MAGNETO-RESISTANCE EFFECT ELEMENT
    1.
    发明申请
    MAGNETO-RESISTANCE EFFECT ELEMENT 有权
    磁阻效应元件

    公开(公告)号:US20120015214A1

    公开(公告)日:2012-01-19

    申请号:US13243553

    申请日:2011-09-23

    IPC分类号: G11B5/39

    摘要: A magneto-resistance effect element, comprising a first magnetic layer, a first metallic layer, which is formed on said first magnetic layer, mainly containing an element selected from the group consisting of Cu, Au, Ag, a current confined layer including an insulating layer and a current path which are made by oxidizing, nitriding or oxynitriding for a second metallic layer, mainly containing Al, formed on said first metallic layer, a functional layer, which is formed on said current confined layer, mainly containing an element selected from the group consisting of Si, Hf, Ti, Mo, W, Nb, Mg, Cr and Zr, a third metallic layer, which is formed on said functional layer, mainly containing an element selected from the group consisting of Cu, Au, Ag; and a second magnetic layer which is formed on said third metallic layer.

    摘要翻译: 一种磁电阻效应元件,包括第一磁性层,第一金属层,其形成在所述第一磁性层上,主要包含选自由Cu,Au,Ag组成的组的元素,包含绝缘体的电流限制层 层和电流路径,其通过对形成在所述第一金属层上的主要包含Al的第二金属层进行氧化,氮化或氧氮化而形成,功能层,其形成在所述电流限制层上,主要含有选自 由Si,Hf,Ti,Mo,W,Nb,Mg,Cr和Zr组成的组,形成在所述功能层上的第三金属层,主要含有选自Cu,Au,Ag ; 以及形成在所述第三金属层上的第二磁性层。

    METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM
    3.
    发明申请
    METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM 审中-公开
    制造磁记录介质的方法

    公开(公告)号:US20110049090A1

    公开(公告)日:2011-03-03

    申请号:US12872820

    申请日:2010-08-31

    IPC分类号: G11B5/84

    CPC分类号: G11B5/855

    摘要: According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a magnetic recording layer, an etching protection layer, and an adhesion layer on a substrate, applying a resist on the adhesion layer, transferring patterns of protrusions and recesses on the resist by imprinting to form a resist pattern, patterning the adhesion layer by using the resist pattern as a mask, patterning the etching protection layer by using the resist pattern as a mask, etching the magnetic recording layer by using patterns of the adhesion layer and the etching protection layer as masks to form patterns of protrusions and recesses of the magnetic recording layer and removing the pattern of the adhesion layer, stripping the pattern of the etching protection layer, and exposing the patterns of protrusions and recesses of the magnetic recording layer to a non-ionized reducing gas.

    摘要翻译: 根据一个实施例,制造磁记录介质的方法包括在基板上形成磁记录层,蚀刻保护层和粘合层,在粘合层上涂布抗蚀剂,在抗蚀剂上转印凹凸图案 通过印刷形成抗蚀剂图案,通过使用抗蚀剂图案作为掩模对粘合层进行图案化,通过使用抗蚀剂图案作为掩模对蚀刻保护层进行图案化,通过使用粘合层和蚀刻的图案蚀刻磁记录层 保护层作为掩模以形成磁记录层的突起和凹陷的图案并去除粘附层的图案,剥离蚀刻保护层的图案,以及将磁记录层的突起和凹陷的图案暴露于非磁性层 - 还原气体。