公开(公告)号：US07132202B2

公开(公告)日：2006-11-07

申请号：US10704749

申请日：2003-11-12

Applicant: Yun-Ho Jung

Inventor： Yun-Ho Jung

IPC: G01F9/00

CPC classification number: B23K26/066 ,  G03B27/00

Abstract: A mask for laser irradiation includes a base substrate, a laser beam shielding pattern on a first surface of the base substrate, wherein the laser beam shielding pattern is made of an opaque metallic material and has laser beam transmitting portions spaced apart from each other, and an anti-thermal oxidation layer covering the laser beam shielding pattern, wherein a second surface of the base substrate is an incident surface of a laser beam.

Abstract translation: 用于激光照射的掩模包括基底基板，在基底基板的第一表面上的激光束屏蔽图案，其中激光束屏蔽图案由不透明的金属材料制成并且具有彼此间隔开的激光束透射部分，以及 覆盖激光束屏蔽图案的抗热氧化层，其中基底基板的第二表面是激光束的入射表面。

公开(公告)号：US20050028729A1

公开(公告)日：2005-02-10

申请号：US10885675

申请日：2004-07-08

Applicant: Yun-Ho Jung

Inventor： Yun-Ho Jung

IPC: C30B13/00 ,  C30B13/24 ,  C30B23/00 ,  C30B25/00 ,  C30B28/12 ,  C30B28/14 ,  H01L21/26 ,  H01L21/324 ,  H01L21/42 ,  H01L21/477

CPC classification number: C30B29/06 ,  C30B13/24 ,  Y10S117/90 ,  Y10T117/10

Abstract: A laser annealing apparatus for sequential lateral solidification (SLS) to uniformly crystallize silicon on an entire silicon substrate by minimizing the dislocation of the silicon substrate during laser beam irradiation is disclosed. During the laser annealing, a vacuum chuck holds the silicon substrate on a movable stage. The device includes a laser source, an optical system patterning the shape and energy of a laser beam irradiated from the laser source, a vacuum chuck supporting a silicon substrate, and a movable stage supporting the vacuum chuck as well as transferring the vacuum chuck in a predetermined direction. Accordingly, the apparatus improves the degree of crystallization because it is able to uniformly carry out SLS on an entire surface of the silicon substrate.

公开(公告)号：US06852162B2

公开(公告)日：2005-02-08

申请号：US10211570

申请日：2002-08-05

Applicant: Yun-Ho Jung

Inventor： Yun-Ho Jung

IPC: C30B13/00 ,  C30B13/24 ,  C30B1/00

CPC classification number: C30B29/06 ,  C30B13/24 ,  Y10S117/90 ,  Y10T117/10

Abstract: A laser annealing apparatus for sequential lateral solidification (SLS) to uniformly crystallize silicon on an entire silicon substrate by minimizing the dislocation of the silicon substrate during laser beam irradiation is disclosed. During the laser annealing, a vacuum chuck holds the silicon substrate on a movable stage. The device includes a laser source, an optical system patterning the shape and energy of a laser beam irradiated from the laser source, a vacuum chuck supporting a silicon substrate, and a movable stage supporting the vacuum chuck as well as transferring the vacuum chuck in a predetermined direction. Accordingly, the apparatus improves the degree of crystallization because it is able to uniformly carry out SLS on an entire surface of the silicon substrate.

Abstract translation: 公开了一种用于顺序侧向固化（SLS）的激光退火装置，以通过在激光束照射期间使硅衬底的位错最小化来在整个硅衬底上均匀地结晶硅。 在激光退火期间，真空吸盘将硅衬底保持在可动台上。 该装置包括激光源，对从激光源照射的激光束的形状和能量进行图案化的光学系统，支撑硅基板的真空卡盘以及支撑真空卡盘的可移动台以及将真空卡盘传送到 预定方向。 因此，由于能够在硅基板的整个表面均匀地进行SLS，所以能够提高结晶度。

公开(公告)号：US06755909B2

公开(公告)日：2004-06-29

申请号：US10151880

申请日：2002-05-22

Applicant: Yun-Ho Jung

Inventor： Yun-Ho Jung

IPC: C30B2504

CPC classification number: H01L21/0268 ,  C30B1/023 ,  C30B13/22 ,  C30B13/32 ,  C30B29/06 ,  H01L21/02532 ,  H01L21/02595 ,  H01L21/2026

Abstract: A sequential lateral solidification mask having a first region with a plurality of first stripes that are separated by a plurality of first slits. The mask further includes a second region having a plurality of second stripes separated by a plurality of second slits. The second stripes are perpendicular to the first stripes. A third region having a plurality of third stripes separated by a plurality of third slits, with the third stripes being transversely arranged relative to the first stripes. A fourth region having a plurality of fourth stripes and a plurality of fourth slits between the fourth stripes, with the fourth stripes being transversely arranged relative to the second stripes. Sequential lateral solidification is performed using the mask by multiple movements of the mask and multiple, overlapping irradiations.

Abstract translation: 一种顺序横向凝固掩模，具有第一区域和多个由多个第一狭缝分开的第一条纹。 掩模还包括具有由多个第二狭缝分开的多个第二条纹的第二区域。 第二条纹垂直于第一条纹。 具有由多个第三狭缝分开的多个第三条纹的第三区域，其中第三条纹相对于第一条纹横向布置。 第四区域，具有多个第四条纹和第四条纹之间的多个第四狭缝，第四条纹相对于第二条纹横向布置。 使用掩模通过掩模的多次移动和多次重叠的照射进行顺序侧向固化。

公开(公告)号：US06736895B2

公开(公告)日：2004-05-18

申请号：US10157201

申请日：2002-05-30

Applicant: Yun-Ho Jung

Inventor： Yun-Ho Jung

IPC: C30B2502

CPC classification number: H01L21/0268 ,  C30B1/023 ,  C30B29/06 ,  H01L21/02532 ,  H01L21/2026 ,  H01L29/66757 ,  H01L29/78675

Abstract: A mask and its application in sequential lateral solidification (SLS) crystallization of amorphous silicon are provided. The mask includes a light absorptive portion for blocking a laser beam and a plurality of stripe-shaped light transmitting portions for passing the laser beam. Each stripe-shaped light transmitting portion is rectangular-shaped, and each light-transmitting portion includes triangular-shaped or semicircular-shaped edges on both sides. The distance between the adjacent light transmitting portions is less than the width of the light transmitting portion. The width of the light transmitting portions is less than or equal to twice the maximum length of lateral grain growth that is to be grown by sequential lateral solidification (SLS).

公开(公告)号：US06323457B1

公开(公告)日：2001-11-27

申请号：US09210081

申请日：1998-12-11

Applicant: Yun-Ho Jung

Inventor： Yun-Ho Jung

IPC: B23K2600

CPC classification number: B23K26/03 ,  B23K26/702

Abstract: A laser annealing apparatus has a laser generating section for producing a laser beam, a splitter arranged to partially reflect and partially transmit the laser beam. The apparatus has a first energy converting section for measuring the energy value of the laser beam reflected from the splitter and outputting it into an electrical signal and has an energy control section for comparing the output signal of the first energy converting section to a reference value and automatically correcting the energy value by the difference between them. A process window may be positioned so the laser beam can pass through a built-in slit for annelaing a substrate. The apparatus further has a second energy converting section for measuring the energy value of the laser beam passing through the process window. In response to the output of the second energy converting section, the energy control section corrects the energy intensity of the laser beam.

Abstract translation: 激光退火装置具有用于产生激光束的激光产生部分，布置成部分地反射和部分透射激光束的分离器。 该设备具有第一能量转换部分，用于测量从分离器反射的激光束的能量值并将其输出为电信号，并具有能量控制部分，用于将第一能量转换部分的输出信号与参考值进行比较;以及 通过它们之间的差异自动校正能量值。 可以将过程窗口定位成使得激光束可以穿过内置的狭缝以环绕衬底。 该装置还具有用于测量通过处理窗口的激光束的能量值的第二能量转换部分。 响应于第二能量转换部分的输出，能量控制部分校正激光束的能量强度。

公开(公告)号：US07879664B2

公开(公告)日：2011-02-01

申请号：US12690738

申请日：2010-01-20

Applicant: Yun-Ho Jung

Inventor： Yun-Ho Jung

IPC: H01L21/8234

CPC classification number: H01L21/02532 ,  H01L21/02595 ,  H01L21/02678 ,  H01L21/2026 ,  H01L27/1285 ,  H01L27/1296 ,  H01L29/04 ,  H01L29/78675

Abstract: A fabricating method of an array substrate for a liquid crystal display device including forming a polycrystalline silicon film on a substrate having a display region and a peripheral region, the polycrystalline silicon film having grains of square shape, forming a first active layer in the display region and a second active layer in the peripheral region by etching the polycrystalline silicon film, forming a first gate electrode over the first active layer, a second gate electrode over the second active layer and a gate line connected to the first gate electrode, and forming first source and drain electrodes connected to the first active layer, second source and drain electrodes connected to the second active layer and data line connected to the first source electrode. Further, the second gate electrode overlaps the first active layer to form a first channel region, and the first channel region is formed inside one of the grains.

Abstract translation: 一种用于液晶显示装置的阵列基板的制造方法，包括在具有显示区域和外围区域的基板上形成多晶硅膜，所述多晶硅膜具有正方形晶粒，在所述显示区域中形成第一有源层 以及通过蚀刻所述多晶硅膜在所述外围区域中的第二有源层，在所述第一有源层上形成第一栅电极，在所述第二有源层上方形成第二栅电极，以及连接到所述第一栅电极的栅极线， 连接到第一有源层的源极和漏极电极，连接到第二有源层的第二源极和漏极电极以及连接到第一源极电极的数据线。 此外，第二栅电极与第一有源层重叠以形成第一沟道区，并且第一沟道区形成在其中一个晶粒内。

公开(公告)号：US07778309B2

公开(公告)日：2010-08-17

申请号：US11643340

申请日：2006-12-20

Applicant: Yun-Ho Jung ,  Yun-Sang Park ,  Bong-Gee Song ,  Young-Hak Kim ,  Byung-Tae Kang ,  Min-Cheol Park ,  In-Hyoung Kim ,  Hae-Dong Yeon

Inventor： Yun-Ho Jung ,  Yun-Sang Park ,  Bong-Gee Song ,  Young-Hak Kim ,  Byung-Tae Kang ,  Min-Cheol Park ,  In-Hyoung Kim ,  Hae-Dong Yeon

IPC: H04L27/30

CPC classification number: H04B7/0845 ,  H04L1/0631 ,  H04L1/0656

Abstract: An apparatus and method for canceling an interference signal in a broadband wireless communication system are provided. A receiver of a wireless communication system includes at least two receive antennas for receiving a target signal of a serving base station and interference signals of at least one neighbor base station; a channel estimator for estimating channels of the signals received through the receive antennas; and a detector for detecting the target signal using channel estimation values of the received signals. Accordingly, it is possible to reduce error propagation caused by the incorrect estimation and detection of the interference signal. In addition, time delay for detecting/restoring/removing the interference signal does not occur. Moreover, the increase of additional buffers can be prevented. Consequently, the increase of hardware complexity can be prevented.

Abstract translation: 提供一种用于在宽带无线通信系统中消除干扰信号的装置和方法。 无线通信系统的接收机包括用于接收服务基站的目标信号和至少一个相邻基站的干扰信号的至少两个接收天线; 用于估计通过接收天线接收的信号的信道的信道估计器; 以及检测器，用于使用所接收信号的信道估计值来检测目标信号。 因此，可以减少由误差估计和干扰信号的检测引起的误差传播。 此外，不发生用于检测/恢复/去除干扰信号的时间延迟。 此外，可以防止额外的缓冲器的增加。 因此，可以防止硬件复杂性的增加。

公开(公告)号：US07357963B2

公开(公告)日：2008-04-15

申请号：US10025907

申请日：2001-12-26

Applicant: Yun-Ho Jung

Inventor： Yun-Ho Jung

IPC: B05D3/06 ,  C30B1/08 ,  C30B21/04 ,  C30B13/22

CPC classification number: H01L21/0268 ,  B23K26/066 ,  B23K26/0853 ,  H01L21/2026

Abstract: A sequential lateral solidification apparatus includes a laser generator for generating and emitting a laser beam; an X-Y stage movable in two orthogonal axial directions; and a mask arranged between the laser generator and the X-Y stage. The mask has a plurality of slits through which the laser beam passes. An objective lens for scaling down the laser beam is arranged between the mask and the X-Y stage. A mask stage is connected to the mask for controlling minute movement of the mask for crystallizing amorphous silicon in one block.

公开(公告)号：US07329936B2

公开(公告)日：2008-02-12

申请号：US11029395

申请日：2005-01-06

Applicant: Yun-Ho Jung

Inventor： Yun-Ho Jung

IPC: H01L31/0232

CPC classification number: B23K26/0661 ,  B23K26/066 ,  C30B1/023 ,  C30B13/22 ,  C30B28/02 ,  C30B29/06 ,  H01L21/02532 ,  H01L21/0268 ,  H01L21/02691 ,  Y10S438/942 ,  Y10T117/1004 ,  Y10T117/1008 ,  Y10T117/1012

Abstract: A method of forming a polycrystalline silicon layer includes: disposing a mask over the amorphous silicon layer, the mask having a plurality of transmissive regions, the plurality of transmissive regions being disposed in a stairstep arrangement spaced apart from each other in a first direction and a second direction substantially perpendicular from the first direction, each transmissive region having a central portion and first and second side portions that are adjacent to opposite ends of the central portion along the first direction, and wherein each of the portions has a length along the first direction and a width along the second direction, and wherein the width of first and second portions decreases away from the central portion along the first direction; irradiating a laser beam onto the amorphous silicon layer a first time through the mask to form a plurality of first irradiated regions corresponding to the plurality of transmissive regions, each first irradiated region having a central portion, and first and second side portions at both sides of the central portion; moving the substrate and the mask relative to one another such that the first side portion of each transmissive region overlaps the central portion of each first irradiated region; and irradiating the laser beam onto the amorphous silicon layer a second time through the mask to form a plurality of second irradiated regions corresponding to the plurality of transmissive regions.

Abstract translation: 一种形成多晶硅层的方法包括：在非晶硅层上设置掩模，所述掩模具有多个透射区域，所述多个透射区域沿第一方向彼此间隔开设置，并且 第二方向与第一方向基本垂直，每个透射区域具有中心部分，以及沿着第一方向与中心部分的相对端相邻的第一和第二侧部分，并且其中每个部分具有沿着第一方向的长度 和沿第二方向的宽度，并且其中第一和第二部分的宽度沿着第一方向远离中心部分减小; 首先通过掩模将激光束照射到非晶硅层上，以形成与多个透射区域相对应的多个第一照射区域，每个第一照射区域具有中心部分，并且第一和第二侧部分位于 中心部分 使所述基板和所述掩模相对于彼此移动，使得每个透射区域的第一侧部分与每个第一照射区域的中心部分重叠; 以及通过所述掩模将所述激光束第二次照射到所述非晶硅层上，以形成对应于所述多个透射区域的多个第二照射区域。