Method of forming a primary, wet-to-wet resin bond between at least two
laminates, and a product by the process thereof
    1.
    发明授权
    Method of forming a primary, wet-to-wet resin bond between at least two laminates, and a product by the process thereof 失效
    在至少两个层压体之间形成主要的湿湿树脂粘合剂的方法,以及通过其工艺制造产品的方法

    公开(公告)号:US5554667A

    公开(公告)日:1996-09-10

    申请号:US457843

    申请日:1995-06-01

    IPC分类号: C08F2/46 C08F291/00

    摘要: The instant invention provides a method of forming a structure which includes at least two laminates each having a minor area of common overlap therebetween and a major area wherein said panels are not overlapped, which comprises the step of forming a primary, wet-to-wet resin bond between said minor areas of common overlap. The invention also contemplates at least one article of manufacture produced by the method.

    摘要翻译: 本发明提供了一种形成结构的方法,该结构包括至少两个层压板,每个层压板之间具有相同的共同重叠区域,其中所述板材不重叠的主要区域,其包括形成初级的,湿润的 所述小区域之间的树脂粘结共同重叠。 本发明还考虑了通过该方法生产的至少一个制品。

    Methods employing magnetic fields for controlling emulsion polymerization
    2.
    发明授权
    Methods employing magnetic fields for controlling emulsion polymerization 失效
    采用磁场控制乳液聚合的方法

    公开(公告)号:US4448657A

    公开(公告)日:1984-05-15

    申请号:US314664

    申请日:1981-10-23

    申请人: Nicholas J. Turro

    发明人: Nicholas J. Turro

    IPC分类号: C08F2/22 C08F2/48 C08F2/50

    CPC分类号: C08F2/48 C08F2/22 Y10S522/91

    摘要: Emulsion polymerization with initiators that produce triplet radical pairs is controlled by the application of a magnetic field. Both the rate of polymerization and the molecular weight of the polymer can be controlled. Emulsion polymerization with oil-soluble initiators is enabled to proceed to high conversions at convenient rates and to produce polymers having molecular weights comparable to or higher than those achievable with conventional water-soluble initiators.

    摘要翻译: 通过施加磁场来控制产生三线态对的引发剂的乳液聚合。 可以控制聚合物的聚合速率和分子量。 具有油溶性引发剂的乳液聚合使得能够以合适的速率进行高转化并产生具有与常规水溶性引发剂可达到的分子量相当或更高的分子量的聚合物。

    Process for hardening photohardenable images
    4.
    发明授权
    Process for hardening photohardenable images 失效
    用于硬化图像的方法

    公开(公告)号:US3723120A

    公开(公告)日:1973-03-27

    申请号:US3723120D

    申请日:1971-08-30

    申请人: DU PONT

    发明人: HUMMEL K

    IPC分类号: B29C67/00 G03F7/20 G03C5/14

    摘要: Photographic images comprising photopolymerizable material on a base support are posthardened by immersing said images in a liquid medium that transmits actinic radiation and which is inert with respect to the photopolymerizable material, and exposing them to an intense source of actinic radiation for a short period.

    摘要翻译: 通过将所述图像浸渍在透射光化辐射的液体介质中并且相对于光聚合材料是惰性的,并且将它们暴露于强烈的光化辐射源的短时间段,将包含基底载体上的可光聚合材料的照相图像后固化。

    SPATIALLY CONTROLLED, IN SITU SYNTHESIS OF POLYMERS
    7.
    发明申请
    SPATIALLY CONTROLLED, IN SITU SYNTHESIS OF POLYMERS 失效
    空间控制,聚合物的合成

    公开(公告)号:US20050043428A1

    公开(公告)日:2005-02-24

    申请号:US10458344

    申请日:2003-06-10

    IPC分类号: C08F2/46 C08G2/00

    CPC分类号: C08F2/46 Y10S522/91

    摘要: An in situ polymer microstructure formation method. The monomer mixture is polymerized in a solvent/precipitant through exposure to ionizing radiation in the absence any chemical mediators. If an exposure mask is employed to block out certain regions of the radiation cross section, then a patterned microstructure is formed. The polymerization mechanism is based on the so-called free-radical retrograde-precipitation polymerization process, in which polymerization occurs while the system is phase separating above the lower critical solution temperature. This method was extended to produce a crosslinked line grid-pattern of poly (N-isopropylacrylamide), which has been known to have thermoreversible properties.

    摘要翻译: 原位聚合物微观结构形成方法。 在没有任何化学介质的情况下,通过暴露于电离辐射,单体混合物在溶剂/沉淀剂中聚合。 如果使用曝光掩模来阻挡辐射截面的某些区域,则形成图案化的微结构。 聚合机理基于所谓的自由基逆行沉淀聚合方法,其中在系统在较低临界溶解温度以上分相时发生聚合。 该方法被扩展以产生已知具有热可逆性质的聚(N-异丙基丙烯酰胺)的交联线栅格图案。

    Photosensitive element containing UV sensitive terpolymers
    9.
    发明授权
    Photosensitive element containing UV sensitive terpolymers 失效
    含有紫外线敏感三元共聚物的感光元件

    公开(公告)号:US4382120A

    公开(公告)日:1983-05-03

    申请号:US347483

    申请日:1982-02-10

    IPC分类号: G03F7/039 G03C1/68

    CPC分类号: G03F7/039 Y10S522/91

    摘要: A photolithographic resist with excellent sensitivity for actinic radiation in the short wavelength ultraviolet region is produced from terpolymers of (1) methyl methacrylate, (2) materials such as 3-oximino-2-butanone methacrylate, and (3) compounds such as methacrylonitrile.

    摘要翻译: 由(1)甲基丙烯酸甲酯,(2)诸如3-肟基-2-丁酮甲基丙烯酸酯的材料和(3)化合物如甲基丙烯腈的三元共聚物制备了在短波长紫外区域中具有优异的光化辐射灵敏度的光刻抗蚀剂。