Anti-parallel diode structure and method of fabrication
    10.
    发明授权
    Anti-parallel diode structure and method of fabrication 有权
    反并联二极管结构及其制造方法

    公开(公告)号:US07911833B2

    公开(公告)日:2011-03-22

    申请号:US12501796

    申请日:2009-07-13

    IPC分类号: G11C11/36

    摘要: An anti-parallel diode structure and method of fabrication is presently disclosed. In some embodiments, an anti-parallel diode structure has a semiconductor region comprising a first insulator layer disposed between a first semiconductor layer and a second semiconductor layer. The semiconductor region can be bound on a first side by a first metal material and bound on a second side by a second metal material so that current below a predetermined value is prevented from passing through the semiconductor region and current above the predetermined value passes through the semiconductor region.

    摘要翻译: 目前公开了一种反并联二极管结构和制造方法。 在一些实施例中,反并联二极管结构具有包括设置在第一半导体层和第二半导体层之间的第一绝缘体层的半导体区域。 半导体区域可以通过第一金属材料在第一侧上结合并且通过第二金属材料在第二侧上结合,使得防止低于预定值的电流通过半导体区域,并且超过预定值的电流通过 半导体区域。