Positive-working photoresist composition for thick film formation
    2.
    发明授权
    Positive-working photoresist composition for thick film formation 有权
    用于厚膜形成的正性光致抗蚀剂组合物

    公开(公告)号:US09436084B2

    公开(公告)日:2016-09-06

    申请号:US11792752

    申请日:2006-03-22

    摘要: The invention provides a chemical-amplification positive-working photoresist composition suitable for forming a resist film of a relatively large thickness on a substrate in addition to other advantages. The inventive composition contains (A) a photoacid-generating agent, (B) an alkali-insoluble resin capable of being imparted with increased alkali-solubility by interaction with an acid, (C) an alkali-soluble resin and (D) an organic solvent, wherein the component (C) is (C1) a polyhydroxystyrene or a copolymer having at least 80% by mass of the hydroxystyrene units in an amount not exceeding 15 parts by mass relative to 100 parts by mass of the total amount of the components (B) and (C).

    摘要翻译: 本发明提供了除了其它优点之外,还适用于在基片上形成厚度相对较大的抗蚀剂膜的化学放大正性光致抗蚀剂组合物。 本发明的组合物含有(A)光致酸产生剂,(B)能够通过与酸相互作用而赋予碱溶性增加的碱不溶性树脂,(C)碱溶性树脂和(D)有机 溶剂,其中组分(C)为(C1)聚羟基苯乙烯或共聚物,相对于100质量份的组分的总量,相对于100质量份,羟基苯乙烯单元的至少80质量%的量不超过15质量份 (B)和(C)。

    Non Metal Tanning
    8.
    发明申请
    Non Metal Tanning 有权
    非金属鞣制

    公开(公告)号:US20130239340A1

    公开(公告)日:2013-09-19

    申请号:US13884778

    申请日:2011-10-25

    IPC分类号: C14C3/26 C14C3/28

    摘要: Tanned leather, skin or pelt is produced by non-metal tanning, comprising the step of tanning a bated hide, skin or pelt with a tanning agent (A), the tanning agent (A) being at least one compound of formula (I), wherein Hal signifies chlorine or fluorine, X signifies N or CR Y signifies hydrogen, C1-8-alkyl, C1-4-alkyl-carbonyl, C1-4-alkyl-sulphonyl or a radical of formula (Ia), or (Ib) —(—C2-3 alkylene-O—)q—H  (Ib) R signifies hydrogen or chlorine, q is 1 to 10 and M signifies hydrogen or an alkali metal cation or an ammonium cation, the ammonium cation being a protonated tertiary amine or a quaternary ammonium cation, in a tanning bath, the tanning bath having a pH of from 6 to 10 at the beginning of the tanning step.

    摘要翻译: 鞣制的皮革,皮肤或毛皮是通过非金属鞣制制成的,包括用鞣剂(A),鞣制剂(A)为至少一种式(I)化合物鞣制皮肤,皮肤或皮肤的步骤, 其中Hal表示氯或氟,X表示N或CRY表示氢,C1-8 - 烷基,C1-4 - 烷基 - 羰基,C1-4 - 烷基 - 磺酰基或式(Ia)的基团,或(Ib ) - ( - C2-3亚烷基-O-)qH(Ib)R表示氢或氯,q表示1〜10,M表示氢或碱金属阳离子或铵阳离子,铵阳离子为质子化叔胺或 在鞣制浴中,在鞣制步骤开始时,鞣制浴的pH为6至10。

    Positive-working photoresist composition for thick film formation
    9.
    发明申请
    Positive-working photoresist composition for thick film formation 有权
    用于厚膜形成的正性光致抗蚀剂组合物

    公开(公告)号:US20080026321A1

    公开(公告)日:2008-01-31

    申请号:US11792752

    申请日:2006-03-22

    申请人: Koichi Misumi

    发明人: Koichi Misumi

    IPC分类号: G03C1/00

    摘要: The invention provides a chemical-amplification positive-working photoresist composition suitable for forming a resist film of a relatively large thickness on a substrate in addition to other advantages. The inventive composition contains (A) a photoacid-generating agent, (B) an alkali-insoluble resin capable of being imparted with increased alkali-solubility by interaction with an acid, (C) an alkali-soluble resin and (D) an organic solvent, wherein the component (C) is (C1) a polyhydroxystyrene or a copolymer having at least 80% by mass of the hydroxystyrene units in an amount not exceeding 15 parts by mass relative to 100 parts by mass of the total amount of the components (B) and (C).

    摘要翻译: 本发明提供了除了其它优点之外,还适用于在基片上形成厚度相对较大的抗蚀剂膜的化学放大正性光致抗蚀剂组合物。 本发明的组合物含有(A)光致酸产生剂,(B)能够通过与酸相互作用而赋予碱溶性增加的碱不溶性树脂,(C)碱溶性树脂和(D)有机 溶剂,其中组分(C)为(C 1)多羟基苯乙烯或具有至少80质量%的羟基苯乙烯单元的共聚物,相对于100份,不超过15份 组分(B)和(C)的总量的质量。