SEMICONDUCTOR SUBSTRATE CUTTING METHOD
    6.
    发明申请
    SEMICONDUCTOR SUBSTRATE CUTTING METHOD 有权
    半导体基板切割方法

    公开(公告)号:US20120077315A1

    公开(公告)日:2012-03-29

    申请号:US13269274

    申请日:2011-10-07

    IPC分类号: H01L21/50

    摘要: A wafer having a front face formed with a functional device is irradiated with laser light while positioning a light-converging point within the wafer with the rear face of the wafer acting as a laser light incident face, so as to generate multiphoton absorption, thereby forming a starting point region for cutting due to a molten processed region within the wafer along a line. Consequently, a fracture can be generated from the starting point region for cutting naturally or with a relatively small force, so as to reach the front face and rear face. Therefore, when an expansion film is attached to the rear face of the wafer by way of a die bonding resin layer after forming the starting point region for cutting and then expanded, the wafer and die bonding resin layer can be cut along the line.

    摘要翻译: 用激光照射具有由功能元件形成的正面的晶片,同时将晶片的后表面作为激光入射面定位晶片内的聚光点,从而产生多光子吸收,从而形成 一个起始点区域,用于沿着一条线在晶片内熔融的处理区域进行切割。 因此,可以从用于自然切割的起点区域或以相对小的力产生断裂,从而到达前表面和后表面。 因此,在形成切割起点区域之后,通过芯片接合树脂层将膨胀膜附着到晶片的背面,然后扩大时,可以沿着线切割晶片和芯片接合树脂层。

    METHOD OF CUTTING AN OBJECT TO BE PROCESSED
    9.
    发明申请
    METHOD OF CUTTING AN OBJECT TO BE PROCESSED 有权
    切割要处理的对象的方法

    公开(公告)号:US20120205358A1

    公开(公告)日:2012-08-16

    申请号:US13451988

    申请日:2012-04-20

    IPC分类号: B23K26/00

    摘要: A method of cutting an object which can accurately cut the object is provided. An object to be processed 1 such as a silicon wafer is irradiated with laser light L while a light-converging point P is positioned therewithin, so as to form a modified region 7 due to multiphoton absorption within the object 1, and cause the modified region 7 to form a starting point region for cutting 8 shifted from the center line CL of the thickness of the object 1 toward the front face 3 of the object 1 along a line along which the object should be cut. Subsequently, the object 1 is pressed from the rear face 21 side thereof. This can generate a fracture from the starting point region for cutting 8 acting as a start point, thereby accurately cutting the object 1 along the line along which the object should be cut.

    摘要翻译: 提供了一种切割能够精确地切割物体的物体的方法。 在聚光点P位于其中的同时用激光L照射诸如硅晶片的物体,从而由于在物体1内由于多光子吸收而形成改质区域7,并使改质区域 形成从物体1的厚度的中心线CL向物体1的前面3移动的起始点区域,沿着被切割物体的线。 随后,物体1从其背面21侧被按压。 这可以从作为起始点的切割起点区域8产生断裂,从而沿着物体应该被切割的线路精确地切割物体1。

    METHOD OF CUTTING AN OBJECT TO BE PROCESSED
    10.
    发明申请
    METHOD OF CUTTING AN OBJECT TO BE PROCESSED 有权
    切割要处理的对象的方法

    公开(公告)号:US20100015783A1

    公开(公告)日:2010-01-21

    申请号:US12570380

    申请日:2009-09-30

    IPC分类号: H01L21/304 B23K26/38

    摘要: A method of cutting an object which can accurately cut the object is provided. An object to be processed 1 such as a silicon wafer is irradiated with laser light L while a light-converging point P is positioned therewithin, so as to form a modified region 7 due to multiphoton absorption within the object 1, and cause the modified region 7 to form a starting point region for cutting 8 shifted from the center line CL of the thickness of the object 1 toward the front face 3 of the object 1 along a line along which the object should be cut. Subsequently, the object 1 is pressed from the rear face 21 side thereof. This can generate a fracture from the starting point region for cutting 8 acting as a start point, thereby accurately cutting the object 1 along the line along which the object should be cut.

    摘要翻译: 提供了一种切割能够精确地切割物体的物体的方法。 在聚光点P位于其中的同时用激光L照射诸如硅晶片的物体,从而由于在物体1内由于多光子吸收而形成改质区域7,并使改质区域 形成从物体1的厚度的中心线CL向物体1的前面3移动的起始点区域,沿着被切割物体的线。 随后,物体1从其背面21侧被按压。 这可以从作为起始点的切割起点区域8产生断裂,从而沿着物体应该被切割的线路精确地切割物体1。