公开(公告)号：US20090272911A1

公开(公告)日：2009-11-05

申请号：US12432874

申请日：2009-04-30

Applicant: Yoshikuni GOSHIMA

Inventor： Yoshikuni GOSHIMA

IPC: H01J3/14 ,  G01N37/00 ,  G01N23/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J2237/3045 ,  H01J2237/30472

Abstract: A method for inspecting a settling time of a deflection amplifier includes setting a settling time, performing shooting a plurality of times alternately to project two patterns of different types which are shaped by making a charged particle beam pass through a first and a second apertures while deflecting the charged particle beam by a deflector controlled by an output of a deflection amplifier which is driven based on the settling time having been set, measuring beam currents of the shooting, calculating an integral current of the beam currents measured, and calculating a difference between the integral current calculated and a reference integral current to output the difference.

Abstract translation: 用于检查偏转放大器的建立时间的方法包括设置建立时间，交替执行多次拍摄以投影通过使带电粒子束通过第一和第二孔而同时偏转的两种不同类型的图案 由偏转放大器的输出控制的带电粒子束，该偏转放大器基于已经设置的建立时间被驱动，测量射束的束电流，计算测量的束电流的积分电流，并计算 积分电流计算和参考积分电流输出差值。

公开(公告)号：US20110255388A1

公开(公告)日：2011-10-20

申请号：US13084870

申请日：2011-04-12

Applicant: Yoshikuni GOSHIMA ,  Akira Noma

Inventor： Yoshikuni GOSHIMA ,  Akira Noma

IPC: G11B9/10 ,  G11B20/18

CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/68 ,  G03F1/78 ,  H01J37/3174 ,  H01J2237/31776 ,  H01J2237/31793 ,  H01J2237/31796

Abstract: Reflected and scattered electrons generated by emitting an electron beam onto a substrate are detected by a detecting unit. The product of the area (SN) and the irradiation time (tN) of the Nth shot in a predetermined measurement unit obtained from writing data is computed by a computing unit. The value obtained by accumulating an instructed equivalent value in the predetermined measurement unit and the value obtained by integrating the signal (DN) from the detecting unit in the predetermined measurement unit are compared and determined by a comparing unit to determine whether or not abnormality occurs in the irradiation amount of the electron beam.

Abstract translation: 通过检测单元检测通过将电子束发射到衬底上而产生的反射和散射的电子。 通过计算单元计算从写入数据获得的预定测量单位中的第N个镜头的面积（SN）和照射时间（tN）的乘积。 通过累积预定测量单位中的指示等效值获得的值和通过对来自预定测量单位的来自检测单元的信号（DN）进行积分而获得的值由比较单元进行比较和确定，以确定是否发生异常 电子束的照射量。

公开(公告)号：US20090237824A1

公开(公告)日：2009-09-24

申请号：US12406390

申请日：2009-03-18

Applicant: Yoshikuni GOSHIMA

Inventor： Yoshikuni GOSHIMA

IPC: G11B27/36

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3023

Abstract: A pattern writing system includes a plurality of control units configured to use different communication standards; a pattern writing unit configured to be controlled by the plurality of control units and write a pattern on a target object by using a charged particle beam; a storage unit configured to receive parameter information from an external slave computer and stores the parameter information; a first interface information circuit group configured to output a received parameter information to at least one of the plurality of control units in conformity with a communication standard on the at least one of plurality of control units; a main computer; and a second interface circuit group configured to receive a request from the main computer, input parameter information been setting in the plurality of control units without passing through the storage unit, convert communication standards of the parameter information input into a communication standard used by the main computer, and output the parameter information whose each communication standard is converted to the main computer.

Abstract translation: 图案写入系统包括被配置为使用不同通信标准的多个控制单元; 图案写入单元，被配置为由所述多个控制单元控制，并且通过使用带电粒子束将图案写入目标物体; 存储单元，被配置为从外部从属计算机接收参数信息并存储参数信息; 第一接口信息电路组，被配置为根据多个控制单元中的至少一个控制单元中的通信标准将接收的参数信息输出到所述多个控制单元中的至少一个; 主电脑 以及第二接口电路组，被配置为从主计算机接收请求，输入参数信息在多个控制单元中被设置而不经过存储单元，将输入的参数信息的通信标准转换为主要使用的通信标准 计算机，并将每个通信标准的参数信息转换为主计算机。

公开(公告)号：US20110012617A1

公开(公告)日：2011-01-20

申请号：US12504428

申请日：2009-07-16

Applicant: Yoshikuni GOSHIMA ,  Seiichi Tsuchiya ,  Yoshimasa Sanmiya ,  John William Kay ,  Chising Lai

Inventor： Yoshikuni GOSHIMA ,  Seiichi Tsuchiya ,  Yoshimasa Sanmiya ,  John William Kay ,  Chising Lai

IPC: H01H31/02

CPC classification number: H03M1/109 ,  G03F1/78 ,  H01J2237/1518 ,  H01J2237/2485 ,  H01J2237/3175 ,  H03M1/66

Abstract: A digital-to-analog converter (DAC)/amplifier testing system for use in an electron-beam (e-beam) mask writer, the e-beam mask writer including a plurality of DAC/amplifier circuits to output analog voltage signals, each DAC/amplifier circuit having a first output terminal and a second output terminal, the first output terminals of the plurality of DAC/amplifier circuits being respectively coupled to deflection plates of the e-beam mask writer to provide the output analog voltages as deflection voltages, is provided. The testing system including a summation circuit to sum voltage signals and to output a summation signal indicating the sum of the received analog voltage signals and an analyzer circuit to digitize the summation signal and to detect to compare the digitized summation signal with an error tolerance range to detect whether at least one of the DAC/amplifier circuits is experiencing an operating error.

Abstract translation: 一种用于电子束（电子束）掩模写入器的数模转换器（DAC）/放大器测试系统，电子束掩模写入器包括多个DAC /放大器电路以输出模拟电压信号，每个 DAC /放大器电路具有第一输出端和第二输出端，多个DAC /放大器电路的第一输出端分别耦合到电子束掩模写入器的偏转板，以提供输出模拟电压作为偏转电压， 被提供。 该测试系统包括一个求和电路，用于求和电压信号，并输出一个表示所接收的模拟电压信号和分析电路之和的求和信号，以对加和信号进行数字化，并检测以将数字化求和信号与误差容差范围进行比较 检测至少一个DAC /放大器电路是否正在经历操作错误。