公开(公告)号：US06290823B1

公开(公告)日：2001-09-18

申请号：US09553784

申请日：2000-04-21

申请人： Bruce E. Hyllberg ,  Gary S. Butters

发明人： Bruce E. Hyllberg ,  Gary S. Butters

IPC分类号： C25B1100

CPC分类号： B01J19/088 ,  B01J2219/0809 ,  B01J2219/0818 ,  B01J2219/083 ,  B01J2219/0837 ,  B01J2219/0849 ,  B01J2219/0879 ,  H01T19/00

摘要： A corona treatment system (10d) has a corona treatment generator (11d), a first stationary electrode (12d) having a dielectric layer (18d) disposed thereon and a second roller electrode (13d) spaced from the first stationary electrode (12d) by a gap (15d). The second roller electrode (13d) has a layer of dielectric material (19d) disposed around a core (23d) and has a conductive layer (24d) disposed over a substantial portion of a length of the second roller (13d). A switch (20) is electrically connected between the conductive layer (24d) and an electrical ground, and the switch (20) is operable to switch the system between a grounded web mode and a dual dielectric mode.

摘要翻译： 电晕处理系统（10d）具有电晕处理发生器（11d），具有设置在其上的电介质层（18d）的第一固定电极（12d）和与第一固定电极（12d）间隔开的第二辊电极（13d） 一个差距（15d）。 第二辊电极（13d）具有设置在芯部（23d）周围的介电材料层（19d），并且具有设置在第二辊子（13d）的长度的大部分上的导电层（24d）。 开关（20）电连接在导电层（24d）和电接地之间，并且开关（20）可操作以在接地网模式和双电介质模式之间切换系统。

公开(公告)号：US20160030912A1

公开(公告)日：2016-02-04

申请号：US14782734

申请日：2014-04-10

申请人： AMLIKA MERCANTILE PRIVATE LIMITED

发明人： Aldo Mango

IPC分类号： B01J19/08 ,  H05H1/48

CPC分类号： B01J19/088 ,  B01J2219/0809 ,  B01J2219/0837 ,  B01J2219/0869 ,  B01J2219/0875 ,  B01J2219/0894 ,  H05H1/48 ,  H05H2001/485

摘要： The present invention relates to a device for generating cold plasma to be used in the process chemical industry, in particular for producing chemical substances, above all acids such as for example nitric acid and sulphuric acid. The invention also relates to reactors and plants involving said cold plasma generator device and to corresponding chemical processes based thereupon. The device and the associated method of the present invention allow producing with high efficiency several chemical substances, in particular acids. The invention also keeps the several advantages of using the cold plasma technology, in particular the one of not requiring catalysts and/or high reaction temperatures.

摘要翻译： 本发明涉及一种生产用于工艺化学工业的冷等离子体的装置，特别是用于生产化学物质，尤其是所有的酸例如硝酸和硫酸。 本发明还涉及涉及所述冷等离子体发生器装置的反应器和设备以及基于此的相应的化学过程。 本发明的装置和相关方法允许以高效率生产几种化学物质，特别是酸。 本发明还保持了使用冷等离子体技术的几个优点，特别是不需要催化剂和/或高反应温度的技术。

公开(公告)号：US20160280556A1

公开(公告)日：2016-09-29

申请号：US15038146

申请日：2014-11-19

申请人： HANWHA CHEMICAL CORPORATION

发明人： Kyu Hak PARK ,  Sung Eun PARK ,  Jea Sung PARK ,  Hee Dong LEE

IPC分类号： C01B33/035

CPC分类号： C01B33/035 ,  B01J19/087 ,  B01J2219/0809 ,  B01J2219/0815 ,  B01J2219/0828 ,  B01J2219/0837

摘要： An apparatus for manufacturing polysilicon using a chemical vapor deposition (CVD) reactor is provided. The apparatus for manufacturing polysilicon includes: a reaction chamber including a substrate and a reactor cover; at least a pair of electrodes installed through the substrate by an insulating member and connected with a power supply; at least a pair of filaments which are coupled with the pair of electrodes by an electrode chuck and of which upper ends are connected to each other; and a cover assembly including an electrode cover surrounding an upper surface and a side of each of the pair of electrodes on the substrate and a cover shield covering the upper surface of the electrode cover.

摘要翻译： 提供了一种使用化学气相沉积（CVD）反应器制造多晶硅的设备。 多晶硅制造装置包括：反应室，包括基板和反应器盖; 至少一对电极，其通过绝缘构件安装在基板上并与电源连接; 至少一对灯丝，其通过电极卡盘与所述一对电极耦合，并且其上端彼此连接; 以及盖组件，其包括围绕所述基板上的所述一对电极的每一个的上表面和侧面的电极盖和覆盖所述电极盖的上表面的盖屏蔽。

公开(公告)号：US06890495B1

公开(公告)日：2005-05-10

申请号：US09890157

申请日：2000-02-28

申请人： Michael Inman

发明人： Michael Inman

IPC分类号： B01D53/32 ,  B01D53/92 ,  B01D53/94 ,  B01J12/00 ,  B01J15/00 ,  B01J19/08 ,  B01J19/24 ,  F01N3/01 ,  F01N3/08 ,  F01N3/28 ,  H05H1/24

CPC分类号： F01N3/28 ,  B01D53/32 ,  B01D53/92 ,  B01D53/9431 ,  B01J12/002 ,  B01J15/005 ,  B01J19/088 ,  B01J19/248 ,  B01J2219/0809 ,  B01J2219/083 ,  B01J2219/0837 ,  B01J2219/0843 ,  B01J2219/0875 ,  B01J2219/0892 ,  B01J2219/0894 ,  F01N3/01 ,  F01N3/0892 ,  F01N2330/02 ,  F01N2330/06 ,  F01N2330/08 ,  F01N2330/10 ,  F01N2330/12 ,  F01N2330/14 ,  F01N2330/18 ,  H05H1/2406 ,  H05H2001/2418 ,  H05H2245/1215 ,  Y02T10/20

摘要： A reactor for the plasma-assisted processing of a gaseous medium, including a pair of electrodes having facing surfaces the separation of which is substantially uniform, with a body of dielectric material positioned between them and defining a plurality of gas passages extending through the space between the electrodes.

摘要翻译： 一种用于气体介质的等离子体辅助处理的反应器，包括一对电极，其具有基本上均匀的相对表面，其间具有基本上均匀的介电材料，并且限定了多个气体通道， 电极。

公开(公告)号：US20240199451A1

公开(公告)日：2024-06-20

申请号：US18287290

申请日：2022-04-28

申请人： The Board of Trustees of the Leland Stanford Junior University

发明人： Benjamin Wang ,  David B. Rogers ,  Mark A. Cappelli

IPC分类号： C02F1/46 ,  B01J19/00 ,  B01J19/08 ,  C01D9/00 ,  C02F1/66 ,  C02F1/68 ,  C02F103/02 ,  C05C1/00 ,  H05H1/24

CPC分类号： C02F1/4608 ,  B01J19/0013 ,  B01J19/088 ,  C01D9/00 ,  C02F1/66 ,  C02F1/68 ,  C05C1/00 ,  H05H1/2406 ,  B01J2219/0837 ,  B01J2219/0869 ,  B01J2219/0871 ,  B01J2219/0877 ,  B01J2219/0896 ,  C02F2103/02 ,  H05H2242/10 ,  H05H2245/20

摘要： Apparatus for treating water is provided where the apparatus includes a reaction chamber having an air-water interface and a plasma applicator disposed in air in proximity to the air-water interface. The plasma applicator includes a solid dielectric plate sandwiched between a first electrode and a second electrode, where the first electrode is closer to the water than the second electrode. The plasma applicator further includes a first insulating layer disposed on the first electrode. The apparatus is configured to generate a plasma between the first insulating layer and the air-water interface during operation.

公开(公告)号：US20230234019A1

公开(公告)日：2023-07-27

申请号：US18001789

申请日：2021-06-15

申请人： THE UNIVERSITY OF LIVERPOOL

发明人： Xin TU ,  Yaolin WANG

IPC分类号： B01J19/08 ,  B01J23/755 ,  B01J23/72 ,  B01J23/75 ,  B01J37/34 ,  B01J35/00 ,  C07C27/06 ,  C07C29/154

CPC分类号： B01J19/088 ,  B01J23/72 ,  B01J23/75 ,  B01J23/755 ,  B01J35/0033 ,  B01J37/347 ,  C07C27/06 ,  C07C29/154 ,  B01J2219/0837 ,  B01J2219/0871 ,  C07C2523/72 ,  C07C2523/75 ,  C07C2523/755

摘要： An apparatus for forming C1 to C5 alcohol, carboxylic acid, or mixture thereof from carbon dioxide and hydrogen is described. The apparatus comprises: a dielectric barrier discharge, DBD, device arranged to generate a plasma; and a passageway having an inlet for the carbon dioxide and the hydrogen and an outlet for the C1 to C5 alcohol, carboxylic acid, or mixture thereof and including therein a catalyst comprising nickel and/or cobalt and/or copper on a support. The passageway extends, at least in part, through the DBD device wherein, in use, the carbon dioxide is exposed to the catalyst in the presence of the hydrogen in the generated plasma, thereby forming the C1 to C5 alcohol, carboxylic acid, or mixture thereof from at least some of the carbon dioxide and the hydrogen. The DBD devices comprises a water electrode. A method and a catalyst are also described.

公开(公告)号：US20160045886A1

公开(公告)日：2016-02-18

申请号：US14778815

申请日：2014-02-26

申请人： WACKER CHEMIE AG

发明人： Heinz KRAUS ,  Andreas HEGEN ,  Christian KUTZA

IPC分类号： B01J19/00 ,  C23C16/24 ,  C01B33/035

CPC分类号： B01J19/0073 ,  B01J19/087 ,  B01J2219/0807 ,  B01J2219/0837 ,  B01J2219/0875 ,  C01B33/035 ,  C23C16/24 ,  H01J37/32477 ,  H01J37/32513 ,  Y02P20/149

摘要： Electrode support seals in a Siemens reactor for the deposition of polycrystalline silicon are protected against thermal stress and degradation, and shorting by falling fragments is prevented by shielding having a high resistivity and also a high thermal conductivity.

摘要翻译： 用于沉积多晶硅的西门子反应器中的电极支撑密封件被保护免受热应力和降解，并且通过具有高电阻率和高导热性的屏蔽防止由碎片产生的短路。