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公开(公告)号：US5371257A
公开(公告)日：1994-12-06
申请号：US159964
申请日：1993-11-30
申请人： Robert Gedridge, Jr.
发明人： Robert Gedridge, Jr.
CPC分类号： C23C16/301 , C07F9/904
摘要： The new compound diisopropyl stibine is prepared by reacting an diisopropyl antimony halide with a hydride or deuteride transferring agent. The reaction is preferably carried out below about 0.degree. C., in an inert atmosphere, under darkened conditions. The diisopropyl stibine is used as a precursor in forming antimony-containing semiconductor material by chemical vapor deposition.
摘要翻译： 通过二异丙基卤化锑与氢化物或氘化物转移剂反应来制备新的化合物二异丙基苯乙烯。 反应优选在低于约0℃，在惰性气氛中，在暗条件下进行。 二异丙基苯乙烯用作通过化学气相沉积法形成含锑半导体材料的前体。
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公开(公告)号：US4377529A
公开(公告)日：1983-03-22
申请号：US209674
申请日：1980-11-24
申请人： David L. Beach , Harrison, James J.
发明人： David L. Beach , Harrison, James J.
IPC分类号： C07C2/26 , B01J25/00 , C07B61/00 , C07C1/00 , C07C11/04 , C07C67/00 , C07F9/535 , C07F9/54 , C07F9/70 , C07F9/72 , C07F9/74 , C07F9/90 , C07F9/92 , C07F15/04 , C07F9/50
摘要： There are provided novel sulfonated group Va ylides defined by the following Formula I: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are either alike or different members selected from the group consisting of hydrogen, alkyl radicals having from about one to about 24 carbon atoms, preferably from about one to about 10 carbon atoms; aryl radicals having from about six to about 20 carbon atoms, preferably from about six to about 10 carbon atoms; alkenyl radicals having from about two to about 30 carbon atoms, preferably from about two to about 20 carbon atoms; cycloalkyl radicals having from about three to about 40 carbon atoms, preferably from about three to about 30 carbon atoms; aralkyl and alkaryl radicals having from about six to about 40 carbon atoms, preferably from about six to about 30 carbon atoms; a halogen radical selected from the group consisting of fluorine, chlorine, bromine and iodine, preferably chlorine; a hydroxyl group; an alkoxy or aryloxy group; a hydrocarbyl group, such as defined above, carrying halogen, hydroxyl, alkoxy or aryloxy; and a sulfonato group (SO.sub.3.sup.-) or an alkyl, aryl, alkenyl, cycloalkyl, aralkyl or alkaryl group carrying a sulfonato group; M is sulfur or oxygen, preferably oxygen; F is phosphorus, arsenic or antimony, preferably phosphorus; and A is the cationic residue of a base selected from the group consisting of an alkali metal hydroxide, an alkyl or aryl lithium, an alkoxide and a hydrocarbyl-substituted ammonium hydroxide.The process for preparing these sulfonated ylides comprises sulfonating an ylide defined by the following Formula II: ##STR2## to obtain the sulfonated ylide defined by the following Formula III: ##STR3## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, F and M are as defined above. The sulfonated ylide is reacted with a base selected from the group consisting of an alkali metal hydroxide, an alkyl or aryl lithium, an alkoxide and a hydrocarbyl-substituted ammonium hydroxide to obtain the ylide defined by Formula I.
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公开(公告)号：US4293502A
公开(公告)日：1981-10-06
申请号：US179079
申请日：1980-08-18
申请人： David L. Beach , James J. Harrison
发明人： David L. Beach , James J. Harrison
IPC分类号： C07C2/32 , B01J31/00 , B01J31/18 , B01J31/22 , C07B61/00 , C07C1/00 , C07C2/36 , C07C11/02 , C07C67/00 , C07F9/535 , C07F9/54 , C07F9/72 , C07F9/74 , C07F9/90 , C07F9/92 , C07F15/04 , C08F110/02
CPC分类号： C07F9/5407 , B01J31/2247 , C07C2/36 , C07F15/04 , C07F15/045 , C07F9/5352 , C07F9/5442 , C07F9/723 , C07F9/743 , C07F9/904 , C07F9/92 , C08F110/02 , B01J2231/20 , B01J2531/847 , B01J2540/32 , B01J31/1895
摘要： A new group of nickel ylides is provided that is highly active at relatively low operating temperatures and pressures in the oligomerization of ethylene. The compounds can be defined by the following Formula I: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7 and R.sub.8 are either alike or different members selected from the group consisting of hydrogen, alkyl radicals having from about one to about 24 carbon atoms, preferably from about one to about 10 carbon atoms; aryl radicals having from about six to about 20 carbon atoms, preferably from about six to about 10 carbon atoms; alkenyl radicals having from about two to about 30 carbon atoms, preferably from about two to about 20 carbon atoms; cycloalkyl radicals having from about three to about 40 carbon atoms, preferably from about three to about 30 carbon atoms; aralkyl and alkaryl radicals having from about six to about 40 carbon atoms, preferably from about six to about 30 carbon atoms; a halogen radical selected from the group consisting of fluorine, chlorine, bromine and iodine, preferably chlorine; a hydroxyl group; an alkoxy or aryloxy group; and a hydrocarbyl group, such as defined above, carrying halogen, hydroxyl or alkoxy or aryloxy; provided that at least one, preferably from about one to about four, of each of R.sub.1 to R.sub.8 is a sulfonato group (--SO.sub.3.sup.-) or an alkyl, aryl, alkenyl, cycloalkyl, aralkyl or alkaryl group carrying a sulfonato group; M is sulfur or oxygen, preferably oxygen; E is phosphorus, arsenic, antimony or nitrogen, preferably phosphorus; and F is phosphorus, arsenic or antimony, preferably phosphorus.
摘要翻译： 提供了一组新的镍内鎓盐，其在乙烯低聚中的相对低的操作温度和压力下具有高活性。 化合物可以由下式I定义：其中R 1，R 2，R 3，R 4，R 5，R 6，R 7和R 8为相同或不同的选自氢，具有约一个 至约24个碳原子，优选约1至约10个碳原子; 具有约6至约20个碳原子，优选约6至约10个碳原子的芳基; 具有约2至约30个碳原子，优选约2至约20个碳原子的烯基; 具有约3至约40个碳原子，优选约3至约30个碳原子的环烷基; 具有约6至约40个碳原子，优选约6至约30个碳原子的芳烷基和烷芳基; 选自氟，氯，溴和碘的卤素，优选氯; 羟基; 烷氧基或芳氧基; 和如上所定义的含有卤素，羟基或烷氧基或芳氧基的烃基; 条件是R 1至R 8中的至少一个，优选约1至约4个为磺酸基（-SO 3 - ）或带有磺酸基的烷基，芳基，烯基，环烷基，芳烷基或烷芳基; M是硫或氧，优选氧; E是磷，砷，锑或氮，优选磷; F是磷，砷或锑，优选磷。
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公开(公告)号：US4611071A
公开(公告)日：1986-09-09
申请号：US701292
申请日：1985-02-13
申请人： Robert N. DePriest
发明人： Robert N. DePriest
摘要： Metal alkyls such as trimethyl arsine are made in improved yields by reacting a metal halide, e.g. AsCl.sub.3, with a Grignard reagent such as methyl magnesium bromide complexed with a polyether such as di(2-methoxyethyl)ether.
摘要翻译： 金属烷基如三甲基胂通过金属卤化物如 AsCl 3与Grignard试剂如甲基溴化镁与聚醚如二（2-甲氧基乙基）醚络合。
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公开(公告)号：US4394322A
公开(公告)日：1983-07-19
申请号：US210283
申请日：1980-11-25
申请人： David L. Beach , James J. Harrison
发明人： David L. Beach , James J. Harrison
IPC分类号： C08F4/00 , B01J27/00 , C07F9/535 , C07F9/54 , C07F9/70 , C07F9/72 , C07F9/74 , C07F9/90 , C07F9/92 , C07F15/04 , C08F4/42 , C07F9/50
摘要： There are provided novel Group VA ylides defined by the following Formula I: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are either alike or different members selected from the group consisting of hydrogen, alkyl radicals having from about one to about 24 carbon atoms, preferably from about one to about 10 carbon atoms; aryl radicals having from about six to about 20 carbon atoms, preferably from about six to about 10 carbon atoms; alkenyl radicals having from about two to about 30 carbon atoms, preferably from about two to about 20 carbon atoms; cycloalkyl radicals having from about three to about 40 carbon atoms, preferably from about three to about 30 carbon atoms; aralkyl and alkaryl radicals having from about six to about 40 carbon atoms, preferably from about six to about 30 carbon atoms; a halogen radical selected from the group consisting of fluorine, chlorine, bromine and iodine, preferably chlorine; a hydroxyl group; an alkoxy or aryloxy group; a hydrocarbyl group, such as defined above, carrying halogen, hydroxyl, alkoxy or aryloxy; and a sulfonato group (--SO.sub.3.sup.-) or an alkyl, aryl, alkenyl, cycloalkyl, aralkyl or alkaryl group carrying a sulfonato group; provided that at least one of R.sub.1, R.sub.2 and R.sub.3 is a sulfonato group or an alkyl, aryl, alkenyl, cycloalkyl, aralkyl or alkaryl, as defined above, carrying a sulfonato group; M is sulfur or oxygen, preferably oxygen; and F is phosphorus, arsenic or antimony, preferably phosphorus.The process for preparing these Group VA ylides comprises reacting a ligand defined by the following formula: ##STR2## with an alpha-substituted ketone or aldehyde or an alpha-substituted thioketone or thioaldehyde defined by the following formula: ##STR3## to obtain the salt defined by the following Formula II: ##STR4## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, F and M are as defined above and X is a halogen radical selected from the group consisting of fluorine, chlorine, bromine and iodine, preferably chlorine and bromine, a tosyl group (a toluene sulfonate group), or an acetate group. This salt is reacted with a base to obtain the novel ylide defined by Formula I.
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公开(公告)号：US4377528A
公开(公告)日：1983-03-22
申请号：US209673
申请日：1980-11-24
申请人： David L. Beach , James J. Harrison
发明人： David L. Beach , James J. Harrison
IPC分类号： C07C2/26 , B01J25/00 , C07B61/00 , C07C1/00 , C07C11/04 , C07C67/00 , C07F9/535 , C07F9/54 , C07F9/70 , C07F9/72 , C07F9/74 , C07F9/90 , C07F9/92 , C07F15/04 , C07F9/50
CPC分类号： C07F9/92 , C07F15/04 , C07F9/5352 , C07F9/5407 , C07F9/5442 , C07F9/723 , C07F9/743 , C07F9/904
摘要： There are provided novel salts defined by the following Formula I: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are either alike or different members selected from the group consisting of hydrogen, alkyl radicals having from about one to about 24 carbon atoms, preferably from about one to about 10 carbon atoms; aryl radicals having from about six to about 20 carbon atoms, preferably from about six to about 10 carbon atoms; alkenyl radicals having from about two to about 30 carbons atoms, preferably from about two to about 20 carbon atoms; cycloalkyl radicals having from about three to about 40 carbon atoms, preferably from about three to about 30 carbon atoms; aralkyl and alkaryl radicals having from about six to about 40 carbon atoms, preferably from about six to about 30 carbon atoms; a halogen radical selected from the group consisting of fluorine, chlorine, bromine and iodine, preferably chlorine; a hydroxyl group; an alkoxy or aryloxy group; a hydrocarbyl group, such as defined above, carrying halogen, hydroxyl, alkoxy or aryloxy; and a sulfonato group (--SO.sub.3.sup.-) or an alkyl, aryl, alkenyl, cycloalkyl, aralkyl or alkaryl group carrying a sulfonato group; provided that at least one of R.sub.1, R.sub.2 and R.sub.3 is a sulfonato group or an alkyl, aryl, alkenyl, cycloalkyl, aralkyl or alkaryl, as defined above, carrying a sulfonato group; M is sulfur or oxygen, preferably oxygen; F is phosphorus, arsenic or antimony, preferably phosphorus; and X is a halogen radical selected from the group consisting of fluorine, chlorine, bromine and iodine, preferably chlorine and bromine, a tosyl group (a toluene sulfonato group), or an acetate group.The process for preparing these salts comprises reacting a ligand defined by the following formula: ##STR2## with an alpha-substituted ketone or aldehyde or an alpha-substituted thioketone or thioaldehyde defined by the following formula: ##STR3## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, F, M and X are as defined above.
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7.发明授权Antimony/Lewis base adducts for Sb-ion implantation and formation of antimonide films 失效用于Sb离子注入和形成锑化物薄膜的锑/路易斯碱加合物
公开(公告)号：US6005127A
公开(公告)日：1999-12-21
申请号：US977507
申请日：1997-11-24
申请人： Michael A. Todd , Thomas H. Baum , Gautam Bhandari
发明人： Michael A. Todd , Thomas H. Baum , Gautam Bhandari
摘要： An antimony/Lewis base adduct of the formula SbR.sub.3.L, wherein each R is independently selected from C.sub.1 -C.sub.8 alkyl, C.sub.1 -C.sub.8 perfluoroalkyl, C.sub.1 -C.sub.8 haloalkyl, C.sub.6 -C.sub.10 aryl, C.sub.6 -C.sub.10 perfluoroaryl, C.sub.6 -C.sub.10 haloaryl, C.sub.6 -C.sub.10 cycloalkyl, substituted C.sub.6 -C.sub.10 aryl and halo; and L is a Lewis base ligand coordinating with SbR.sub.3. The adducts of the invention are useful as metal source compositions for chemical vapor deposition, assisted chemical vapor deposition (e.g., laser-assisted chemical vapor deposition, light-assisted chemical vapor deposition, plasma-assisted chemical vapor deposition and ion-assisted chemical vapor deposition), ion implantation, molecular beam epitaxy, and rapid thermal processing, to form antimony or antimony-containing films.
摘要翻译： 式SbR3.L的锑/路易斯碱加成物，其中每个R独立地选自C 1 -C 8烷基，C 1 -C 8全氟烷基，C 1 -C 8卤代烷基，C 6 -C 10芳基，C 6 -C 10全氟芳基，C 6 -C 10卤代芳基， C 6 -C 10环烷基，取代的C 6 -C 10芳基和卤素; L是与SbR 3配位的路易斯碱配位体。 本发明的加成物可用作化学气相沉积，辅助化学气相沉积（例如激光辅助化学气相沉积，光辅助化学气相沉积，等离子体辅助化学气相沉积和离子辅助化学气相沉积 ），离子注入，分子束外延和快速热处理，以形成含锑或锑的膜。
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公开(公告)号：US4529554A
公开(公告)日：1985-07-16
申请号：US179080
申请日：1980-08-18
申请人： David L. Beach , James J. Harrison
发明人： David L. Beach , James J. Harrison
IPC分类号： B01J31/00 , B01J31/18 , B01J31/22 , B01J31/24 , C07B61/00 , C07C2/36 , C07F9/535 , C07F9/72 , C07F9/74 , C07F9/90 , C07F9/92 , C07F15/04 , C08F110/02
CPC分类号： B01J31/226 , B01J31/2247 , B01J31/2404 , C07C2/36 , C07F15/04 , C07F9/5352 , C07F9/723 , C07F9/743 , C07F9/904 , C07F9/92 , C08F110/02 , B01J2231/20 , B01J2531/847 , B01J2540/32 , B01J31/1895
摘要： A process is provided for preparing nickel ylides which are themselves novel compounds defined by the following Formula I: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7 and R.sub.8 are either alike or different members selected from the group consisiting of hydrogen, alkyl radicals having from about one to about 24 carbon atoms, preferably from about one to about 10 carbon atoms; aryl radicals having from about six to about 20 carbon atoms, preferably from about six to about 10 carbon atoms; alkenyl radicals having from about two to about 30 carbon atoms, preferably from about two to about 20 carbon atoms; cycloalkyl radicals having from about three to about 40 carbon atoms, preferably from about three to about 30 carbon atoms; aralkyl and alkaryl radicals having from about six to about 40 carbon atoms, preferably from about six to about 30 carbon atoms; a halogen radical selected from the group consisting of fluorine, chlorine, bromine and iodine, preferably chlorine; a hydroxyl group; an alkoxy or aryloxy group; a hydrocarbyl group, such as defined above, carrying halogen, hydroxyl or alkoxy or aryloxy; and a sulfonato group (--SO.sub.3 .sup.-) or an alkyl, aryl, alkenyl, cycloalkyl, aralkyl or alkaryl group carrying a sulfonato group; provided that at least one of R.sub.1, R.sub.2 and R.sub.3 is a sulfonato group or an alkyl, aryl, alkenyl, cycloalkyl, aralkyl or alkaryl, as defined above, carrying a sulfonato group; M is sulfur or oxygen, preferably oxygen; E is phosphorus, arsenic, antimony or nitrogen, preferably phosphorus; and F is phosphorus, arsenic or antimony, preferably phosphorus. The process comprises reacting a ligand defined by the following formula: ##STR2## with an alpha-substituted ketone or aldehyde or an alpha-substituted thioketone or thioaldehyde defined by the following formula: ##STR3## to obtain the metal salt defined by the following Formula II: ##STR4## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.7, R.sub.8, F and M are as defined above and X is a halogen radical selected from the group consisting of fluorine, chlorine, bromine and iodine, preferably chlorine and bromine, a tosyl group (a tolune sulfonate group), or an acetate group. This metal salt is reacted with a base to obtain the novel ylide defined by the following Formula III: ##STR5## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.7, R.sub.8, F and M are as defined above. This ylide is then reacted with (1) a zero valent nickel compound or any nickel compound convertible to a zero valent nickel compound in situ and (2) a ligand having the formula: ##STR6## wherein R.sub.4, R.sub.5, R.sub.6 and E are as defined above.
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公开(公告)号：US4507247A
公开(公告)日：1985-03-26
申请号：US469897
申请日：1983-02-25
申请人： David L. Beach , James J. Harrison
发明人： David L. Beach , James J. Harrison
CPC分类号： C07F9/723 , C07F9/5352 , C07F9/743 , C07F9/904 , C07F9/92
摘要： There are provided novel sulfonated Group Va ylides defined by the following Formula I: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are either alike or different members selected from the group consisting of hydrogen, alkyl radicals having from about one to about 24 carbon atoms, preferably from about one to about 10 carbon atoms; aryl radicals having from about six to about 20 carbon atoms, preferably from about six to about 10 carbon atoms; alkenyl radicals having from about two to about 30 carbons atoms, preferably from about two to about 20 carbon atoms; cycloalkyl radicals having from about three to about 40 carbon atoms, preferably from about three to about 30 carbon atoms; aralkyl and alkaryl radicals having from about six to about 40 carbon atoms, preferably from about six to about 30 carbon atoms; a halogen radical selected from the group consisting of fluorine, chlorine, bromine and iodine, preferably chlorine; a hydroxyl group; an alkoxy or aryloxy group; a hydrocarbyl group, such as defined above, carrying halogen, hydroxyl, alkoxy or aryloxy; and a sulfonato group (SO.sub.3.sup.-) or an alkyl, aryl, alkenyl, cycloalkyl, aralkyl or alkaryl group carrying a sulfonato group; M is sulfur or oxygen, preferably oxygen; F is phosphorus, arsenic or antimony, preferably phosphorus; and A is the cationic residue of a base selected from the group consisting of an alkali metal hydroxide, an alkyl or aryl lithium, an alkoxide and a hydrocarbyl-substituted ammonium hydroxide.The process for preparing these sulfonated ylides comprises sulfonating an ylide defined by the following Formula II: ##STR2## to obtain the sulfonated ylide defined by the following Formula III: ##STR3## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, F and M are as defined above. The sulfonated ylide is reacted with a base selected from the group consisting of an alkali metal hydroxide, an alkyl or aryl lithium, an alkoxide and a hydrocarbyl-substituted ammonium hydroxide to obtain the ylide defined by Formula I.
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公开(公告)号：US3448127A
公开(公告)日：1969-06-03
申请号：US3448127D
申请日：1964-03-27
申请人： SIEMENS AG
发明人： DOTZER RICHARD
IPC分类号： C07C395/00 , C07F3/00 , C07F5/00 , C07F5/06 , C07F9/00 , C07F9/54 , C07F9/90 , C25C3/00 , C25D3/02 , C25D3/44 , C25D3/66 , H01G9/02 , H01G9/022 , H01G9/028
CPC分类号： H01G9/028 , C07C395/00 , C07F3/00 , C07F5/00 , C07F5/006 , C07F5/062 , C07F9/00 , C07F9/5456 , C07F9/90 , C07F9/904 , C07F9/908 , C25C3/00 , C25D3/02 , C25D3/44 , C25D3/66 , H01G9/022
摘要： Onium salts having a complex anion are prepared by the reaction of (a) an electron donor compound of formula R1kHlkY, (b) a electron acceptor compound of formula MR11nX1mn and (c) an organic compound RX, wherein R, R1 and R11 are alkyl or aryl groups, X is halogen, pseudohalogen or an acid residue, X1 is halogen or hydrogen, Y is N, P, As, Sb, Bi, S, Se or Te, M is Be, Zn, Cd, B, Al, In, Ga, Tl, Si, Ge, Pb or Sn, l and m are integers representing the capacities of Y and M respectively to combine with hydrogen, and k and n are 0 or an integer from 1 to l or m respectively. The reaction in its simplest form may be represented by:-D + A + RX --> [DR]+[AX]-wherein D represents the electron donor and A the electron acceptor, but compounds formed by the reaction of two molecules of acceptor with one each of donor and RX ar also disclosed. The reaction may be carried out by first forming a co-ordination compound between donor and acceptor and reacting this with RX, or an adduct or mixture may be formed from the acceptor and RX which is then reacted with the donor, or the donor and RX may be first mixed and then reacted with the acceptor. Trimethylammonium triethylchloroaluminate obtained by first passing triethylamine gas into triethylaluminium to form a 1 : 1 complex and passing methyl chloride into the product. By passing further methyl chloride there is obtained the complex Triethylpropylstibonium triethylbromoindanate is prepared by reacting methylantimony and triethylindium under an inert gas and adding N :propyl bromide to the product. Further examples are indicated by the equations:- The complex onium salts may be degraded by such methods as solvolysis with methanol or water, oxidative cleavage or displacement with a stronger complexing agent for the acceptor compound to give the simple onium salt (DR)+X- where D represents the donor compound. For example, tetraethylstibonium triethyl bromoaluminate in solution in dichloromethane is added to methanol, ethane is evolved and aluminium methoxide removed by decantation, and the residue worked up to yield tetraethylstibonium bromide.
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