公开(公告)号：US4152055A

公开(公告)日：1979-05-01

申请号：US798416

申请日：1977-05-19

申请人： Yoshiharu Ohta ,  Shinji Tominaga

发明人： Yoshiharu Ohta ,  Shinji Tominaga

IPC分类号： G03B7/16 ,  G03B15/05 ,  G03B17/20 ,  G03B7/08

CPC分类号： G03B15/05 ,  G03B2215/05

摘要： A device for visually indicating the camera incident light conditions and the readiness of an associated photoflash network on a single element includes an incandescent indicating lamp connected through parallel transistors to a current source. One transistor is controlled in response to the light incident on a photoconductor to apply a steady current to the lamp when the photoconductor incident light is below a predetermined level. The other transistor is controlled by a relax action oscillator including the photoflash triggering capacitor to apply an intermittent current at a visually perceptable frequency to the lamp when the charge on the photoflash main capacitor is at least at a predetermined value. The lamp is advantageously located as to be visible through the camera view finder.

摘要翻译： 用于在单个元件上可视地指示相机入射光条件和相关联的闪光灯网络的准备的装置包括通过并联晶体管连接到电流源的白炽指示灯。 响应于入射到光电导体上的光来控制一个晶体管，以在光电导入射光低于预定水平时向灯施加稳定的电流。 另一个晶体管由包括闪光闪光触发电容器的松弛动作振荡器控制，当闪光主电容器上的电荷至少为预定值时，将视觉上可感知的频率的间歇电流施加到灯。 该灯有利地位于通过照相机取景器可见。

公开(公告)号：US4174165A

公开(公告)日：1979-11-13

申请号：US897841

申请日：1978-04-19

申请人： Takeo Hohda ,  Shinji Tominaga ,  Yoshiharu Ohta

发明人： Takeo Hohda ,  Shinji Tominaga ,  Yoshiharu Ohta

IPC分类号： G03B15/03 ,  G03B15/05 ,  G03B17/24

CPC分类号： G03B7/16 ,  G03B15/05 ,  G03B17/24 ,  G03B2215/05 ,  G03B2217/007 ,  G03B2217/243

摘要： In a camera provided with a data or auxiliary information recording device and an electronic flash device for illuminating an object scene to be photographed, another electronic flash device is provided for the illumination of data to be recorded. A single power source is used for both the above two electronic flash devices and an automatic exposure control circuit. To avoid a voltage drop of the power source during the operation of the exposure control circuit due to charging of the main capacitor for the electronic flash for the scene illumination, a power supply switch for the main capacitor charging circuit is manually closed independently of the camera exposure operation. A capacitor for energizing the electronic flash for the data illumination is charged in conjunction with the camera release operation before the camera exposure is commenced.

摘要翻译： 在配备有数据或辅助信息记录装置的照相机和用于照亮要拍摄的对象场景的电子闪光装置中，提供另一电子闪光装置用于照亮要记录的数据。 上述两个电子闪光装置和自动曝光控制电路都使用单个电源。 为了避免由于用于场景照明的电子闪光灯的主电容器的充电而在曝光控制电路的操作期间电源的电压降，用于主电容器充电电路的电源开关独立于相机手动关闭 曝光操作。 在照相机曝光开始之前，将电子闪光灯用于数据照明的电容器与相机释放操作相结合。

公开(公告)号：US08062548B2

公开(公告)日：2011-11-22

申请号：US11794626

申请日：2006-01-05

申请人： Yoshiharu Ohta ,  Rika Tanaka ,  Hiroshi Nitta ,  Yoshitaka Morioka

发明人： Yoshiharu Ohta ,  Rika Tanaka ,  Hiroshi Nitta ,  Yoshitaka Morioka

IPC分类号： C09K13/00

CPC分类号： C09K3/1463 ,  C09G1/02 ,  C23F3/06 ,  H01L21/30625 ,  H01L21/31053 ,  H01L21/3212

摘要： An object of one embodiment of the present invention is to provide a polishing slurry which can reduce dishing and erosion of a to-be-polished semiconductor wafer. The polishing slurry contains an oxidizing agent and two or more kinds of abrasive grains for polishing, i.e., fumed silica and colloidal silica. A ratio (selectivity ratio) between a polishing rate of a metal film such as a tungsten film and a polishing rate of an insulating film (oxide film) such as a SiO2 film can be adjusted by changing a mixing ratio between fumed silica and colloidal silica, and dishing and erosion of the semiconductor wafer can be thus reduced.

摘要翻译： 本发明的一个实施方案的目的是提供一种能够减少被抛光的半导体晶片的凹陷和侵蚀的抛光浆料。 抛光浆料含有氧化剂和两种或更多种用于抛光的磨料颗粒，即煅制二氧化硅和胶体二氧化硅。 可以通过改变煅制二氧化硅和胶态二氧化硅之间的混合比来调节诸如钨膜的金属膜的研磨速率与诸如SiO 2膜的绝缘膜（氧化物膜）的研磨速率之间的比率（选择比） ，因此可以减少半导体晶片的凹陷和侵蚀。

公开(公告)号：US20080263965A1

公开(公告)日：2008-10-30

申请号：US10594635

申请日：2005-03-28

申请人： Yoshiharu Ohta ,  Yasuyuki Itai

发明人： Yoshiharu Ohta ,  Yasuyuki Itai

IPC分类号： C09K3/14

CPC分类号： H01L21/02024 ,  C09G1/02

摘要： A semiconductor polishing composition is disclosed. The semiconductor polishing composition includes fumed silica. The semiconductor polishing composition is an aqueous dispersion solution of fumed silica. Further, an increase rate of average particle diameter of fumed silica after a shake test for 10 days is 10% or less.

摘要翻译： 公开了一种半导体抛光组合物。 半导体抛光组合物包括热解法二氧化硅。 半导体抛光组合物是热解法二氧化硅的水性分散液。 此外，振动试验10天后的热解法二氧化硅的平均粒径的增加率为10％以下。

公开(公告)号：US4199242A

公开(公告)日：1980-04-22

申请号：US945789

申请日：1978-09-25

申请人： Hiroshi Hosomizu ,  Yoshiharu Ohta

发明人： Hiroshi Hosomizu ,  Yoshiharu Ohta

IPC分类号： G03B15/05 ,  G03B17/24 ,  G03B15/03

CPC分类号： G03B15/05 ,  G03B2215/05

摘要： In a system where a single power source battery is commonly used for the oscillation circuit of an electronic flash device and for another circuit, such as a control circuit for energizing a light source for a data recording for a given period of time, the operation of the oscillation circuit is interrupted by a semiconductor switching device in response to a firing of the flash tube of the flash device. The oscillation circuit interruption continues for a predetermined period during which the aforesaid another circuit is operated from the battery. To this end, the semiconductor switch may be controlled by a delay circuit.

摘要翻译： 在电子闪光装置的振荡电路中通常使用单个电源电池的系统和用于在给定时间段内为数据记录提供光源的控制电路的另一电路的操作， 响应于闪光装置的闪光管的点火，振荡电路被半导体开关装置中断。 振荡电路中断持续一段预定时间段，在此期间，上述另一电路从电池操作。 为此，半导体开关可以由延迟电路控制。

公开(公告)号：US4132926A

公开(公告)日：1979-01-02

申请号：US780176

申请日：1977-03-22

申请人： Yoshiharu Ohta ,  Hiroshi Hosomizu

发明人： Yoshiharu Ohta ,  Hiroshi Hosomizu

IPC分类号： G03B15/05 ,  H05B41/32

CPC分类号： H05B41/32

摘要： In an electronic flash device, wherein electrical energy stored by a main capacitor and an electronic flash tube is fired by the stored energy, a relaxation oscillator is adapted to oscillate when the main capacitor is charged to a given voltage level, which is a condition for completion of preparation for flash tube operation. The relaxation oscillator includes a capacitor, a glow discharge tube, and a resistor and the oscillation thereof causes intermittent glow discharge through the glow discharge tube for indicating the completion of preparation for flash tube operation. The electronic flash tube is triggered to emit a light flash by the stored energy of the relaxation oscillator capacitor. Excitation of the flash device, even with a power supply switch open, is prevented by isolating the main capacitor from the trigger capacitor and also from the glow discharge tube to also prevent an indication of flash preparation. The trigger capacitor is also discharged through the resistor to prevent actuation of the flash device should the flash synchro switch be closed with the power supply switch open.

摘要翻译： 在电子闪光装置中，其中由主电容器和电子闪光管存储的电能被存储的能量激发，当主电容器被充电到给定电压电平时，张弛振荡器适于振荡，这是一个 完成闪光管操作的准备。 张弛振荡器包括电容器，辉光放电管和电阻器，并且其振荡导致通过辉光放电管的间歇辉光放电，以指示闪光管操作的准备完成。 触发电子闪光管通过张弛振荡电容器的存储能量发出闪光。 通过将主电容器与触发电容器以及辉光放电管隔离来防止闪光装置的激发，即使电源开关断开也可防止闪光准备的指示。 触发电容器也通过电阻放电，以防止在电源开关打开时闪光同步开关闭合时闪光装置的启动。

公开(公告)号：US20090278080A1

公开(公告)日：2009-11-12

申请号：US11794626

申请日：2006-01-05

申请人： Yoshiharu Ohta ,  Rika Tanaka ,  Hiroshi Nitta ,  Yoshitaka Morioka

发明人： Yoshiharu Ohta ,  Rika Tanaka ,  Hiroshi Nitta ,  Yoshitaka Morioka

IPC分类号： C09K13/00

CPC分类号： C09K3/1463 ,  C09G1/02 ,  C23F3/06 ,  H01L21/30625 ,  H01L21/31053 ,  H01L21/3212

摘要： An object of one embodiment of the present invention is to provide a polishing slurry which can reduce dishing and erosion of a to-be-polished semiconductor wafer. The polishing slurry contains an oxidizing agent and two or more kinds of abrasive grains for polishing, i.e., fumed silica and colloidal silica. A ratio (selectivity ratio) between a polishing rate of a metal film such as a tungsten film and a polishing rate of an insulating film (oxide film) such as a SiO2 film can be adjusted by changing a mixing ratio between fumed silica and colloidal silica, and dishing and erosion of the semiconductor wafer can be thus reduced.

摘要翻译： 本发明的一个实施方案的目的是提供一种能够减少被抛光的半导体晶片的凹陷和侵蚀的抛光浆料。 抛光浆料含有氧化剂和两种或更多种用于抛光的磨料颗粒，即煅制二氧化硅和胶体二氧化硅。 可以通过改变煅制二氧化硅和胶态二氧化硅之间的混合比来调节诸如钨膜的金属膜的研磨速率与诸如SiO 2膜的绝缘膜（氧化物膜）的研磨速率之间的比率（选择比） ，因此可以减少半导体晶片的凹陷和侵蚀。

公开(公告)号：US07611552B2

公开(公告)日：2009-11-03

申请号：US10594480

申请日：2005-03-28

申请人： Yoshiharu Ohta ,  Yasuyuki Itai

发明人： Yoshiharu Ohta ,  Yasuyuki Itai

IPC分类号： C09G1/02 ,  C09G1/04 ,  C09K3/14

CPC分类号： H01L21/31053 ,  C09G1/02

摘要： A semiconductor polishing composition is disclosed. The composition includes fumed silica. The semiconductor polishing composition is an aqueous dispersion solution of fumed silica. Further, the number of particles of fumed silica having a particle diameter of 0.5 μm or more is 600,000 pieces/ml or less and the number of particles of fumed silica having a particle diameter of 1 μm or more is 6000 pieces/ml or less.

摘要翻译： 公开了一种半导体抛光组合物。 组合物包括热解法二氧化硅。 半导体抛光组合物是热解法二氧化硅的水性分散液。 此外，粒径为0.5μm以上的热解法二氧化硅的粒子数为600,000个/ ml以下，粒径为1μm以上的热解法二氧化硅的粒子数为6000个/ ml以下。

公开(公告)号：US20070209288A1

公开(公告)日：2007-09-13

申请号：US10594636

申请日：2005-03-28

申请人： Yoshiharu Ohta ,  Yasuyuki Itai

发明人： Yoshiharu Ohta ,  Yasuyuki Itai

IPC分类号： B24D3/02 ,  C01B33/12

CPC分类号： C09G1/02 ,  C09K3/1409 ,  C09K3/1463 ,  H01L21/31053

摘要： A semiconductor polishing composition is disclosed. The composition includes fumed silica, the semiconductor polishing composition being an aqueous dispersion solution of fumed silica. A content of the fumed silica includes a particle diameter of 100 nm or less is 15% by volume or more based on a total amount of the fumed silica.

摘要翻译： 公开了一种半导体抛光组合物。 该组合物包括热解法二氧化硅，半导体抛光组合物是热解二氧化硅的水性分散液。 热解法二氧化硅的含量相对于热解二氧化硅的总量，其粒径为100nm以下为15体积％以上。

公开(公告)号：US5282967A

公开(公告)日：1994-02-01

申请号：US888429

申请日：1992-05-28

申请人： Toshio Tatsuno ,  Mitsuo Miyamoto ,  Yoshiharu Ohta ,  Koichi Sawada

发明人： Toshio Tatsuno ,  Mitsuo Miyamoto ,  Yoshiharu Ohta ,  Koichi Sawada

IPC分类号： A01N59/10 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  C02F1/50 ,  C02F9/00 ,  B01D61/58

CPC分类号： A01N59/10 ,  C02F9/00 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F1/444 ,  C02F1/50 ,  C02F2103/04

摘要： A method of feeding pure water under germ-free conditions is provided by purifying raw water into primary water by successive passage through a defined series of purification units, temporarily storing the primary water in a primary water tank, further purifying the stored water to still higher purity by passage through a defined series of purification units; injecting HF or a salt of HF into the thus-purified water in bacteriostatic and sterilizing concentrations and then feeding it to its point of use.

摘要翻译： 通过连续通过定义的一系列净化单元，将原水净化到初级水中，将初级水暂时储存在初级水箱中，进一步将储存的水进一步纯化，提供无菌条件下的纯水进料方法 通过经过一系列净化单元的纯度; 将HF或HF的盐以抑菌和杀菌浓度注射到如此净化的水中，然后将其送入其使用点。