公开(公告)号：US20130139967A1

公开(公告)日：2013-06-06

申请号：US13764420

申请日：2013-02-11

Applicant: NORDSON CORPORATION

Inventor： Thomas V. Bolden ,  Louis Fierro ,  James D. Getty

IPC: H01J15/02

CPC classification number: H01J15/02 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32568 ,  H01J37/32577

Abstract: Apparatus for treating products with plasma generated from a source gas. The apparatus includes a vacuum chamber, a plurality of juxtaposed electrodes arranged in adjacent pairs inside the vacuum chamber, and a plasma excitation source electrically coupled with the electrodes. The apparatus may include conductive members extending into the interior of each electrode to establish a respective electrical connection with the plasma excitation source. The apparatus may include a gas distribution manifold and multiple gas delivery tubes coupled with the gas distribution manifold. Each gas delivery tube has an injection port configured to inject the source gas between each adjacent pair of electrodes. The apparatus may further include flow restricting members that operate to partially obstruct a peripheral gap between each adjacent pair of electrodes, which restricts the escape of the source gas from the process chamber between each adjacent pair of electrodes.

公开(公告)号：US08372238B2

公开(公告)日：2013-02-12

申请号：US12123954

申请日：2008-05-20

Applicant: Thomas V. Bolden, II ,  Louis Fierro ,  James D. Getty

Inventor： Thomas V. Bolden, II ,  Louis Fierro ,  James D. Getty

IPC: H01L21/00 ,  C23C16/00

CPC classification number: H01J15/02 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32568 ,  H01J37/32577

Abstract: Apparatus for treating products with plasma generated from a source gas. The apparatus includes a vacuum chamber, a plurality of juxtaposed electrodes arranged in adjacent pairs inside the vacuum chamber, and a plasma excitation source electrically coupled with the electrodes. The apparatus may include conductive members extending into the interior of each electrode to establish a respective electrical connection with the plasma excitation source. The apparatus may include a gas distribution manifold and multiple gas delivery tubes coupled with the gas distribution manifold. Each gas delivery tube has an injection port configured to inject the source gas between each adjacent pair of electrodes. The apparatus may further include flow restricting members that operate to partially obstruct a peripheral gap between each adjacent pair of electrodes, which restricts the escape of the source gas from the process chamber between each adjacent pair of electrodes.

Abstract translation: 用于从源气体产生的等离子体处理产品的装置。 该装置包括真空室，在真空室内相邻布置的多个并置电极以及与电极电耦合的等离子体激发源。 该装置可以包括延伸到每个电极内部的导电构件，以与等离子体激发源建立相应的电连接。 该装置可以包括气体分配歧管和与气体分配歧管连接的多个气体输送管。 每个气体输送管具有被配置为在每个相邻的一对电极之间注入源气体的注入口。 该装置还可以包括流动限制构件，其操作以部分地阻塞每对相邻电极之间的周边间隙，其限制源气体从每个相邻的一对电极之间的处理室逸出。

公开(公告)号：US20240153739A1

公开(公告)日：2024-05-09

申请号：US17769664

申请日：2020-10-16

Applicant: US Electron, Inc.

Inventor： John Noonan ,  Dean Walters

IPC: H01J37/315 ,  B23K15/00 ,  B23K15/06 ,  H01J15/02 ,  H01J29/86 ,  H01J29/94

CPC classification number: H01J37/315 ,  B23K15/0026 ,  B23K15/06 ,  H01J15/02 ,  H01J29/865 ,  H01J29/94 ,  H01J2229/94 ,  H01J2237/049

Abstract: In an embodiment, a system is provided that includes an electron gun, a focusing system, and a housing. The electron gun can include a cold cathode electron source and an extraction electrode. The focusing system can be configured to focus a beam of electrons extracted from the electron gun to a focal region. The housing can include the electron gun and extend along a housing axis in the direction of the electron beam. The cold cathode source is configured to emit electrons at a first operating pressure that is higher than a second operating pressure at the focal region of the electron beam.

公开(公告)号：US08288950B2

公开(公告)日：2012-10-16

申请号：US12899012

申请日：2010-10-06

Applicant: Scott G. Walton ,  Christopher D. Cothran ,  Richard F. Fernsler ,  Robert A. Meger ,  William E. Amatucci

Inventor： Scott G. Walton ,  Christopher D. Cothran ,  Richard F. Fernsler ,  Robert A. Meger ,  William E. Amatucci

IPC: H05B31/26

CPC classification number: H01J3/025 ,  H01J15/02

Abstract: An apparatus and method for controlling electron flow within a plasma to produce a controlled electron beam is provided. A plasma is formed between a cathode and an acceleration anode. A control anode is connected to the plasma and to the acceleration anode via a switch. If the switch is open, the ions from the plasma flow to the cathode and plasma electrons flow to the acceleration anode. With the acceleration anode suitably transparent and negatively biased with a DC high voltage source, the electrons flowing from the plasma are accelerated to form an electron beam. If the switch is closed, the ions still flow to the cathode but the electrons flow to the control anode rather than the acceleration anode. Consequently, the electron beam is turned off, but the plasma is unaffected. By controlling the opening and closing of the switch, a controlled pulsed electron beam can be generated.

Abstract translation: 提供了一种用于控制等离子体内的电子流以产生受控电子束的装置和方法。 在阴极和加速度阳极之间形成等离子体。 控制阳极通过开关连接到等离子体和加速器阳极。 如果开关断开，来自等离子体的离子流向阴极，等离子体电子流向加速度阳极。 由于采用直流高电压源加速阳极适当地透明和负偏压，所以从等离子体流出的电子被加速以形成电子束。 如果开关闭合，离子仍然流到阴极，但电子流向控制阳极，而不是加速阳极。 因此，电子束被关闭，但是等离子体不受影响。 通过控制开关的打开和关闭，可以产生受控的脉冲电子束。

公开(公告)号：US20110080093A1

公开(公告)日：2011-04-07

申请号：US12899012

申请日：2010-10-06

Applicant: Scott G. Walton ,  Christopher D. Cothran ,  Richard F. Fernsler ,  Robert A. Meger ,  William E. Amatucci

Inventor： Scott G. Walton ,  Christopher D. Cothran ,  Richard F. Fernsler ,  Robert A. Meger ,  William E. Amatucci

IPC: H05B31/26

CPC classification number: H01J3/025 ,  H01J15/02

Abstract: An apparatus and method for controlling electron flow within a plasma to produce a controlled electron beam is provided. A plasma is formed between a cathode and an acceleration anode. A control anode is connected to the plasma and to the acceleration anode via a switch. If the switch is open, the ions from the plasma flow to the cathode and plasma electrons flow to the acceleration anode. With the acceleration anode suitably transparent and negatively biased with a DC high voltage source, the electrons flowing from the plasma are accelerated to form an electron beam. If the switch is closed, the ions still flow to the cathode but the electrons flow to the control anode rather than the acceleration anode. Consequently, the electron beam is turned off, but the plasma is unaffected. By controlling the opening and closing of the switch, a controlled pulsed electron beam can be generated.

Abstract translation: 提供了一种用于控制等离子体内的电子流以产生受控电子束的装置和方法。 在阴极和加速度阳极之间形成等离子体。 控制阳极通过开关连接到等离子体和加速器阳极。 如果开关断开，来自等离子体的离子流向阴极，等离子体电子流向加速度阳极。 由于采用直流高电压源加速阳极适当地透明和负偏压，所以从等离子体流出的电子被加速以形成电子束。 如果开关闭合，离子仍然流到阴极，但电子流向控制阳极，而不是加速阳极。 因此，电子束被关闭，但是等离子体不受影响。 通过控制开关的打开和关闭，可以产生受控的脉冲电子束。

公开(公告)号：US20090288773A1

公开(公告)日：2009-11-26

申请号：US12123954

申请日：2008-05-20

Applicant: Thomas V. Bolden, II ,  Louis Fierro ,  James D. Getty

Inventor： Thomas V. Bolden, II ,  Louis Fierro ,  James D. Getty

IPC: C23F1/08 ,  C23C14/22

CPC classification number: H01J15/02 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32568 ,  H01J37/32577

Abstract: Apparatus for treating products with plasma generated from a source gas. The apparatus includes a vacuum chamber, a plurality of juxtaposed electrodes arranged in adjacent pairs inside the vacuum chamber, and a plasma excitation source electrically coupled with the electrodes. The apparatus may include conductive members extending into the interior of each electrode to establish a respective electrical connection with the plasma excitation source. The apparatus may include a gas distribution manifold and multiple gas delivery tubes coupled with the gas distribution manifold. Each gas delivery tube has an injection port configured to inject the source gas between each adjacent pair of electrodes. The apparatus may further include flow restricting members that operate to partially obstruct a peripheral gap between each adjacent pair of electrodes, which restricts the escape of the source gas from the process chamber between each adjacent pair of electrodes.

Abstract translation: 用于从源气体产生的等离子体处理产品的装置。 该装置包括真空室，在真空室内相邻布置的多个并置电极以及与电极电耦合的等离子体激发源。 该装置可以包括延伸到每个电极内部的导电构件，以与等离子体激发源建立相应的电连接。 该装置可以包括气体分配歧管和与气体分配歧管连接的多个气体输送管。 每个气体输送管具有被配置为在每个相邻的一对电极之间注入源气体的注入口。 该装置还可以包括流动限制构件，其操作以部分地阻塞每对相邻的电极对之间的周边间隙，其限制源气体从每个相邻的一对电极之间的处理室逸出。