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1.发明授权Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes 有权具有密封处理室的多电极等离子体处理系统和与电极的内部总线电连接公开(公告)号：US08372238B2
公开(公告)日：2013-02-12
申请号：US12123954
申请日：2008-05-20
CPC分类号： H01J15/02 , H01J37/3244 , H01J37/32449 , H01J37/32568 , H01J37/32577
摘要： Apparatus for treating products with plasma generated from a source gas. The apparatus includes a vacuum chamber, a plurality of juxtaposed electrodes arranged in adjacent pairs inside the vacuum chamber, and a plasma excitation source electrically coupled with the electrodes. The apparatus may include conductive members extending into the interior of each electrode to establish a respective electrical connection with the plasma excitation source. The apparatus may include a gas distribution manifold and multiple gas delivery tubes coupled with the gas distribution manifold. Each gas delivery tube has an injection port configured to inject the source gas between each adjacent pair of electrodes. The apparatus may further include flow restricting members that operate to partially obstruct a peripheral gap between each adjacent pair of electrodes, which restricts the escape of the source gas from the process chamber between each adjacent pair of electrodes.
摘要翻译： 用于从源气体产生的等离子体处理产品的装置。 该装置包括真空室，在真空室内相邻布置的多个并置电极以及与电极电耦合的等离子体激发源。 该装置可以包括延伸到每个电极内部的导电构件，以与等离子体激发源建立相应的电连接。 该装置可以包括气体分配歧管和与气体分配歧管连接的多个气体输送管。 每个气体输送管具有被配置为在每个相邻的一对电极之间注入源气体的注入口。 该装置还可以包括流动限制构件，其操作以部分地阻塞每对相邻电极之间的周边间隙，其限制源气体从每个相邻的一对电极之间的处理室逸出。
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2.发明申请PLASMA TREATMENT SYSTEMS AND METHODS FOR UNIFORMLY DISTRIBUTING RADIOFREQUENCY POWER BETWEEN MULTIPLE ELECTRODES 有权等离子体处理系统和均匀分布多个电极之间的射频功率的方法公开(公告)号：US20120279658A1
公开(公告)日：2012-11-08
申请号：US13100605
申请日：2011-05-04
IPC分类号： C23F1/08 , H05H7/02 , C23C16/505 , B08B13/00 , C23C16/50
CPC分类号： H01J37/32082 , H01J37/32174 , H01J37/32532 , H01J37/32568 , H01J37/32577
摘要： Plasma treatment systems and methods for distributing RF energy to electrodes in a plasma treatment system. The plasma treatment system includes power and ground busses, positive and negative phase primary electrode busses, and positive and negative phase secondary electrode busses. The power and ground busses are coupled to the secondary electrode busses by isolation transformers so that the negative phase secondary electrode buss is provided with an RF signal that is 180 degrees out of phase with the RF signal supplied to the positive phase secondary electrode buss. The secondary electrode busses are coupled to respective positive and negative phase primary electrode busses by capacitors. The primary electrode busses are each coupled to electrodes in the vacuum chamber. Load coils coupling the primary electrode busses to an RF ground may cooperative with the capacitors to adjust the input impedance at the power buss.
摘要翻译： 用于在等离子体处理系统中将RF能量分配到电极的等离子体处理系统和方法。 等离子体处理系统包括电源和接地总线，正负相母线总线以及正负相辅助电机总线。 功率和接地总线通过隔离变压器耦合到次级电池总线，使得负相位二次电池总线上提供与提供给正相二次电极母线的RF信号相差180度的RF信号。 二次电极总线通过电容器耦合到相应的正相和主相母线总线。 主电极总线各自耦合到真空室中的电极。 将主电极母线耦合到RF地的负载线圈可以与电容器协调以调节功率总线处的输入阻抗。
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3.发明授权Plasma treatment systems and methods for uniformly distributing radiofrequency power between multiple electrodes 有权用于在多个电极之间均匀分布射频功率的等离子体处理系统和方法公开(公告)号：US08333166B2
公开(公告)日：2012-12-18
申请号：US13100605
申请日：2011-05-04
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H01J7/24 , H05B31/26
CPC分类号： H01J37/32082 , H01J37/32174 , H01J37/32532 , H01J37/32568 , H01J37/32577
摘要： Plasma treatment systems and methods for distributing RF energy to electrodes in a plasma treatment system. The plasma treatment system includes power and ground busses, positive and negative phase primary electrode busses, and positive and negative phase secondary electrode busses. The power and ground busses are coupled to the secondary electrode busses by isolation transformers so that the negative phase secondary electrode buss is provided with an RF signal that is 180 degrees out of phase with the RF signal supplied to the positive phase secondary electrode buss. The secondary electrode busses are coupled to respective positive and negative phase primary electrode busses by capacitors. The primary electrode busses are each coupled to electrodes in the vacuum chamber. Load coils coupling the primary electrode busses to an RF ground may cooperative with the capacitors to adjust the input impedance at the power buss.
摘要翻译： 用于在等离子体处理系统中将RF能量分配到电极的等离子体处理系统和方法。 等离子体处理系统包括电源和接地总线，正负相母线总线以及正负相辅助电机总线。 功率和接地总线通过隔离变压器耦合到次级电池总线，使得负相位二次电池总线上提供与提供给正相二次电极母线的RF信号相差180度的RF信号。 二次电极总线通过电容器耦合到相应的正相和主相母线总线。 主电极总线各自耦合到真空室中的电极。 将主电极母线耦合到RF地的负载线圈可以与电容器协调以调节功率总线处的输入阻抗。
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4.发明申请公开(公告)号：US20090288773A1
公开(公告)日：2009-11-26
申请号：US12123954
申请日：2008-05-20
CPC分类号： H01J15/02 , H01J37/3244 , H01J37/32449 , H01J37/32568 , H01J37/32577
摘要： Apparatus for treating products with plasma generated from a source gas. The apparatus includes a vacuum chamber, a plurality of juxtaposed electrodes arranged in adjacent pairs inside the vacuum chamber, and a plasma excitation source electrically coupled with the electrodes. The apparatus may include conductive members extending into the interior of each electrode to establish a respective electrical connection with the plasma excitation source. The apparatus may include a gas distribution manifold and multiple gas delivery tubes coupled with the gas distribution manifold. Each gas delivery tube has an injection port configured to inject the source gas between each adjacent pair of electrodes. The apparatus may further include flow restricting members that operate to partially obstruct a peripheral gap between each adjacent pair of electrodes, which restricts the escape of the source gas from the process chamber between each adjacent pair of electrodes.
摘要翻译： 用于从源气体产生的等离子体处理产品的装置。 该装置包括真空室，在真空室内相邻布置的多个并置电极以及与电极电耦合的等离子体激发源。 该装置可以包括延伸到每个电极内部的导电构件，以与等离子体激发源建立相应的电连接。 该装置可以包括气体分配歧管和与气体分配歧管连接的多个气体输送管。 每个气体输送管具有被配置为在每个相邻的一对电极之间注入源气体的注入口。 该装置还可以包括流动限制构件，其操作以部分地阻塞每对相邻的电极对之间的周边间隙，其限制源气体从每个相邻的一对电极之间的处理室逸出。
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5.发明授权公开(公告)号：US08226795B2
公开(公告)日：2012-07-24
申请号：US12364888
申请日：2009-02-03
申请人： William J. Brass , Louis Fierro , James D. Getty
发明人： William J. Brass , Louis Fierro , James D. Getty
IPC分类号： H01F7/20
CPC分类号： H01F7/0252 , H01J37/20 , H01J2237/2007 , H01L21/68728 , H01L21/68771 , H01L21/68778
摘要： Magnetic clips for use with a substrate holder for holding a substrate in a processing chamber of a plasma treatment system. The clip includes first and second body members each having a clamping surface and a magnet. The first body member is configured to be mechanically connected with the substrate holder. The second body member is pivotally connected by a hinge with the first body member for movement relative to the first body member between closed and opened positions. In the closed position, an edge region of the substrate is positioned between the clamping surfaces. In the opened position, the edge region is released. The magnet on the second body member magnetically attracts the magnet on the first body member, when the second body member is in the closed position, to apply a force that restrains movement of the edge region of the substrate relative to the clamping surfaces.
摘要翻译： 用于将衬底保持在等离子体处理系统的处理室中的衬底保持器使用的磁性夹具。 夹具包括每个具有夹紧表面和磁体的第一和第二主体构件。 第一本体构件被构造成与衬底保持器机械连接。 第二主体构件通过铰链枢转地连接有第一主体构件，用于相对于第一主体构件在关闭位置和打开位置之间移动。 在关闭位置，衬底的边缘区域位于夹紧表面之间。 在打开位置，边缘区域被释放。 当第二主体构件处于关闭位置时，第二主体构件上的磁体磁吸引第一主体构件上的磁体，以施加限制基板的边缘区域相对于夹紧表面的移动的力。
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6.发明申请公开(公告)号：US20100194505A1
公开(公告)日：2010-08-05
申请号：US12364888
申请日：2009-02-03
申请人： William J. Brass , Louis Fierro , James D. Getty
发明人： William J. Brass , Louis Fierro , James D. Getty
IPC分类号： H01F7/20
CPC分类号： H01F7/0252 , H01J37/20 , H01J2237/2007 , H01L21/68728 , H01L21/68771 , H01L21/68778
摘要： Magnetic clips for use with a substrate holder for holding a substrate in a processing chamber of a plasma treatment system. The clip includes first and second body members each having a clamping surface and a magnet. The first body member is configured to be mechanically connected with the substrate holder. The second body member is pivotally connected by a hinge with the first body member for movement relative to the first body member between closed and opened positions. In the closed position, an edge region of the substrate is positioned between the clamping surfaces. In the opened position, the edge region is released. The magnet on the second body member magnetically attracts the magnet on the first body member, when the second body member is in the closed position, to apply a force that restrains movement of the edge region of the substrate relative to the clamping surfaces.
摘要翻译： 用于将衬底保持在等离子体处理系统的处理室中的衬底保持器使用的磁性夹具。 夹具包括每个具有夹紧表面和磁体的第一和第二主体构件。 第一本体构件被构造成与衬底保持器机械连接。 第二主体构件通过铰链枢转地连接有第一主体构件，用于相对于第一主体构件在关闭位置和打开位置之间移动。 在关闭位置，衬底的边缘区域位于夹紧表面之间。 在打开位置，边缘区域被释放。 当第二主体构件处于关闭位置时，第二主体构件上的磁体磁吸引第一主体构件上的磁体，以施加限制基板的边缘区域相对于夹紧表面的移动的力。
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公开(公告)号：US20060163201A1
公开(公告)日：2006-07-27
申请号：US11278483
申请日：2006-04-03
申请人： James Getty , Louis Fierro
发明人： James Getty , Louis Fierro
CPC分类号： H01J37/32541 , H01J37/32009 , H01J37/32082 , H01J37/32568 , H05H1/46 , H05H2001/466 , H05K3/26 , H05K2203/095
摘要： A plasma treatment system for treating multiple substrates with a plasma. The treatment chamber of the plasma treatment system includes at least one pair of electrodes, typically vertically oriented, between which a substrate is positioned for plasma treatment. Each electrode includes a perforated panel that permits horizontal process gas and plasma flow, which improves plasma uniformity. A process recipe is defined that is effective for removing thin polymer areas, such as flash or chad, attached to and projecting from a polymer substrate.
摘要翻译： 一种用等离子体处理多个基板的等离子体处理系统。 等离子体处理系统的处理室包括至少一对电极，通常垂直取向，在其间定位用于等离子体处理的基板。 每个电极包括允许水平处理气体和等离子体流动的穿孔板，这改善了等离子体均匀性。 定义了一种方法配方，用于去除附着到聚合物基材上并从聚合物基底突出的薄聚合物区域，如闪光或乍得。
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