类号： B01D53/68 ,  B01D53/32 ,  B01D53/70 ,  B01D53/79 ,  B01D2259/818

    摘要： There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water. According to another embodiment, a vaporized portion of a liquid reducing agent is mixed with the halogen-containing gas to produce a reaction mixture and a non-thermal plasma is generated in the reaction gas mixture to reduce the halogen-containing gas.

    摘要翻译： 公开了用于处理含卤素气体例如F 2 N的各种方法，装置和系统，其涉及产生等离子体，以便将含卤素气体化学地减少为更环保的产品。 根据具体实施方案，将还原剂与含卤素气体混合以产生进料气体混合物，并且在液态水存在下在进料气体混合物中产生非热等离子体。 根据另一个实施方案，将液体还原剂的蒸发部分与含卤素气体混合以产生反应混合物，并且在反应气体混合物中产生非热等离子体以还原含卤素气体。

    Treatment of effluent from a substrate processing chamber
    8.
    发明授权
    Treatment of effluent from a substrate processing chamber 失效
    处理底物处理室的流出物

    公开(公告)号：US07160521B2

    公开(公告)日：2007-01-09

    申请号：US10342121

    申请日：2003-01-13

    申请人： Peter Porshnev ,  Sebastien Raoux ,  Mike Woolston ,  Christopher L. Aardahl ,  Rick J. Orth ,  Kenneth G. Rappe

    发明人： Peter Porshnev ,  Sebastien Raoux ,  Mike Woolston ,  Christopher L. Aardahl ,  Rick J. Orth ,  Kenneth G. Rappe

    IPC分类号： B01J19/08

    CPC分类号： B01D53/68 ,  B01D53/70 ,  B01D2259/818

    摘要： A substrate processing apparatus has a process chamber and an effluent treatment reactor. The process chamber has a substrate support, a process gas supply, a gas energizer, and an exhaust conduit. The effluent treatment reactor has an effluent inlet to receive effluent from the exhaust conduit of the process chamber, a plasma cell having one or more electrodes electrically connected to a voltage source adapted to electrically bias the electrodes to couple energy to effluent received in the plasma cell, a scrubbing cell coaxially exterior to the plasma cell, the scrubbing cell having a scrubbing fluid inlet to introduce scrubbing fluid into effluent in the scrubbing cell and a scrubbing fluid outlet, and an effluent outlet to release the treated effluent.

    摘要翻译： 基板处理装置具有处理室和流出物处理反应器。 处理室具有基板支撑件，工艺气体供应器，气体增压器和排气导管。 流出物处理反应器具有用于接收来自处理室的排气管道的流出物的流出物入口，具有电连接到电压源的一个或多个电极的等离子体电池，该电压源适于电气偏置电极以将能量耦合到在等离子体电池中接收的流出物 洗涤单元，其具有洗涤流体入口，用于将洗涤流体引入洗涤池中的流出物和洗涤流体出口，以及流出物出口以释放经处理的流出物。