Electron diffraction holography
    1.
    发明授权

    公开(公告)号:US11906450B2

    公开(公告)日:2024-02-20

    申请号:US17900863

    申请日:2022-08-31

    申请人: FEI Company

    摘要: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.

    Detection of one or more interstitial constituents in a polycrystalline diamond element using radiation
    2.
    发明授权
    Detection of one or more interstitial constituents in a polycrystalline diamond element using radiation 有权
    使用辐射检测多晶金刚石元件中的一个或多个间隙成分

    公开(公告)号:US09116094B1

    公开(公告)日:2015-08-25

    申请号:US14517547

    申请日:2014-10-17

    摘要: In an embodiment, a method of non-destructively testing a polycrystalline diamond (“PCD”) element includes providing a PCD element including a plurality of bonded diamond grains defining a plurality of interstitial regions, at least a portion of the plurality of interstitial regions including one or more interstitial constituents disposed therein. The method further includes exposing the PCD element to neutron radiation from a neutron radiation source, receiving a portion of the neutron radiation that passes through the PCD element, and determining at least one characteristic of the PCD element at least partially based on the portion of the neutron radiation received. For example, the at least one characteristic may be the presence and distribution of metal-solvent catalyst, residual metal-solvent catalyst, an infiltrant, residual infiltrant, or other interstitial constituents within a PCD element.

    摘要翻译: 在一个实施例中,一种非破坏性地测试多晶金刚石(“PCD”)元件的方法包括提供包括限定多个间隙区域的多个结合金刚石晶粒的PCD元件,所述多个间隙区域的至少一部分包括 设置在其中的一个或多个间质成分。 该方法还包括将PCD元件暴露于来自中子辐射源的中子辐射,接收穿过PCD元件的一部分中子辐射,以及至少部分地基于所述PCD元件的一部分来确定PCD元件的至少一个特性 收到中子辐射。 例如,至少一个特征可以是在PCD元件内金属溶剂催化剂,残余金属溶剂催化剂,浸润剂,残余浸润剂或其它间隙成分的存在和分布。

    Method and a device for determining the radiation-damage resistance of an optical material
    3.
    发明授权
    Method and a device for determining the radiation-damage resistance of an optical material 失效
    用于确定光学材料的辐射损伤电阻的方法和装置

    公开(公告)号:US06734970B2

    公开(公告)日:2004-05-11

    申请号:US10224391

    申请日:2002-08-21

    申请人: Hexin Wang

    发明人: Hexin Wang

    IPC分类号: G01B1100

    CPC分类号: G01N33/385 G01N33/386

    摘要: A method and a device for determining the resistance of an optical material to radiation damage, wherein several sample volumes (1a, 1b; 1211-1233) within the optical material are simultaneously irradiated with test radiation having differing, measured or preset radiant-energy densities. The radiation employed for all sample volumes comes from a common radiation source (3; 13) and at least one parameter indicative of the resistances to radiation damage of the irradiated sample volumes is measured using measuring radiation. The measuring radiation also comes from the same radiation source that supplies the test radiation and the material's resistance to radiation damage is determined based on a functional relation between its radiation-damage-resistance parameter and the radiant-energy densities, wherein that functional relation is determined using the values of the radiation-damage-resistance parameters measured for the various sample volumes for the various radiant-energy densities employed. Such a method and device have application, e.g., in determining the resistances of CaF2 and other optical materials to damage by ultraviolet laser radiation.

    摘要翻译: 一种用于确定光学材料对辐射损伤的电阻的方法和装置,其中光学材料内的几个样本体积(1a,1b; 1211-1233)同时用具有不同的,测量的或预设的辐射能量密度的测试辐射同时照射 。 用于所有样品体积的辐射源自共同的辐射源(3; 13),并且使用测量辐射来测量指示辐照样品体积的辐射损伤的电阻的至少一个参数。 测量辐射也来自提供测试辐射的相同的辐射源,并且基于其辐射损伤抗性参数和辐射能量密度之间的函数关系来确定材料对辐射损伤的抵抗力,其中该功能关系被确定 使用为各种样品体积测量的各种辐射能量密度测量的辐射损伤抗力参数的值。 这种方法和装置具有例如在确定CaF 2和其它光学材料对紫外激光辐射损坏的电阻的应用。

    ORIENTATION IMAGING USING WIDE ANGLE CONVERGENT BEAM DIFFRACTION IN TRANSMISSION ELECTRON MICROSCOPY
    5.
    发明申请
    ORIENTATION IMAGING USING WIDE ANGLE CONVERGENT BEAM DIFFRACTION IN TRANSMISSION ELECTRON MICROSCOPY 有权
    传输电子显微镜中使用角度变换光束衍射的方位成像

    公开(公告)号:US20120025073A1

    公开(公告)日:2012-02-02

    申请号:US13192443

    申请日:2011-07-27

    申请人: Vineet Kumar

    发明人: Vineet Kumar

    IPC分类号: G01N23/20

    摘要: Methods of orientation imaging microscopy (OIM) techniques generally performed using transition electron microscopy (TEM) for nanomaterials using dynamical theory is presented. Methods disclosed may use a wide angle convergent beam electron diffraction for performing OIM by generating a diffraction pattern having at least three diffraction discs that may provide additional information that is not available otherwise.

    摘要翻译: 介绍了使用动力学理论对纳米材料进行过渡电子显微镜(TEM)的定向成像显微镜(OIM)技术。 所公开的方法可以使用广角收敛束电子衍射来通过产生具有至少三个衍射盘的衍射图来执行OIM,所述衍射图可以提供另外不可用的附加信息。

    FREQUENCY CHARACTERIZATION OF QUARTZ CRYSTALS
    6.
    发明申请
    FREQUENCY CHARACTERIZATION OF QUARTZ CRYSTALS 有权
    QUARTZ晶体的频率特性

    公开(公告)号:US20050146244A1

    公开(公告)日:2005-07-07

    申请号:US10707723

    申请日:2004-01-07

    摘要: Techniques for determining a frequency profile of a quartz crystal in real time. Quartz crystals are subjected to a series of temperature cycles at various temperature rates and the crystal frequencies, crystal temperature parameters, and the temperature rates are monitored as the crystal is subjected to the temperature cycles. The monitored frequencies are grouped correlated with the monitored temperature parameters and temperature rates. A system for determining the frequency of a quartz crystal includes a processor adapted to perform the frequency profiling techniques.

    摘要翻译: 实时测定石英晶体频率分布的技术。 石英晶体在各种温度下进行一系列温度循环,并且晶体经受温度循环后,晶体频率,晶体温度参数和温度速率都被监测。 监测的频率与监测的温度参数和温度变化相关。 用于确定石英晶体的频率的系统包括适于执行频率分析技术的处理器。

    Method and a device for determining the radiation-damage resistance of an optical material
    7.
    发明申请
    Method and a device for determining the radiation-damage resistance of an optical material 失效
    用于确定光学材料的辐射损伤电阻的方法和装置

    公开(公告)号:US20030223065A1

    公开(公告)日:2003-12-04

    申请号:US10224391

    申请日:2002-08-21

    发明人: Hexin Wang

    IPC分类号: G01B011/00

    CPC分类号: G01N33/385 G01N33/386

    摘要: A method and a device for determining the resistance of an optical material to radiation damage, wherein several sample volumes (1a, 1b; 1211-1233) within the optical material are simultaneously irradiated with test radiation having differing, measured or preset radiant-energy densities. The radiation employed for all sample volumes comes from a common radiation source (3; 13) and at least one parameter indicative of the resistances to radiation damage of the irradiated sample volumes is measured using measuring radiation. The measuring radiation also comes from the same radiation source that supplies the test radiation and the material's resistance to radiation damage is determined based on a functional relation between its radiation-damage-resistance parameter and the radiant-energy densities, wherein that functional relation is determined using the values of the radiation-damage-resistance parameters measured for the various sample volumes for the various radiant-energy densities employed. Such a method and device have application, e.g., in determining the resistances of CaF2 and other optical materials to damage by ultraviolet laser radiation.

    摘要翻译: 一种用于确定光学材料对辐射损伤的电阻的方法和装置,其中光学材料内的几个样本体积(1a,1b; 1211-1233)同时用具有不同的,测量的或预设的辐射能量密度的测试辐射同时照射 。 用于所有样品体积的辐射源自共同的辐射源(3; 13),并且使用测量辐射来测量指示辐照样品体积的辐射损伤的电阻的至少一个参数。 测量辐射也来自提供测试辐射的相同的辐射源,并且基于其辐射损伤抗性参数和辐射能量密度之间的函数关系来确定材料对辐射损伤的抵抗力,其中该功能关系被确定 使用为各种样品体积测量的各种辐射能量密度测量的辐射损伤抗力参数的值。 这种方法和装置具有例如在确定CaF 2和其它光学材料对紫外激光辐射损坏的电阻的应用。

    Stress history measurement method and stress sensor

    公开(公告)号:US09835611B2

    公开(公告)日:2017-12-05

    申请号:US14893804

    申请日:2014-05-26

    摘要: It is an object to provide a stress history measurement method and a stress sensor by which the stress history of an object being measured can be measured easily with high accuracy over a wide stress measurement range. In the stress history measurement method, the stress history to which the object being measured has been subjected is measured on the basis of the ratio of twinned calcite particles after the object to be measured has been subjected to an external force, the object having a stress sensor embedded therein and capable of being deformed elastically when being subjected to the external force, the sensor including a number of calcite particles. The stress sensor is configured such that a number of calcite particles are hardened by a resin with adjacent particles kept in contact with each other.

    METHOD OF INSPECTING SAPPHIRE STRUCTURES AND METHOD OF FORMING THE SAME
    10.
    发明申请
    METHOD OF INSPECTING SAPPHIRE STRUCTURES AND METHOD OF FORMING THE SAME 有权
    检查SAPPHIRE结构的方法及其形成方法

    公开(公告)号:US20150226723A1

    公开(公告)日:2015-08-13

    申请号:US14175845

    申请日:2014-02-07

    申请人: APPLE INC.

    摘要: A method of inspecting and forming sapphire structures. The method of inspecting a sapphire structure may include may include providing an annealed sapphire structure, and measuring a profile of at least a portion of the annealed sapphire structure. The profile of at least the portion of the annealed sapphire structure may be measured using a non-x-ray based measuring device. Additionally, the method of inspecting may include identifying a defect within at least a portion of the measured profile of the annealed sapphire structure.

    摘要翻译: 检查和形成蓝宝石结构的方法。 检查蓝宝石结构的方法可以包括提供退火的蓝宝石结构,以及测量退火蓝宝石结构的至少一部分的轮廓。 可以使用非基于X射线的测量装置来测量退火蓝宝石结构的至少部分的轮廓。 另外,检查方法可以包括识别退火蓝宝石结构的测量轮廓的至少一部分内的缺陷。